Abstract: It is an object of the present invention to provide a semiconductor inspection apparatus capable of well carrying out position alignment and correctly determining whether the position alignment has been carried out successfully or has ended in a failure without operator interventions even if an inspected image is an image having few characteristics as is the case with a repetitive pattern or the inspected image is an image having a complicated shape.

Abstract: A charged particle beam apparatus includes: an optical system that irradiates a sample mounted on a sample stage with a charged particle beam; at least one detector that detects a signal generated from the sample; an imaging device that acquires an observation image; a mechanism for changing observation positions in the sample which has at least one of a stage that moves the sample stage and a deflector that changes the charged particle beam's irradiation position; a display unit that displays an operation screen provided with an observation image displaying portion that displays the observation image and an observation position displaying portion that displays an observation position of the observation image; and a controller that controls display processing of the operation screen. The controller superimposes and displays on the observation position displaying portion a plurality of observation position images at different magnifications, based on the observation images' magnifications and coordinates.

Abstract: Provided is an automatic analysis device that enables a reagent to be reliably loaded in and loaded out within a stipulated amount of time, even during analysis and without stopping the analysis, and that enables a reagent to be exchanged without causing a long wait for the operator.

Abstract: A charged particle beam device capable of removing a foreign matter adhered to an electric field-correcting electrode arranged in an outer peripheral portion of a measurement sample is provided. The invention is directed to a charged particle beam device including a sample stage provided with the measurement sample and an electric field-correcting electrode correcting an electric field in the vicinity of the outer peripheral portion of the measurement sample and in which the measurement sample is measured by being irradiated with a charged particle beam, wherein a foreign-matter removal control unit controls a power source connected to the electric field-correcting electrode such that an absolute value of a voltage to be applied to the electric field-correcting electrode is equal to or more than an absolute value of a voltage to be applied to the electric field-correcting electrode when the measurement sample is measured.

Abstract: An electrochemiluminescence method of detecting an analyte in a liquid sample and a corresponding analysis system. An analyte in a liquid sample is detected by first providing a receptacle containing a fluid comprising protein coated magnetic microparticles to a stirring unit. Stirring of the fluid is necessary since the density of the microparticles is usually higher than the density of the buffer fluid. Thus the microparticles tend to deposit on the bottom of the receptacle leading to an aggregation of the microparticles because of weak interactions. To obtain representative measurements a homogeneous distribution of the microparticles in the buffer fluid is necessary to ensure a constant concentration of microparticles for each analysis cycle. It is further necessary to provide disaggregation of the microparticles, which is also realized by stirring the fluid. Stirring is conducted with a rotational frequency that is adapted to the amount of fluid to be stirred.

Abstract: The objective of the present invention is to propose a charged particle beam device with which an imaging optical system and an irradiation optical system can be adjusted with high precision. In order to achieve this objective, provided is a charged particle beam device comprising: a first charged particle column which serves as an irradiation optical signal; a deflector that deflects charged particles which have passed through the inside of the first charged particle column toward an object; and a second charged particle column which serves as an imaging optical system.

Abstract: There is provided a charged particle beam device which includes a charged particle beam source, a charged particle beam optical system that irradiates a sample with a charged particle beam from the charged particle beam source, a detector that detects a secondary signal generated from the sample by irradiation with the charged particle beam, and an image processing unit that executes integration processing of image data obtained from the secondary signal and outputting an integrated image, and in which the image processing unit executes a normalization integration computation of outputting an integrated image in which a luminance value of the integrated image is always “1” in an integration process.

Abstract: A plasma processing apparatus includes a processing chamber for processing a sample with a plasma, an RF power supply for generating the plasma within the processing chamber, an RF bias power supply for supplying RF bias power to a sample stage on which the sample is mounted, a pulse generation unit for creating first pulses for modulating the output from the RF power supply for generating the plasma and second pulses for modulating the output from the RF bias power supply, and a controller for providing control of the processing of the sample with the sample. The pulse generation unit creates the first pulses and the second pulses synchronized based on a pulse delay time transmitted from the controller. The pulse delay time is established to delay the second pulses relative to the first pulses.

Abstract: A control section causes one dispensing mechanism of either a reagent dispensing mechanism or a sample dispensing mechanism to first discharge a predetermined amount of a liquid into the reaction container, and then, with respect to the cases where the amount of a liquid to be discharged by the other dispensing mechanism is larger or smaller than the amount of the liquid in the reaction container, causes the other dispensing mechanism to discharge the liquid such that the discharge speed in the case where the amount of the liquid to be discharged is larger is decreased relative to the discharge speed in the case where the amount of the liquid to be discharged is smaller.

Abstract: A vacuum processing apparatus includes a vacuum processing chamber, an upper electrode, a lower electrode, a first high-frequency power source, a second high-frequency power source, a first matching box, a second matching box, a copper plate for connecting an electrode shaft of the lower electrode with the second matching box, a drive base on which the electrode shaft of the lower electrode and the second matching box are mounted, a drive unit for ascending or descending the drive base, and an exhaust unit disposed at a position equally distanced from an exhaust outlet by a distance.

Abstract: An electron beam apparatus which can stably achieve high spatial resolution also during low acceleration observation using CeB6 for the CFE electron source is provided. In an electron beam apparatus having a CFE electron source, the emitter of the electron beam of the CFE electron source is Ce hexaboride or a hexaboride of a lanthanoid metal heavier than Ce, the hexaboride emits the electron beam from the {310} plane, and the number of the atoms of the lanthanoid metal on the {310} plane is larger than the number of boron molecules comprising six boron atoms on the {310} plane.

Abstract: This ion milling device is provided with a vacuum chamber (105), an exhaust device (101) for evacuating the interior of the vacuum chamber, a sample stage (103) for supporting a sample (102) to be irradiated inside the vacuum chamber, a heater (107) for heating the interior of the vacuum chamber, a gas source (106) for introducing into the vacuum chamber a gas serving as a heating medium, and a controller (110) for controlling the gas source, the controller controlling the gas source so that the vacuum chamber internal pressure is in a predetermined state during heating by the heater. This enables the control in a short time of the temperature for suppressing condensation, or the like, occurring at atmospheric release after cooling and ion milling a sample.

Abstract: A nucleic acid amplifier comprises a holder 3 which is provided with a plurality of temperature control blocks 10 each designed to hold at least one reaction vessel 105 storing a reaction solution. The temperature of the reaction solution in each reaction vessel 105 is controlled individually by using temperature control devices 14 and 15 arranged in each of the temperature control blocks 10. The temperature that is set in each temperature control block 10 and the timing for temperature changes are controlled independently of the temperatures of other temperature control blocks 10. This configuration makes it possible to provide a nucleic acid amplifier and a nucleic acid inspection device (employing the nucleic acid amplifier) capable of processing multiple types of samples differing in the protocol in parallel (parallel processing) and starting a process for a different sample even when there is a process in execution.

Abstract: A sample liquid-surface position measurement device includes: a first light source that illuminates a side face of a container containing a sample; a first optical measurement sensor that is located on the opposite side of the container from the first light source, and measures transmitted light from the first light source; a first label position measuring unit that measures a position of a label affixed to the container; and an analysis section that calculates a liquid-surface position or an interface position of the sample in the container, from transmitted-light intensity data in a longitudinal direction of the container which is measured by the first optical measurement sensor, and from the position of the label in the longitudinal direction of the container which is measured by the first label position measuring unit.

Abstract: The automatic analyzer includes a control unit provided with a determination unit which determines requirement or non-requirement of the calibration executed to the loaded reagent when the reagent ID reader identifies the reagent, a request generation unit which makes a notice of a standard solution necessary for the calibration when the determination unit determines requirement of the calibration, and generates a calibration request when loading of the standard solution is detected, and a planning unit which makes a plan of the carry-in and the calibration to execute the calibration as required immediately after the carry-in of the reagent into the reagent disc. This makes it possible to lessen the process to be performed by the user until the reagent is made available for measurement of the patient specimen.

Abstract: The charged particle beam device includes a charged particle beam source which emits a primary charged particle beam, an objective lens which focuses the primary charged particle beam on a sample, a passage electrode which is formed of a metal material and is disposed between the charged particle beam source and a tip end of the objective lens, a detector which detects a secondary charged particle emitted from the sample, and an electrostatic field electrode which is electrically insulated from the passage electrode. The passage electrode is formed such that the primary charged particle beam passes through the inside of the passage electrode. The electrostatic field electrode is formed to cover an outer periphery of the passage electrode.

Abstract: In time-series data indicating light emission of plasma when plasma processing is carried out on a sample by generating the plasma, an analysis apparatus creates combinations of a plurality of light emission wavelengths of elements and a plurality of time intervals within a plasma processing interval and calculates, for each of the combinations of the wavelengths and the time intervals, a correlation between an average value of light emission intensity and the number of times the plasma processing is carried out on the samples for each of the combinations of the wavelengths and the time intervals that have been created. Thereafter, the data analysis apparatus selects, as a combination of the wavelength and the time interval used to observe or control the plasma processing, a combination of a wavelength of light emitting from a specific element and a specific time interval having a maximum correlation.