Patents Assigned to IMEC
  • Publication number: 20110315951
    Abstract: The present disclosure is related to a method for forming a catalyst nanoparticle on a metal surface, the nanoparticle being suitable for growing a single nanostructure, in particular a carbon nanotube, the method comprising at least the steps of: providing a substrate, having a metal layer on at least a portion of the substrate surface, depositing a sacrificial layer at least on the metal layer, producing a small hole in the sacrificial layer, thereby exposing the metal layer, providing a single catalyst nanoparticle into the hole, removing the sacrificial layer. The disclosure is further related to growing a carbon nanotube from the catalyst nanoparticle.
    Type: Application
    Filed: April 28, 2011
    Publication date: December 29, 2011
    Applicants: Katholieke Universiteit Leven, K.U.LEUVEN R&D, IMEC
    Inventors: Hari Pathangi Sriraman, Ann Witvrouw, Philippe M. Vereecken
  • Publication number: 20110317486
    Abstract: Multi-gate metal-oxide-semiconductor (MOS) transistors and methods of operating such multi-gate MOS transistors are disclosed. In one embodiment, the multi-gate MOS transistor comprises a first gate associated with a first body factor and comprising a first gate electrode for applying a first gate voltage, and a second gate associated with a second body factor greater than or equal to the first body factor and comprising a second gate electrode for applying a second gate voltage. The multi-gate MOS transistor further comprises a body of semiconductor material between the first dielectric layer and the second dielectric layer, where the semiconductor body comprises a first channel region located close to the first dielectric layer and a second channel region located close to the second dielectric layer. The multi-gate MOS transistor still further comprises a source region and a drain region each having a conductivity type different from a conductivity type of the body.
    Type: Application
    Filed: June 24, 2011
    Publication date: December 29, 2011
    Applicant: IMEC
    Inventors: Zhichao Lu, Nadine Collaert, Marc Aoulaiche, Malgorzata Jurczak
  • Publication number: 20110317575
    Abstract: Embodiments of the present invention relate to methods and systems of transmitting data signals from at least one transmitting terminal with a spatial diversity capability to at least two receiving user terminals, each provided with spatial diversity receiving device. The methods and systems are useful, for example, in communication between terminals, e.g., wireless communication. In certain embodiments, transmission can be between a base station and two or more user terminals, wherein the base station and user terminals are each equipped with more than one antenna.
    Type: Application
    Filed: May 25, 2011
    Publication date: December 29, 2011
    Applicant: IMEC
    Inventors: André Bourdoux, Nadia Khaled
  • Publication number: 20110313270
    Abstract: The present disclosure relates to a neural probe system comprising: a carrier, at least one planar microelectrode attached to the carrier, the planar microelectrode comprising a set of two or more conductive segments, the set being confined in an area of from 15 ?m2 to 8000 ?m2, and electrical connections assuring that at least two sub-sets of conductive segments within the set are individually switchable to a same input and/or output line so that the surface area and/or the shape of the microelectrode electrically connected to the line can be varied.
    Type: Application
    Filed: April 8, 2011
    Publication date: December 22, 2011
    Applicants: Katholieke Universiteit Leuven, K.U. LEUVEN R&D, IMEC
    Inventors: Hercules Pereira Neves, Guy Orban
  • Publication number: 20110309457
    Abstract: Methods of providing a semiconductor device with a control electrode structure having a controlled overlap between control electrode and first and second main electrode extensions without many spacers are disclosed. A preferred method provides a step of etching back an insulating layer performed after amorphizing and implanting the main electrode extensions. Preferably, the step that amorphizes the extensions also partly amorphizes the insulating layer. Because etch rates of amorphous insulator and crystalline insulator differ, the amorphized portion of the insulating layer may serve as a natural etch stop to enable even better fine-tuning of the overlap. Corresponding semiconductor devices are also provided.
    Type: Application
    Filed: June 23, 2011
    Publication date: December 22, 2011
    Applicants: Koninkiijke Philips Electronics N.V., Interuniversitair Microelektronica centrum (IMEC)
    Inventors: Kirklen Henson, Radu Catalin Surdeanu
  • Publication number: 20110313175
    Abstract: The present preferred embodiments relate to a method for the synthesis of a compound having the following general formula: the method comprising the step of reacting, in presence of a diprotic acid having a negative pKa, a compound having the general formula: wherein R1 and R2 are organic groups and wherein X and Y are independently selected from the group consisting of hydrogen, chloro, bromo, iodo, boronic acid, boronate esters, borane, pseudohalogen and organotin. It further relates to compounds so obtained and to compounds resulting from the ring closure of compound (II).
    Type: Application
    Filed: February 16, 2011
    Publication date: December 22, 2011
    Applicants: Universiteit Hasselt, IMEC
    Inventors: Dirk Vanderzande, Laurence Lutsen, Sarah Van Mierloo
  • Publication number: 20110308598
    Abstract: A method for forming, on an organic semiconductor layer, an electrical contact layer comprising a metal, is disclosed. In one aspect, the method includes providing a charge collecting barrier layer on the organic semiconductor layer, providing a liquid composition comprising a precursor for the metal on the charge collecting barrier layer, and performing a sintering process. The charge collecting barrier layer is substantially impermeable to the components of the liquid composition.
    Type: Application
    Filed: May 12, 2011
    Publication date: December 22, 2011
    Applicants: KATHOLIEKE UNIVERSITEIT LEUVEN R&D, IMEC
    Inventor: CLAUDIO GIROTTO
  • Publication number: 20110312056
    Abstract: The present invention relates to a population of monodisperse magnetic nanoparticles with a diameter between 1 and 100 nm which are coated with a layer with hydrophilic end groups. Herein the layer with hydrophilic end groups comprises an inner layer of monosaturated and/or monounsaturated fatty acids bound to said nanoparticles and bound to said fatty acids, an outer layer of a phospholipid conjugated to a monomethoxy polyethyleneglycol (PEG) comprising a hydrophilic end group, or comprises a covalently bound hydrophilic layer bound to said nanoparticles.
    Type: Application
    Filed: May 19, 2011
    Publication date: December 22, 2011
    Applicants: KATHOLIEKE UNIVERSITEIT LEUVEN, K.U. LEUVEN R&D, IMEC
    Inventors: Deepak Balaji Thimiri Govinda Raj, Liesbet Lagae, Wim Annaert, Gustaaf Borghs
  • Publication number: 20110309489
    Abstract: A method of forming a doped region in a semiconductor layer of a substrate by alloying with doping elements is disclosed. In one aspect, the method includes screen printing a paste layer of doping element paste to the substrate and firing the screen printed paste layer of doping element paste, wherein a highly pure doping element layer is applied to the semiconductor layer after which the paste layer is screen printed to the doping element layer.
    Type: Application
    Filed: June 16, 2011
    Publication date: December 22, 2011
    Applicant: IMEC
    Inventor: Sukhvinder Singh
  • Publication number: 20110308603
    Abstract: A method of passivating a silicon surface is disclosed. In one aspect, the method includes cleaning the silicon surface by subjecting the silicon surface to a sequence of steps wherein the final step is a chemical oxidation step resulting in a hydrophilic silicon surface. The method may also include drying the cleaned silicon surface using an advanced drying technique, and/or depositing an oxide layer on the silicon surface.
    Type: Application
    Filed: June 17, 2011
    Publication date: December 22, 2011
    Applicants: Katholieke Universiteit Leuven, IMEC
    Inventors: Bart Vermang, Aude Rothschild, Twan Bearda
  • Publication number: 20110311227
    Abstract: Systems and methods for transferring incoming single-ended burst signals of which at least one characteristic varies widely from burst to burst onto a pair of differential lines. The systems comprise an input for receiving an incoming burst signal, a signal adaptation block for adapting said widely varying characteristic and a single-ended-to-differential converter. In a first aspect a reset signal for resetting a settings determination block, which controls the signal adaptation block, is sent backwards over the differential lines, preferably using a common-mode signal. In a second aspect, a status freezing mechanism is employed for freezing the settings of the settings determination block after the end of the preamble of an incoming burst.
    Type: Application
    Filed: April 4, 2008
    Publication date: December 22, 2011
    Applicants: Universiteit Gent, Interuniversitair Microelektronica Centrum (IMEC)
    Inventors: Peter Ossieur, Tine De Ridder, Johan Bauwelinck, Xing Zhi Qiu, Jan Vandewege
  • Patent number: 8080505
    Abstract: The present invention is related to a slurry composition for polishing copper integrated with tungsten containing barrier layers and its use in a CMP method. The present invention is also related to a method for polishing copper integrated with tungsten containing barrier layers by means of an aqueous solution containing abrasive particles, an inorganic acid such as HNO3 as etchant for copper that prevents galvanic corrosion of the tungsten containing metal barrier and at least one organic compound to provide sufficient copper corrosion inhibition.
    Type: Grant
    Filed: June 8, 2009
    Date of Patent: December 20, 2011
    Assignee: IMEC
    Inventors: Didem Ernur, Valentina Terzieva, Jörg Schuhmacher
  • Publication number: 20110304987
    Abstract: The present disclosure is related to a device for cooling the surface of a semiconductor device such as an integrated circuit or the like, the cooling device comprising a plurality of channels (3?) which are non-parallel to the surface to be cooled, each channel comprising a plurality of separate electrodes (5) or equivalent conducting areas arranged along the length of each channel, the device further comprising or being connectable to means for applying a voltage to the electrodes or conducting areas in each channel according to a sequence, the sequence being such that a droplet (6) of cooling liquid in a channel may be moved from one electrode to the next, thereby transporting the droplet from the top of the channel to the bottom, from where the droplet impinges on the surface to be cooled.
    Type: Application
    Filed: June 1, 2011
    Publication date: December 15, 2011
    Applicant: IMEC
    Inventors: Herman Oprins, Bart Vandevelde, Paolo Fiorini, Eric Beyne, Joeri De Vos, Bivragh Majeed
  • Publication number: 20110305099
    Abstract: A semiconductor memory device is disclosed. In one aspect, the device includes memory blocks with memory cells connected to a local bit-line, each local bit-line being connectable to a global bit-line for memory readout. There are also pre-charging circuitry for pre-charging the bit-lines and a read buffer for discharging the global bit-line during a read operation. The local bit-lines are pre-charged to a predetermined first voltage substantially lower than the supply voltage (VDD) of the memory device. A segment buffer is provided between each local bit-line and an input node of the respective read buffer. The segment buffer activates the read buffer during the read operation upon occurrence of a discharge on the connected local bit-line.
    Type: Application
    Filed: May 11, 2011
    Publication date: December 15, 2011
    Applicants: Stichting IMEC Nederland, Katholieke Universiteit Leuven, IMEC
    Inventors: Vibhu Sharma, Stefan Cosemans, Wim Dehaene, Francky Catthoor, Maryam Ashouei, Jos Huisken
  • Publication number: 20110303280
    Abstract: A method for manufacturing interdigitated back contact photovoltaic cells is disclosed. In one aspect, the method includes providing on a rear surface of a substrate a first doped layer of a first dopant type, and providing a dielectric masking layer overlaying it. Grooves are formed through the dielectric masking layer and first doped layer, extending into the substrate in a direction substantially orthogonal to the rear surface and extending in a lateral direction underneath the first doped layer at sides of the grooves. Directional doping is performed in a direction substantially orthogonal to the rear surface, thereby providing doped regions with dopants of a second dopant type at a bottom of the grooves. Dopant diffusion is performed to form at the rear side of the substrate one of the emitter regions and back surface field regions between the grooves and the other at the bottom of the grooves.
    Type: Application
    Filed: June 14, 2011
    Publication date: December 15, 2011
    Applicant: IMEC
    Inventors: Bartlomiej Jan Pawlak, Tom Janssens
  • Patent number: 8079093
    Abstract: One inventive aspect is related to an atomic force microscopy probe. The probe comprises a tip configuration with two probe tips on one cantilever arm. The probe tips are electrically isolated from each other and of approximately the same height with respect to the cantilever arm. The outer surface of the tip configuration has the shape of a body with a base plane and an apex. The body is divided into two sub-parts by a gap located approximately symmetrically with respect to the apex and approximately perpendicular to the base plane. Another inventive aspect related to methods for producing such an AFM probe.
    Type: Grant
    Filed: February 6, 2009
    Date of Patent: December 13, 2011
    Assignee: IMEC
    Inventor: Marc Fouchier
  • Patent number: 8072012
    Abstract: Tunnel field-effect transistors (TFETs) are regarded as successors of metal-oxide semiconductor field-effect transistors (MOSFETs), but silicon-based TFETs typically suffer from low on-currents, a drawback related to the large resistance of the tunnel barrier. To achieve higher on-currents an elongate monocrystalline nanostructure-based TFET with a heterostructure made of a different semiconducting material (e.g. germanium (Ge)) is used. An elongate monocrystalline nanostructure made of a different semiconducting material is introduced which acts as source (or alternatively drain) region of the TFET. The introduction of the heterosection is such that the lattice mismatch between silicon and germanium does not result in a highly defective interface. A dynamic power reduction as well as a static power reduction can result, compared to conventional MOSFET configurations.
    Type: Grant
    Filed: September 14, 2007
    Date of Patent: December 6, 2011
    Assignees: IMEC, Katholieke Universiteit Leuven, K.U. Leuven R&D
    Inventors: Anne S. Verhulst, William G. Vandenberghe
  • Publication number: 20110291891
    Abstract: A method is disclosed for mixed analog/digital beamforming in a wireless communication system having transmit and receive antennas and analog front-ends connected to either the transmit antennas or the receive antennas.
    Type: Application
    Filed: May 20, 2011
    Publication date: December 1, 2011
    Applicant: IMEC
    Inventors: Jimmy Nsenga, André Bourdoux
  • Publication number: 20110291179
    Abstract: A method for manufacturing a non-volatile memory device is described. The method comprises growing a layer in a siliconoxide consuming material, e.g. DyScO, on top of the upper layer of the layer where charge is stored. A non-volatile memory device is also described. In the non-volatile memory device, the interpoly/blocking dielectric comprises a layer in a siliconoxide consuming material, e.g. DyScO, on top of the upper layer of the layer where charge is stored, the siliconoxide consuming material having consumed at least part of the upper layer.
    Type: Application
    Filed: August 11, 2011
    Publication date: December 1, 2011
    Applicant: IMEC
    Inventors: Bogdan Govoreanu, Stefan De Gendt, Sven Van Elshocht, Tom Schram
  • Patent number: 8067810
    Abstract: Systems and methods for controlling a micro electromechanical device using power actuation are disclosed. The disclosed micro electromechanical systems comprise at least one electrostatically actuatable micro electromechanical device and an actuation device. The micro electromechanical device comprises a first conductor and a second conductor having a moveable portion which in use may be attracted by the first conductor as a result of a predetermined actuation power. The actuation device comprises a high frequency signal generator for generating at least part of the actuation power by means of a predetermined high frequency signal with a frequency higher than the mechanical resonance frequency of the moveable portion of the micro electromechanical device.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: November 29, 2011
    Assignee: IMEC
    Inventors: Xavier Rottenberg, Stefan Pauwen