Abstract: Methods of vapor depositing metal-containing films using certain organometallic compounds containing a carbonyl-containing ligand are disclosed.
Type:
Grant
Filed:
September 14, 2010
Date of Patent:
January 1, 2013
Assignee:
Rohm and Haas Electronic Materials LLC
Inventors:
Qing Min Wang, Deodatta Vinayak Shenai-Khatkhate, Huazhi Li
Abstract: A gallium formulated ink is provided. Also provided are methods of preparing the gallium formulated ink and for using the gallium formulated ink to deposit a Group 1b/gallium/(optional indium)/Group 6a material on a substrate for use in the manufacture of a variety of chalcogenide containing semiconductor materials, such as, thin film transistors (TFTs), light emitting diodes (LEDs); and photoresponsive devices (e.g., electrophotography (e.g., laser printers and copiers), rectifiers, photographic exposure meters and photovoltaic cells) and chalcogenide containing phase change memory materials.
Abstract: A device for dispensing individual components of a two-component adhesive includes first and second manifold members, each having a distribution chamber therein. A set of conveying tubes is supported within the dispensing device and collectively present a predetermined total cross-sectional flow area to the first distribution chamber. An array of openings and an array of passages extend through the second member. The openings receive the discharge ends of the conveying tubes. The passages are disposed in fluid communication with the second distribution chamber. The passages collectively present a predetermined total cross-sectional flow area to the second distribution chamber member. The openings and the passages are laterally spaced with respect to each other such that the discharge ends of the tubes are interspersed among the passages. The cross-sectional flow areas presented to the first and second distribution chambers are different.
Type:
Application
Filed:
December 17, 2010
Publication date:
December 27, 2012
Applicant:
Actamax Surgical Materials, LLC
Inventors:
James William Ashmead, William Gerald DiMaio
Abstract: Disclosed are metal plating compositions for plating a metal on a substrate. The metal plating compositions include compounds which influence the leveling and throwing performance of the metal plating compositions. Also disclosed are methods of depositing metals on a substrate.
Type:
Grant
Filed:
August 15, 2011
Date of Patent:
December 25, 2012
Assignee:
Rohm and Haas Electronic Materials LLC
Inventors:
Erik Reddington, Gonzalo U. Desmaison, Zukra I. Niazimbetova, Donald E. Cleary, Mark Lefebvre
Abstract: Compositions are provided which can be used for treating photoresist patterns in the manufacture of electronic devices. The compositions allow for the formation of fine lithographic patterns and find particular applicability in semiconductor device manufacture.
Type:
Grant
Filed:
June 28, 2010
Date of Patent:
December 25, 2012
Assignee:
Rohm and Haas Electronic Materials LLC
Inventors:
Young Cheol Bae, Thomas Cardolaccia, Yi Liu
Abstract: This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise a multi cyclic lactone moiety.
Type:
Grant
Filed:
June 22, 2010
Date of Patent:
December 25, 2012
Assignee:
Rohm and Haas Electronic Materials LLC
Inventors:
Mingqi Li, Cheng-Bai Xu, Emad Aqad, Cong Liu
Abstract: Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.
Type:
Grant
Filed:
June 28, 2010
Date of Patent:
December 25, 2012
Assignee:
Rohm and Haas Electronic Materials LLC
Inventors:
Young Cheol Bae, Thomas Cardolaccia, Yi Liu
Abstract: Electroplating methods provide substantially uniform deposits of copper on the edges and walls of through-holes of printed circuit boards. The electroplating methods provide copper deposits which have high throwing power.
Type:
Application
Filed:
December 15, 2011
Publication date:
December 20, 2012
Applicant:
Rohm and Haas Electronic Materials LLC
Inventors:
Elie H. NAJJAR, Mark LEFEBVRE, Leon R. BARSTAD, Michael P. TOBEN
Abstract: Provided are polymers and photoresist compositions useful in forming photolithographic patterns. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
Type:
Application
Filed:
December 2, 2011
Publication date:
December 6, 2012
Applicants:
Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
Inventors:
Young Cheol Bae, David Richard Wilson, Jibin Sun
Abstract: A copper interconnection structure includes an insulating layer, an interconnection body including copper in an opening provided on the insulating layer, and a diffusion barrier layer formed between the insulating layer and the interconnection body. The diffusion barrier layer includes an oxide layer including manganese having a compositional ratio of oxygen to manganese (y/x) less than 2.
Abstract: Methods of purifying acidic metal solutions by removing at least a portion of alpha-particle emitting materials are provided. The purified metal solutions are useful in a variety of applications requiring low levels of alpha-particle emission.
Type:
Application
Filed:
May 24, 2012
Publication date:
November 29, 2012
Applicants:
Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
Inventors:
Matthew L. Grandbois, Harlan Robert Goltz, Jeffrey M. Calvert, Matthew Lawrence Rodgers, Charles R. Marston
Abstract: The present invention provides a novel process for synthesis of a copper-alloy particle with improved grain boundary properties. The process comprises the steps of: forming a solution from an alcoholic agent and a branched dispersing agent; forming a reaction mixture with the solution and a copper precursor and optionally a nickel precursor; heating the reaction mixture; cooling the reaction mixture; adding an additional amount of copper precursor and at least one precursor selected from the group consisting of: nickel, zinc, and bismuth; heating the reaction mixture; and maintaining the reaction mixture for a time sufficient to reduce the reaction mixture to copper-alloy particles.
Abstract: Provided are polymers containing a unit having a particular acetal moiety and photoresist compositions containing such a polymer. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, photoresist compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.
Type:
Application
Filed:
December 31, 2011
Publication date:
November 15, 2012
Applicants:
Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
Inventors:
Young Cheol BAE, Matthew M. Meyer, Jibin Sun, Seung-Hyun Lee, Jong Keun Park
Abstract: An adhesion solution containing curable amine compounds and curable epoxy compounds are applied to a dielectric material followed by drying the solution and electrolessly plating a thin metal layer on the dielectric material. The composite is then annealed to cure the amine and epoxy compounds. The adhesion solution contains an excess amount of curable amine to curable epoxy. The adhesion solution and method may be used in the manufacture of printed circuit boards.
Abstract: A selenium ink comprising a chemical compound having a formula RZ—Sex—Z?R? stably dispersed in a liquid carrier is provided, wherein the selenium ink is hydrazine free and hydrazinium free. Also provided are methods of preparing the selenium ink and of using the selenium ink to deposit selenium on a substrate for use in the manufacture of a variety of chalcogenide containing semiconductor materials, such as, thin film transistors (TFTs), light emitting diodes (LEDs); and photoresponsive devices (e.g., electrophotography (e.g., laser printers and copiers), rectifiers, photographic exposure meters and photovoltaic cells) and chalcogenide containing phase change memory materials.
Type:
Grant
Filed:
July 27, 2009
Date of Patent:
November 13, 2012
Assignee:
Rohm and Haas Electronic Materials LLC
Inventors:
David Mosley, Kevin Calzia, Charles Szmanda
Abstract: A selenium/Group 1b ink comprising, as initial components: a selenium component comprising selenium, an organic chalcogenide component having a formula selected from RZ—Z?R? and R2—SH, a Group 1b component and a liquid carrier; wherein Z and Z? are each independently selected from sulfur, selenium and tellurium; wherein R is selected from H, C1-20 alkyl group, a C6-20 aryl group, a C1-20 alkylhydroxy group, an arylether group and an alkylether group; wherein R? and R2 are selected from a C1-20 alkyl group, a C6-20 aryl group, a C1-20 alkylhydroxy group, an arylether group and an alkylether group; and wherein the selenium/Group 1b ink is a stable dispersion.
Type:
Grant
Filed:
September 28, 2009
Date of Patent:
November 13, 2012
Assignee:
Rohm and Haas Electronics Materials LLC
Inventors:
Kevin Calzia, David W. Mosley, Charles R. Szmanda, David L. Thorsen
Abstract: A portable protection system including a selectively collapsible truss for supporting a protection member. The truss is movable between a collapsed position and an expanded position. The protection member includes at least one layer of ballistic armor material for disrupting a projectile. The truss includes suitable connectors for releasably connecting the protection member to the truss, and also suitable connectors for releasably connecting the truss to an adjoining truss so as to form a protection wall.
Type:
Application
Filed:
July 3, 2012
Publication date:
November 8, 2012
Applicant:
Dynamic Defense Materials LLC
Inventors:
John Carberry, George Forsythe, Harvey Kliman, Katherine Leighton, John Garnier, Ray Ballario, Wiktor Serafin, Jason Ickes
Abstract: Molybdenum disulfide powders include substantially spherically-shaped particles of molybdenum disulfide that are formed from agglomerations of generally flake-like sub-particles. The molybdenum disulfide powders are flowable and exhibit uniform densities. Methods for producing a molybdenum disulfide powder may include the steps of: Providing a supply of molybdenum disulfide precursor material; providing a supply of a liquid; providing a supply of a binder; combining the molybdenum disulfide precursor material with the liquid and the binder to form a slurry; feeding the slurry into a stream of hot gas; and recovering the molybdenum disulfide powder, the molybdenum disulfide powder including substantially spherically-shaped particles of molybdenum disulfide formed from agglomerations of generally flake-like sub-particles.
Type:
Application
Filed:
April 27, 2011
Publication date:
November 1, 2012
Applicant:
Climax Engineered Materials, LLC
Inventors:
Matthew C. Shaw, Carl V. Cox, Yakov Epshteyn
Abstract: An aqueous acidic composition which includes alkaline compounds, fluoride ions and oxidizing agents is provided for texturing polycrystalline semiconductors. Methods for texturing are also disclosed. The textured polycrystalline semiconductors have reduced reflectance of light incidence.