Abstract: The pixel circuit of the image sensor includes one or more photoelectric conversion elements that generates charges in response to incident light, a first capacitance that receives and stores the charges generated in the one or more photoelectric conversion elements, a second capacitance that is connected to the first capacitance via a switch, and a comparator that compares the amount of charges stored in the first capacitance with a predetermined value. The second capacitance is connected to the first capacitance via the switch, and the pixel circuit includes a comparator that compares the amount of the charges stored in the first capacitance with a predetermined value. When the amount of the charges accumulated in the first capacitance in the comparator is greater than the predetermined value, the switch is turned on and the charges are accumulated by the capacitance that is the sum of the first capacitance and the second capacitance.

Abstract: An arithmetic logic unit (ALU) includes a front end latch stage coupled to a signal latch stage coupled to a Gray code (GC) to binary stage. First inputs of an adder stage are coupled to receive outputs of the GC to binary stage. Outputs of the adder stage are generated in response to the first inputs and second inputs of the adder stage. A pre-latch stage is coupled to latch outputs of the adder stage. A feedback latch stage is coupled to latch outputs of the pre-latch stage. The second inputs of the adder stage are coupled to receive outputs of the feedback latch stage. The feedback stage includes first conversion gain feedback latches configured to latch outputs of the pre-latch stage having a first conversion gain and second conversion gain feedback latches configured to latch outputs of the pre-latch stage having a second conversion gain.

Abstract: Low power event driven pixels with passive, differential difference detection circuitry (and reset control circuits for the same) are disclosed herein. In one embodiment, an event driven pixel comprises a photosensor, a photocurrent-to-voltage converter, and a difference circuit. The difference circuit includes (a) a first circuit branch configured to sample a reference light level based on a voltage output by the photocurrent-to-voltage converter, and to output a first analog light level onto a first column line that is based on the reference light level; and (b) a second circuit branch configured to sample a light level based on the voltage, and to output a second analog light level onto a second column line that is based on the light level. A difference between the second analog light level and the first analog light level indicates whether the event driven pixel has detected an event in an external scene.

Abstract: A compact camera includes an image sensor, a transparent layer, and a microlens (ML) layer, between the image sensor and the transparent layer. The ML layer forms (a) a first ML array having a plurality of first MLs, and (b) a second ML array with a plurality of second MLs interleaved with the plurality of first MLs. The compact camera also includes a baffle layer, between the ML layer and the image sensor, that forms a plurality of first aperture stops each aligned with a different one of the first MLs and a plurality of second aperture stops each aligned with a different one of the second MLs. The first MLs each have a first set of optical characteristics and the second MLs each have a second set of optical characteristics that are different from the first set of optical characteristics.

Abstract: Examples of the disclosed subject matter propose disposing trench isolation structure around the perimeter of the pixel transistor region of the pixel cell. The trench isolation structure includes front side (e.g., shallow and deep) trench isolation structure and back side deep trench isolation structure that abut against or contacts the bottom of front side deep trench isolation structure for isolating the pixel transistor channel of the pixel cell's pixel transistor region. The formation and arrangement of the trench isolation structure in the pixel transistor region forms a floating doped well region, containing, for example, a floating diffusion (FD) and source/drains (e.g., (N) doped regions) of the pixel transistors. This floating P-well region aims to reduce junction leakage associated with the floating diffusion region of the pixel cell.

Abstract: A flare-reducing image sensor includes a plurality of pixels, NP in number, and a plurality of microlenses, NML in number, where each of the plurality of microlenses is aligned to a respective one of the plurality of pixels, such that NP=NML. The flare-reducing image sensor further includes a plurality of phase-shifting layers, NL, in number, where each phase-shifting layer is aligned with a respective one of the plurality of microlenses, where NL, is less than or equal to NML.

Abstract: A time-of-flight pixel array includes photodiodes that generate charge in response to incident reflected modulated light. First transfer transistors transfer a first portion of the charge from the photodiodes in response to a first modulation signal and second transfer transistors transfer a second portion of the charge from the photodiodes in response to a second modulation signal, which is an inverted first modulation signal. First floating diffusions are coupled to the first transfer transistors. A binning transistor is coupled between one of the first floating diffusions and another one of the first floating diffusions. A first memory node is coupled to one of the first floating diffusions through a first sample and hold transistor and a second memory node is coupled to another one of the first floating diffusions through a second sample and hold transistor.

Abstract: An image sensor module comprises an image sensor having a light sensing area, a cover glass for covering the light sensing area, a dam between the image sensor and the cover glass, which surrounds the light sensing area, and has an outer wall and an inner wall, where a cross-section of the inner wall parallel to the surface of the light sensing area of the image sensor forms a sawtooth pattern and/or, where a cross-section of the inner wall orthogonal to the surface of the light sensing area of the image sensor forms an inclined surface.

Abstract: A multi-pixel detector of an image sensor is described. The multi-pixel detector includes a first photodiode region disposed within a semiconductor substrate to form a first pixel, a second photodiode region disposed within the semiconductor substrate to form a second pixel adjacent to the first pixel, and a partial isolation structure extending from a first side of the semiconductor substrate towards a second side of the semiconductor substrate between the first photodiode region and the second photodiode region. A length of a lateral portion of the partial isolation structure between the first photodiode region and the second photodiode region is less than a lateral length of the first photodiode region.

Abstract: An uneven-trench pixel cell includes a semiconductor substrate that includes a floating diffusion region, a photodiode region, and, between a front surface and a back surface: a first sidewall surface, a shallow bottom surface, a second sidewall surface, and a deep bottom surface. The first sidewall surface and a shallow bottom surface define a shallow trench, located between the floating diffusion region and the photodiode region, that extends into the semiconductor substrate from the front surface. A shallow depth of the shallow trench exceeds a junction depth of the floating diffusion region. The second sidewall surface and a deep bottom surface define a deep trench, located between the floating diffusion region and the photodiode region, that extends into the semiconductor substrate from the front surface. A distance between the deep bottom surface and the front surface defines a deep depth, of the deep trench, that exceeds the shallow depth.

Abstract: An electronic camera assembly includes a camera chip cube bonded to camera bondpads of an interposer; at least one light-emitting diode (LED) bonded to LED bondpads of the interposer at the same height as the camera bondpads; and a housing extending from the interposer and LEDs to the height of the camera chip cube, with light guides extending from the LEDs through the housing to a top of the housing. In embodiments, the electronic camera assembly includes a cable coupled to the interposer. In typical embodiments the camera chip cube has footprint dimensions of less than three and a half millimeters square.

Abstract: A passive speckle-suppressing diffuser includes a microlens array for diffusing a light field originating from one or more coherent light beams, and a diffractive optical element mounted in series with the microlens array and having a pixelated thickness distribution, characterized by a spatial variation across the diffractive optical element, to impose a spatially varying phase shift on the light field. The pixelated thickness distribution may be configured such that the spatially varying phase shift suppresses speckle of the light field while minimizing introduction of distinct diffraction structure.

Abstract: A method for estimating a signal charge collected by a pixel of an image sensor includes determining an average bias that depends on the pixel's floating-diffusion dark current and pixel-sampling period. The method also includes determining a signal-charge estimate as the average bias subtracted from a difference between a weighted sum of a plurality of N multiple-sampling values each multiplied by a respective one of a plurality of N sample-weights.

Abstract: A pixel cell with an elevated floating diffusion region is formed to reduce diffusion leakage (e.g., gate induced drain leakage, junction leakage, etc.). The floating diffusion region can be elevated by separating a doped floating diffusion region from the semiconductor substrate by disposing an intervening layer (e.g., undoped, lightly doped, etc.) on the semiconductor substrate and beneath the doped floating diffusion region. For instance, the elevated floating diffusion region can be formed by stacked material layers composed of a lightly or undoped base or intervening layer and a heavy doped (e.g., As doped) “elevated” layer. In some examples, the stacked material layers can be formed by first and second epitaxial growth layers.

Abstract: In an embodiment, a method of reducing resistance-capacitance delay along photodiode transfer lines of an image sensor includes forking a plurality of photodiode transfer lines each into a plurality of sublines coupled together and to a first decoder-driver at a first end of each subline; and distributing selection transistors of a plurality of multiple-photodiode cells among the plurality of sublines. In embodiments, the sublines may be recombined at a second end of the sublines and driven by a second decoder-driver at the second end.

Abstract: A multiple-lens optical fingerprint reader for reading fingerprints through a display has a spacer; and multiple microlenses with concave and convex surfaces in a microlens array, each microlens of multiple lenses focuses light arriving at that microlens from a finger adjacent the display through the spacer forms an image on associated photosensors on a photosensor array of an image sensor integrated circuit. A method of verifying identity of a user includes illuminating a finger of the user with an OLED display; focusing light from the finger through arrayed microlenses onto a photosensor array, reading the array into overlapping electronic fingerprint images; extracting features from the overlapping fingerprint images or from a stitched fingerprint image, and comparing the features to features of at least one user in a library of features and associated with one or more fingers of one or more authorized users.

Abstract: Embodiments disclosed herein reduce petal flare. A flare-suppressing image sensor includes a plurality of pixels including a first set of pixels and a second set of pixels. The flare-suppressing image sensor further includes plurality of microlenses, where each microlens is aligned to a respective one of the first set of pixels. The flare-suppressing image sensor further includes plurality of sub-microlens, where each microlens array is aligned to a respective one of the second set of pixels.

Abstract: A light-trapping image sensor includes a pixel array and a lens array. The pixel array is formed in and on a semiconductor substrate and including photosensitive pixels each including a reflective material forming a cavity around a portion of semiconductor material to at least partly trap light that has entered the cavity. The cavity has a ceiling at a light-receiving surface of the semiconductor substrate, and the ceiling forms an aperture for receiving the light into the cavity. The lens array is disposed on the pixel array. Each lens of the lens array is aligned to the aperture of a respective cavity to focus the light into the cavity through the aperture.

Abstract: A shallow trench isolation (STI) structure and method of fabrication includes forming a shallow trench isolation (STI) structure having a polygonal shaped cross-section in a semiconductor substrate of an image sensor includes a two-step etching process. The first step is a dry plasma etch that forms a portion of the trench to a first depth. The second step is a wet etch process that completes the trench etching to the desired depth and cures damage caused by the dry etch process. A CMOS image sensor includes a semiconductor substrate having a photodiode region and a pixel transistor region separated by a shallow trench isolation (STI) structure having a polygonal shaped cross-section.

Abstract: A pixel-array substrate includes a semiconductor substrate with a pixel array, a back surface, and a front surface, and a guard ring formed of a doped semiconductor, enclosing the pixel array, and extending into the semiconductor substrate from the front surface, the back surface forming a trench extending into the semiconductor substrate, the trench overlapping the guard ring. A method for reducing leakage current into a pixel-array includes doping a semiconductor substrate to form a guard ring that extends into the semiconductor substrate from a front surface, encloses a pixel array, excludes a periphery region, and resists a flow of electric current, and forming, into a back surface of the semiconductor substrate, a trench that penetrates into the back surface and overlaps the guard ring, the guard ring and the trench configured to resist the flow of electric current between the pixel array and the periphery region.