Patents Assigned to Hitachi High-Technologies Corporation
  • Patent number: 10424459
    Abstract: A processing apparatus and a processing method are provided, which use a charged particle beam device that achieves defection of secondary electrons/reflected electrons at a large angle and cancels out noises of an electromagnetic deflector and an electrostatic deflector to suppress a position shift of a primary electron beam caused by circuit noises of a primary beam/secondary beam separation circuit.
    Type: Grant
    Filed: June 5, 2017
    Date of Patent: September 24, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Wen Li, Ryo Kadoi, Kazuki Ikeda, Hiroyuki Takahashi, Hajime Kawano
  • Patent number: 10422797
    Abstract: An electrochemiluminescence method of detecting an analyte in a liquid sample and a corresponding analysis system. An analyte in a liquid sample is detected by first providing a receptacle containing a fluid comprising protein coated magnetic microparticles to a stirring unit. Stirring of the fluid is necessary since the density of the microparticles is usually higher than the density of the buffer fluid. Thus the microparticles tend to deposit on the bottom of the receptacle leading to an aggregation of the microparticles because of weak interactions. To obtain representative measurements a homogeneous distribution of the microparticles in the buffer fluid is necessary to ensure a constant concentration of microparticles for each analysis cycle. It is further necessary to provide disaggregation of the microparticles, which is also realized by stirring the fluid. Stirring is conducted with a rotational frequency that is adapted to the amount of fluid to be stirred.
    Type: Grant
    Filed: December 14, 2015
    Date of Patent: September 24, 2019
    Assignees: ROCHE DIAGNOSTICS OPERATIONS, INC., HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Ralf Kraus, Oliver Larbolette, Friedrich Staebler, Yoshihiro Yamashita, Yukinori Sakashita, Shinya Matsuoka, Michihiro Saito, Taku Sakazume, Katsuaki Takahashi
  • Patent number: 10424472
    Abstract: A first rod electrode set has a first center axis, into which ions and air current are introduced. A second rod electrode set has a second center axis at a distance from the first center axis, from which the ions are discharged. A power supply applies voltages to the first rod electrode set and the second rod electrode set. The first rod electrode set and the second rod electrode set have a region where the sets overlap each other in the longitudinal direction, and form a single multipole ion guide by being combined to each other in the region. Different offset DC voltages are applied to the first rod electrode set and the second rod electrode set, respectively, and a DC potential for moving the ions to the second rod electrode set in the region is formed, the ions having been guided by the first rod electrode set.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: September 24, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Masuyuki Sugiyama, Hideki Hasegawa, Masao Suga, Hiroyuki Satake, Yuichiro Hashimoto
  • Patent number: 10416179
    Abstract: A high-throughput automatic analyzer integrates a biochemical analysis section and a blood coagulation analysis section. The analyzer is capable of achieving a reduction in size, system cost, and lifecycle cost. The automatic analyzer includes: a reaction disk; a first reagent dispensing mechanism that dispenses a reagent to reaction cells on the reaction disk; a photometer that irradiates a reaction solution in the reaction cell with light; a reaction cell cleaning mechanism; a reaction vessel supply unit that supplies a disposable reaction vessel for mixing and reacting a sample and a reagent with each other; a second reagent dispensing mechanism that dispenses a reagent to the disposable reaction vessel; a blood coagulation time measuring section that irradiates a reaction solution in the disposable reaction vessel with light to detect transmitted or scattered light; and a sample dispensing mechanism that dispenses a sample to the reaction cell and the disposable reaction vessel.
    Type: Grant
    Filed: June 7, 2017
    Date of Patent: September 17, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akihisa Makino, Hajime Yamazaki, Keiko Yoshikawa, Manabu Ando, Masahiko Iijima
  • Patent number: 10418254
    Abstract: In an etching method of etching a tungsten film, the method is provided to execute a generating a surface reaction layer on a tungsten film that is formed on a surface of a base material by supplying a reactive species including fluorine which is generated in plasma onto the base material for a first predetermined time in a state where the base material of which the tungsten film is formed on at least a portion of the surface is cooled to a melting point temperature or lower of a tungsten fluoride, and a removing the surface reaction layer that is generated on the tungsten film by heating the base material of which the surface reaction layer is generated on the tungsten film to a boiling point temperature or higher of the tungsten fluoride for a second predetermined time.
    Type: Grant
    Filed: February 27, 2018
    Date of Patent: September 17, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kazunori Shinoda, Naoyuki Kofuji, Hiroyuki Kobayashi, Nobuya Miyoshi, Kohei Kawamura, Masaru Izawa, Kenji Ishikawa, Masaru Hori
  • Patent number: 10418224
    Abstract: In the plasma etching method, a sample is placed on a stage in a chamber. A first gas is introduced into the chamber. Electric field is supplied within the chamber to plasma is generated from the first gas. A first RF power of a first frequency, which is for generating a bias voltage in the sample for etching the sample with radicals which are generated in the plasma while the plasma is generated, is supplied to the stage. A second gas is introduced from a position in outer periphery of a surface of the stage, on which the sample is placed. A second RF power of a second frequency higher than the first frequency and capable of generating plasma from the second gas above the stage that allows radicals generated in the plasma generated from the second gas to be supplied in the outer periphery, is supplied to the stage.
    Type: Grant
    Filed: April 12, 2018
    Date of Patent: September 17, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Naoyuki Kofuji, Ken'etsu Yokogawa, Nobuyuki Negishi, Masami Kamibayashi, Masatoshi Miyake
  • Patent number: 10417756
    Abstract: The purpose of the present invention is to provide a pattern measurement apparatus that appropriately assesses patterns formed by patterning methods for forming patterns that do not exist on photomasks. In order to achieve this purpose, the present invention provides a pattern measurement apparatus comprising a processor that measures the dimensions of patterns formed on a sample by using data acquired by irradiating the sample with a beam, wherein the processor extracts pattern coordinate information on the basis of the data acquired by irradiating the sample with a beam, and uses the coordinate information to generate measurement reference data used when performing dimension measurements of the pattern.
    Type: Grant
    Filed: January 23, 2015
    Date of Patent: September 17, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kei Sakai, Satoru Yamaguchi, Kazuyuki Hirao, Yasunori Takasugi
  • Patent number: 10408787
    Abstract: In an apparatus for analyzing small number of samples, wasteful consumption of a polymer as a separation Medium is suppressed. The apparatus has a configuration provided with a plurality of capillary units each of which can be attached/detached to/from the apparatus, and performs analysis for capillaries after sealing of a polymer by attaching the capillaries by the number in accordance with the number of samples. Since analysis can be performed by using capillaries by the number identical with that of the samples to be analyzed, wasteful polymer is not used in the capillaries not used for the analysis. In addition, the polymer injection mechanism is unnecessary and the polymer is not necessary for maintenance and upon starting of analysis. An electrophoresis apparatus which is small in the size with no polymer injection mechanism, and with low running cost not wastefully consuming the polymer can be provided.
    Type: Grant
    Filed: November 30, 2011
    Date of Patent: September 10, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Motohiro Yamazaki, Michiru Fujioka, Takamichi Muramatsu, Takashi Gomi
  • Patent number: 10408762
    Abstract: A plasma processing apparatus, plasma processing method, and plasma processing analysis method in which a suitable combination of wavelength, time interval, and etching condition parameter for control to change etching conditions is determined among wavelengths, time intervals, and changeable parameters for spectroscopic measurement data in order to ensure stable etching conditions. Specifically, a regression equation which represents the correlation between emission intensity and etching result at a wavelength and a time interval is obtained for each of two or more combinations of wavelength, time interval, and etching condition parameter. Furthermore, for each of the combinations, the amount of change is calculated from the regression equation when the value set for the etching condition parameter is changed.
    Type: Grant
    Filed: August 12, 2015
    Date of Patent: September 10, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Ryoji Asakura, Kenji Tamaki, Daisuke Shiraishi, Akira Kagoshima, Satomi Inoue
  • Patent number: 10401304
    Abstract: The present invention provides an inspection device that is capable of detecting foreign matter with high accuracy, the inspection device including: a light source; an electro-optic element on which light from the light source is incident and which changes a phase of the light into at least two states; and a controller. The controller corrects a phase fluctuation of the electro-optic element itself, using intensity modulation characteristics of the eletro-optic element which are obtained by changing an applied voltage that is input to the electro-optic element.
    Type: Grant
    Filed: September 17, 2018
    Date of Patent: September 3, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Masami Makuuchi, Kazuma Ogawa, Akira Hamamatsu
  • Patent number: 10401300
    Abstract: A defect observation method for observing a defect on a sample detected by another inspection device with a scanning electron microscope including the steps of: optically detecting the defect using the position information for the defect: illuminating the sample including the defect with an illumination intensity pattern having periodic intensity variation in two dimensions by irradiating a plurality of illumination light beams onto the surface of the sample while phase modulating the light beams in a single direction and successively moving the light beams in small movements in a direction different from the single direction, imaging the surface of the sample that is illuminated by the illumination intensity pattern having periodic intensity variation in two dimensions and includes the defect detected by the other inspection device, and detecting the defect detected by the other inspection device from the image obtained through the imaging of the surface of the sample.
    Type: Grant
    Filed: May 27, 2015
    Date of Patent: September 3, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuko Otani, Yuta Urano, Toshifumi Honda
  • Publication number: 20190266713
    Abstract: A versatile template generation unit cuts a first region in which a similarity level to a template image is a first similarity level and a second region in which the similarity level to the template image is a second similarity level different from the first similarity level, from an input image including an alignment mark, to generate a versatile template image.
    Type: Application
    Filed: January 30, 2019
    Publication date: August 29, 2019
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Naoaki KONDO, Minoru HARADA, Yuji TAKAGI, Takehiro HIRAI
  • Publication number: 20190265261
    Abstract: The present invention is provided with: an automatic analysis device 200 for performing an analysis process to analyze a specimen that is to be analyzed; a specimen pre-processing module 100 for performing pre-processing to cause the specimen to enter a state in which the analysis process can be performed; a main conveyance line 161 for conveying a specimen container carrier 10 which accommodates the specimen that is to be analyzed and in which at least one specimen container can be mounted; and annular conveyance lines 111, 121, 131, 141, 151, 411 that are disposed adjacent to the main conveyance line 161 and that are moreover disposed so as to be capable of transferring the specimen container carrier 10 to and from the main conveyance line 161, the annular conveyance lines 111, 121, 131, 141, 151, 411 being capable of circulating and conveying the specimen container carrier 10 separately without the use of another conveyance line (e.g., a return line 162).
    Type: Application
    Filed: July 18, 2017
    Publication date: August 29, 2019
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Shigeki YAMAGUCHI, Naoto TSUJIMURA, Tomoyuki NEMOTO
  • Publication number: 20190265187
    Abstract: An electrolyte concentration measurement device includes a measurement unit that includes an ion selective electrode, a reference electrode and a potential measurement unit; a record and calculation unit that obtains an ion concentration of an internal standard liquid or a specimen; and a concentration value correction/determination unit that determines whether the ion concentration of the internal standard liquid is within a preset value range, and corrects an ion concentration value of the internal standard liquid obtained by the record and calculation unit, in which the measurement unit includes an internal standard liquid bottle storage unit storing a plurality of bottles, and the concentration value correction/determination unit corrects the obtained ion concentration of the internal standard liquid after the bottle is switched, by using information of the ion concentration before the bottle accommodating the internal standard liquid is switched.
    Type: Application
    Filed: June 13, 2017
    Publication date: August 29, 2019
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Atsushi KISHIOKA, Tetsuyoshi ONO
  • Patent number: 10395935
    Abstract: A plasma processing apparatus includes a plasma processing chamber processing a sample using plasma, a radio frequency power supply supplying radio frequency power for generating the plasma, a sample stage including an electrode electrostatically chucking the sample, mounting the sample thereon, a DC power supply applying DC voltage to the electrode, and a control device shifting the DC voltage previously set, in a negative direction by a first shift amount during discharge of the plasma, shifting the DC voltage having been shifted in the negative direction by the first shift amount, in a positive direction by a second shift amount after the discharge of the plasma. The first shift amount has a value changing potential over a surface of the sample to 0 V, upon shifting the DC voltage in the positive direction. The second shift amount has a value obtained based on a floating potential of the plasma.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: August 27, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Masaki Ishiguro, Masahiro Sumiya, Shigeru Shirayone, Kazuyuki Ikenaga, Tomoyuki Tamura
  • Patent number: 10393509
    Abstract: A pattern height measurement device capable of high-precision measurement of the dimensions of a fine pattern, and a charged particle beam device are provided. The pattern height measurement device includes a calculation device that determines dimensions of a sample, in the height direction, based on first reflected light information obtained by dispersing light reflected from a sample. The calculation device determines second reflected light information based on a formula for the relationship between the value for the dimension in the sample surface direction of a pattern formed upon the sample, obtained by irradiation of a charged particle beam on the sample, the value for the dimension in the height direction of the sample, and reflected light information; compares a second reflected light intensity and the first reflected light information; and outputs the value for the dimension in the height direction of the sample in the second reflected light information.
    Type: Grant
    Filed: July 30, 2014
    Date of Patent: August 27, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroki Kawada, Katsuhiro Sasada, Takenori Hirose, Shou Takami
  • Patent number: 10386380
    Abstract: A sample processing system is configured for analyzing, preprocessing, or carrying out other operations for a biological sample such as blood or urea. With the sample processing system, it is possible to store samples to be stored in a thermally insulated state or specimens required for accuracy control in the thermally insulated state for preventing evaporation or denaturing of the samples and specimens. Also it is possible to carry in or out the samples, rack by rack, according to necessity. Further, the sample processing system is provided with a buffer unit in a cold container having a capability for cold storage and also by accessing a sample rack at random for carrying in or out a rack with a transfer mechanism provided outside of the cold container.
    Type: Grant
    Filed: December 5, 2017
    Date of Patent: August 20, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kuniaki Onizawa, Koichi Obari, Junichi Oizumi, Shigemi Oba, Tetsuaki Abe
  • Publication number: 20190250125
    Abstract: This drive screw device is provided with: a drive screw; a drive unit which causes the drive screw to rotate; a slider which moves along the drive screw by means of the rotation of the drive screw; and an external load which is provided on the drive screw and applies a rotational load to the drive screw. By this means it is possible to provide a drive screw device with which there is little pressure variation even if a frictional force varies.
    Type: Application
    Filed: September 23, 2016
    Publication date: August 15, 2019
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Katsuhiro ARITOME, Ryusuke KIMURA, Motohiro YAMAZAKI, Go NAKAJIMA, Naomichi KAWASAKI
  • Publication number: 20190244349
    Abstract: The present invention provides a method and an apparatus for analyzing a cell state, cell death in particular, in an interior of a spheroid non-invasively and quantitatively when the spheroid is cultured. More specifically, the present invention provides a method and an apparatus for analyzing a cell state by implementing optical imaging of a spheroid by using an optical instrument characterized by a high resolution and analyzing the internal structure of the spheroid.
    Type: Application
    Filed: June 16, 2016
    Publication date: August 8, 2019
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Naoko SENDA, Toshinari SAKURAI
  • Patent number: 10373802
    Abstract: An object of the present invention relates to high-resolution observation on a light field STEM, a dark field image STEM, and an EELS, at a low acceleration voltage. The present invention relates to controlling on incorporation angles of a STEM detector and an electron energy loss spectroscopy by changing the disposition of a sample with respect to an optical axis direction of a primary electron beam in a scanning transmission microscopy including an electron energy loss spectroscopy. According to the present invention, it is possible to easily control an optimum scattering angle in each of a light field STEM, a dark field STEM, and an EELS while suppressing occurrence of chromatic aberration accompanying the controlling on the incorporation angle.
    Type: Grant
    Filed: September 29, 2015
    Date of Patent: August 6, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yu Yamazawa, Kazutoshi Kaji