Patents Assigned to Materious, LLC
  • Patent number: 8501266
    Abstract: Disclosed is a method of providing a constant concentration of a metal-containing precursor compound in the vapor phase in a carrier gas. Such method is particularly useful in supplying a constant concentration of a gaseous metal-containing compound to a plurality of vapor deposition reactors.
    Type: Grant
    Filed: March 29, 2010
    Date of Patent: August 6, 2013
    Assignee: Rohm and Haas Electronics Materials LLC
    Inventors: Egbert Woelk, Ronald L. DiCarlo, Jr.
  • Publication number: 20130196174
    Abstract: A thin film of tin is plated directly on nickel coating a metal substrate followed by plating silver directly on the thin film of tin. The silver has good adhesion to the substrate even at high temperatures.
    Type: Application
    Filed: July 26, 2012
    Publication date: August 1, 2013
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Wan ZHANG-BEGLINGER, Margit Clauss, Michael P. Toben
  • Publication number: 20130195789
    Abstract: A low swell, long-lived hydrogel sealant formed by reacting a highly oxidized polysaccharide containing aldehyde groups with a multi-arm amine is described. The hydrogel sealant may be particularly suitable for applications requiring low swell and slow degradation, for example, ophthalmic applications such as sealing wounds resulting from trauma such as corneal lacerations, or from surgical procedures such as vitrectomy procedures, cataract surgery, LASIK surgery, glaucoma surgery, and corneal transplants; neurosurgery applications, such as sealing the dura; and as a plug to seal a fistula or the punctum. The low swell, long-lived hydrogel sealant may also be useful as a tissue sealant and adhesive, and as an anti-adhesion barrier.
    Type: Application
    Filed: March 14, 2013
    Publication date: August 1, 2013
    Applicant: Actamax Surgical Materials LLC
    Inventor: Actamax Surgical Materials LLC
  • Publication number: 20130186766
    Abstract: A flux composition which includes one or more organic compounds including one or more sulfonic acid groups, salts or anhydrides thereof is applied to tin or tin alloy deposits. The flux composition is then homogenized on the tin or tin alloy to inhibit tin or tin alloy oxidation and improve brightness of the tin or tin alloy.
    Type: Application
    Filed: January 20, 2013
    Publication date: July 25, 2013
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventor: Rohm and Haas Electronic Materials LLC
  • Publication number: 20130189221
    Abstract: Method of forming tissue adhesives by reacting an oxidized polysaccharide with a water-dispersible multi-arm polyether amine, wherein at least three of the arms are terminated by primary amine groups, are disclosed. The use of the tissue adhesives for medical and veterinary applications such as topical wound closure; and surgical procedures, such as intestinal anastomosis, vascular anastomosis, tissue repair, and ophthalmic procedures; drug delivery; anti-adhesive applications; and as a bulking agent to treat urinary incontinence are described.
    Type: Application
    Filed: March 8, 2013
    Publication date: July 25, 2013
    Applicant: Actamax Surgical Materials, LLC
    Inventor: Actamax Surgical Materials, LLC
  • Publication number: 20130190267
    Abstract: Tissue adhesives formed by reacting an oxidized polysaccharide with a water-dispersible multi-arm polyether amine, wherein at least three of the arms are terminated by primary amine groups, are disclosed. The use of the tissue adhesives for medical and veterinary applications such as topical wound closure; and surgical procedures, such as intestinal anastomosis, vascular anastomosis, tissue repair, and ophthalmic procedures; drug delivery; anti-adhesive applications; and as a bulking agent to treat urinary incontinence are described.
    Type: Application
    Filed: March 8, 2013
    Publication date: July 25, 2013
    Applicant: Actamax Surgical Materials, LLC
    Inventor: Actamax Surgical Materials, LLC
  • Patent number: 8491773
    Abstract: Methods of replenishing indium ions in indium electroplating compositions are disclosed. Indium ions are replenished during electroplating using indium salts of certain weak acids. The method may be used with soluble and insoluble anodes.
    Type: Grant
    Filed: April 22, 2009
    Date of Patent: July 23, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Edit Szocs, Felix J. Schwager, Thomas Gaethke
  • Patent number: 8491774
    Abstract: Tin and tin alloy deposits which are substantially free of certain crystal planes or equivalents thereof inhibit or prevent whisker formation. The tin or tin alloy deposits which are free of these crystal planes and inhibit or prevent whisker formation may be deposited by electroplating. Tin alloys include tin/copper, tin/nickel, tin/silver, tin/bismuth, tin/zinc and tin/antimony. The tin and tin alloy baths used to deposit the tin and tin alloys may be acidic or alkaline.
    Type: Grant
    Filed: December 19, 2005
    Date of Patent: July 23, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventor: André Egli
  • Patent number: 8492068
    Abstract: Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.
    Type: Grant
    Filed: June 28, 2010
    Date of Patent: July 23, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Young Cheol Bae, Thomas Cardolaccia, Yi Liu
  • Patent number: 8492075
    Abstract: Methods of forming electronic devices are provided. The methods involve alkaline treatment of photoresist patterns and allow for the formation of high density resist patterns. The methods find particular applicability in semiconductor device manufacture.
    Type: Grant
    Filed: June 28, 2010
    Date of Patent: July 23, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Young Cheol Bae, Thomas Cardolaccia, Yi Liu
  • Publication number: 20130171452
    Abstract: Articles with graphene are selectively transparent to electromagnetic radiation. The articles transmit electromagnetic radiation in the infrared and visible light bands while inhibiting incident radio frequency radiation. The articles have high electrical conductivity and may be used in windows and domes.
    Type: Application
    Filed: July 2, 2012
    Publication date: July 4, 2013
    Applicant: Rohm and Haas Electronic Materials LLC
    Inventors: Jitendra S. Goela, Nathaniel E. Brese
  • Publication number: 20130167362
    Abstract: The disclosure generally describes a method to prepare a composite anode for a lithium rechargeable battery comprising silicon particles from silicon kerf. Said silicon particles are mechanically resized, separated, cleaned, mixed with carbonaceous materials and polymer binder, and formed into an anode for a lithium rechargeable battery. The lithium rechargeable battery featuring such an anode exhibits an exceptionally high specific capacity, an excellent reversible capacity, and a long cycle life.
    Type: Application
    Filed: October 17, 2012
    Publication date: July 4, 2013
    Applicant: Electrochemical Materials, LLC
    Inventors: Wanli XU, John T. FUSSELL
  • Publication number: 20130164545
    Abstract: A composition comprising the following: A) a cure catalyst selected from Formula A: [NR1?R2?R3?R4?]+X???(Formula A), R1?, R2?, R3?, R4? are each independently selected from hydrogen, alkyl, substituted alkyl, aryl, or substituted aryl; X is a monovalent anion, and wherein at least one of R1?, R2?, R3? or R4? is a methyl; and B) a prepolymer formed from a first composition comprising: Ra comprises one or more multiple bonds, provided that, if Ra comprises more than one multiple bond, these multiple bonds are not in a conjugated configuration; R1, R2, R3 are described herein; Rb is selected from H or a saturated group comprising alkyl, alkylene, or alkylidene; R4, R5, R6 are described herein; Rc comprises more than one multiple bond, and these multiple bonds are in a conjugated configuration; R7, R8, R9 described herein; and R10, R11, R12, R13 described herein.
    Type: Application
    Filed: December 5, 2012
    Publication date: June 27, 2013
    Applicants: Rohm and Haas Electric Materials LLC, Dow Global Technologies LLC
    Inventors: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
  • Patent number: 8470717
    Abstract: Methods of making current tracks for semiconductors are disclosed. The methods involve selectively depositing a hot melt ink resist containing rosin resins and waxes on a silicon dioxide or silicon nitride layer coating a semiconductor followed by etching uncoated portions of the silicon dioxide or silicon nitride layer with an inorganic acid etch to expose the semiconductor and simultaneously inhibit undercutting of the hot melt ink resist. The etched portions may then be metallized to form a plurality of substantially uniform current tracks.
    Type: Grant
    Filed: May 18, 2011
    Date of Patent: June 25, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Hua Dong
  • Patent number: 8465692
    Abstract: A method for producing a metal article may include: Producing a supply of a composite metal powder by: providing a supply of molybdenum metal powder; providing a supply of a sodium compound; combining the molybdenum metal powder and the sodium compound with a liquid to form a slurry; feeding the slurry into a stream of hot gas; and recovering the composite metal powder; and consolidating the composite metal powder to form the metal article, the metal article comprising a sodium/molybdenum metal matrix. Also disclosed is a metal article produced accordance with this method.
    Type: Grant
    Filed: March 2, 2011
    Date of Patent: June 18, 2013
    Assignee: Climax Engineered Materials, LLC
    Inventors: Naresh Goel, Carl Cox, Dave Honecker, Eric Smith, Chris Michaluk, Adam DeBoskey, Sunil Chandra Jha
  • Patent number: 8465901
    Abstract: Methods of adjusting dimensions of resist patterns are provided. The methods allow for control of photoresist pattern dimensions and find particular applicability in resist pattern rework in semiconductor device manufacturing.
    Type: Grant
    Filed: June 28, 2010
    Date of Patent: June 18, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Young Cheol Bae, Thomas Cardolaccia, Yi Liu
  • Patent number: 8466327
    Abstract: Aldehyde-functionalized polyethers containing thiomethylaldehyde groups are described. Also described is a method of preparing the aldehyde-functionalized polyethers. These functionalized polyethers may be useful for protein conjugation, surface modification, and for the formation of hydrogel adhesives and sealants which are useful for medical applications.
    Type: Grant
    Filed: August 31, 2009
    Date of Patent: June 18, 2013
    Assignee: Actamax Surgical Materials, LLC
    Inventor: Samuel David Arthur
  • Patent number: 8466314
    Abstract: An additive obtained from the reaction product obtained by reacting glutaraldehyde and at least one type of compound selected from hydrocarbon compounds containing a hydroxyl group, and at least one type of compound selected from amine compounds, as well as a tin or tin alloy plating solution containing this additive.
    Type: Grant
    Filed: April 26, 2011
    Date of Patent: June 18, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Motoya Shimazu, Yasuo Ohta
  • Patent number: 8460474
    Abstract: A method of cleaning semiconductor wafers using an acid cleaner followed by an alkaline cleaner to clean contaminants from the materials is provided. The acid cleaner removes substantially all of the metal contaminants while the alkaline cleaner removes substantially all of the non-metal contaminants, such as organics and particulate material.
    Type: Grant
    Filed: January 13, 2010
    Date of Patent: June 11, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Robert K. Barr, Raymond Chan, Matthew L. Moynihan
  • Patent number: 8460533
    Abstract: Indium compositions including hydrogen suppressor compounds and methods of electrochemically depositing indium metal from the compositions onto substrates are disclosed. Articles made with the indium compositions are also disclosed.
    Type: Grant
    Filed: December 13, 2007
    Date of Patent: June 11, 2013
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Edit Szocs, Felix J. Schwager, Thomas Gaethke, Nathaniel E. Brese, Michael P. Toben