Patents Assigned to Materious, LLC
  • Publication number: 20130240368
    Abstract: Copper electroplating methods provide low internal stress copper deposits. Concentrations of accelerators in the copper electroplating bath vary as a function of the plating current density and the low internal stress copper deposit is observed as a matt copper deposit.
    Type: Application
    Filed: September 9, 2012
    Publication date: September 19, 2013
    Applicant: Rohm and Haas Electronic Material LLC
    Inventors: George R. Allardyce, Gary Hamm, Narsmoul Karaya
  • Publication number: 20130244178
    Abstract: New photoresist compositions are provided that comprise a component that comprises two or more amide groups.
    Type: Application
    Filed: September 9, 2012
    Publication date: September 19, 2013
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Gregory P. Prokopowicz, Gerhard Pohlers, Cong Liu, Chunyi Wu, Cheng-Bai Xu, Joon Seok Oh
  • Patent number: 8536049
    Abstract: Methods of forming metal contacts with metal inks in the manufacture of photovoltaic devices are disclosed. The metal inks are selectively deposited on semiconductor coatings by inkjet and aerosol apparatus. The composite is heated to selective temperatures where the metal inks burn through the coating to form an electrical contact with the semiconductor. Metal layers are then deposited on the electrical contacts by light induced or light assisted plating.
    Type: Grant
    Filed: October 14, 2011
    Date of Patent: September 17, 2013
    Assignees: Rohm and Haas Electronic Materials LLC, Alliance for Sustainable Energy, LLC
    Inventors: Erik Reddington, Thomas C. Sutter, Lujia Bu, Alexandra Cannon, Susan E. Habas, Calvin J. Curtis, Alexander Miedaner, David S. Ginley, Marinus Franciscus Antonius Maria Van Hest
  • Patent number: 8535591
    Abstract: A process for making biodegradable articles is presented. The process comprises providing a biodegradable material. A molding assembly comprising a mold and a carrier for affixing the mold to a centrifuge is provided. The biodegradable material is inserted into the mold and the mold subjected to a centrifugal force wherein solvent is separated from the biodegradable material and the shaped article is formed.
    Type: Grant
    Filed: November 2, 2007
    Date of Patent: September 17, 2013
    Assignee: Green Materials, LLC
    Inventors: Dara L. Woerdeman, Peter J. Joyce, John E. Joyce
  • Publication number: 20130236742
    Abstract: White bronze is electroplated from a cyanide-free tin/copper bath onto a void inhibiting layer coating a copper underlayer. The void inhibiting metal layer includes one or more void inhibiting metals.
    Type: Application
    Filed: August 30, 2012
    Publication date: September 12, 2013
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Katharina WEITERSHAUS, Wan ZHANG-BEGLINGER, Jonas GUEBEY
  • Patent number: 8531033
    Abstract: A contact plug structure formed on a contact hole of an insulating layer of a semiconductor device includes a metal silicide layer formed on a bottom part of the contact hole of the insulating layer, a manganese oxide layer formed on the metal silicide layer in the contact hole, and a buried copper formed on the manganese oxide layer which substantially fills the contact hole.
    Type: Grant
    Filed: September 7, 2010
    Date of Patent: September 10, 2013
    Assignee: Advanced Interconnect Materials, LLC
    Inventors: Junichi Koike, Akihiro Shibatomi, Kouji Neishi
  • Publication number: 20130230657
    Abstract: Catalysts include nanoparticles of catalytic metal and gallic acid or gallic acid derivatives or salts thereof. The catalysts are used in electroless metal plating. The catalysts are free of tin.
    Type: Application
    Filed: August 17, 2012
    Publication date: September 5, 2013
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Kristen M. Milum, Donald E. Cleary, Maria Anna Rzeznik
  • Publication number: 20130230707
    Abstract: Optical articles of zinc sulfide and zinc selenide with thick coatings of alumina are disclosed. The alumina coatings are deposited on the zinc sulfide and zinc selenide by a microwave assisted magnetron sputtering. In addition to alumina coatings, the optical articles may also include various polymer coatings.
    Type: Application
    Filed: September 20, 2010
    Publication date: September 5, 2013
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Jitendra S. GOELA, Heather A. G. STERN
  • Patent number: 8518230
    Abstract: A method of reducing tin whisker formation including steps of a) providing a tin or tin-alloy bath containing one or more sources of tin and one or more crystal plane orientation enhancing compounds selected from imides, imines, amides, polyamides, amines, polyamines, polyols, dibutyl thiourea, allyl thiourea, amino thiazole, rhodanine, sulfosalicylic acid and sulfamides; and b) electrodepositing a layer of tin or tin-alloy on a substrate, the tin or tin-alloy layer is free of crystal planes or equivalent planes thereof forming an angle of 5° to 22° with an adjacent crystal plane or an equivalent plane.
    Type: Grant
    Filed: July 13, 2005
    Date of Patent: August 27, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: André Egli
  • Publication number: 20130216713
    Abstract: Catalysts which include nanoparticles of palladium metal and cellulose derivatives are used in electroless metal plating. The palladium catalysts are free of tin.
    Type: Application
    Filed: August 17, 2012
    Publication date: August 22, 2013
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Feng LIU, Maria Anna Rzeznik
  • Publication number: 20130216718
    Abstract: Catalysts include nanoparticles of catalytic metal and cellulose or cellulose derivatives. The catalysts are used in electroless metal plating. The catalysts are free of tin.
    Type: Application
    Filed: August 17, 2012
    Publication date: August 22, 2013
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Feng LIU, Maria Anna RZEZNIK
  • Patent number: 8513052
    Abstract: A method for preparing a Group 1a-1b-3a-6a material using a selenium ink comprising a chemical compound having a formula RZ—Sex—Z?R? stably dispersed in a liquid carrier is provided, wherein the selenium ink is hydrazine free and hydrazinium free.
    Type: Grant
    Filed: October 12, 2012
    Date of Patent: August 20, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Kevin Calzia, David Mosley, Charles R. Szmanda
  • Publication number: 20130206602
    Abstract: Tin-silver alloy electroplating baths having certain amine-oxide surfactants and methods of electrodepositing a tin-silver-containing layer using these baths are disclosed. Such electroplating baths are useful to provide tin-silver solder deposits having reduced void formation and improved within-die uniformity.
    Type: Application
    Filed: February 9, 2012
    Publication date: August 15, 2013
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Inho LEE, Elissei Iagodkine, Yi Qin, Yu Luo
  • Publication number: 20130211118
    Abstract: A method of continuously manufacturing organometallic compounds is provided where two or more reactants are conveyed to a reactor having a laminar flow contacting zone, a heat transfer zone, and a mixing zone having a turbulence-promoting device; and causing the reactants to form the organometallic compound.
    Type: Application
    Filed: August 15, 2012
    Publication date: August 15, 2013
    Applicants: Rohm and Haas Electronic Materials LLC, Dow Global Technologies Inc.
    Inventors: Ravindra S. Dixit, Hua Bai, Curtis D. Modtland, Robert A. Ware, John G. Pendergast, JR., Christopher P. Christenson, Deodatta Vinayak Shenai-Khatkhate, Artashes Amamchyan, Kenneth M. Crouch, Robert F. Polcari
  • Publication number: 20130209934
    Abstract: A copolymer comprising the polymerized product of an electron-sensitizing acid deprotectable monomer, such as the monomer having the formula (XX), and a comonomer: wherein Ra is H, F, —CN, C1-10 alkyl, or C1-10 fluoroalkyl; Rx and Ry are each independently a substituted or unsubstituted C1-10 alkyl group or C3-10 cycloalkyl group; Rz is a substituted or unsubstituted C6-20 aromatic-containing group or C6-20 cycloaliphatic-containing group; wherein Rx and Ry together optionally form a ring; and wherein at least one of Rx, Ry and Rz is halogenated. A photoresist and coated substrate comprising the copolymer, and a method of making an electronic device using the photoresist, are also disclosed.
    Type: Application
    Filed: January 29, 2013
    Publication date: August 15, 2013
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Owendi Ongayi, James W. Thackeray
  • Patent number: 8507090
    Abstract: Molybdenum disulfide powders include substantially spherically-shaped particles of molybdenum disulfide that are formed from agglomerations of generally flake-like sub-particles. The molybdenum disulfide powders are flowable and exhibit uniform densities. Methods for producing a molybdenum disulfide powder may include the steps of: Providing a supply of molybdenum disulfide precursor material; providing a supply of a liquid; providing a supply of a binder; combining the molybdenum disulfide precursor material with the liquid and the binder to form a slurry; feeding the slurry into a stream of hot gas; and recovering the molybdenum disulfide powder, the molybdenum disulfide powder including substantially spherically-shaped particles of molybdenum disulfide formed from agglomerations of generally flake-like sub-particles.
    Type: Grant
    Filed: April 27, 2011
    Date of Patent: August 13, 2013
    Assignee: Climax Engineered Materials, LLC
    Inventors: Matthew C. Shaw, Carl V. Cox, Yakov Epshteyn
  • Patent number: 8507176
    Abstract: Provided are radiation-sensitive polymers and compositions which may be used in photolithographic processes. The polymers and compositions provide enhanced sensitivity to activating radiation.
    Type: Grant
    Filed: December 30, 2010
    Date of Patent: August 13, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James W. Thackeray, Emad Aqad
  • Patent number: 8506788
    Abstract: Leveling agents for metal plating baths are provided. Plating baths containing such leveling agents provide metal deposits having substantially level surfaces. Such leveling agents may be selected to selectively incorporate desired levels of impurities into the metal deposit.
    Type: Grant
    Filed: September 11, 2012
    Date of Patent: August 13, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Deyan Wang, Robert D. Mikkola, George G. Barclay
  • Patent number: 8507185
    Abstract: Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.
    Type: Grant
    Filed: June 28, 2010
    Date of Patent: August 13, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Young Cheol Bae, Thomas Cardolaccia, Yi Liu
  • Patent number: 8501383
    Abstract: Cyanurate compositions are provided that are particularly useful as a reagent to form a resin component of a coating composition underlying an overcoated photoresist. Preferred isocyanurates compound comprise substitution of multiple cyanurate nitrogen ring atoms by at least two distinct carboxy and/or carboxy ester groups.
    Type: Grant
    Filed: May 18, 2010
    Date of Patent: August 6, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Anthony Zampini, Vipul Jain, Cong Liu, Suzanne Coley, Owendi Ongayi