Patents Assigned to Hitachi High-Technologies Corporation
  • Patent number: 10451553
    Abstract: During analysis of samples of unknown concentration, situations frequently occur in which the dynamic range is insufficient, necessitating reanalysis. Accordingly, a fluorescence spectrometer which splits a single object image into multiple images having different fluorescent intensity by means of image splitting elements, and simultaneously detects the plurality of images obtained thereby in different regions within the same detection plane, is proposed.
    Type: Grant
    Filed: March 18, 2015
    Date of Patent: October 22, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Motohiro Yamazaki, Yuichiro Ota, Satoshi Takahashi, Yoshitaka Kodama
  • Patent number: 10453663
    Abstract: An object of the invention is to provide a mass spectrometry device and an ion detection method therefor in which an ion amount can be detected with high accuracy. In order to achieve the object described above, a mass spectrometry device is provided which performs a channel scan measurement by changing a voltage to be applied to a mass separation unit to selectively extract a desired ion. The mass spectrometry device includes: an ion detection unit which detects an ion separated by the mass separation unit and outputs an electric signal; an ion amount measuring unit which measures an ion amount from the output of the ion detection unit; and an ion amount correction unit which corrects a detection amount of ion from an output of the ion amount measuring unit. In a process of a channel scan, the ion amount correction unit performs correction of a detection amount of ion detected in a present channel based on a detection amount of ion in a previous channel.
    Type: Grant
    Filed: January 21, 2016
    Date of Patent: October 22, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Shinichi Murakami, Yasushi Terui
  • Patent number: 10451643
    Abstract: The sample dispensing device sucks a liquid sample from a predetermined container and then discharges the sample to another container. The sample dispensing device includes a nozzle tip that sucks and holds the sample; a dispensing nozzle to which the nozzle tip can be detachably attached via a fitting part; a dispensing nozzle position control means that controls the position of the dispensing nozzle with respect to the predetermined container and the other container; a nozzle tip removing means that removes the nozzle tip from the dispensing nozzle; and a discarding box into which water can be supplied, and in which the nozzle tip removed from the dispensing nozzle is discarded. The nozzle tip is made of a water-soluble material, and after being removed from the dispensing nozzle by the nozzle tip removing means, the nozzle tip is dissolved by water in the discarding box.
    Type: Grant
    Filed: May 15, 2015
    Date of Patent: October 22, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Kouichi Obari, Eiji Takaya, Takashi Otsu
  • Patent number: 10451584
    Abstract: Provided is a biomolecule measuring device capable of effectively reducing measurement noise occurring when measuring a biomolecule sample using a semiconductor sensor. This biomolecule measuring device generates a trigger to react a sample with a reagent after starting to send the reagent onto the semiconductor sensor that detects ion concentration (see FIG. 7).
    Type: Grant
    Filed: November 18, 2013
    Date of Patent: October 22, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yoshimitsu Yanagawa, Takahide Yokoi, Naoshi Itabashi, Takayuki Kawahara, Sonoko Migitaka, Makiko Yoshida, Takamichi Muramatsu
  • Patent number: 10453695
    Abstract: A plasma processing apparatus processes a film layer to be processed disposed in advance on a surface of a wafer by using a plasma being switched on and off in a processing chamber in predetermined cycles and periods and includes a detection control unit for detecting a processing amount of the film layer on the surface of the wafer. The detection control unit includes a light source unit, a detection unit, and a film thickness/depth calculation unit. This detection control unit detects a plurality of times an amount indicating the intensity of light on a sample surface at predetermined cycles during a period in which the plasma is switched off while the wafer is being processed and detects a processing amount of the film layer on the sample surface by using the detected amount indicating the light intensity.
    Type: Grant
    Filed: September 25, 2017
    Date of Patent: October 22, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Soichiro Eto, Takeshi Ohmori, Tatehito Usui, Satomi Inoue
  • Patent number: 10453192
    Abstract: The present invention realizes determination of tissues and cells from an image by calculating feature values of a deformed degree of the cells even in a case where the tissues or the cells have various shapes. An image diagnosis support apparatus according to the present invention executes processing of inputting an image of cells, processing of extracting the feature values of a plurality of direction components from a target image of the processing, processing of determining whether or not the image corresponds to one-classification by using the plurality of feature values, and processing of determining whether or not the determination processing is finished with respect to all of the classifications set in advance (FIG. 1).
    Type: Grant
    Filed: January 28, 2016
    Date of Patent: October 22, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Hideharu Hattori, Yasuki Kakishita, Kenko Uchida, Sadamitsu Aso, Fumiaki Hamazato
  • Patent number: 10453650
    Abstract: A charged particle beam apparatus includes: an optical system that irradiates a sample mounted on a sample stage with a charged particle beam; at least one detector that detects a signal generated from the sample; an imaging device that acquires an observation image; a mechanism for changing observation positions in the sample which has at least one of a stage that moves the sample stage and a deflector that changes the charged particle beam's irradiation position; a display unit that displays an operation screen provided with an observation image displaying portion that displays the observation image and an observation position displaying portion that displays an observation position of the observation image; and a controller that controls display processing of the operation screen. The controller superimposes and displays on the observation position displaying portion a plurality of observation position images at different magnifications, based on the observation images' magnifications and coordinates.
    Type: Grant
    Filed: November 25, 2015
    Date of Patent: October 22, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Hiroyuki Chiba, Yoshinobu Hoshino, Shigeru Kawamata
  • Publication number: 20190316963
    Abstract: An automatic analysis apparatus comprises: a light source generating light having a center wavelength equal to or shorter than 340 nm; a fluorescent substance excited by the light source light, and generates light together with transmitted light from the light source, having a wavelength of 340 nm to 800 nm; a condenser lens; at least one slit; a reaction cell holding a reaction solution where a specimen and reagent are mixed, and that the light source light and the light from the fluorescent substance enter; and a detector that detects light transmitted through the reaction cell. The light source, fluorescent substance, condenser lens, and slit are provided along a straight light corresponding to the optical axis. The width of the slit's opening is equal to or narrower than the width of a ray forming an image of the light source at the position of the slit.
    Type: Application
    Filed: October 24, 2017
    Publication date: October 17, 2019
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Takeshi ISHIDA, Isao YAMAZAKI, Sakuichiro ADACHI, Shin IMAMURA
  • Publication number: 20190318906
    Abstract: A low noise blanking unit corresponds to a wide range of acceleration voltages (from several times higher than related voltages to low acceleration voltages) of an electron beam. A blanking unit of the measurement and inspection device includes a blanking control circuit, in which (i) an upper and a lower blanking electrodes are arranged in the irradiation direction of an electron beam; electrodes on the reverse sides of two opposing electrodes in each of the blanking electrodes arranged in the same direction are connected with the ground, (ii) when blanking is ON, positive voltages are output to remaining electrodes of the upper blanking electrode and negative voltages are output to remaining electrodes of the lower blanking electrode, and (iii) when the blanking is OFF, the same ground reference signal is output to the remaining electrodes of the upper blanking electrode and to the remaining electrodes of the lower blanking electrode.
    Type: Application
    Filed: January 18, 2019
    Publication date: October 17, 2019
    Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Wen LI, Shinichi MURAKAMI, Hiroyuki TAKAHASHI, Yuko SASAKI, Minoru YAMAZAKI, Hajime KAWANO
  • Patent number: 10446361
    Abstract: In order to provide an aberration correction system that realizes a charged particle beam of which the anisotropy is reduced or eliminated on a sample surface even in the case where there is magnetic interference between pole stages of an aberration corrector, an correction system includes a line cross position control device (209) which controls a line cross position in the aberration corrector of the charged particle beam so that a designed value and an actually measured value of the line cross position are equal to each other, an image shift amount extraction device (210), and a feedback determination device (211) which determines whether or not changing an excitation amount of the aberration corrector is necessary whether or not changing an excitation amount is necessary from an extracted image shift amount.
    Type: Grant
    Filed: July 1, 2015
    Date of Patent: October 15, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Zhaohui Cheng, Tomonori Nakano, Kotoko Urano, Takeyoshi Ohashi, Yasunari Sohda, Hideyuki Kazumi
  • Patent number: 10446359
    Abstract: Provided is a charged particle beam device that enables, even if a visual field includes therein a plurality of regions having different secondary electron emission conditions, the setting of appropriate energy filter conditions adapted to each of these regions. The charged particle beam device is equipped with a detector for detecting charged particles obtained on the basis of scanning, over a sample, a charged particle beam emitted from a charged particle source, and an energy filter for filtering by energy the charged particles emitted from the sample. Index values are determined for the plurality of regions contained within the scanning region of the charged particle beam, and, for each of a plurality of energy filter conditions, differences are calculated between the plurality of index values and the reference index values that have been set for each of the plurality of regions.
    Type: Grant
    Filed: January 28, 2015
    Date of Patent: October 15, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Toshiyuki Yokosuka, Hideyuki Kazumi, Yuzuru Mizuhara, Hajime Kawano
  • Patent number: 10444011
    Abstract: A sample for coordinates calibration including (1) a substrate having a circular plate-shape, and (2) multiple intentional defects that form a grid pattern with squares as unit grids on a surface of the substrate, the intentional defect providing a center point of the grid pattern coinciding with a center point of the substrate and, letting the maximum value of a number of the unit grids arranged from the center point of the substrate in radial directions be N (a natural number equal to or larger than two), a number of the intentional defects formed at equal spaces along one side of the unit grid being N+1 including the two intentional defects providing a vertex of the unit grid is proposed.
    Type: Grant
    Filed: November 25, 2014
    Date of Patent: October 15, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventor: Takahiro Jingu
  • Patent number: 10445875
    Abstract: A pattern-measuring apparatus and a semiconductor-measuring system are provided which are able to obtain an evaluation result for suitably selecting processing with respect to a semiconductor device. In particular, there is proposed a pattern-measuring apparatus including an arithmetic device which compares a circuit pattern of an electronic device with a reference pattern, in which the arithmetic device classifies the circuit pattern in processing unit of the circuit pattern on the basis of a comparison of a measurement result between the circuit pattern and the reference pattern with at least two threshold values.
    Type: Grant
    Filed: April 27, 2018
    Date of Patent: October 15, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yasutaka Toyoda, Norio Hasegawa, Takeshi Kato, Hitoshi Sugahara, Yutaka Hojo, Daisuke Hibino, Hiroyuki Shindo
  • Patent number: 10436576
    Abstract: To review minute defects that were buried in roughness scattered light with an observation device provided with a dark-field microscope, a scanning electron microscope (SEM), and a control unit, the present invention configures the dark-field microscope by installing a filter for blocking a portion of the scattered light, an imaging lens for focusing the scattered light that has passed through the filter, and a detector for dividing the image of the scattered light focused by the imaging lens into the polarization directions converted by a wavelength plate and detecting the resulting images, and the control has a calculation unit for determining the position of a defect candidate detected by another inspection device using the plurality of images separated into polarization directions and detected by the detector.
    Type: Grant
    Filed: March 19, 2015
    Date of Patent: October 8, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yohei Minekawa, Yuko Otani, Yuji Takagi
  • Patent number: 10438771
    Abstract: Provided is a measurement device including: an irradiation optical system which emits a primary charged quantum beam to a sample for scanning; a detector which detects secondary charged particles generated from the sample; and a signal processing unit which processes an output signal from the secondary charged particle detector which has detected the secondary charged particles, in which the signal processing unit includes a measurement unit which measures widths of a first pattern group calibrated with a well-known first dimension and a second pattern group calibrated with a well-known second dimension, and an operation unit which defines a relationship between the well-known dimensions of the first and second pattern groups and length measurement values of the first and second pattern groups as a function.
    Type: Grant
    Filed: September 22, 2016
    Date of Patent: October 8, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Michio Hatano, Yoshinori Nakayama, Masaru Matsuzaki, Hiroki Kawada, Yoshinori Momonoi, Zhigang Wang
  • Patent number: 10429363
    Abstract: In order to achieve high sensitivity without an increase in device complexity or cost, a far-ultraviolet absorbance detection device for liquid chromatography is provided with: an optical system including a light source that emits light including far-ultraviolet light, a diffraction grating for dispersing the light emitted from the light source, a flow cell through which a liquid is passed, a slit for selecting a predetermined wavelength of +1 order light diffracted by the diffraction grating and causing the light to enter the flow cell, a first photodetector for detecting the light transmitted by the flow cell, and a second photodetector for detecting light other than the +1 order light diffracted by the diffraction grating; a mechanism for evacuating or substituting the optical system with nitrogen gas; and a computation unit that calculates absorbance from an output signal from the first photodetector and an output signal from the second photodetector. The second photodetector is fixedly disposed.
    Type: Grant
    Filed: February 4, 2016
    Date of Patent: October 1, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuichi Uchiho, Masao Kamahori, Toshimichi Aota
  • Patent number: 10431445
    Abstract: To reduce contamination of the apparatus with an additive and to quickly switch spraying and stopping of the additive, provided is an ion analyzer including: an ion source for ionizing a measurement target substance, a spray unit for atomizing and spraying toward the measurement target substance a liquid containing an additive that reacts with the measurement target substance; a separation analysis unit for separately analyzing an ion generated by a reaction between the measurement target substance and the additive; a detector for detecting the ion that has been separately analyzed by the separation analysis unit; and a control unit for lowering a flow rate of the additive supplied to the spray unit during a time when the additive is not necessary.
    Type: Grant
    Filed: October 9, 2015
    Date of Patent: October 1, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Kazushige Nishimura, Hiroyuki Satake, Masuyuki Sugiyama, Hideki Hasegawa, Tomoyuki Sakai
  • Patent number: 10431417
    Abstract: In order to provide a sample holder capable of easily searching for an observation field of view, the sample holder includes a sample placement portion including a first top surface on which a counterbore part is formed and a rotational axis for rotating the first top surface horizontally, the counterbore part being aligned by being mounted with a sample supporting member having a pattern for alignment, a sample base portion including an opening through which the sample placement portion is capable of moving vertically and a second top surface around the opening, and a sample cover portion which has conductivity and is pressed down toward a direction of the second top surface of the sample base portion, so that a top surface of the sample supporting member placed on the sample placement portion and the second top surface of the sample base portion are flush with each other.
    Type: Grant
    Filed: April 13, 2016
    Date of Patent: October 1, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Ikeuchi, Shigeru Haneda, Yoshinobu Hoshino
  • Patent number: 10431416
    Abstract: In order to observe a water-containing sample with excellent convenience under an air atmosphere or a gas atmosphere, or under a desired pressure, in the present invention, there is provided an observation support unit for observation by irradiating the sample disposed in a non-vacuum space separated by a diaphragm from an inner space of a charged particle optical lens barrel that generates a charged particle beam, with the charged particle beam. The observation support unit includes a main body portion for covering a hole portion that forms an observation region where the sample is observed, and the sample, and the observation support unit is directly mounted between the sample and the diaphragm, that is, on the sample.
    Type: Grant
    Filed: August 21, 2015
    Date of Patent: October 1, 2019
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Yusuke Ominami, Akiko Hisada
  • Patent number: 10422808
    Abstract: A rinse mechanism rinses reaction cuvettes with first and second detergents. An R1 reagent pipetting mechanism 8 rinses the reaction cuvettes that have been rinsed by the rinse mechanism with a special detergent. A counting unit counts and stores in a storage unit a use frequency of each reaction cuvette for a specific reagent item. A determining unit determines whether the counted use frequency exceeds a predetermined threshold N1. A control unit controls the R1 reagent pipetting mechanism such that, in a case where the counted use frequency exceeds the predetermined threshold N1, the reaction cuvettes, which have exceeded the predetermined threshold N1, are soaked with the special detergent only for a period equal to or less than a value derived by multiplying a pipetting cycle time, which indicates a period when a sample is pipetted, by the total number of reaction cuvettes and a predetermined integer.
    Type: Grant
    Filed: February 27, 2018
    Date of Patent: September 24, 2019
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Hiroyuki Takayama, Kazuhiro Nakamura