Abstract: CMP selectivity, removal rate, and uniformity are controlled both locally and globally by altering electric charge at the wafer surface. Surface charge characterization is performed by an on-board metrology module. Based on a charge profile map, the wafer can be treated in an immersion bath to impart a more positive or negative charge overall, or to neutralize the entire wafer before the CMP operation is performed. If charge hot spots are detected on the wafer, a charge pencil can be used to neutralize localized areas. One type of charge pencil bears a tapered porous polymer tip that is placed in close proximity to the wafer surface. Films present on the wafer absorb ions from, or surrender ions to, the charge pencil tip, by electrostatic forces. The charge pencil can be incorporated into a CMP system to provide an in-situ treatment prior to the planarization step or the slurry removal step.

Abstract: A wavy line interconnect structure that accommodates small metal lines and large vias is disclosed. A lithography mask design used to pattern metal line trenches uses optical proximity correction (OPC) techniques to approximate wavy lines using rectangular opaque features. The large vias can be formed using a self-aligned dual damascene process without the need for a separate via lithography mask. Instead, a sacrificial layer allows etching of an underlying thick dielectric block, while protecting narrow features of the trenches that correspond to the metal line interconnects. The resulting vias have an aspect ratio that is relatively easy to fill, while the larger via footprint provides low via resistance. By lifting the shrink constraint for vias, thereby allowing the via footprint to exceed the minimum size of the metal line width, a path is cleared for further process generations to continue shrinking metal lines to dimensions below 10 nm.

Abstract: In an embodiment, a channel estimator includes first, second, and third stages. The first stage is configurable to generate a first observation scalar for a first communication path of a first communication channel, and the second stage is configurable to generate a second observation scalar for a first communication path of a second communication channel. And the third stage is configurable to generate channel-estimation coefficients in response to the first and second observation scalars. For example, such a channel estimator may use a recursive algorithm, such as a Vector State Scalar Observation (VSSO) Kalman algorithm, to estimate the responses of channels over which propagate simultaneous orthogonal-frequency-division-multiplexed (OFDM) signals (e.g., MIMO-OFDM signals) that suffer from inter-carrier interference (ICI) due to Doppler spread.

Abstract: One method disclosed includes, among other things, forming a fin structure comprised of a semiconductor material, a first epi semiconductor material and a second epi semiconductor material, forming a sacrificial gate structure above the fin structure, forming a sidewall spacer adjacent the sacrificial gate structure, performing at least one etching process to remove the portions of the fin structure positioned laterally outside of the sidewall spacer so as to thereby define a fin cavity in the source/drain regions of the device and to expose edges of the fin structure positioned under the sidewall spacer, and performing an epitaxial deposition process to form an epi etch stop layer on the exposed edges of the fin structure positioned under the sidewall spacer and within the fin cavity.

Abstract: A system and method for encoding a stream of bits with a run-length limited high-rate reverse order encoding schema. According to one embodiment, an RLL encoding block includes a receiver having a precoder operable to receive a stream of N-bits having symbols of M-bits in length, a histogram operable to identify an index symbol of M-bits that does not occur within the received stream of N-bits. It is this index symbol that may be used as the key to encoding a block of symbols so as to ensure unique decodability when RLL decoding. Finally, an encoder operable to perform an exclusive-or operation on each symbol with the next symbol stored in the stream. Such an encoding system only adds one symbol of M bits in length to a block of N bits and still results in a stream of bits sufficient to support high-rate requirements and strict timing loop control.

Abstract: In an embodiment, a transmitter includes a transmission path that is configurable to generate first pilot clusters each including a respective first pilot subsymbol in a first cluster position and a respective second pilot subsymbol in a second cluster position such that a vector formed by the first pilot subsymbols is orthogonal to a vector formed by the second pilot subsymbols. For example, where such a transmitter transmits simultaneous orthogonal-frequency-division-multiplexed (OFDM) signals (e.g., MIMO-OFDM signals) over respective channels that may impart inter-carrier interference (ICI) to the signals due to Doppler spread, the pattern of the pilot symbols that compose the pilot clusters may allow a receiver of these signals to estimate the responses of these channels more accurately than conventional receivers.

Abstract: A semiconductor device may include a substrate, and an array of PCM memory cells above the substrate. Each PCM memory cell may include first and second vertically aligned electrodes, a first dielectric layer between the first and second electrodes, a carbon nanotube extending vertically through the first dielectric layer from the second electrode and toward the first electrode, and a PCM body between the first electrode and the at least one carbon nanotube.

Abstract: A semiconductor material is patterned to define elongated fins insulated from an underlying substrate. A polysilicon semiconductor material is deposited over and in between the elongated fins, and is patterned to define elongated gates extending to perpendicularly cross over the elongated fins at a transistor channel. Sidewall spacers are formed on side walls of the elongated gates. Portions of the elongated fins located between the elongated gates are removed, along with the underlying insulation, to expose the underlying substrate. One or more semiconductor material layers are then epitaxially grown from the underlying substrate at locations between the elongated gates. The one or more semiconductor material layers may include an undoped epi-layer and an overlying doped epi-layer. The epitaxial material defines a source or drain of the transistor.

Abstract: One illustrative method disclosed herein involves, among other things, forming trenches to form an initial fin structure having an initial exposed height and sidewalls, forming a protection layer on at least the sidewalls of the initial fin structure, extending the depth of the trenches to thereby define an increased-height fin structure, with a layer of insulating material over-filling the final trenches and with the protection layer in position, performing a fin oxidation thermal anneal process to convert at least a portion of the increased-height fin structure into an isolation material, removing the protection layer, and performing an epitaxial deposition process to form a layer of semiconductor material on at least portions of the initial fin structure.

Abstract: Methods and structures for increasing strain in fully insulated finFETs are described. The finFET structures may be formed on an insulating layer and include source, channel, and drain regions that are insulated all around. During fabrication, the source and drain regions may be formed as suspended structures. A strain-inducing material may be formed around the source and drain regions on four contiguous sides so as to impart strain to the channel region of the finFET.

Abstract: Methods and structures for forming finFETs of different semiconductor composition and of different conductivity type on a same wafer are described. Some finFET structures may include strained channel regions. FinFETs of a first semiconductor composition may be grown in trenches formed in a second semiconductor composition. Material of the second semiconductor composition may be removed from around some of the fins at first regions of the wafer, and may remain around fins at second regions of the wafer. A chemical component from the second semiconductor composition may be driven into the fins by diffusion at the second regions to form finFETs of a different chemical composition from those of the first regions. The converted fins at the second regions may include strain.

Abstract: An embodiment of a receiver includes a channel estimator and a data-recovery unit. The channel estimator is configured to determine a characteristic of a channel over which a first signal, which is received simultaneously with a second signal, propagated, the first and second signals respectively having first and second components that include approximately a frequency. And the data-recovery unit is configured to recover data from the first signal in response to the determined channel characteristic. For example, such a receiver may be able to receive simultaneously, and over the same channel space, orthogonal-frequency-division-multiplexed (OFDM) signals that include one or more of the same subcarrier frequencies, and to recover data from one or more of the OFDM signals despite the frequency overlap. A receiver with this capability may allow an increase in the effective bandwidth of the channel space, and thus may allow more devices to simultaneously share the channel space.

Abstract: In an embodiment, a channel estimator includes first and second stages. The first stage is configurable to generate an observation scalar for a communication path of a communication channel, and the second stage is configurable to generate channel-estimation coefficients in response to the first observation scalar. For example, such a channel estimator may use a recursive algorithm, such as a VSSO Kalman algorithm, to estimate the response of a channel over which propagates an OFDM signal that suffers from ICI due to Doppler spread. Such a channel estimator may estimate the channel response more accurately, more efficiently, with a less-complex algorithm, and with less-complex software or circuitry, than conventional channel estimators. Furthermore, such a channel estimator may be able to dynamically account for changes in the number of communication paths that compose the channel, changes in the delays of these paths, and changes in the signal-energy levels of these paths.

Abstract: In accordance with an embodiment, a method of operating an electronic system includes detecting an incoming transmission on a power line, and modifying a switching behavior of a switched-mode power supply coupled to the power line upon detecting the incoming transmission. Modifying reduces the level of interference produced by the switched-mode power supply.

Abstract: Methods and structures for forming a localized, strained region of a substrate are described. Trenches may be formed at boundaries of a localized region of a substrate. An upper portion of sidewalls at the localized region may be covered with a covering layer, and a lower portion of the sidewalls at the localized region may not be covered. A converting material may be formed in contact with the lower portion of the localized region, and the substrate heated. The heating may introduce a chemical species from the converting material into the lower portion, which creates stress in the localized region. The methods may be used to form strained-channel finFETs.

Abstract: A transistor includes a body and a semiconductor region configured to stress a portion of the body. For example, stressing a channel of the transistor may increase the mobility of carriers in the channel, and thus may reduce the “on” resistance of the transistor. For example, the substrate, source/drain regions, or both the substrate and source/drain regions of a PFET may be doped to compressively stress the channel so as to increase the mobility of holes in the channel. Or, the substrate, source/drain regions, or both the substrate and source/drain regions of an NFET may be doped to tensile stress the channel so as to increase the mobility of electrons in the channel.

Abstract: An ashing chemistry employing a combination of Cl2 and N2 is provided, which removes residual material from sidewalls of a patterned metallic hard mask layer without residue such that the sidewalls of the patterned metallic hard mask layer are vertical. The vertical profiled of the sidewalls of the patterned metallic hard mask layer can be advantageously employed to reduce pattern factor dependency in the etch bias between the pattern transferred into an underlying layer and the pattern as formed on the metallic hard mask layer. Further, the ashing chemistry can be employed to enhance removal of stringers in vertical portions of a metallic material layer.

Abstract: A method for fabricating a CMOS integrated circuit structure and the CMOS integrated circuit structure. The method includes creating one or more n-type wells, creating one or more p-type wells, creating one or more pFET source-drains embedded in each of the one or more n-type wells, creating one or more nFET source-drains embedded in each of the one or more p-type wells, creating a pFET contact overlaying each of the one or more pFET source-drains, and creating an nFET contact overlaying each of the one or more nFET source-drains. A material of each of the one or more pFET source-drains includes silicon doped with a p-type material; a material of each of the one or more nFET source-drains includes silicon doped with an n-type material; a material of each pFET contact includes nickel silicide; and a material of each nFET contact comprises titanium silicide.

Abstract: Methods and structures for forming strained-channel FETs are described. A strain-inducing layer may be formed under stress in a silicon-on-insulator substrate below the insulator. Stress-relief cuts may be formed in the strain-inducing layer to relieve stress in the strain-inducing layer. The relief of stress can impart strain to an adjacent semiconductor layer. Strained-channel, fully-depleted SOI FETs and strained-channel finFETs may be formed from the adjacent semiconductor layer. The amount and type of strain may be controlled by etch depths and geometries of the stress-relief cuts and choice of materials for the strain-inducing layer.

Abstract: A leadless semiconductor package includes a package body on a leadframe that includes a die paddle and a plurality of bond pads, none of which extend as far as a lateral face of the body. During manufacture of the package, molding compound is deposited over a face of the leadframe on which the die paddle and bond pads are positioned. After the molding compound is cured, a back side of the leadframe is etched to isolate the die paddle and bond pads, back surfaces of which remain exposed at a back face of the body. During manufacture of the leadframe, a parent substrate is etched to define the die paddle and a plurality of bond pads on one side of the substrate and a plurality of cavities on the opposite face.