Abstract: Provided is a stage apparatus that reduces thermal deformation and temperature rise in an upper table on which a sample is mounted and a charged particle beam apparatus including the stage apparatus. The stage apparatus includes: an upper stage that moves an upper table on which a sample is mounted in a first direction; a middle stage that moves a middle table on which the upper stage is mounted in a second direction orthogonal to the first direction; and a lower stage that moves a lower table on which the middle stage is mounted in a third direction orthogonal to the first direction and the second direction. The upper table and the middle table use a material having a smaller thermal expansion coefficient than in a material of the lower table, and the lower table uses a material having higher thermal conductivity than in the material of the upper table and the middle table.

Abstract: An object of the invention is to provide a device for observing the same field of view with a charged particle beam device and a camera without increasing a size of a housing.

Abstract: A charged particle beam device includes: a first charged particle source that generates first charged particles and irradiates a sample with the generated first charged particles; a phase plate that changes phases of the first charged particles in accordance with charged states of portions through which the first charged particles are transmitted; and a phase plate control system that controls the charging of the phase plate.

Abstract: A method of washing an aspiration probe of an in-vitro diagnostic system is disclosed. The aspiration probe comprises an outer surface and an inner surface forming an inner space for receiving a fluid. The method comprises dipping the aspiration probe into a first wash fluid so that the outer surface is immersed at least in part into the first wash fluid, aspirating an amount of the first wash fluid into the inner space of the aspiration probe, propagating an ultrasonic vibration to the outer surface of the aspiration probe via the first wash fluid, and rinsing the outer surface and the inner surface of the aspiration probe with a second wash fluid. Further, an in-vitro diagnostic method and an in-vitro diagnostic system are disclosed.

Abstract: An automatic analyzer with high processing capacity is capable of immediately measuring an emergency specimen rack. The automatic analyzer includes a conveying line for conveying a specimen rack, and an analysis unit which has a dispensing line in which a plurality of specimen racks are arranged for waiting until sample dispensing, and a sampling area for dispensing the sample to the analysis unit. A rack save area is provided in the dispensing line and at a position adjacent to the upstream side of the sampling area. When a specimen rack exists in the sampling area at the time of measuring an emergency specimen rack, a controller moves the specimen rack to the save area and positions the emergency specimen rack to be moved from a downstream side of the sampling area to the sampling area.

Abstract: An electron microscope device includes: a first detection means disposed at a high elevation angle for detecting electrons having relatively low energy; a second detection means disposed at a low elevation angle for detecting electrons having relatively high energy; a means for identifying, from a first image obtained from a first detector, a hole region in a semiconductor pattern within a preset region; a means for calculating for individual holes, from a second image obtained from a second detector, indexes pertaining to an inclined orientation and an inclination angle, on the basis of the distance between the outer periphery of the hole region and the hole bottom; and a means for calculating, from the results measured for the individual holes, indexes pertaining to an inclined orientation of the hole and an inclination angle of the hole as representative values for the image being measured.

Abstract: A sample releasing method for releasing a sample subjected to plasma processing from a sample stage on which the sample is electrostatically attracted by applying DC voltage to an electrostatic chuck electrode, and the method includes: moving the sample subjected to the plasma processing upward above the sample stage; and after moving the sample, controlling the DC voltage such that an electric potential of the sample is to be smaller.

Abstract: Provided are a first tank; a second tank; a thin film having a nanopore, which communicates the first tank to the second tank, and disposed between the first and second tanks; a first electrode provided in the first tank; and a second electrode provided in the second tank. A wall surface of the nanopore has an ion adsorption preventing structure to prevent desorption/adsorption of an ion contained in a solution filling the first tank and/or the second tank, and a voltage is applied between the first and second electrodes to measure an ion current flowing through the nanopore.

Abstract: To a biomolecule measuring apparatus, a semiconductor sensor for detecting ions generated by a reaction between a biomolecular sample and a reagent is set. The semiconductor sensor has a plurality of cells which are arranged on a semiconductor substrate, and each of which detects ions, and a plurality of readout wires. Each of the plurality of cells has an ISFET which has a floating gate and which detects ions, a first MOSFET M2 for amplifying an output from the ISFET, and a second MOSFET M3 which selectively transmits an output from the first MOSFET to a corresponding readout wire R1. Each of the plurality of cells is provided with a third MOSFET M1 which generates hot electrons in the ISFET and which injects a charge to the floating gate of the ISFET. Here, the second MOSFET and the third MOSFET are separately controlled.

Abstract: The purpose of the present invention is to provide an automatic analysis device capable of efficiently performing a plurality of analyses, while reducing the footprint and cost of the device. Provided is an automatic analysis device characterized by being provided with containers for containing samples, one rack for placing the containers thereon, and a control unit, the control unit generating, with respect to the one rack, a plurality of registration patterns in which information of the positions where the containers are disposed, and information of the samples contained in the containers are correlated with each other, storing the registration patterns thus generated, applying, to the one rack, one registration pattern selected from among the registration patterns thus stored, and analyzing the samples. Also provided is an analysis method using the device.

Abstract: The present invention aims at providing a defect inspection technique capable of setting parameters used for detecting a defect with a less burden to a user. A defect inspection device according to the present invention receives multiple reference values input by the user and calculates a defect extraction condition so as to optimize an evaluation value calculated with the use of the reference values, the number of actual reports, and the number of false reports (refer to FIG. 8).

Abstract: A compound used in the conventional enzymatic reactions and mass spectrometry methods needs to be altered with respect to the structure thereof as a substrate compound, such as the length of an alkyl chain contained therein, depending on the type of a target enzyme, and therefore has the problem that the conditions for the mass spectrometry on a product compound are undesirably varied and the sensitivity is deteriorated. In the present invention, a compound is provided, which can be used in an enzymatic reaction and a microanalysis method both for detecting a trace component stably and with high sensitivity. The compound according to the present invention is characterized by having a nitrogen atom, an amide bond and a glycosidic bond at specific sites, respectively, has high reactivity with an enzyme, and can provide a compound capable of being detected very easily with a mass spectrometer.

Abstract: A defect inspection apparatus includes a light irradiation unit irradiating a sample placed on a table unit with illumination light, a detection optical system forming a scattered light image from the sample and detecting the generated scattered light image through an image sensor, a processing unit receiving a signal from the image sensor of the detection optical system that detects the scattered light image, generating an image of the scattered light, and detecting a defect of the sample by processing the generated image, an output unit outputting the defect image processed by the image processing unit, and a control unit controlling the stable unit, the light irradiation unit, the detection optical system, and the image processing unit. The image processing unit includes an image generation unit that receives the signal and generates the image, a correction unit that corrects lightness discontinuity and a defect detection unit for image processing.

Abstract: Provided is a semiconductor manufacturing apparatus including: a container in which a processing chamber is installed; a stage installed in the processing chamber and configured to hold a semiconductor substrate; a gas supply line configured to supply reactive gas to the processing chamber; and a vacuum line configured to exhaust the processing chamber, wherein the semiconductor substrate includes a high-k insulating film, and as the reactive gas, mixed gas including complex-forming gas forming a volatile organometallic complex by reacting with a metal element included in the high-k insulating film and complex stabilizing material gas that increases stability of the organometallic complex is supplied.

Abstract: A cytometric mechanism includes: a flow path through which a cell suspension is made to flow; a liquid drive unit for sending the cell suspension which is in the flow path; and a computation unit for irradiating, with irradiation light from a light source, a cell suspension flowing through a flow cell, and for finding a cell survival rate in the cell suspension on the basis of a resulting forward scattered light intensity and transmittance and/or side scattered light intensity. The invention is provided with a calibration curve database for storing, in advance, respective calibration curves indicative of a relationship between viable cell concentration and forward scattered light intensity, a relationship between dead cell concentration and the transmittance, and a relationship between a cell survival rate and the side scattered light intensity.

Abstract: In order to provide a plasma processing apparatus or method with improved processing uniformity, a plasma processing apparatus includes: a processing chamber which is disposed inside a vacuum container; a sample stage which is disposed inside the processing chamber and has a top surface for placing a wafer corresponding to a processing target thereon; an electric field forming part which forms an electric field supplied into the processing chamber; a coil which forms a magnetic field for forming plasma inside the processing chamber by an interaction with the electric field; and a controller which increases or decreases intensity of the plasma inside the processing chamber by repeatedly increasing or decreasing intensity of the magnetic field formed by the coil at a predetermined interval, wherein the wafer is processed while the plasma is repeatedly formed and diffused.

Abstract: There is provided a charged particle beam apparatus capable of obtaining a high SN ratio with a small electron irradiation amount. The charged particle beam apparatus includes a charged particle detection device. The charged particle detection device detects an analog pulse waveform signal (110) in a detection of emitted electrons (1 event) when one primary electron enters a sample, converts the analog pulse waveform signal (110) into a digital signal (111), perform a wave height discrimination (112) with the use of a unit peak corresponding electron, and outputs the digital signal (111) as a multilevel count value.