Abstract: A memory device includes a data array, a parity array and an ECC circuit. The ECC circuit is coupled to the data array and the parity array. In a first test mode, the ECC function of the ECC circuit is disabled, and in a second test mode, the ECC circuit directly accesses the parity array to read or write parity information through the parity array.

Abstract: The present application discloses a method for fabricating a semiconductor device. The method includes providing a substrate, forming a first conductive layer above the substrate, concurrently forming a bottom conductive layer and a redistribution structure above the first conductive layer, forming a programmable insulating layer on the bottom conductive layer, and forming a top conductive layer on the programmable insulating layer. The bottom conductive layer, the programmable insulating layer, and the top conductive layer together configure a programmable unit. The bottom conductive layer and the redistribution structure are electrically coupled to the first conductive layer.

Abstract: A fuse component, a semiconductor device, and a method of manufacturing a fuse component are provided. The fuse component includes an active region having a surface, a fuse dielectric layer extending from the surface of the active region into the active region, and a gate metal layer surrounded by the fuse dielectric layer.

Abstract: The present disclosure provides a dynamic random access memory (DRAM) array. The memory array includes a semiconductor substrate, an isolation structure and contact enhancement sidewall spacers. The semiconductor substrate has a trench defining laterally separate active areas formed of surface regions of the semiconductor substrate. Top surfaces of a first group of the active areas are recessed with respect to top surfaces of a second group of the active areas. The isolation structure is filled in the trench and in lateral contact with bottom portions of the active areas. The contact enhancement sidewall spacers laterally surround top portions of the active areas, respectively.

Abstract: A voltage generator and a voltage generating method are provided. The voltage generator includes at least one first charge pump circuit, at least one second charge pump circuit, an oscillator, a passing circuit, and a voltage detector. The first charge pump circuit is configured to receive a clock signal to generate a first pump voltage. The second charge pump circuit is configured to receive the clock signal to generate a first pump voltage. The oscillator is configured to provide the clock signal. The passing circuit is configured to receive the clock signal, a power-on detection signal and an external command. The voltage detector is configured to receive an operation voltage, and generate the power-on detection signal by detecting the operation voltage. The passing circuit determines whether to transmit the clock signal to the second charge pump circuit or not to activate or deactivate the second charge pump circuit.

Abstract: A memory device includes a data array, a parity array and an ECC circuit. The ECC circuit is coupled to the data array and the parity array. In a first test mode, the ECC function of the ECC circuit is disabled, and in a second test mode, the ECC circuit directly accesses the parity array to read or write parity information through the parity array.

Abstract: The present application discloses a method for fabricating a semiconductor device with graphene layers The method includes providing a substrate; forming a first passivation layer above the substrate; forming a redistribution layer on the first passivation layer; forming a first adjustment layer on the redistribution layer; forming a pad layer on the first adjustment layer; forming a second adjustment layer between the pad layer and the first adjustment layer; forming a second passivation layer on the first passivation layer; wherein the first adjustment layer and the second adjustment layer are formed of graphene.

Abstract: The fuse device includes a plurality of fuse circuits, a global latch circuit and a plurality of local latch circuits. The global latch circuit is coupled to the fuse circuits. The global latch circuit is used to sense the blown states of the fuse circuits at different times, so as to output the fuse information of the fuse circuits at the different times. The local latch circuits are coupled to the global latch circuits. Each of these local latch circuits latches the fuse information output by the global latch circuit at the different times.

Abstract: A method of measuring a fuse resistance includes steps as follows. A predetermined voltage value of a force voltage on a common ground (CGND) bus electrically connected to at least one fuse element, a first current value of a measured current through the CGND bus in a first condition, and a second current value of another measured current through the CGND bus in a second condition are preloaded. The second current value is subtracted from the first current value, so as to get a subtracted current value, thereby removing a value of a leakage current through the CGND bus. The predetermined voltage value is divided by the subtracted current value to equal the fuse resistance of the at least one fuse element.

Abstract: A method for fabricating a crown capacitor includes: forming a first supporting layer over a substrate; forming a second supporting layer above the first supporting layer; alternately stacking first and second sacrificial layers between the first and second supporting layers to collectively form a stacking structure; forming a recess extending through the stacking structure; performing an etching process to the first sacrificial layers at a first etching rate and the second sacrificial layers at a second etching rate greater than the first etching rate, such that each second sacrificial layer and immediately-adjacent two of the first sacrificial layers collectively define a concave portion; forming a first electrode layer over a surface of the recess in which the first electrode layer has a wavy structure; removing the first and second sacrificial layers; and forming a dielectric layer and a second electrode layer over the first electrode layer.

Abstract: A memory device includes a first chip, a second chip and a processor. The second chip is coupled to the first chip at a first node. The second chip includes a first capacitor and a first variable resistor. The first capacitor is coupled to the first node. The first variable resistor is coupled in series with the first capacitor. The processor is coupled to the first node, and is configured to perform a first read operation to the first chip via the first node. A method for operating a memory device is also disclosed herein.

Abstract: A voltage regulator for providing a word line voltage is provided. The voltage regulator includes a voltage divider, a comparator, a boost circuit and a bypass transistor. The voltage divider is coupled between the word line voltage and a low reference voltage. The voltage divider includes resistive elements connected in series at intermediate nodes. The comparator provides an enable signal according to a divided voltage value on a divided intermediate node among the intermediate nodes. The boost circuit boosts the word line voltage in response to the enable signal. A source terminal of the bypass transistor is connected to a first intermediate node among the intermediate nodes. A drain terminal of the bypass transistor is connected to a second intermediate node among the intermediate nodes. The bypass transistor is turned-off in response to the control signal having an intermediate voltage value on the first intermediate node.

Abstract: A method for preparing a semiconductor device structure includes forming a target layer over a semiconductor substrate, and forming a plurality of first mask patterns over the target layer. The method also includes forming a lining layer conformally covering the first mask patterns and the target layer. A first opening is formed over the lining layer and between the first mask patterns. The method further includes filling the first opening with a second mask pattern, and performing an etching process on the lining layer and the target layer using the first mask patterns and the second mask pattern as a mask such that a plurality of second openings are formed in the target layer.

Abstract: An off-chip driver (OCD), including a pull-up driver and a pull-down driver, is provided. The pull-up driver and the pull-down driver are coupled to an output pad. One of the pull-up driver and the pull-down driver includes a main driving circuit, an auxiliary driving circuit, a connection circuit, and a common impedance. The main driving circuit is used to perform an output driving operation on the output pad, and the auxiliary driving circuit is used to selectively perform the output driving operation on the output pad. A first terminal of the common impedance is coupled to a driving terminal of the main driving circuit and a driving terminal of the auxiliary driving circuit through the connection circuit. A second terminal of the common impedance is coupled to the output pad.

Abstract: A semiconductor device can be applied to a memory device. The semiconductor device of the disclosure includes a voltage sensor, a convertor and a command/address on-die-termination (CA_ODT) circuit. The voltage sensor receives a voltage setting command, and sense a voltage level of the voltage setting command to generate a sensing signal. The convertor generates a setting signal in response to the sensing signal. The CA_ODT circuit generates a power voltage for the memory device in response to the setting signal, wherein a voltage level of the power voltage corresponds to the voltage level of the voltage setting command.

Abstract: The disclosure provides a method of manufacturing a semiconductor device including bonding a second device wafer to a first device wafer, such that a first bonding interface including a dielectric-to-dielectric bonding interface and a metal-to-metal bonding interface is formed between the first device wafer and the second device wafer, wherein the second device wafer is electrically coupled to the first device wafer, and a function of the first device wafer and the second device wafer are the same kind of device wafer. A semiconductor device is also provided.

Abstract: A manufacturing method of a semiconductor package is provided as follows. A semiconductor die is provided, wherein the semiconductor die comprises a semiconductor substrate, an interconnection layer and a through semiconductor via, the interconnection layer is disposed on an active surface of the semiconductor substrate, the through semiconductor via penetrates the semiconductor substrate from a back surface of the semiconductor substrate to the active surface of the semiconductor substrate. An encapsulant is provided to laterally encapsulate the semiconductor die. A through encapsulant via penetrating through the encapsulant is formed.

Abstract: The present application discloses a method for fabricating a semiconductor device including providing a first stacking structure comprising a first controller die, and a plurality of first storage dies sequentially stacked on the first controller die; providing a second stacking structure comprising a second controller die, and a plurality of second storage dies sequentially stacked on the second controller die; bonding the first controller die onto a bottom die through a plurality of first interconnect units; and bonding the second controller die onto the bottom die through a plurality of second interconnect units. The plurality of first storage dies respectively comprise a plurality of first storage units configured as a floating array. The plurality of second storage dies comprise a plurality of second storage units respectively comprising an insulator-conductor-insulator structure.

Abstract: The present application provides a memory device having word lines with improved resistance, and a manufacturing method of the memory device. The memory device includes a semiconductor substrate defined with a peripheral region and an array region at least partially surrounded by the peripheral region, and including a first recess extending into the semiconductor substrate and disposed in the array region; an isolation structure surrounded by the semiconductor substrate and disposed in the peripheral region; and a word line disposed within the first recess, wherein the word line includes an insulating layer conformal to the first recess and a conductive member surrounded by the insulating layer, and the conductive member includes a second recess extending into the conductive member and toward the semiconductor substrate. A method of manufacturing the memory device is also disclosed.

Abstract: The present disclosure provides a method of manufacturing a semiconductor structure. The method includes providing a semiconductor substrate including an active region and an isolation structure. The method also includes forming a contact structure on the active region of the semiconductor substrate. The method further includes forming a dielectric spacer on opposite sides of the contact structure. The method also includes forming a conductive element on the isolation structure of the semiconductor substrate, wherein the dielectric spacer has a concave surface facing the conductive element.