Abstract: To provide an X-ray analysis device and a method for optical axis alignment thereof by which measurement time is shortened and measurement cost may be reduced without optical axis alignment at each measurement using an analyzer. The X-ray analysis device includes a sample stage for supporting a sample, an N-dimensional detector, and an analyzer including analyzer crystals. A detection surface of the N-dimensional detector has first and second detection areas, a plurality of optical paths includes a first optical path that directly reaches the first detection area and a second optical path that reaches via the analyzer crystals, and the N-dimensional detector performs a measurement of the first optical path by X-ray detection of the first detection area, and performs a measurement of the second optical path by X-ray detection of the second detection area.

Abstract: An X-ray fluorescence analysis method according to an FP method uses a predefined theoretical intensity formula in a standard sample theoretical intensity calculation step for obtaining a sensitivity constant and in an unknown sample theoretical intensity calculation step during iterative calculation. In the formula, only in an absorption term relating to absorption of X-rays, a mass fraction of each component is normalized so that a sum of the mass fractions of all components becomes 1.

Abstract: An X-ray thin film inspection device according to the present invention has an X-ray irradiation unit 40 mounted in a first rotation arm 32, an X-ray detector 50 mounted in a second rotation arm 33, a fluorescence X-ray detector 60 for detecting fluorescent X-ray occurring from an inspection target due to irradiation of X-ray, a temperature measuring unit 110 for measuring the temperature corresponding to the temperature of the X-ray thin film inspection device, and a temperature correcting system (central processing unit 100) for correcting an inspection position on the basis of the temperature measured by the temperature measuring unit 110.

Abstract: Provided is an X-ray fluorescence spectrometer, which has a simple structure, and is capable of promptly performing high-accuracy analysis.

Abstract: A device that uses a grating to carry out high sensitivity radiographic image shooting using the wave nature of x-rays or the like can shoot a sample that moves relative to a device. A pixel value computation section determines, using a plurality of intensity distribution images of a sample that moves in a direction that traverses the path of radiation, whether or not a point (p, q) on the sample belongs in a region (Ak) on each intensity distribution image. Further, the pixel value computation section obtains a sum pixel value (Jk) for each region (Ak) by summing pixel values on the each intensity distribution image for point (p, q) that belongs to each region (Ak). An image computation section creates a required radiographic image using the sum pixel values (Jk) of the region (Ak).

Abstract: An X-ray thin film inspection device of the present invention includes an X-ray irradiation unit 40 installed on a first rotation arm 32, an X-ray detector 50 installed on a second rotation arm 33, and a fluorescence X-ray detector 60 for detecting fluorescence X-rays generated from an inspection target upon irradiation of X-rays. The X-ray irradiation unit 40 includes an X-ray optical element 43 comprising a confocal mirror for receiving X-rays radiated from an X-ray tube 42, reflects plural focused X-ray beams monochromatized at a specific wavelength and focuses the plural focused X-ray beams to a preset focal point, and a slit mechanism 46 for passing therethrough any number of focused X-ray beams out of the plural focused X-ray beams reflected from the X-ray optical element 43.

Abstract: A computer-implemented method of processing X-ray diffraction data, wherein the data is provided by an X-ray detector (1030) configured to detect diffracted X-ray beams (20) of a sample (30).

Abstract: At least two values of an X-ray irradiation width are set for a single specimen. A rocking curve is measured for each of the X-ray irradiation widths. A rocking curve width value is determined for each of the rocking curves. The values of the X-ray irradiation width and the values of the rocking curve width are plotted on a planar coordinate system having a vertical axis representing the rocking curve width value and a horizontal axis representing the X-ray irradiation width value, and a rocking curve width shift line is determined based on the plotted points. A gradient of the rocking curve width shift line is determined. A curvature radius of the specimen is determined based on the gradient. The amount of bowing of a single-crystal substrate under measurement can be measured without a need to move the single-crystal substrate for reliable measurement with a small amount of error.

Abstract: Only X-rays having a specific wavelength, selected from a group of focusing X-rays diffracted from a sample, are reflected from a monochromator based on a Bragg's condition, passed through a receiving slit and detected by an X-ray detector. The monochromator is configured to be freely removable, and arranged between the sample and a focal point at which the wavelength-selected focusing X-rays diffracted from the sample are directly focused. At this time, the monochromator is moved so as to position the monochromator as close to the focal point as possible. The monochromator comprises a multilayer mirror having an internal interplanar spacing, wherein said internal interplanar spacing varies continuously from one end of the monochromator to the other end.

Abstract: Provided is an X-ray fluorescence spectrometer, which has a simple structure, and is capable of promptly performing high-accuracy analysis.

Abstract: Provided is an X-ray small angle optical system, which easily achieves a desired angular resolution, including: an X-ray source having a microfocus; a multilayer mirror having an elliptical reflection surface, and being configured to collect X-rays emitted from the X-ray source and to irradiate a sample; and an X-ray detector configured to detect scattered X-rays generated from the sample, in which the elliptical reflection surface of the multilayer mirror has a focal point A and a focal point B, in which the X-ray source is arranged such that the microfocus includes the focal point A, and in which the X-ray detector is arranged on the multilayer mirror side of the focal point B.

Abstract: An X-ray diffraction apparatus includes: an X-ray source (110); a first incident path letting the generated X-ray beam pass therethrough; a second incident path letting the generated X-ray beam be reflected by a multilayer film mirror and letting the reflected X-ray beam pass therethrough in parallel with the X-ray beam having passed through the first incident path. A movement mechanism is provided moving the X-ray source (110) between the first incident path and the second incident path while preserving respective relative positions thereof. An incident slit (160) allows an X-ray beam to be incident on a sample S pass therethrough; and a sample support stage (165) supports the sample S at a position fixed relative to the incident slit (160).

Abstract: The X-ray reflectometer of the present invention includes: an irradiation angle variable unit (10) configured to vary an irradiation angle of a focused X-ray beam (6) with a sample surface (8a); a position sensitive detector (14) which is fixed; and a reflection intensity calculation unit (15) configured to, per reflection angle of reflected X-rays (13) constituting a reflected X-ray beam (12), integrate a detected intensity by a corresponding detection element (11), for only the detection elements (11) positioned within a divergence angle width of the reflected X-ray beam (12) in the position sensitive detector (14), in synchronization of variation in the irradiation angle (?) of the focused X-ray beam (6) by the irradiation angle variable unit (10).

Abstract: A stress analysis apparatus capable of improving the accuracy of a stress value, a method, and a program are provided. A stress analysis apparatus 100 that calculates a residual stress of a sample S includes an analysis unit configured to calculate an error as one of solutions by using an equation including an error term and prescribing a relationship between stress and strain with using measured values of diffracted X-rays with respect to a plurality of scattering vectors and a provisional value when the stress in a direction perpendicular to the surface of the sample S is constant, and a provisional value correction unit configured to correct the provisional value using the calculated error, and the analysis unit and the provisional value correction unit repeat the calculation of the error and the correction of the provisional value.

Abstract: Provided are operation guide system for X-ray analysis to enable users to easily understand measurement of X-ray optical system to be selected. The operation guide system includes: measurement information acquisition unit for acquiring information on a sample and each X-ray measurement optical system part; sample magnification acquisition unit for acquiring magnification for display; incident X-ray shape deformation unit for determining distorted shape of an incident X-ray obtained by magnifying shape of the incident X-ray based on the magnification in a plane perpendicular to an optical axis direction; scattered X-ray shape deformation unit for determining distorted shape of a scattered X-ray obtained by magnifying shape of the scattered X-ray based on the magnification in the plane; and X-ray measurement optical system modeling unit for modeling a deformed shape of the sample, the distorted shape of the incident X-ray, and the distorted shape of the scattered X-ray.

Abstract: A detector capable of securing space for arranging pixels in the vicinity of edges of adjacent readout chips according to design of counting circuits. A 2-dimensional hybrid pixel array detector configured to detect radiation rays, including a detection unit configured to detect the radiation rays incident in a region of each pixel 115, and a plurality of the readout chips including counting circuits 121 respectively connected to each of the pixels 115, the counting circuits 121 having a smaller set pitch than the pixels 115 along a certain direction in a detection surface. The regions occupied by the pixels and counting circuits corresponding to the pixels overlapping at least partially, and the connection being made in the overlapping regions.

Abstract: A wavelength dispersive X-ray fluorescence spectrometer includes a single one-dimensional detector (10) having detection elements (7) arranged linearly, and includes a detector position change mechanism (11) for setting a position of the one-dimensional detector (10) to either a parallel position at which an arrangement direction of the detection elements (7) is parallel to a spectral angle direction of a spectroscopic device (6) or an intersection position at which the arrangement direction intersects the spectral angle direction. At the parallel position, a receiving surface of the one-dimensional detector (10) is located at a focal point of focused secondary X-rays (42). At the intersection position, a receiving slit (9) is disposed at the focal point of the focused secondary X-rays (42), and the receiving surface is located at a traveling direction side of the focused secondary X-rays (42) farther from the spectroscopic device (6) than the receiving slit (9).

Abstract: A grazing incidence X-ray fluorescence spectrometer (1) of the present invention includes: a bent spectroscopic device (4) to monochromate X-rays (3) from an X-ray source (2) and generate an X-ray beam (5) focused on a fixed position (15) on a surface of a sample (S); a slit member (6) disposed between the bent spectroscopic device (4) and the sample (S) and having a linear opening (61); a slit member moving unit (7) to move the slit member (6) in a direction that intersects the X-ray beam (5) passing through the linear opening (61); a glancing angle setting unit (8) to move the slit member (6) by using the slit member moving unit (7), and set a glancing angle (?) of the X-ray beam (5) to a desired angle; and a detector (10) to measure an intensity of fluorescent X-rays (9) from the sample (S) irradiated with the X-ray beam (5).

Abstract: To provide a structure refining apparatus, a method and a program capable of univocally and appropriately setting a restraint with a statistically feasible intensity and specifying a crystal structure model making use of a measurement result under a constraint condition to reasonable known data. A structure refining apparatus 100 adjusting the crystal structure model on the basis of the measurement result and the known data includes a restraint applying unit 120 configured to apply the restraint such that a divergence between a parameter specifying a crystal structure and a known representative value becomes equivalent to a standard uncertainty of the known representative value and a structure specifying unit 140 configured to specify the crystal structure model on the basis of the measurement result under the applied restraint.

Abstract: Provided are an X-ray generator capable of easily measuring a beam size of an electron beam on an electron target, and an adjustment method therefor. The X-ray generator includes an electron target including a first metal, a second metal different from the first metal, and a third metal different from the second metal, which are sequentially arranged side by side along a first direction in a continuous manner.