Abstract: A method of manufacturing a non-volatile memory is provided. A substrate including a first region and a second region is provided. A first patterning process is performed to the first region, so as to form a plurality of gate stack structures in the first region. Afterwards, a first sidewall oxide layer is formed to cover sidewalls and an upper surface of each gate stack structure, and a protection layer is then formed on the first sidewall oxide layer. Next, an ion implantation process is performed to the second region, and a second patterning process is performed to the second region so as to form a plurality of gate structures. Then, a second sidewall oxide layer covering sidewalls of each gate structure is formed.

Abstract: A method for fabricating semiconductor structure is provided. A substrate having a plurality of blocks is provided. Each of the blocks includes a first region and a second region. The first region and the second region are disposed alternately. A plurality of composite layers is formed on the substrate. The top-most layer of the composite layers is patterned. A plurality of composite blocks is formed on the first region of the substrate. The composite layers and the composite blocks on the blocks are removed successively by a removal process. A staircase structure is formed on the substrate.

Abstract: This invention provides a memory structure and an operation method thereof. The memory structure includes a triode for alternating current (TRIAC) and a memory cell. The memory cell is electrically connected to the TRIAC.

Abstract: A patterning method is provided. Mask structures including first mask layers and first photoresist layers are formed sequentially on a material layer. A second mask layer covering the mask structures is conformally formed on the material layer. First sacrificed layers are formed between the mask structures. Parts of the second mask layer are removed to expose the first photoresist layers and form first U-shape mask layers. The first photoresist layers and the first sacrificed layers are removed. A third mask layer having first surfaces and second surfaces lower than the first surfaces is conformally formed on the material layer. Second sacrificed layers are formed on the second surfaces. Parts of the third mask layer are removed to expose protrusions of the first U-shape mask layers and form second U-shape mask layers. The material layer is patterned by using protrusions of the second U-shape mask layers as masks.

Abstract: A flash memory apparatus and an initialization method for programming operation thereof are provided. The initialization method includes: providing a plurality of increasing programming pulse voltages to operate a plurality of without program inhibit programming actions on memory cells of the flash memory, and operating a plurality of programming verification actions on the memory cells according to a programming verification voltage; obtaining a recorded programming voltage value according verified results of the programming verification actions; providing a plurality of increasing reading pulse voltages to operate a plurality of reading actions on the memory cells; obtaining a recorded reading voltage value according to read result of the reading actions; and obtaining an initial programming voltage and an incremental step programming pulse voltages according to the recorded programming voltage value, the recorded reading voltage value and a voltage value of the programming verification voltage.

Abstract: A manufacturing method of a non-volatile memory is provided. A tunneling dielectric layer, a first conductive pattern, and isolation structures are formed on a substrate. Using a first photoresist layer as a mask, the first conductive pattern is partially removed to form a first opening exposing the substrate. An insulating layer is formed to fill the first opening and cover the first conductive pattern and the isolation structures. Using a second photoresist layer shielding a portion of the first conductive pattern as a mask, the insulating layer surrounding the first conductive pattern is removed to form a patterned insulating layer having a second opening exposing a portion of the first conductive pattern. An inter-gate dielectric layer and a second conductive pattern are formed on the first conductive pattern to fill the second opening, the first conductive pattern forms a floating gate, and the second conductive pattern forms a control gate.

Abstract: A method of making a flash memory includes providing a substrate. Then, a first insulating layer, a first conductive layer and a second insulating layer are formed to cover the substrate. Later, a first trench is formed in the first conductive layer and the second insulating layer. After that, a second conductive layer and a mask layer are formed to cover the second insulating layer, and the second conductive layer fills up the first trench. Then, the mask layer are patterned to form patterned mask layers. Subsequently, a spacer is formed on the sidewall of the patterned mask layer. Then, an etching process is carried out by using the patterned mask layers and the spacer as a mask so as to form a first gate structure and a second gate structure.

Abstract: A non-volatile semiconductor memory device utilized to implement the writing of data by adding a predetermined voltage for assigning a word line to a non-volatile memory cell includes a control process or generating and outputting control data implementing a program code for writing data including a word line assignment command and voltage source assignment data, a writing controller decoding the control data and generating a control signal of the word line assignment command and a control signal of the voltage source assignment data, a voltage generation circuit generating several voltages for writing data, and a switch circuit selecting a voltage, corresponding to voltage source assignment data, among several voltages, according to the control signal of the word line assignment command and the control signal of voltage source assignment data and outputting the selected voltage to the word line corresponding to the word line assignment command.

Abstract: A resistive random access memory (RRAM) structure including a first transistor, a second transistor and a RRAM cell string is provided. The first transistor and the second transistor are cascaded by electrically connecting a first terminal of the first transistor and the second transistor. The RRAM cell string includes a plurality of memory cells connected with each other and is electrically connected to a second terminal of the first transistor.

Abstract: A method of manufacturing an isolation structure suitable for a non-volatile memory is provided. A substrate is provided. A dielectric layer, a conductive layer, and a hard mask layer are sequentially formed on the substrate. The hard mask layer and the conductive layer are patterned to form a first trench which exposes the dielectric layer. A first liner is formed on the substrate. The first liner and the dielectric layer that are exposed by the first trench are removed to expose the substrate. A spacer is formed on sidewalls of the conductive layer and the hard mask layer. The substrate is partly removed to form in a second trench with use of the conductive layer and the hard mask layer with the spacer as a mask. An isolation layer is formed in the second trench. The distance between the conductive layers is greater than the width of the second trench.

Abstract: A polishing method and a polishing system are provided. By means of adjusting a rotational center of a polishing article corresponding to positions of a polishing pad or polishing pads, a polishing rate of the polishing article surface has a better uniformity, resulted from compensation of polishing rates at the rotational center of the polishing article.

Abstract: A method for fabricating semiconductor device is disclosed. The method includes the steps of: providing a substrate having a first gate layer and a first dielectric layer thereon, and a shallow trench isolation (STI) in the substrate and surrounding the first gate layer and the first dielectric layer; removing the first dielectric layer; forming a first spacer on the sidewall of the STI above the first gate layer; and using the first spacer as mask to remove part of the first gate layer and part of the substrate for forming a first opening while defining a first gate structure and a second gate structure.

Abstract: A negative reference voltage generating circuit generating a negative reference voltage is provided, including a differential amplifier, a first diode, second diodes, and a third resistor. The differential amplifier includes a non-inverting input terminal, an inverting input terminal, and an output terminal, and is driven by a positive and a negative power voltages. The output terminal is connected with the non-inverting input terminal via a first resistor and connected with the inverting input terminal via a second resistor. The first diode includes a cathode connected with the non-inverting input terminal of the differential amplifier and an anode connected with a ground. The second diodes respectively include a cathode connected with a predetermined connection point and an anode connected with the ground, and are connected in parallel. The third resistor is connected between the connection point and the inverting input terminal of the differential amplifier.

Abstract: A CMOS image sensor unit and a method for fabricating the same are described. The image sensor unit includes a photodiode, a transfer gate, a reset gate, a source follower gate, a floating drain region between the transfer gate and the reset gate, and a PIP capacitor. The lower poly-Si electrode of the PIP capacitor is electrically connected with the floating drain region and the source follower gate to also serve as an interconnect between the floating drain region and the source follower gate. The fabrication method includes forming contact plugs on the floating drain region and the source follower gate, and then forming a PIP capacitor whose lower poly-Si electrode is connected with each contact plug.

Abstract: A manufacturing method of floating gate is disclosed. A substrate having a plurality of isolation structures is provided, and top surfaces of the isolation structures are higher than a top surface of the substrate. A first conductive layer is formed on the substrate. A sacrificial layer is formed on the first conductive layer. Parts of the sacrificial layer are removed while parts of the sacrificial layer on the first conductive layer between the isolation structures are remained. Parts of the first conductive layer are removed by using the remaining parts of the sacrificial layer as masks to form conductive structures between the adjacent isolation structures. The remaining parts of the sacrificial layer are removed. A second conductive layer is formed on the substrate and the second conductive layer electrically connects with the conductive structures. The second conductive layer and the conductive structures are patterned to form floating gates.

Abstract: A resistive random access memory including a substrate, a dielectric layer, and at least one memory cell string is provided. The dielectric layer is disposed on the substrate. The memory cell string includes memory cells and at least one first interconnect structure. The memory cells are vertically and adjacently disposed in the dielectric layer, and each memory cells includes a first conductive line, a second conductive line, and a variable resistance structure. The second conductive line is disposed at one side of the first conductive line, and the top surface of the second conductive line is higher than the top surface of the first conductive line. The variable resistance structure is disposed between the first conductive line and the second conductive line. The variable resistance structures in the vertically adjacent memory cells are isolated from each other. The first interconnect structure is connected to the vertically adjacent first conductive lines.

Abstract: An image sensor device includes a substrate having an active array region and a peripheral circuit region, a plurality of light-sensing elements disposed within the active array region, a first dielectric layer on the substrate, and a second dielectric layer on the first dielectric layer. A recess region is provided in the second dielectric layer to reveal a top surface of the first dielectric layer within the active array region. An angle between a sidewall of the second dielectric layer that defines the perimeter of the recess region and the top surface of the first dielectric layer is less than 90 degrees.

Abstract: A flash memory apparatus and data erasing method thereof. The data erasing method includes: setting a plurality of incremental erasing voltages sequentially, and operating a plurality of data erasing operations on memory cells according to the erasing voltages; recording a recoded erasing voltage corresponding to the last data erasing operation; setting a plurality of incremental reading voltage sequentially, operating a plurality of data reading operations on the memory cells, and recording a final reading voltage corresponding to the last reading operation; setting a final erasing voltage for operating a final erasing operation on the memory cells, wherein a voltage level of the final erasing voltage equals to a sum of voltage levels of an erasing verification voltage, the final reading voltage and the recorded erasing voltage.

Abstract: A gap fill treatment for via process is provided. A substrate with a plurality of openings has formed therein is provided. The substrate includes a dense pattern region and an isolated pattern region. A positive resist layer is formed to fill in the openings on the substrate, wherein the thickness of the positive resist layer on the surface of the isolated pattern region is greater than that on the surface of the dense pattern region. The positive resist layer on the surface of the substrate is exposed only. The exposed positive resist layer is developed to form a gap-filling material layer, wherein the gap-filling material layer has the same thickness in the dense pattern region and in the isolated pattern region. A reagent is coated on the surface to form a reaction layer. The reaction layer is removed so that a cap layer remained on the gap-filling material layer.

Abstract: A resistive random access memory (RRAM) including a substrate, a dielectric layer, memory cells and an interconnect structure is provided. The dielectric layer is disposed on the substrate. The memory cells are vertically and adjacently disposed in the dielectric layer, and each of the memory cells includes a first electrode, a second electrode and a variable resistance structure. The second electrode is disposed on the first electrode. The variable resistance structure is disposed between the first electrode and the second electrode. In two vertically adjacent memory cells, the first electrode of the upper memory cell and the second electrode of the lower memory cell are disposed between the adjacent variable resistance structures and isolated from each other. The interconnect structure is disposed in the dielectric layer and connects the first electrodes of the memory cells.