Abstract: In order to improve visibility of a measurement/inspection image in an inspection measurement apparatus inspecting or measuring a fine pattern, a charged particle beam device is configured to include a charged particle optical system that irradiates a surface of a sample with a converged charged particle beam so as to perform scanning, a detection unit that detects secondary charged particles generated from the sample irradiated with the charged particle beam by the charged particle optical system, an image forming unit that receives a detection signal from the detection unit and forms an image of the sample, an image processing unit that processes the image formed in the image forming unit, and a display unit that displays a result processed by the image processing unit, in which the image forming unit includes an analog signal processing portion that processes an analog signal component of the detection signal in the detection unit so as to form an image, a pulse count method signal processing portion that

Abstract: A diagnostic imaging assistance apparatus according to the present invention performs a process of inputting images of a tissue and a cell, a process of extracting feature amounts of a wide view and a narrow view from a target image to be processed, a process of classifying whether the target images having different views are normal or abnormal from the feature amounts, and a process of classifying a lesion likelihood using a classification result.

Abstract: A defect observation device detects a defect with high accuracy regardless of a defect size. One imaging configuration for observing an observation target on a sample is selected from an optical microscope, an optical microscope, and an electron microscope, and an imaging condition of the selected imaging configuration is controlled.

Abstract: Provided are: a flow path switching valve that reduces the pressure load in a contact surface outer peripheral section of the flow path switching valve and inhibits friction between constituent components; and a liquid chromatographic device using the flow path switching valve. The flow path switching valve is provided with a stator having a plurality of through holes and a seal having conduction grooves for causing the through holes to conduct. The seal has a first portion present vertically beneath a region comprising at least a surface of contact with the stator, and a second portion having lower rigidity than the first portion, on the outside of the first portion. Due to this configuration, it is possible to reduce the pressure load when a flow path of a liquid is switched under high-pressure conditions, and inhibit the phenomenon of friction itself.

Abstract: Although analysis can be very quickly conducted at a low cost by a method for measuring a biopolymer using a nanopore, the accuracy of distinguishing the individual monopolymers constituting the biopolymer is low. To both ends of a biopolymer through a nanopore, molecules which are larger than the nanopore are attached and then the biopolymer is reciprocated by an external force to thereby perform repeated measurements.

Abstract: An object of the invention is to provide a stage apparatus that realizes compatibility between long stroke driving and reduction of a burden on a drive mechanism. In order to achieve the above object, there is suggested a stage apparatus including a first table that moves a sample in a first direction, a second table that moves the first table in a second direction different from the first direction, moving mechanisms that move the tables, respectively, a movable body that supports a moving mechanism, and a third moving mechanism that moves the movable body so as to follow the second table.

Abstract: In order to provide an ion beam apparatus excellent in safety and stability even when a sample is irradiated with hydrogen ions, the ion beam apparatus includes a vacuum chamber, a gas field ion source that is installed in the vacuum chamber and has an emitter tip, and gas supply means for supplying a gas to the emitter tip. The gas supply means includes a mixed gas chamber that is filled with a hydrogen gas and a gas for diluting the hydrogen gas below an explosive lower limit.

Abstract: To provide an ion milling system that can suppress an orbital shift of an observation electron beam emitted from an electron microscope column, the ion milling system includes: a Penning discharge type ion gun 100 that includes a permanent magnet 114 and that generates ions for processing a sample; and a scanning electron microscope for observing the sample, in which a magnetic shield 172 for reducing a leakage magnetic field from the permanent magnet 114 to the electron microscope column is provided.

Abstract: An automatic analyzer includes sample vessels containing samples to be measured and; reaction vessels in which to mix a sample and a reagent. A sample dispenser 5 dispenses a sample from any of the sample vessels to any of the reaction vessels. A reagent dispenser dispenses a reagent from a reagent vessel to a reaction vessel, and a stirrer stirs the sample-reagent mix contained in the reaction vessel. A photometric measurement unit is provided for obtaining multiple measurement data points during the progress of reaction of a mixed solution. At least one approximation formula is performed and an approximation curve from the measurement data points is generated. A shape descriptor is calculated from the approximation curve and abnormalities based on the shape descriptor are determined. This not only allows abnormalities to be detected accurately from each measurement result, but also allows the causes of the abnormalities to be identified.

Abstract: A charged particle beam device using a multi-pole type aberration corrector includes: a charged particle source which generates a primary charged particle beam; an aberration correction optical system which corrects aberrations of the primary charged particle beam; a detection unit which detects a secondary charged particle generated from a sample irradiated with the primary charged particle beam whose aberrations have been corrected; an image forming unit which forms a charged particle image of the sample from a signal obtained by detecting the secondary charged particle; an aberration correction amount calculation unit which processes the charged particle image, separates aberrations having different symmetries, selects an aberration to be preferentially corrected from the separated aberrations, and calculates a correction amount of the aberration correction optical system; and an aberration correction optical system control unit which controls the aberration correction optical system based on the calculate

Abstract: A reagent container carrier structure for holding at least one reagent container, wherein the carrier structure has thereon an RFID assembly and an optically detectable definition pattern defining an orientation of the carrier structure, is disclosed. The reagent container carrier structure may have an orientation identification label that has a front surface and a back surface, and further include an RFID assembly positioned on the back surface, and an optically detectable definition pattern defining an orientation of the label on the front surface. A reader module for reading RFID data in combination with optically detectable data defining an orientation of a respective label is also disclosed.

Abstract: A measuring device for measuring a sample by emitting a charged particle beam includes a particle source, an electronic lens, a detector, a stage, a sensor for measuring the environment, and a control device, in which the control device includes a control module having a height calculation module configured to calculate a height estimation value indicating an estimated height of the sample at a measurement position; and a correction value calculation module configured to calculate a correction value reflecting a change of the environment based on the measurement position of the sample and an amount of change of the environment measured by the sensor, and the control module corrects the height estimation value based on the correction value, and sets a control value for controlling focus adjustment using the electronic lens based on the corrected height estimation value.

Abstract: A defect class that can identify true information or false information regarding a defect of an inspection target is received, it is determined whether or not the number of true information and the number of false information are insufficient to set a defect extraction parameter of a predetermined region, a feature amount of the defect is extracted in a region other than the predetermined region when it is determined that the number of true information and the number of false information are insufficient, the feature amounts are totalized by adding the feature amount of the defect extracted in a region other than the predetermined region to the feature amount of the defect extracted in the predetermined region, and the totalized feature amount of the defect is displayed for adjustment of the defect extraction parameters.

Abstract: To provide an image analysis apparatus capable of easily extracting an edge of an upper layer pattern formed intersecting with a lower layer pattern so as not to be affected by the lower layer pattern, the image analysis apparatus includes a calculation unit that calculates an analysis range including a region where the lower layer pattern intersects with the upper layer pattern and a region where the lower pattern is not formed, a calculation unit that averages a plurality of signal profiles, a calculation unit that calculates a maximum value and a minimum value of a signal intensity, a calculation unit that calculates a threshold level difference using the maximum value and the minimum value, and a calculation unit that calculates the edge of the upper layer pattern on the signal profile.

Abstract: A charged particle beam device is provided that performs proper beam adjustment while suppressing a decrease in MAM time, with a simple configuration without adding a lens, a sensor, or the like. The charged particle beam device includes: an optical element which adjusts a charged particle beam emitted from a charged particle source; an adjustment element which adjusts an incidence condition of the charged particle beam with respect to the optical element; and a control device which controls the adjustment element, wherein the control device determines a difference between a first feature amount indicating a state of the optical element based on the condition setting of the optical element, and a second feature amount indicating a state where the optical element reaches based on the condition setting and executes adjustment by the adjustment element when the difference is greater than or equal to a predetermined value.

Abstract: Provided is a high-brightness, high-current electron source including a wire-like member. The wire-like member has an electron emission plane at the tip of the wire-like member. The electron emission plane has a projectingly curved surface. At least the surface of the electron emission plane is formed of an amorphous material.

Abstract: The purpose of the present invention is to provide an automatic analysis device that combines a biochemical analysis unit and a blood coagulation analysis unit and has a high processing capacity while reducing device cost and life-cycle cost. An automatic analysis device is characterized in that when a synthetic-substrate item or latex-agglutination item from among synthetic-substrate, latex-agglutination, and clotting-time blood-coagulation-test items is made to be a first test item and the clotting-time item is made to be a second test item, if there is a measurement request for the first test item and second test item in the same specimen rack, a control unit determines the conveyance path of the specimen rack such that the first test item is measured using a biochemical analysis unit and the second test item is measured using a coagulation time analysis unit and controls a conveyance line.

Abstract: An object of the invention is to provide a mass spectrometer system capable of obtaining a mass spectrum with high resolution as the mass number of an ion becomes higher. In the mass spectrometer system of the invention, a control unit 8 controls a mass spectrometry unit 4 so that a direct current voltage U, an amplitude V of a radio-frequency voltage, and a frequency F of the radio-frequency voltage, which are applied to a quadrupole electrode 13, are increased as a mass-to-charge ratio m/z of an ion of a target for mass spectrometry becomes larger. By controlling in this manner, the ion frequency when the ion passes through the inside of the mass spectrometry unit 4 is increased as the mass number of an ion becomes higher, and therefore, it is possible to obtain the mass spectrum with higher resolution.

Abstract: There is provided a method for controlling a plasma processing apparatus that eliminates a preliminary study on a resonance point while maintaining a low contamination and a high uniformity even in multi-step etching. In a method for controlling a plasma processing apparatus including the step of adjusting a radio frequency bias current carried to a counter antenna electrode, the method includes the steps of: setting a reactance of a variable element to an initial value; detecting a bias current carried to the counter antenna electrode; searching for a maximum value of the detected electric current; and adjusting a value of the reactance of the variable element from the maximum value to the set value and then fixing the value.

Abstract: To provide an ion gun of a penning discharge type capable of narrowing a beam with a low ion beam current at a low acceleration voltage, an ion milling device including the same, and an ion milling method. An ion milling device that controls half width of a beam profile of an ion beam with which a sample is irradiated from an ion gun to be in a range of 200 ?m to 350 ?m. The device includes: the ion gun that ionizes a gas supplied from the outside, and emits an ion beam; a gas-flow-rate varying unit that varies a flow rate of the gas supplied to the ion gun; and a current measurement unit that measures a current value of the ion beam emitted from the ion gun. The gas-flow-rate varying unit sets a gas flow rate to be higher than a gas flow rate at which the ion beam current has a maximum value based on the current value measured by the current measurement unit and the flow rate of the gas determined by the gas-flow-rate varying unit.