Abstract: The present invention relates to process I/O controllers for semiconductor manufacturing to which a tool host can delegate data collection, monitoring and control tasks. In particular, it relates to process I/O controllers that can perform more than one of data collection, monitoring, control and response to commands from a tool host with statistically repeatable performance and precision. Embodiments described use prioritized real time operating systems to control of semiconductor manufacturing tools and data collection from tool associated with the sensors. Statistically repeatable responsiveness to selected commands and to sensor inputs during selected recipe steps effectively reduces jitter.

Abstract: A system for detecting and correcting for spurious frequencies that may coincide in a bandwidth of interest in an RF metrology system. The system can (1) utilize a deterministic scheme to detect an interference by a spurious frequency and correct the distortion effect or (2) utilize a mixed signal processing architecture to avoid the occurrence of spurious frequency contamination. A detection scheme identifies the event of distortion and triggers either (a) a shift in the analog to digital convert sample rate or (b) a mathematical vector manipulation. The shift of the analog to digital convert sample rate moves an aliased image of the spurious frequency outside of the frequency of interest. The mathematical vector correction removes the distortion and restores the signal of interest.

Abstract: A system and methods are described for generating reagent ions and product ions for use in a mass spectrometry system. Applications for the system and method are also disclosed for detecting volatile organic compounds in trace concentrations. A microwave or high-frequency RF energy source ionizes particles of a reagent vapor to form reagent ions. The reagent ions enter a chamber, such as a drift chamber, to interact with a fluid sample. An electric field directs the reagent ions and facilitates an interaction with the fluid sample to form product ions. The reagent ions and product ions then exit the chamber under the influence of an electric field for detection by a mass spectrometer module. The system includes various control modules for setting values of system parameters and analysis modules for detection of mass and peak intensity values for ion species during spectrometry and faults within the system.

Abstract: Methods and apparatus for controlling a plasma used for materials processing feature cooperative action of a resonant circuit and a switch unit coupled to a plasma vessel and a power supply. A sensor for acquiring a signal associated with a state of a plasma in the plasma vessel supports closed-loop control of the switch unit. Undesirable plasma states detected by the sensor can be eliminated by closing the switch unit to shunt the resonant circuit.

Abstract: An apparatus and method provide measurement of a constituent of a fluid, such as ozone in ozonated water. The apparatus includes a vessel to contain the fluid, a light source configured to direct a first band of light and a second band of light along a substantially shared path though the fluid, and a photosensor that senses the first band of light and the second band of light. The constituent has a greater absorption associated with the first band of light than with the second band of light. The method includes modification of a measured attribute of the component in response to the sensed second band of light to improve the accuracy of the measured attribute.

Abstract: A retroreflector adapted to be mounted to a motor including a first, second, and third petal having a mutually perpendicular first, second, and third reflective surface that form a retroreflective surface. A base is directly connected to at least one of the first, second, or third petal so as to minimize a vertical profile of the retroreflector. The base is removably connected to the motor with a fastening mechanism. A spatial distance between the fastening mechanism and at least one of the first, second, or third petal minimizes a stress from the motor propagated to the retroreflective surface.

Abstract: Described are computer-based methods and apparatuses, including computer program products, for automated predictive design space estimation. A design space of input factors and output responses is estimated for a physical process. Data is received for one or more input factors for a physical process, one or more output responses for the process, and criteria. For each of the one or more input factors, a calculated range of input values within the corresponding experimented range of input values is calculated. A modified range of input values is calculated for each of the one or more input factors. A design space estimate is predicted based at least on the modified ranges of input values, wherein the modified ranges of input values each comprise a largest region of variability for one or more of the input factors where the criteria are fulfilled.

Abstract: A mass flow controller having a feedback controller gain, comprises: a sensor configured so as to sense the flow of fluid through controller; a valve arranged so as to adjust the flow of fluid through the controller; and a processor configured so as to control the valve as a function of the flow of fluid sensed by the sensor. The sensor and valve are arranged within a feedback system, and the processor updates the feedback controller gain in real time based on the ratio of at least one calibration gas parameter to at least one operating gas parameter, such that the closed loop transfer function of the feedback system remains substantially constant regardless of operating conditions so as to have a consistent control performance at different operation conditions from the calibration condition.

Abstract: A method for creating an oxide layer having a reduced copper concentration over a surface of an object comprising aluminum and copper for use in a semiconductor processing system. The oxide layer produced using a plasma electrolytic oxidation process has a reduced copper peak concentration, which decreases a risk of copper contamination, and includes magnesium oxides that can be converted to magnesium halide upon exposure to an excited halogen-comprising gas or halogen-comprising plasma to increase the erosion/corrosion resistance of the oxide layer.

Abstract: A metrology system monitors radio frequency (RF) power at a plurality of locations in a circuit. The system includes a plurality of RF sensors that generate respective analog signals based on electrical properties of the RF power, a multiplexing module that generates an output signal based on the analog signals, and an analysis module that generates messages based on the output signal. The messages contain information regarding the electrical properties that are sensed by the plurality of RF sensors.

Abstract: An improved plasma vessel (i.e., plasma applicator) that provides effective cooling includes a plurality of generally linear tubes having a dielectric interior fluidly connected together by dielectric connectors. The tubes and connectors are joined together to form a leak-tight plasma vessel. A cooling system surrounding the improved plasma vessel includes a rigid cooling plate and a deformable thermal transfer material disposed between the plasma vessel and the cooling plate. After use or at an operator's discretion, the plasma vessel can be removed from the cooling system and a new vessel may be inserted in its place. Alternatively, the used vessel may be refurbished and re-inserted into the cooling system. The new or refurbished vessel may or may not be of the same size or configuration as the used vessel. Thermal contact between the cooling system and the new or refurbished vessel, however is maintained through the deformable thermal transfer material.

Abstract: A pressure control system remotely controls pressure within one or more remote zones, each respectively connected to an enclosure through a conduit, by controlling flow of a fluid into and out of each enclosure. The pressure of the fluid is measured within each enclosure. An estimated pressure within each zone is computed, as a function of the measured pressure in the enclosure and known characteristics of the conduit and the zone. For each zone, an inlet proportional valve and an outlet proportional valve of each enclosure is operated so as to control the input flow rate of the fluid into the respective enclosure and the output flow rate of the fluid out of the enclosure as a function of a pressure set point and the estimated pressure, thereby regulating pressure within the zone in accordance with the pressure set point.

Abstract: A radio frequency (RF) sensor that measures RF current includes a substrate that has an inner perimeter that defines an aperture. A conductor extends through the aperture. Sensor pads are arranged on the aperture and are connected to form two sensor loops. The loops generate an electrical signal that represents RF current flow through the center conductor. Additionally, a plurality of circular conductive rings may be included in the RF sensor to generate a signal representing the voltage of the conductor.

Abstract: A radio frequency (RF) system includes a control module that allocates M predetermined frequency intervals. The system also includes N RF sources that each applies first RF power to electrodes within a plasma chamber at frequencies within an assigned respective one of the M predetermined frequency intervals. The N RF sources also each respond to second RF power including feedback from the plasma chamber. The N RF sources each include a processing module that adjusts the first RF power based on the second RF power and the respective one of the M predetermined frequency intervals. M and N are integers greater than 1.

Abstract: A multi-channel radio frequency (RF) generator module includes N power amplifiers, M drivers, a power supply module, and a control module. The N power amplifiers generate N RF outputs, respectively. The M drivers drive the N power amplifiers based on M driver control signals, respectively. The power supply module receives alternating current (AC) input power and applies L rail voltages to the N power amplifiers based on L rail voltage setpoints, respectively. The control module sets the L rail voltage setpoints and the M driver control signals. N is an integer greater than one, L and M are integers greater than zero, and M and L are less than or equal to N.

Abstract: An apparatus and method provide measurement of a constituent of a fluid, such as ozone in ozonated water. The apparatus includes a vessel to contain the fluid, a light source configured to direct a first band of light and a second band of light along a substantially shared path though the fluid, and a photosensor that senses the first band of light and the second band of light. The constituent has a greater absorption associated with the first band of light than with the second band of light. The method includes modification of a measured attribute of the component in response to the sensed second band of light to improve the accuracy of the measured attribute.

Abstract: A system and methods are described for generating reagent ions and product ions for use in a quadruple mass spectrometry system. A microwave or high-frequency RF energy source ionizes particles of a reagent vapor to form reagent ions. The reagent ions enter a chamber, such as a drift chamber, to interact with a fluid sample. An electric field directs the reagent ions and facilitates an interaction with the fluid sample to form product ions. The reagent ions and product ions then exit the chamber under the influence of an electric field for detection by a quadruple mass spectrometer module. The system includes various control modules for setting values of system parameters and analysis modules for detection of mass values for ion species during spectrometry and faults within the system.

Abstract: A system, components thereof, and methods are described for time-of-flight mass spectrometry. A microwave or high-frequency RF energy source is used to ionize a reagent vapor to form reagent ions. The reagent ions enter a chamber and interact with a fluid sample to form product ions. The reagent ions and product ions are directed to a time-of-flight mass spectrometer module for detection and determination of a mass value for the ions. The time-of-flight mass spectrometer module can include an optical system and an ion beam adjuster for focusing, interrupting, or altering a flow of reagent and product ions according to a specified pattern. The time-of-flight mass spectrometer module can include signal processing techniques to collect and analyze an acquired signal, for example, using statistical signal processing, such as maximum likelihood signal processing.

Abstract: A method for monitoring a manufacturing process features acquiring metrology data for semiconductor wafers at the conclusion of a final process step for the manufacturing process (“Step a”). Data is acquired for a plurality of process variables for a first process step for manufacturing semiconductor wafers (“Step b”). A first mathematical model of the first process step is created based on the metrology data and the acquired data for the plurality of process variables for the first process step (“Step c”). Steps b and c are repeated for at least a second process step for manufacturing the semiconductor wafers (“Step d”). An nth mathematical model is created based on the metrology data and the data for the plurality of process variables for each of the n process steps ('Step e“). A top level mathematical model is created based on the metrology data and the models created by steps c, d and e (”Step f').

Abstract: Eight or more transition points are generated during a given period, and are used in tracking movement of an interferometer reflector. Duty cycles of generated square waves are used to establish precise intervals between the transition points, and precise wave-phase relationships.