Abstract: According to an embodiment, a method for stress-reduced forming a semiconductor device includes: providing a semiconductor wafer including an upper side and a first semiconductor layer of a first semiconductor material at the upper side; forming, in a vertical cross-section which is substantially orthogonal to the upper side, at the upper side a plurality of first vertical trenches and a plurality of second vertical trenches between adjacent first vertical trenches so that the first vertical trenches have, in the vertical cross-section, a larger horizontal extension than the second vertical trenches; and forming a plurality of third semiconductor layers at the upper side which are, in the vertical cross-section, spaced apart from each other by gaps each of which overlaps, in the vertical cross-section, with a respective first vertical trench when seen from above. At least one of the third semiconductor layers includes a semiconductor material which is different to the first semiconductor material.
Abstract: A method for producing a semiconductor component with a semiconductor body includes providing a substrate of a first conductivity type. A buried semiconductor layer of a second conductivity type is provided on the substrate. A functional unit semiconductor layer is provided on the buried semiconductor layer. At least one trench, which reaches into the substrate, is formed in the semiconductor body. An insulating layer is formed, which covers inner walls of the trench and electrically insulates the trench interior from the functional unit semiconductor layer and the buried semiconductor layer, the insulating layer having at least one opening in the region of the trench bottom. The at least one trench is filled with an electrically conductive semiconductor material of the first conductivity type, wherein the electrically conductive semiconductor material forms an electrical contact from a surface of the semiconductor body to the substrate.
Type:
Application
Filed:
January 28, 2014
Publication date:
May 22, 2014
Applicant:
Infineon Technologies AG
Inventors:
Andreas Meiser, Walter Hartner, Hermann Gruber, Dietrich Bonart, Thomas Gross
Abstract: The invention relates to a device and a method for storing binary data in a storage device, in which the binary data is transformed to and stored as ternary data. The storage device uses memory cells capable of storing three states. The device and method furthermore are configured to identify and correct falsified ternary data when reading and outputting the data from storage device.
Abstract: Methods of fabricating semiconductor devices and structures thereof are disclosed. In a preferred embodiment, a method of fabricating a semiconductor device includes providing a workpiece having a plurality of trenches formed therein, forming a liner over the workpiece, and forming a layer of photosensitive material over the liner. The layer of photosensitive material is removed from over the workpiece except from over at least a portion of each of the plurality of trenches. The layer of photosensitive material is partially removed from over the workpiece, leaving a portion of the layer of photosensitive material remaining within a lower portion of the plurality of trenches over the liner.
Abstract: In various embodiments, a method for filling a contact hole in a chip package arrangement is provided. The method may include introducing electrically conductive discrete particles into a contact hole of a chip package; and forming an electrical contact between the electrically conductive particles and a contact terminal of the front side and/or the back side of the chip.
Type:
Grant
Filed:
September 10, 2010
Date of Patent:
May 20, 2014
Assignee:
Infineon Technologies AG
Inventors:
Benjamin Alles, Joachim Mahler, Edward Fuergut, Ivan Nikitin
Abstract: A semiconductor switching arrangement includes a normally on semiconductor component of a first conduction type and a normally off semiconductor component of a second conduction type which is the complement of the first conduction type. A load path of the normally off semiconductor component is connected in series with the load path of the normally on semiconductor component. A first actuation circuit connected between the control connection of the normally on semiconductor component and a load path connection of the normally on semiconductor component. The load path connection of the normally on semiconductor component is arranged between the normally on and normally off semiconductor components. A second actuation circuit is connected between the control connection of the normally off semiconductor component and a load path connection of the normally off semiconductor component.
Abstract: A circuit arrangement includes: a reverse conducting IGBT configured to allow for conducting a load current in a forward direction and in a reverse direction, the IGBT having a load current path and a gate electrode; a gate control unit connected to the gate electrode and configured to activate or deactivate the IGBT by charging or, respectively, discharging the gate electrode in accordance with a gate control signal; a gate driver unit configured to detect whether the IGBT conducts current in the forward direction or the reverse direction by sensing a gate current caused by a change of a voltage drop across the load path due to a changing of the reverse conducting IGBT into its reverse conducting state, the gate control unit further configured to deactivate the IGBT or to prevent an activation of the IGBT via its gate electrode when the gate driver unit detects that the IGBT is in its reverse conducting state.
Abstract: A CMOS device with transistors having different gate dielectric materials and a method of manufacture thereof. A CMOS device is formed on a workpiece having a first region and a second region. A first gate dielectric material is deposited over the second region. A first gate material is deposited over the first gate dielectric material. A second gate dielectric material comprising a different material than the first gate dielectric material is deposited over the first region of the workpiece. A second gate material is deposited over the second gate dielectric material. The first gate material, the first gate dielectric material, the second gate material, and the second gate dielectric material are then patterned to form a CMOS device having a symmetric Vt for the PMOS and NMOS FETs.
Abstract: A signal transmission arrangement includes a transformer with a first and a second winding. A damping circuit has an input terminal for receiving an input signal. The damping circuit is coupled to the first winding and is configured to have an electrical resistance that is dependent on the input signal. An oscillator circuit includes the second winding and is configured to provide an oscillating signal. An evaluation circuit is configured to receive the oscillating signal and to provide an output signal that is dependent on an amplitude of the oscillating signal.
Abstract: A memory circuit arrangement and a fabrication method are disclosed. The memory circuit arrangement has a memory cell area. The memory cell area contains memory cell transistors, one column of which are selected using a triple gate area selection transistor. The transistor has gate area that extends into isolating trenches. The isolating trenches isolate the memory cell in different columns of the memory cell array.
Abstract: A sensor arrangement is provided, the sensor arrangement including a chip including a sensor circuit configured to detect a bending of the chip; and a package structure configured to protect the chip; wherein the package structure includes a first region and a second region, and wherein the package structure is configured such that it is easier to be deformed in the first region than in the second region.
Abstract: Some embodiments herein relate to a sensor package. The sensor package includes a printed circuit board with a laminar current conductor arranged on a first main surface of the printed circuit board. The sensor package also includes a sensor chip adapted to measure a current flowing through the laminar current conductor, wherein the sensor chip comprises a magnetic field sensor. The sensor chip is electrically insulated from the current conductor by the printed circuit board, and is arranged on a second main surface of the printed circuit board opposite to the first main surface. The sensor chip is hermetically sealed between the mold material and the printed circuit board, or is arranged in the printed circuit board and hermetically sealed by the printed circuit board.
Abstract: Contact openings are produced in a semiconductor body by forming a plurality of self-aligned structures on a main surface of a semiconductor body, each self-aligned structure filling a trench formed in the semiconductor body and extending above and onto the main surface. Adjacent ones of the self-aligned structures have spaced apart sidewalls which face each other. A spacer layer is formed on the sidewalls of the self-aligned structures. Openings are formed in the semiconductor body between adjacent ones of the self-aligned structures while the spacer layer is on the sidewalls of the self-aligned structures. Each opening has a width and a distance to the sidewall of an adjacent trench which corresponds to a thickness of the spacer layer. Self-aligned contact structures can also be produced on a semiconductor body, with or without using the spacer layer.
Abstract: A power semiconductor module includes a housing, a base plate disposed in the housing, a plurality of substrates mounted to the base plate, a plurality of power transistor die mounted to the substrates and a plurality of terminals mounted to the substrates and protruding through the housing. The terminals are in electrical connection with the power transistor die. The power semiconductor module further includes a wireless surface acoustic wave (SAW) temperature sensor disposed in the housing of the power semiconductor module.
Abstract: The disclosed invention relates to a passive keyless entry receiver system having an application controller that is activated upon receipt of an entire payload of a data packet to determine if peak RSSI levels for a plurality of RSSI steps within the payload match an expected sequence of peak RSSI levels (i.e., if a fingerprint is genuine). The receiver system has a receiver that receives a wireless signal having a data packet with a plurality of power levels within a plurality of RSSI steps of the payload. The receiver system writes a plurality of peak RSSI levels to a plurality of RSSI peak payload registers that store the peak RSSI levels for RSSI steps of the payload. Once an entire payload of a data packet has been received an application controller determines if the peak payloads correspond to an expected sequence of power levels.
Abstract: An analog-to-digital converter arrangement may include an analog amplifier with variable gain; an analog-to-digital converter; a digital reconstruction element including elements to reduce an influence of transients during a change of the variable gain of the analog amplifier.
Type:
Application
Filed:
November 12, 2013
Publication date:
May 15, 2014
Applicant:
Infineon Technologies AG
Inventors:
Dietmar STRAEUSSNIGG, Andreas WIESBAUER
Abstract: A system having has a pulse width modulation controller to successively activate each of a plurality of channels each in its own individual channel time slot is described. The system also has a sampling multiplexer configured to successively sample a signal derived from each of the plurality of channels during each individual channel time slot. Each individual time slot has an individual sampling sequence.
Abstract: A semiconductor device is provided. The semiconductor device includes: a substrate; device isolation regions formed in the substrate; an impurity region formed in a region of the substrate between every two adjacent ones of the device isolation regions; a gate electrode formed on the substrate; first and second interlayer insulating films sequentially formed on the substrate; a metal interlayer insulating film formed on the second interlayer insulating film and comprising metal wiring layers; a first contact plug electrically connecting each of the metal wiring layers and the impurity region; and a second contact plug electrically connecting each of the metal wiring layers and the gate electrode, wherein the first contact plug is formed in the first and second interlayer insulating films, and the second contact plug is formed in the second interlayer insulating film.
Type:
Application
Filed:
January 17, 2014
Publication date:
May 15, 2014
Applicants:
Samsung Electronics Co., Ltd., International Business Machines Corporation, Infineon Technologies AG
Inventors:
Dong-Hee Yu, Bong-Seok Suh, Yoon-Hae Kim, O Sung Kwon, Oh-Jung Kwon
Abstract: A power semiconductor device is manufactured by forming a power transistor having a plurality of transistor cells on a semiconductor die, and purposely introducing inhomogeneity into the power transistor so that the number of current filaments in the transistor cells with reduced local current density increases and fewer transient avalanche oscillations occur in the power transistor during operation.
Abstract: In an embodiment, a method of generating a pulse-width modulated signal from an input signal includes calculating a finite number of basis functions of a first pulse-width modulated signal based on the input signal, and forming an electronic output based on the calculated finite number of basis functions.