Patents Assigned to Shipley Company, L.L.C.
  • Patent number: 6849374
    Abstract: This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that generate an ?,?-difluoroalkyl sulfonic acid upon exposure to activating radiation. Positive- and negative-acting chemically amplified resists that contain such PAGs are particularly preferred. The invention also includes methods for synthesis of such PAGs and ?,?-difluoroalkyl sulfonic acids.
    Type: Grant
    Filed: November 3, 2001
    Date of Patent: February 1, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: James F. Cameron, Thomas M. Zydowsky
  • Patent number: 6849381
    Abstract: The present invention includes polymers and photoresist compositions that comprise the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-200 nm, particularly 193 nm. Polymers of the invention suitably contain 1) photoacid labile groups that preferably contain an alicyclic moiety; 2) a polymerized electron-deficient monomer; 3) a polymerized cyclic olefin moiety. Particularly preferred polymers of the invention are tetrapolymers or pentapolymers, preferably with differing polymerized norbornene units.
    Type: Grant
    Filed: April 7, 2003
    Date of Patent: February 1, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Stefan J. Caporale, Wang Yueh, Zhibiao Mao, Joseph Mattia
  • Patent number: 6848839
    Abstract: Optoelectronic packages comprise both an optical array and base chip. The array and base chip are aligned and coupled using a combination of V-grooves, wick stops, and alignment spheres (e.g., presion ball bearings). The array and base chip are passively aligned by disposeing an optical fiber having an angled endface onto V-grooves in both the array and base chip. The base chip typically comprises an optical surface device, such as a vertical cavity, surface emitting laser or photodetector.
    Type: Grant
    Filed: April 6, 2001
    Date of Patent: February 1, 2005
    Assignee: Shipley Company, L.L.C.
    Inventor: Dan A. Steinberg
  • Patent number: 6849376
    Abstract: The invention includes polymers that contain a polymers of the invention contain one or more 1) carbonate units and/or 2) a lactone provided by a monomer having a ring oxygen adjacent to the monomer vinyl group. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-200 nm.
    Type: Grant
    Filed: February 25, 2002
    Date of Patent: February 1, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Stefan J. Caporale
  • Publication number: 20050019705
    Abstract: New methods and compositions are provided that enable application and processing of photoresist as thick coating layers, e.g. at dried layer (post soft-bake) thicknesses of in excess of 2 microns. Resists can be imaged at short wavelengths in accordance with the invention, including 248 nm.
    Type: Application
    Filed: August 23, 2004
    Publication date: January 27, 2005
    Applicant: Shipley Company, L.L.C.
    Inventors: James Thackeray, James Mori, Gary Teng
  • Publication number: 20050016858
    Abstract: A composition and method for electroplating a metal on a substrate. The composition has a chloride to brightener concentration ratio of from 20:1 to 125:1. The method of electroplating, which employs the composition, employs pulse patterns that improve physical properties of metal surfaces.
    Type: Application
    Filed: December 19, 2003
    Publication date: January 27, 2005
    Applicant: Shipley Company, L.L.C.
    Inventors: Leon Barstad, Thomas Buckley, Raymond Cruz, Trevor Goodrich, Gary Hamm, Mark Kapeckas, Katie Price, Erik Reddington, Wade Sonnenberg
  • Patent number: 6846370
    Abstract: Electrically resistive material including platinum and from about 5 and about 70 molar percent or iridium, ruthenium or mixtures thereof, calculated based on platinum as 100%, are disclosed.
    Type: Grant
    Filed: July 3, 2002
    Date of Patent: January 25, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Craig S. Allen, John Schemenaur, David D. Senk, Marc Langlois, Xiaodong Hu, Jan Tzyy-Jiuan Hwang, Jud Ready, Trifon Tomov
  • Patent number: 6847764
    Abstract: An optical interconnect includes a waveguide holder having a first side and a second side. The first side has a first depression and the second side has a second depression. The waveguide holder has an opening in which a plurality of waveguides are disposed.
    Type: Grant
    Filed: April 16, 2001
    Date of Patent: January 25, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Dan A. Steinberg, David W. Sherrer
  • Patent number: 6844270
    Abstract: The present invention includes polyacetal polymers and photoresist compositions that include the polymers as a resin binder component. Photoresists of the invention include chemically-amplified positive-acting resists that can be effectively imaged at short wavelengths such as sub-300 nm, particularly 157 nm.
    Type: Grant
    Filed: November 26, 2001
    Date of Patent: January 18, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Anthony Zampini, Sungseo Cho
  • Patent number: 6842577
    Abstract: Provided are photodefinable compositions suitable for use in forming an optical waveguide. The compositions include a silsesquioxane polymer having polymerized units of the formula (R1SiO1.5) and (R2SiO1.5), wherein R1 and R2 are different and are substituted or unsubstituted organic side chain groups and are free of hydroxy groups, and two or more functional end groups, and a photoactive component. The solubility of the silsesquioxane polymer is altered upon exposure to actinic radiation such that the composition is developable in an aqueous developer solution. Also provided are methods of forming an optical waveguide with the inventive compositions, optical waveguides, and electronic devices including one or more optical waveguide.
    Type: Grant
    Filed: December 2, 2002
    Date of Patent: January 11, 2005
    Assignee: Shipley Company L.L.C.
    Inventors: James G. Shelnut, Matthew L. Moynihan, Omari Patterson
  • Patent number: 6841331
    Abstract: The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.
    Type: Grant
    Filed: February 26, 2002
    Date of Patent: January 11, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Stefan J. Caporale, Robert J. Kavanagh, Nick Pugliano
  • Patent number: 6842552
    Abstract: The present invention provides an optical switch. The switch includes a substrate and a first waveguide holding member. The switch also includes a second waveguide holding member disposed over the substrate and movable relative to the first waveguide holding member to provide a switching function. A movement guiding member is provided for guiding the movement of the second waveguide holding member. A registration element is disposed at the movement guiding member for positioning the second waveguide holding member at a selected location relative to the first waveguide holding member. The selected location is one that provides alignment between a selected waveguide of the first waveguide holding member and a selected waveguide of the second waveguide holding member.
    Type: Grant
    Filed: January 31, 2003
    Date of Patent: January 11, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Dan A. Steinberg, John J. Fisher, David W. Sherrer, Mindaugas F. Dautartas, William T. Stacy
  • Patent number: 6839474
    Abstract: An optical assembly which allows for passive alignment of the various elements is described. A substrate with a cut out portion and an upper surface is utilized as a mount for an optical array and an imaging assembly. The optical array, which preferably includes a plurality of optical fibers is positioned on V-grooves located on the upper surface. The imaging assembly, which preferably includes a plurality of lenses, such as GRIN lenses, is lowered at least partially into the cut-out portion. The optical fibers are optically coupled with said lenses. A waveguide, having a plurality of waveguide cores within a cladding, may further be optically coupled with the lenses, or alternatively, directly to the optical fibers. An integrated optic chip may also be affixed to the substrate or mounted on the substrate.
    Type: Grant
    Filed: November 15, 2001
    Date of Patent: January 4, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: Dan A. Steinberg, David W. Sherrer, Mindaugas F. Dautartas, Arden Jeantilus
  • Publication number: 20040265754
    Abstract: Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing photoresist that is imaged at short exposure wavelengths.
    Type: Application
    Filed: November 20, 2003
    Publication date: December 30, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: George G. Barclay, James F. Cameron
  • Patent number: 6835294
    Abstract: Electrolytic copper plating methods are provided, wherein copper is electrolytically deposited on a substrate, and the electrolytic copper plating solution supplied to the electrolytic copper plating is subjected to dummy electrolysis using an insoluble anode. The method described above can maintain and restore the electrolytic copper plating solution so as to maintain satisfactory appearance of plated copper, fineness of deposited copper film, and via-filling.
    Type: Grant
    Filed: June 7, 2002
    Date of Patent: December 28, 2004
    Assignee: Shipley Company, L.L.C.
    Inventors: Hideki Tsuchida, Masaru Kusaka, Shinjiro Hayashi
  • Publication number: 20040257193
    Abstract: Resistive materials have resistivities that are axis dependent are provided. Such resistive materials having a resistivity in a first direction and a very different resistivity in an orthogonal direction. These resistive materials are particularly suitable for use as resistors embedded in printed wiring boards.
    Type: Application
    Filed: October 17, 2003
    Publication date: December 23, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Craig S. Allen, Andrew T. Hunt, Wen-Yi Lin, David D. Senk, John Schemenaur
  • Publication number: 20040259025
    Abstract: The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.
    Type: Application
    Filed: April 5, 2004
    Publication date: December 23, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Stefan J. Caporale, Robert J. Kavanagh, Nick Pugliano
  • Publication number: 20040258847
    Abstract: A method to determine and monitor concentrations of inert metal plating components in metal plating baths. An inert indictor is included in the bath composition and the concentration of the inert indictor is monitored during plating. The change in the concentration of the inert indicator is used to determine the change in the concentration of inert bath components.
    Type: Application
    Filed: November 26, 2003
    Publication date: December 23, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Martin W. Bayes, Raymund W. M. Kwok
  • Publication number: 20040253535
    Abstract: Multilayer photoresist systems are provided. In particular aspects, the invention relates to underlayer composition for an overcoated photoresist, particularly an overcoated silicon-containing photoresist. Preferred underlayer compositions comprise one or more resins or other components that impart etch-resistant and antireflective properties, such as one or more resins that contain phenyl or other etch-resistant groups and anthracene or other moieties that are effective anti-reflective chromophores for photoresist exposure radiation.
    Type: Application
    Filed: November 20, 2003
    Publication date: December 16, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: James F. Cameron, Dana A. Gronbeck, George G. Barclay
  • Publication number: 20040253450
    Abstract: This invention provides a process for electroless copper plating without using formaldehyde and an electroless copper plating solution which is used in the process. To this end, there is disclosed a process for electroless copper plating, which treatment comprises depositing a palladium or palladium-tin catalyst on a resin substrate, and then treating said resin substrate having the catalyst deposited thereon with a formaldehyde-free electroless copper plating solution that contains copper ions and a reducing agent, wherein the need for an accelerating treatment of a catalyst after said catalyst depositing treatment is obviated. The productivity of a copper-resin composite material is dramatically enhanced by the process of the present invention, because a copper thin layer can be formed on the resin substrate in a short time, even if an accelerating treatment for a catalyst is not performed in a separate process.
    Type: Application
    Filed: October 29, 2003
    Publication date: December 16, 2004
    Applicant: Shipley Company, L.L.C.
    Inventors: Masaru Seita, Hideki Tsuchida, Masaaki Imanari, Yoshihiro Sugita, Andre Egli, William Brasch