Patents Assigned to Shipley Company, L.L.C.
  • Patent number: 7026093
    Abstract: Photoresist compositions having a resin binder with an acid labile blocking group with an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base.
    Type: Grant
    Filed: June 9, 2003
    Date of Patent: April 11, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, James F. Cameron, Roger F. Sinta
  • Patent number: 7024090
    Abstract: A fiber optic array (90) is provided having fibers (24) positioned at a selected angle relative to the output face of the array. The array includes first (20) and second (30) substrates each of which has a plurality of fiber passageways extending therethrough. The substrates are positioned relative to one another such that each passageway (22) of the first substrate is registered to a respective passageway (32) of the second substrate. An optical fiber is disposed in each pair of registered passageways. The passageways are dimensioned to permit the optical fiber disposed therein to be positioned at a range of angles relative to the output face of the array. The first and second substrates are moved relative to one another to select an angle from the range of angles at which the fibers are oriented relative to the output face of the array. A method for fabricating such a fiber optic array is also provided.
    Type: Grant
    Filed: September 26, 2002
    Date of Patent: April 4, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: Arden Jeantilus, David W. Sherrer
  • Patent number: 7022454
    Abstract: The present invention provides novel alicyclic-esterified norbornene carboxylates monomers, polymers and photoresist compositions that comprise the polymers as a resin binder component. Methods for synthesis of the monomers and polymers of the invention are also provided. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to short wavelengths, including sub-300 and sub-200 nm wavelengths such as 193 nm and 157 nm.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: April 4, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Wang Yueh, Joseph Mattia
  • Patent number: 7022455
    Abstract: The present invention relates to new polymers that contain photoacid-labile groups that comprise arylalkyl groups. Particularly preferred are polymers having a benzylic carbon directly linked to an ester oxygen. Polymers of the invention are useful as a component of chemically-amplified positive-acting resists.
    Type: Grant
    Filed: December 20, 2002
    Date of Patent: April 4, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Patrick J. Bolton
  • Publication number: 20060065538
    Abstract: Disclosed are electrolyte compositions for depositing tin-copper alloys that are substantially free of lead. Also disclosed are methods of plating tin-copper alloys that are substantially free of lead on substrates and uses for such plated substrates.
    Type: Application
    Filed: November 2, 2005
    Publication date: March 30, 2006
    Applicant: Shipley Company, L.L.C.
    Inventors: Robert Schetty, Michael Toben, James Martin, Neil Brown, Jeffrey Crosby, Keith Whitlaw
  • Patent number: 7018678
    Abstract: Methods for depositing uniform, pinhole-defect free organic polysilica coatings are provided. These methods allow for the use of these materials as spin-on cap layers in the manufacture of integrated circuits.
    Type: Grant
    Filed: June 3, 2003
    Date of Patent: March 28, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: Dana A. Gronbeck, Michael K. Gallagher, Jeffrey M. Calvert, Gregory P. Prokopowicz, Timothy G. Adams
  • Patent number: 7018717
    Abstract: New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition (“ARC”) for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively from an undercoated dielectric layer.
    Type: Grant
    Filed: June 9, 2003
    Date of Patent: March 28, 2006
    Assignee: Shipley Company, L.L.C.
    Inventor: Edward K. Pavelchek
  • Patent number: 7018947
    Abstract: Free standing articles of chemical vapor deposited silicon carbide with electrical resistivities of less than 0.9 ohm-cm are provided without substantially degrading its thermal conductivity or other properties.
    Type: Grant
    Filed: February 21, 2001
    Date of Patent: March 28, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: Jitendra S. Goela, Michael A. Pickering
  • Patent number: 7014982
    Abstract: Antihalation compositions and methods for reducing the reflection of exposure radiation of a photoresist overcoated said compositions. The antihalation compositions of the invention comprise a resin binder and material capable of causing a thermally induced crosslinking reaction of the resin binder.
    Type: Grant
    Filed: April 26, 2004
    Date of Patent: March 21, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, George W. Orsula
  • Publication number: 20060058472
    Abstract: A functionalized copolymer containing a main chain derived from polymerizable monomers and pendent functional groups terminated with one or more ? or ? ethylenically or acetylenically unsaturated groups. The functionalized copolymers are self cross-linking and are suitable for use as binders.
    Type: Application
    Filed: October 28, 2005
    Publication date: March 16, 2006
    Applicant: Shipley Company, L.L.C.
    Inventors: Edgardo Anzures, Robert Barr, Yueping Fu
  • Patent number: 7008750
    Abstract: New methods are provided for synthesis of polysiloxanes (silsesquioxanes) and photoresists comprising same. Synthetic methods of the invention include use of a polymerization templating reagent that has multiple reactive nitrogen groups, particularly a diamine reagent.
    Type: Grant
    Filed: March 3, 2003
    Date of Patent: March 7, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Subbareddy Kanagasabapathy, Matthew A. King
  • Patent number: 6998148
    Abstract: Porous thermoset dielectric materials having low dielectric constants useful in electronic component manufacture are provided along with methods of preparing the porous thermoset dielectric materials. Also provided are methods of forming integrated circuits containing such porous thermoset dielectric material.
    Type: Grant
    Filed: March 26, 2002
    Date of Patent: February 14, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: Yujian You, Nikoi Annan, Michael K. Gallagher, Robert H. Gore
  • Patent number: 6994757
    Abstract: Electrically resistive material including platinum and from about 5 and about 70 molar percent of iridium, ruthenium or mixtures thereof, calculated based on platinum as 100%, are disclosed.
    Type: Grant
    Filed: June 21, 2004
    Date of Patent: February 7, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: Craig S. Allen, John Schemenaur, David D. Senk, Marc Langlois, Xiaodong Hu, Jan Tzyy-Jiuan Hwang, Jud Ready, Trifon Tomov
  • Patent number: 6991675
    Abstract: An object of the present invention is to provide an electroless displacement gold plating solution, an additive for use in preparing the plating solution, and a metal composite material obtained by treatment with the plating solution. The electroless displacement gold plating solution contains a water-soluble gold compound, a complexing agent, and a water-soluble silver compound, and optionally a water-soluble thallium compound, a water-soluble lead compound, a water-soluble copper compound or a water-soluble nickel compound, or any combination thereof. The plating solution has good stability and, even not only immediately after the preparation but also after a lapse of a certain time period from the preparation, can be used for production of a metal composite material exhibiting an even plated appearance and also having a thick gold coating film.
    Type: Grant
    Filed: August 21, 2001
    Date of Patent: January 31, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: Kazuyuki Suda, Yasushi Takizawa, Kazunori Hibi
  • Patent number: 6989224
    Abstract: The invention provides novel polymers and photoresist compositions that comprise the polymers as a resin component. Polymers of the invention contain two distinct groups which can undergo a deblocking reaction in the presence of photogenerated acid, wherein one of the deblocking moieties is an acetal group. The second photoacid-labile group is suitably an ester, particularly as provided by polymerization of an alkyl acrylate group, such as t-butylmethacrylate.
    Type: Grant
    Filed: October 9, 2002
    Date of Patent: January 24, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: Timothy G. Adams, Matthew A. King
  • Patent number: 6987919
    Abstract: An optical device is disclosed which includes a waveguide that support a first optical mode in a first region and a second optical mode in a second region. The waveguide further includes single material guiding layer having a lower portion with a first taper and an upper portion with a second taper.
    Type: Grant
    Filed: December 14, 2001
    Date of Patent: January 17, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: Hui Luo, Mindaugas F. Dautartas, Dan A. Steinberg
  • Publication number: 20050285216
    Abstract: The present invention provides an optical microbench having intersecting structures etched into a substrate. In particular, microbenches in accordance with the present invention include structures having a planar surfaces formed along selected crystallographic planes of a single crystal substrate. Two of the structures provided are an etch-stop pit and an anisotropically etched feature disposed adjacent the etch-stop pit. At the point of intersection between the etch-stop pit and the anisotropically etched feature the orientation of the crystallographic planes is maintained. The present invention also provides a method for micromachining a substrate to form an optical microbench. The method comprises the steps of forming an etch-stop pit and forming an anisotropically etched feature adjacent the etch-stop pit. The method may also comprise coating the surfaces of the etch-stop pit with an etch-stop layer.
    Type: Application
    Filed: June 14, 2005
    Publication date: December 29, 2005
    Applicant: Shipley Company, L.L.C.
    Inventors: Dan Steinberg, Larry Rasnake
  • Patent number: 6977035
    Abstract: A method for electrolytic copper plating using an electrolytic copper plating solution including a compound containing a structure of —X—S—Y—, wherein X and Y are independently chosen from hydrogen atom, carbon atom, sulfur atom, nitrogen atom, and oxygen atom, and X and Y may be the same only when they are a carbon atom, and by contacting the electrolytic copper plating solution with ozone is disclosed.
    Type: Grant
    Filed: November 26, 2003
    Date of Patent: December 20, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Hideki Tsuchida, Masaru Kusaka, Shinjiro Hayashi
  • Patent number: 6971429
    Abstract: An improved method of and apparatus that is continuously automatically operative in an in-line system is described for applying under vacuum, heat and mechanical pressure a dry film photoresist-forming layer to printed circuit boards (200) that already have been prelaminated by the loose application thereto of the dry film resist as discrete cut sheets within the confines of the surface of the boards whereby a laminate without entrapped air bubbles and closely conforming to the raised circuit traces and irregular surface contours of the printed circuit board is obtained. Featured is a conveyorized vacuum applicator (12) comprising two independent vacuum lamination chambers (18,20) in end-to-end relation. The first vacuum chamber operates at ambient temperature to draw off all of the air entrapped between the dry film resist and the surface of the printed circuit board at conditions that do not result in premature tacking of the dry film to the surface of the board.
    Type: Grant
    Filed: December 11, 2002
    Date of Patent: December 6, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Charles R Keil, Osvaldo Novello, Roberto Stanich
  • Patent number: RE38980
    Abstract: The invention provides photoresist compositions comprising a resin binder having acid labile blocking groups requiring an activation energy in excess of 20 Kcal/mol. for deblocking, a photoacid generator capable of generating a halogenated sulfonic acid upon photolysis and optionally, a base additive. It has been found that linewidth variation is substantially reduced when using the halogenated sulfonic acid generator in a process involving a high temperature post exposure bake.
    Type: Grant
    Filed: March 14, 2002
    Date of Patent: February 14, 2006
    Assignee: Shipley Company, L.L.C.
    Inventors: James W. Thackeray, James F. Cameron, Roger F. Sinta