Abstract: Provided is an electron microscope with which a sample can be observed stably and with high accuracy. The electron microscope comprises: a sample stage; an electron optical system that scans an electron beam over a sample; a vacuum system that maintains the sample stage and the electron optical system in a vacuum; a secondary electron detector that detects secondary electrons emitted from the sample; transmitted electron detectors that detect transmitted electrons that have transmitted through the sample; and a control device that obtains a secondary electron image and a transmitted electron image on the basis of the secondary electrons and the transmitted electrons detected by the secondary electron detector and the transmitted electron detectors and stores the secondary electron image and the transmitted electron image. The sample stage is provided with cooling means for cooling the sample.

Abstract: Provided is an automatic analysis device capable of reducing a reagent cost. In the present invention, in each mixed reagent preparation cycle, an amount of mixed reagent for N analyses is mixed and prepared, and an amount of mixed reagent for one analysis is dispensed from the amount of mixed reagent for N analyses and used to analyze one sample. Minimum (Nmin) and maximum (Nmax) values for N are determined for a control unit beforehand, and if the analysis of J samples is requested, the control unit sets the value of N at the time of a mixed reagent preparation cycle within a range from Nmin to Nmax so as to minimize the remaining mixed reagent.

Abstract: A first rod electrode set has a first center axis, into which ions and air current are introduced. A second rod electrode set has a second center axis at a distance from the first center axis, from which the ions are discharged. A power supply applies voltages to the first rod electrode set and the second rod electrode set. The first rod electrode set and the second rod electrode set have a region where the sets overlap each other in the longitudinal direction, and form a single multipole ion guide by being combined to each other in the region. Different offset DC voltages are applied to the first rod electrode set and the second rod electrode set, respectively, and a DC potential for moving the ions to the second rod electrode set in the region is formed, the ions having been guided by the first rod electrode set.

Abstract: Provided are an imaging method and device for imaging using far infrared light that make it possible to quickly image a subject without producing damage or a non-linear phenomenon in the subject. A variable-frequency coherent light source is used, illumination light from the light source is irradiated onto a linear area on an imaging subject, transmitted or reflected light is used to form an image of the imaging subject, a non-linear optical crystal is used for wavelength conversion, and a one-dimensional or two-dimensional array sensor is used to image the imaging subject while the imaging subject is moved in at least one direction.

Abstract: There is provided a technique for automatically determining or predicting a line range specific to a sample that appears in a reaction curve in an automated analyzer for mixing a specimen and a reagent and measuring a change in a mixture of the specimen and the reagent with time. This invention approximates reaction curve data by a function and automatically determines a curve part at an early stage or a second stage of a reaction. The invention determines a line range not including a curve part for each sample and calculates a laboratory test value using absorbance data within the determined line range. This invention also automatically determines a start time of line at the early stage of the reaction on the basis of absorbance data obtained up to a point halfway through the reaction curve, predicts a line range on the basis of the end time of line and a planned end time of line, and calculates a predictive value on the basis of a result of the prediction.

Abstract: The purpose of the present invention is to provide an image forming device and the like that is capable of forming a proper integrated signal even when an image or a signal waveform is acquired from a pattern having the possibility of preventing proper matching, such as a repetition pattern, a shrinking pattern, and the like. In order to achieve the purpose, there is proposed an image forming device that forms an integrated image by integrating a plurality of image signals and that is provided with: a matching processing section that performs a matching process between the plurality of image signals; an image integration section that integrates the plurality of image signals for which positioning has been performed by the matching processing section; and a periodicity determination section that determines a periodicity of a pattern contained in the image signals.

Abstract: The objective of the present invention is to provide a charged particle beam device for setting, from an image of a trench-like groove or a pit, device conditions for finding a hole or the like provided in the trench or the pit, or measuring a hole or the like provided inside the trench or the like with high accuracy. In the present invention, a charged particle beam device comprises: a deflector for causing a charged particle beam emitted from a charged particle source to perform a scan; a detector for detecting a charged particle obtained on the basis of the scanning of the charged particle beam; and a computation processing device for generating an image on the basis of the output of the detector.

Abstract: A base sequence determination apparatus includes (1) a mobility correction unit that outputs a mobility correction signal obtained by mobility correction of a time-series signal of a wavelength spectrum corresponding to each base, (2) a deconvolution unit that executes processes for calculating a deconvoluted signal of the mobility correction signal respectively for a plurality of parameter candidates of point spread function, calculating variance of peak intervals for the calculated deconvoluted signal, specifying a parameter of the point spread function using the calculated variance, and outputting the deconvoluted signal corresponding to the point spread function having the specified parameter as an updated deconvoluted signal, (3) a peak extracting unit that extracts a peak waveform from the updated deconvoluted signal and outputs an updated peak-extracted signal, and (4) a sequence specifying unit that inputs the updated peak-extracted signal and determines a base sequence.

Abstract: The purpose of the present invention is to provide a pattern measurement condition setting device which appropriately sets a measurement condition for finding out an appropriate exposure condition.

Abstract: An object of the present invention is to provide an ion milling apparatus capable of processing deposits attached to an ion gun and an ion milling method capable of processing deposits attached to an ion gun. The ion milling apparatus includes gas injection means for injecting a gas toward the ion gun, and the gas injection means included in the ion milling apparatus moves the deposits attached to the ion gun by injecting the gas toward the inside of the ion gun.

Abstract: According to the present invention, a dry-etching method for performing plasma etching in a vertical profile while maintaining selectivity relative to a mask, includes: a first process of etching a film to be etched with use of reactive gas to cause an etching profile of the film to be etched to be formed in a footing profile; and a second process of, after the first process, causing the footing profile to be formed in a vertical profile by means of sputtering etching.

Abstract: A plasma processing apparatus includes a processing chamber to be depressurized in a vacuum vessel with a sidewall made of a transparent or translucent dielectric material, a stage in the processing chamber to mount a wafer thereon, a coil disposed around an outer side of the sidewall and supplied with radio-frequency power for forming plasma above the stage in the processing chamber, a lamp disposed above the coil outside the vacuum vessel which radiates light onto the wafer, and a reflector disposed the coil and reflecting light to irradiate an inside of the processing chamber.

Abstract: An automatic analyzing apparatus capable of eliminating static electricity charged in a specimen container at a specimen dispensing position provided. The automatic analyzing apparatus includes a dispensing mechanism having a probe that aspirates a liquid and an arm that holds the probe, and a static eliminator having a generation source of neutralizing ions and a neutralizing ion blowing mechanism for blowing the neutralizing ions generated in the generation source to a target, which are provided in the dispensing mechanism.

Abstract: In a plasma processing apparatus including a first radio-frequency power supply which supplies first radio-frequency power for generating plasma in a vacuum chamber, a second radio-frequency power supply which supplies second radio-frequency power to a sample stage on which a sample is mounted, and a matching box for the second radio-frequency power supply, the matching box samples information for performing matching during a sampling effective period which is from a point of time after elapse of a prescribed time from a beginning of on-state of the time-modulated second radio-frequency power until an and of the on-state and maintains a matching state attained during the sampling effective period from after the end of the on-state until a next sampling effective period.

Abstract: In a side entry type sample holder, vibrations in the radial direction of the sample holder provoke a resolving power decrease in the measurement results. In the present invention, the side entry type sample holder has a stepped portion in the radial direction of an axial portion. The sample stage has a support part contacting the stepped portion in a cylindrical portion capable of moving as one body in the axis direction of the sample holder, and, through the contact between the stepped portion and the support part, a frictional force is generated, opposing the radial direction of the axial portion in the sample holder. In this manner, the vibrations in the radial direction of the sample holder are suppressed, and the resolving power decrease in the measurement results is suppressed.

Abstract: The computational cost for a mapping process performed in analyzing genome/exome/transcriptome is reduced by sorting all cyclic permutations or suffixes of all read sequences to allow a search to be performed on the basis of any base sequence as a key. Also performed is computing and storing, for each base position in a genome sequence, the minimum length for uniqueness (MLU) at which a partial sequence starting from the base position becomes unique in the genome. In analysis of variations, a target region is scanned to inspect the number of matching read sequences that contain a partial sequence with a length of MLU and thus estimate the position of a variation, and then, the read sequences are collected at a position where the possibility of a variation having occurred is high to perform comparison analysis of the sequences.

Abstract: The objective of the present invention is to provide a charged particle detector and a charged particle beam device with which it is possible to acquire a high luminous output while rapidly eliminating charged particles that are incident to a scintillator. In order to achieve said objective the present invention proposes: a charged particle detector provided with a light-emitting unit including a laminated structure obtained by laminating a GaInN-containing layer and a GaN layer, and provided with a conductive layer that is in contact with the GaInN-containing layer on the charged particle incidence surface side of the laminated structure; and a charged particle beam device.

Abstract: A plasma processing method includes forming a deposition film containing silicon as a component in a processing chamber by generating a first plasma in the processing chamber; plasma etching of a sample in which a film containing a metal is formed in the processing chamber; and removing of a metal-based reaction product by generating a second plasma including an element having reducibility and halogen. The plasma processing method further includes removing the deposition film by a third plasma generated by using gas containing a fluorine element; and removing residual gas by a fourth plasma.