Patents Assigned to SGS-Thomson Microelectronics S.A.
  • Patent number: 6172864
    Abstract: The present invention relates to a system for protecting against overloads in a telephone system. The telephone system includes a telephone exchange, a ringing device and an interface, coupled to receive input signals on subscriber lines. The input signals are forwarded to either the telephone exchange or the ringing device depending upon the operating mode of the telephone system. The telephone line supplies a signal indicating the operating mode. A single protection device is coupled between the input of the subscriber lines and the interface. The protection device is controlled by the operating mode signal, and includes logic for protecting both the ringing device and the telephone exchange.
    Type: Grant
    Filed: March 18, 1997
    Date of Patent: January 9, 2001
    Assignee: SGS-Thomson Microelectronics S.A.
    Inventors: Andr{acute over (e)} Bremond, Philippe Merceron
  • Patent number: 6172574
    Abstract: The present invention relates to a voltage-controlled quartz crystal oscillator, including an oscillation transistor, the base of which is connected to a first terminal of a quartz crystal and the emitter of which is connected, via a first capacitor, to a second terminal of the quartz crystal connected to a first supply terminal, and including an active circuit introducing a variable capacitance between the base and the emitter of the oscillation transistor, the active circuit being voltage-controlled.
    Type: Grant
    Filed: January 21, 1998
    Date of Patent: January 9, 2001
    Assignee: SGS-Thomson Microelectronics S.A.
    Inventor: Philippe Sirito-Olivier
  • Patent number: 6171931
    Abstract: A wafer of semiconductor material for fabricating integrated devices, including a stack of superimposed layers including first and second monocrystalline silicon layers separated by an intermediate insulating layer made of a material selected from the group comprising silicon carbide, silicon nitride and ceramic materials. An oxide bond layer is provided between the intermediate layer and the second silicon layer. The wafer is fabricated by forming the intermediate insulating layer on the first silicon layer in a heated vacuum chamber; depositing the oxide layer; and superimposing the second silicon layer. When the stack of silicon, insulating material, oxide and silicon layers is heat treated, the oxide reacts so as to bond the insulating layer to the second silicon layer. As a ceramic material beryllium oxide, aluminium nitride, boron nitride and alumina may be used.
    Type: Grant
    Filed: October 6, 1998
    Date of Patent: January 9, 2001
    Assignee: SGS-Thomson Microelectronics S.r.l.
    Inventors: Bruno Murari, Flavio Villa, Ubaldo Mastromatteo
  • Patent number: 6173242
    Abstract: The present invention relates to a circuit for simulating a break-over semiconductor component, including at least one switch simulating a switching function of the component and at least one voltage or current sensor controlling the switch, the sensor being associated with an adjustable check value corresponding to a characteristic value of the break-over component to be simulated by the circuit.
    Type: Grant
    Filed: September 25, 1997
    Date of Patent: January 9, 2001
    Assignee: SGS-Thomson Microelectronics S.A.
    Inventor: Micha{umlaut over (e)}l Davy
  • Patent number: 6169300
    Abstract: An Insulated Gate Bipolar Transistor includes a semiconductor substrate of a first conductivity type forming a first electrode of the device, a semiconductor layer of a second conductivity type superimposed over said substrate, a plurality of body regions of the first conductivity type formed in the semiconductor layer, a first doped region of the second conductivity type formed inside each body region, an insulated gate layer superimposed over portions of the semiconductor layer between the body regions and forming a control electrode of the device, a conductive layer insulatively disposed over the insulated gate layer and contacting each body region and each doped region formed therein, the conductive layer forming a second electrode of the device.
    Type: Grant
    Filed: March 4, 1998
    Date of Patent: January 2, 2001
    Assignee: SGS-Thomson Microelectronics S.r.l.
    Inventor: Leonardo Fragapane
  • Patent number: 6163790
    Abstract: A modular arithmetic coprocessor designed to perform computations according to the Montgomery method includes a division circuit to perform integer divisions. The integer division circuit computes the division of a binary data element A encoded on n+n (bits by a binary data element B encoded on n bits, A, B, n, n' and n" being on-zero integers. For this function, the integer division circuit includes: a first n-bit register and a second n-bit register to contain the binary data element A and the result of the division, a third n-bit register to contain an intermediate result, a fourth n-bit register to contain the binary data element B, two subtraction circuits each having a first series input and a second series input and a series output, and a test circuit having an input and an output.
    Type: Grant
    Filed: July 9, 1998
    Date of Patent: December 19, 2000
    Assignee: SGS-Thomson Microelectronics S.A.
    Inventor: Guy Monier
  • Patent number: 6156594
    Abstract: The present invention relates to a method for fabricating an integrated circuit including MOS transistors and a bipolar transistor of NPN type, including the steps of: forming the MOS transistors, covering the entire structure with a protection layer, opening the protection layer at the base-emitter location of the bipolar transistor, forming a first P-type doped layer of polysilicon, a second layer of silicon nitride and a second oxide layer, opening these last three layers at the center of the emitter-base region of the bipolar transistor, and depositing a third silicon nitride layer, forming spacers, removing the apparent parts of the third layer of silicon nitride, and depositing a third N-type doped polysilicon layer.
    Type: Grant
    Filed: November 13, 1997
    Date of Patent: December 5, 2000
    Assignee: SGS-Thomson Microelectronics S.A.
    Inventor: Yvon Gris
  • Patent number: 6156616
    Abstract: The present invention relates to a bipolar transistor of NPN type implemented in an epitaxial layer within a window defined in a thick oxide layer, including an opening formed substantially at the center of the window, this opening penetrating into the epitaxial layer down to a depth of at least the order of magnitude of the thick oxide layer, an N-type doped region at the bottom of the opening, a first P-type doped region at the bottom of the opening, a second lightly-doped P-type region on the sides of the opening, and a third highly-doped P-type region in the vicinity of the upper part of the opening, the three P-type regions being contiguous and forming the base of the transistor.
    Type: Grant
    Filed: November 13, 1997
    Date of Patent: December 5, 2000
    Assignee: SGS-Thomson Microelectronics S.A.
    Inventor: Yvon Gris
  • Patent number: 6154163
    Abstract: A successive approximation register has a serial input and output comprises a chain of logic circuits of the bistable type which have selectable input terminals feedback connected by a storage and control element and logic gate circuits of the OR-type, and connected to a serial line through respective internal switches communicating the serial line to input terminals of the logic circuits in said chain, the serial line forming an input to a flip-flop of the D type which is the output element of the register.
    Type: Grant
    Filed: June 29, 1998
    Date of Patent: November 28, 2000
    Assignee: SGS-Thomson Microelectronics S.r.l.
    Inventors: Annamaria Rossi, Giona Fucili, Marcello Leone, Maurizio Nessi
  • Patent number: 6153537
    Abstract: A method for manufacturing a semiconductor device having improved adhesion at an interface between layers of dielectric material, comprising the steps of forming a first layer of dielectric material on at least one part of a structure defined in a semiconductor substrate and forming a second dielectric material layer superimposed on the least one part of the first layer. The method further includes the step of forming, in the part where the first and second layers are superimposed, an intermediate adhesion layer comprising a ternary compound of silicon, oxygen and carbon. The formation of the adhesion layer takes place at low temperature and in an atmosphere kept essentially free of oxidative substances different from those serving to provide the silicon and the carbon to the layer. Preferably the layer is formed by the plasma enhanced chemical vapour deposition technique.
    Type: Grant
    Filed: December 22, 1995
    Date of Patent: November 28, 2000
    Assignee: SGS-Thomson Microelectronics S.r.l.
    Inventors: Maurizio Bacchetta, Luca Zanotti, Giuseppe Queirolo
  • Patent number: 6150844
    Abstract: An output stage for electronic circuits with high voltage tolerance and of the type comprising an output buffer made up of a complementary transistor pair comprising a P-channel MOS pull-up transistor and an N-channel MOS pull-down transistor. The transistors are connected together to make up an output terminal of the stage which comprises in addition a switch having an input connected to the output terminal of the stage and an output connected to the control terminal of the pull-up transistor to drive said control terminal in a state of extinction of the output buffer.
    Type: Grant
    Filed: July 23, 1997
    Date of Patent: November 21, 2000
    Assignee: SGS-Thomson Microelectronics S.r.l.
    Inventors: Giovanni Campardo, Stefano Zanardi, Carla Golla
  • Patent number: 6150853
    Abstract: The operation of externally connected output power transistors of a class AB amplifier is controlled without employing any external sensing resistance of the output current by driving an externally connected power transistor through a level shifting buffer and employing a limiting network composed of an integrated transistor driven by the output of a signal amplifying stage and a resistance connected in series with its drain. The buffer stage shifts the level of the driving signal of the external power transistor by a value equal to the threshold voltage of the integrated transistor of the limiting network thus ensuring the turn-off of the external power transistor under quiescent conditions.
    Type: Grant
    Filed: February 27, 1995
    Date of Patent: November 21, 2000
    Assignee: SGS-Thomson Microelectronics S.r.l.
    Inventors: Francesco Chrappan, Maurizio Nessi, Alberto Salina
  • Patent number: 6148413
    Abstract: Programming and reading management architecture, particularly for test purposes, for memory devices of the non-volatile type, comprising at least two memory half-matrices, a bidirectional internal bus for the transmission of data to and from the memory half-matrices, a programming unit for each one of the at least two memory half-matrices, and a data sensing unit. The programming units are adapted to program the at least two memory half-matrices and the data sensing unit and the programming units communicate with the bidirectional internal bus to reroute onto the bus reading data and programming data of the at least two memory half-matrices.
    Type: Grant
    Filed: March 28, 1997
    Date of Patent: November 14, 2000
    Assignee: SGS-Thomson Microelectronics S.r.l.
    Inventors: Luigi Pascucci, Marco Fontana
  • Patent number: 6147380
    Abstract: A non-volatile memory cell of the type which includes at least one floating gate transistor and which is realized over a semiconductor substrate includes a source region, and a drain region, separated by a channel region which is overlaid by a thin layer of gate oxide. The gate oxide isolates a floating gate region from the substrate. The floating gate region is coupled to a control gate terminal. The floating gate region of the memory cell develops a first potential barrier between the semiconductor substrate and the gate oxide layer, and a second different potential barrier between the floating gate region and the gate oxide.
    Type: Grant
    Filed: March 8, 2000
    Date of Patent: November 14, 2000
    Assignee: SGS-Thomson Microelectronics S.r.l.
    Inventor: Paolo Cappelletti
  • Patent number: 6147521
    Abstract: The disclosure relates to detectors of the level of supply voltage in an integrated circuit. The disclosed detector is designed to detect the crossing of low levels of supply voltage. It comprises a first arm to define a first reference voltage and a second arm to define a second reference voltage, these two reference voltages varying differently as a function of the supply voltage and their curves of variation intersecting for a value of the supply voltage located close to a desired threshold. A comparator receives the two reference voltages. The first arm has a resistive divider bridge, an intermediate connector of which constitutes the first reference voltage. The second arm comprises a resistor series-connected with a native P type MOS transistor, the point of junction of this resistor and this transistor constituting the second reference voltage. A non-linear element may be parallel-connected to the resistor which constitutes the first reference voltage.
    Type: Grant
    Filed: June 12, 1997
    Date of Patent: November 14, 2000
    Assignee: SGS-Thomson Microelectronics S.A.
    Inventors: Hubert Degoirat, Mathieu Lisart
  • Patent number: 6147566
    Abstract: An oscillator circuit produces first and second oscillating logic signals that are of a same frequency and are non-overlapping in a first logic state. This oscillator includes a flip-flop circuit to produce third and fourth oscillating logic signals of opposite polarities, this flip-flop circuit being driven by first and second driving logic signals. First and second logic gates receive the third and fourth logic signals and produce the first and second logic signals, the logic state transitions in the first and second logic signals being produced as a function of the logic state transitions of the third and fourth logic signals. The first and second logic gates are organized so as to introduce a delay into the transitions from a second logic state to the first logic state, in the first and second logic signals, with respect to transitions in the third and fourth logic signals.
    Type: Grant
    Filed: December 22, 1997
    Date of Patent: November 14, 2000
    Assignee: SGS-Thomson Microelectronics S.A.
    Inventors: Olivier Pizzuto, Fran.cedilla.ois Pierre Tailliet
  • Patent number: 6144257
    Abstract: The present invention relates to a bus control buffer amplifier. The output terminal is associated with a first pull-down N-channel MOS transistor and with a second pull-up N-channel MOS transistor. The first N-channel MOS transistor is directly controlled by an input signal. The second MOS transistor is an N-channel transistor, and its gate is controlled by a third pull-down N-channel MOS transistor directly controlled by the input signal, and by a fourth pull-up N-channel MOS transistor, which is controlled by the inverted input signal. The fourth N-channel MOS transistor has a very abrupt drain-substrate junction.
    Type: Grant
    Filed: February 24, 1998
    Date of Patent: November 7, 2000
    Assignee: SGS-Thomson Microelectronics S.A.
    Inventors: Ilias Bouras, Constantin Papadas, Jean-Pierre Moreau
  • Patent number: 6144078
    Abstract: A method for programming a read-only memory cell including a transistor whose source and drain, which have a second type of doping, are formed in a semiconductor substrate with a first type of doping, includes a step of carrying out a contradoping in a region of the source, the region being adjacent to the conduction channel 4, to make it a region with the first type of doping so as to prevent a transistor effect from occurring.
    Type: Grant
    Filed: July 30, 1996
    Date of Patent: November 7, 2000
    Assignee: SGS-Thomson Microelectronics S.A.
    Inventor: Richard Pierre Fournel
  • Patent number: 6144321
    Abstract: The present invention relates to a microprocessor including an operator dedicated to a concatenation of variable-length codes to form a sequence of contiguous codes, the operator being associated with a dedicated instruction using two parameters, a first one of which is a word containing a group of bits and the second one of which indicates the length of the group of bits, the operator responding to the dedicated instruction by isolating, in the first parameter, the group of bits having the length indicated by the second parameter and by inserting the bit group so isolated into an active register, in concatenation with a bit group which has been inserted in the active register by a previous execution of the dedicated instruction.
    Type: Grant
    Filed: December 15, 1997
    Date of Patent: November 7, 2000
    Assignee: SGS-Thomson Microelectronics S.A.
    Inventors: Olivier Deygas, Michel Harrand
  • Patent number: 6143059
    Abstract: Disclosed are a self-catalytic bath and a method for the deposition of Ni-P alloy on a substrate. The bath comprises nickel sulfate, sodium hypophosphite as a reducing agent, acetic acid as a buffer and traces of lead as a stabilizer. It also includes a citrate used as a complexing agent associated with a gluconate used both as a catalyst and a stabilizer. The disclosed bath makes it possible to tolerate large quantities of hypophosphite and is relatively long-lived. Furthermore, it can be used to prepare large quantities of Ni-P alloy per liter of solution.
    Type: Grant
    Filed: September 21, 1998
    Date of Patent: November 7, 2000
    Assignee: SGS-Thomson Microelectronics S.A.
    Inventors: Abdallah Tangi, Mohamed Elhark, Ali Ben Bachir, Abdallah Shriri, Mohamed Cherkaoui, Mohamed Ebntouhami, Mustapha Saaoudi El