Abstract: A pixel cell is formed on a semiconductor substrate having a front surface. The pixel cell includes a photodiode, a floating diffusion region, and a transfer gate. The photodiode is disposed in the semiconductor substrate. The floating diffusion region includes a first doped region disposed in the semiconductor substrate, wherein the first doped region extends from the front surface to a first junction depth in the semiconductor substrate. The transfer gate is configured to selectively couple the photodiode to the floating diffusion region controlling charge transfer between the photodiode and the floating diffusion region. The transfer gate includes a planar gate disposed on the front surface of the semiconductor substrate and a pair of vertical gate electrodes. Each vertical gate electrode extending a gate depth from the planar gate into the semiconductor substrate. The first junction depth is greater than the gate depth.

Abstract: A time-of-flight sensor includes a pixel array of pixel circuits. A first subset of the pixel circuits is illuminated by reflected modulated light from a portion of an object. A second subset of the pixel circuits is non-illuminated by the reflected modulated light. Each pixel circuit includes a floating diffusion that stores a portion of charge photogenerated in a photodiode in response to the reflected modulated light. A transfer transistor transfers the portion of charge from the photodiode to the floating diffusion in response to modulation by a phase modulation signal. A modulation driver block generates the phase modulation signal and is coupled to a light source that emits the modulated light to the portion of the object. The modulation driver block synchronizes scanning the modulated light emitted by the light source across the object with scanning of the first subset of the pixel circuits across the pixel array.

Abstract: A ramp generator includes an operational amplifier having an output to generate a ramp signal. An integration current source is coupled to a first input and a reference voltage is coupled to a second input of the operational amplifier. A feedback capacitor is coupled between the first input and the output of the operational amplifier. A monitor circuit is coupled to the first and second inputs of the operational amplifier to generate an output flag in response to a comparison of the first and second inputs. A trimming control circuit is configured to generate a trimming signal in response to the output flag. An assist current source is configured to conduct an assist current from the output of the operational amplifier to ground in response the trimming signal generated by the trimming control circuit.

Abstract: A method for forming a deep trench isolation structure for a CMOS image sensor includes providing a trench that extends from a first side toward a second side of a semiconductor substrate. The trench has an opening on the first side and a bottom and sides. A conformal layer of B-doped oxide is deposited on the bottom and sides of the trench and is less than half a width of the trench leaving a depthwise recess in the trench. A second material is deposited on the conformal layer of B-doped oxide in the trench filling the recess in the trench to the first side. The conformal layer of B-doped oxide is annealed driving boron from the conformal layer of B-doped oxide to the semiconductor substrate forming a B-doped region as a passivation layer juxtaposed next to the conformal layer of B-doped oxide having negative fixed charges.

Abstract: A pixel circuit includes a transfer transistor is coupled between a photodiode and a floating diffusion to transfer the image charge from the photodiode to the floating diffusion. A lateral overflow integration capacitor (LOFIC) includes an insulating region between a first metal electrode and a second metal electrode that is coupled to a first reset transistor and selectively coupled to the floating diffusion. A second reset transistor and a bias voltage source are coupled to the first metal electrode. During an idle period, the first reset transistor is configured to be on, the second reset transistor is configured to be off, and the bias voltage source is configured to provide a first bias voltage to the first metal electrode to reverse bias the LOFIC. The first bias voltage is less than a reset voltage provided from the reset voltage source.

Abstract: In some embodiments, an image sensor is provided. The image sensor comprises a plurality of photodiodes arranged as a photodiode array. The photodiodes of the photodiode array are arranged into a first quadrant, a second quadrant, a third quadrant, and a fourth quadrant. A first polarization filter and a first telecentric lens are aligned with the first quadrant. A second polarization filter and a second telecentric lens are aligned with the second quadrant. A third polarization filter and a third telecentric lens are aligned with the third quadrant. A fourth telecentric lens is aligned with the fourth quadrant.

Abstract: A global shutter readout circuit includes a pixel enable signal and a first sample and hold (SH) signal that are configured to turn ON a pixel enable transistor and a first storage transistor at a first time during a global transfer period. The pixel enable signal is configured to begin a transition to an OFF level at a second time and complete the transition to the OFF level at a third time to turn OFF the pixel enable transistor. The first SH signal is configured to begin a transition to the OFF level at a fourth time, which occurs after the second and third times, and complete the transition to the OFF level at a fifth time to turn OFF the first storage transistor. An OFF transition duration between the fourth and fifth times is greater than an ON transition duration of the first SH signal at the first time.

Abstract: An image sensor has a plurality of pixels arranged in a row direction and in a column direction. Each pixel comprises a color filter that has a portion with a low transmissivity and a portion with a high transmissivity, and a photoelectric conversion element that includes a first photoelectric conversion cell which receives light transmitting through the portion with the low transmissivity of the color filter, and a second photoelectric conversion cell which receives light transmitting through the portion with the high transmissivity of the color filter. The plurality of pixels are arranged such that positions of the portions with the low transmissivity for pixels of one color are identical among the plurality of pixels, and the portions with the low transmissivity are positioned adjacent to each other between adjacent pixels of different colors in the row direction only.

Abstract: A pixel circuit includes a photodiode configured to photogenerate image charge in response to incident light. A transfer transistor is configured to transfer the image charge from the photodiode to a floating diffusion. A reset transistor coupled between a reset voltage source and the floating diffusion. A lateral overflow integration capacitor (LOFIC) includes an insulating region disposed between a first metal electrode and a second metal electrode. The first metal electrode is coupled to a bias voltage source, the second metal electrode is selectively coupled to the floating diffusion, and excess image charge photogenerated by the photodiode during an idle period is configured to overflow from the photodiode through the transfer transistor into the floating diffusion.

Abstract: Low power event driven pixels with passive difference detection circuit (and reset control circuits for the same) are disclosed herein. In one embodiment, an event driven pixel comprises a photosensor; a photocurrent-to-voltage converter, and a difference circuit. The difference circuit includes a source follower transistor and a switched-capacitor filter having an input coupled to the photocurrent-to-voltage converter and an output coupled to a gate of the source follower transistor. The switched-capacitor filter includes a first capacitor coupled between the input and the output of the switched-capacitor filter, a second capacitor having a first plate coupled to the output of the switched-capacitor filter, and a reset transistor coupled between a reference voltage and the output of the switched-capacitor filter. The difference circuit is configured generate a difference signal that is indicative of whether the event driven pixel has detected an event in an external scene.

Abstract: A pixel circuit includes a transfer transistor coupled between a photodiode and a floating diffusion. A lateral overflow integration capacitor (LOFIC) includes an insulating region disposed between a first metal electrode coupled to a bias voltage source, and a second metal electrode selectively coupled to the floating diffusion. A multifunction reset transistor includes a gate, a drain, a first source, and a second source. The drain, the first source, and the second source are coupled to each other in response to a multifunction reset control signal turning the multifunction reset transistor on. The drain, the first source, and the second source are decoupled from one another in response to the multifunction reset control signal turning the multifunction reset transistor off. The drain is coupled to a reset voltage source, the first source is coupled to the first metal electrode, and the second source is coupled to the second metal electrode.

Abstract: A global shutter readout circuit includes a reset transistor coupled between a reset voltage and a bitline. A pixel enable transistor is coupled between the reset transistor and a source follower transistor. First and second terminals of the pixel enable transistor are coupled together in response to a pixel enable signal coupled to a third terminal of the pixel enable transistor. A first storage transistor coupled to the second terminal of the pixel enable transistor and the gate of the source follower transistor. A first storage capacitor is coupled to the first storage transistor. A second storage transistor coupled to the second terminal of the pixel enable transistor and the gate of the source follower transistor. A second storage capacitor is coupled to the second storage transistor. A row select transistor is coupled to the source follower transistor to generate an output signal from the global shutter readout circuit.

Abstract: A ramp buffer circuit includes an input device having an input coupled to receive a ramp signal. A bias current source is coupled to an output of the input device. The input device and the bias current source are coupled between a power line and ground. An assist current source is coupled between the output of the input device and ground. The assist current source is configured to conduct an assist current from the output of the input device to ground only during a ramp event generated in the ramp signal.

Abstract: The present disclosure provides an alignment method for image sensor fabrication that involve forming a number of set of alignment marks using key process mask layers to improve alignment registration between process mask layers so as to reduce number of alignment transfer improves alignment accuracy between pixel elements. The present disclosure further provides a semiconductor device that includes such alignment mark structures.

Abstract: An imaging device includes groupings of photodiodes having four photodiodes. A transfer transistor is between each photodiode and a floating diffusion. Each floating diffusion is coupled to up to two photodiodes per grouping at a time through transfer transistors. A buffer transistor is coupled to each floating diffusion. The buffer transistors may be in a first or second grouping of buffer transistors. A first bit line is coupled to up to two buffer transistors of the first grouping and a second bit line is coupled to up to two buffer transistors of the second grouping of buffer transistors at a time. A color filter array including a plurality of groupings of color filters is disposed over respective photodiodes of the photodiode array, wherein each grouping of color filters includes four color filters having a same color, wherein each grouping of color filters overlaps two groupings of photodiodes.

Abstract: A switch driver circuit includes a plurality of pullup transistors. The plurality of pullup transistors includes a first pullup transistor coupled between a voltage supply and a first output node. A plurality of pulldown transistors includes a first pulldown transistor coupled between the first output node and a ground node. A slope control circuit is coupled to the ground node. A plurality of global connection switches includes a first global connection switch coupled between the first output node and the slope control circuit.

Abstract: A flicker-mitigating pixel-array substrate includes a semiconductor substrate and a metal annulus. The semiconductor substrate includes a small-photodiode region. A back surface of the semiconductor substrate forms a trench surrounding the small-photodiode region in a cross-sectional plane parallel to a back-surface region of the back surface above the small-photodiode region. The metal annulus (i) at least partially fills the trench, (ii) surrounds the small-photodiode region in the cross-sectional plane, and (iii) extends above the back surface. A method for fabricating a flicker-mitigating pixel-array substrate includes forming a metal layer (i) in a trench that surrounds the small-photodiode region in a cross-sectional plane parallel to a back-surface region of the back surface above the small-photodiode region and (ii) on the back-surface region. The method also includes decreasing a thickness of an above-diode section of the metal layer located above the back-surface region.

Abstract: An image sensor includes a plurality of pixels that is arranged in a matrix and each of which outputs a signal in response to incident light, wherein readout of data can be performed with respect to the plurality of pixels, and simultaneous readout of data of a plurality of columns of pixels can be performed, and at least one pixel of the plurality of columns of pixels to be read simultaneously can be read for phase detection with respect to each of divided sub-pixels. The image sensor is configured to, with n rows as a readout unit where n is an integer of 2 or more, perform readout for at least one sub-pixel of at least one pixel in one readout cycle within the readout unit, perform readout for each pixel including phase detection readout for the other sub-pixel of the at least one pixel in which the at least one sub-pixel has been read in the one readout cycle, in another readout cycle within the readout unit, and end the readout for the readout unit with the n+1 readout cycles.

Abstract: An image sensing device includes an image sensing circuit, a voltage supply grid, bitlines, and a control circuit. The image sensing circuit includes pixels arranged in rows and columns. Each one of the bitlines is coupled to a corresponding one of the columns. The voltage supply grid is coupled to the pixels. The control circuit is coupled to output at least a row select signal and a transfer signal to the rows. Each one of the rows is selectively coupled to the bitlines to selectively output image data signals in response to the row select signal and the transfer signal. Each one of the rows is further selectively coupled to the bitlines to selectively clamp the bitlines in response to the row select signal and the transfer signal. Each one of the rows is selectively decoupled from the bitlines in response to the row select signal.

Abstract: A method of fabricating a target shallow trench isolation (STI) structure between devices in a wafer-level image sensor having a large number of pixels includes etching a trench, the trench having a greater depth and width than a target STI structure and epitaxially growing the substrate material in the trench for a length of time necessary to provide the target depth and width of the isolation structure. An STI structure formed in a semiconductor substrate includes a trench etched in the substrate having a depth and width greater than that of the STI structure, and semiconductor material epitaxially grown in the trench to provide a critical dimension and target depth of the STI structure. An image sensor includes a semiconductor substrate, a photodiode region, a pixel transistor region and an STI structure between the photodiode region and the pixel transistor region.