Patents Assigned to Tohoku University
  • Patent number: 8559696
    Abstract: Scattered waves from the defect of burst ultrasonic waves radiated from an ultrasonic transmitter to a structure in two different arrangements of the ultrasonic transmitter and an array receiver are received by the array receiver so as to obtain a reception signal. The reception signal is subjected to a band-pass filter that passes a specific frequency component, shifted by different time according to the position of each reception sensor element of the array receiver and then, added so as to obtain a processing signal. On the basis of the processing signal, an image of the defect is obtained, respectively. A common portion of the obtained two images is extracted.
    Type: Grant
    Filed: May 19, 2009
    Date of Patent: October 15, 2013
    Assignee: Tohoku University
    Inventors: Kazushi Yamanaka, Yoshikazu Ohara, Yohei Shintaku
  • Patent number: 8557122
    Abstract: The present invention provides ballast water treatment equipment which can decompose fungicide included in ballast water and reduce the amount of use of fungicide adsorbing material by passing through the ballast water.
    Type: Grant
    Filed: March 5, 2010
    Date of Patent: October 15, 2013
    Assignees: Tohoku University, Kowa Kogyo Co., Ltd., Yamanishi Corporation, Tsuda Kaiun Co., Ltd., Japan Basic Material Co., Ltd.
    Inventors: Akihiro Kijima, Yasuaki Kohama, Masae Suzuki, Ikuo Chiba, Kouji Onodera, Keiki Kano, Kouichirou Kanno, Takayuki Ito, Yoshinobu Yashima, Toshihiko Abe
  • Patent number: 8551830
    Abstract: There is provided a small-type semiconductor integrated circuit whose circuit area is small and whose wiring length is short. The semiconductor integrated circuit is constructed in a multi-layer structure and is provided with a first semiconductor layer, a first semiconductor layer transistor formed in the first semiconductor layer, a wiring layer which is deposited on the first semiconductor layer and in which metal wires are formed, a second semiconductor layer deposited on the wiring layer and a second semiconductor layer transistor formed in the second semiconductor layer. It is noted that insulation of a gate insulating film of the first semiconductor layer transistor is almost equal with that of a gate insulating film of the second semiconductor layer transistor and the gate insulating film of the second semiconductor layer transistor is formed by means of radical oxidation or radical nitridation.
    Type: Grant
    Filed: April 28, 2008
    Date of Patent: October 8, 2013
    Assignees: Advantest Corporation, National University Corporation Tohoku University
    Inventors: Tadahiro Ohmi, Koji Kotani, Kazuyuki Maruo, Takahiro Yamaguchi
  • Patent number: 8541731
    Abstract: A pixel output line is provided for each of the pixels two-dimensionally arrayed in a pixel area. The pixel output lines are extended to a memory area, and a memory unit is connected to each of those lines. The memory unit includes a writing-side transistor, a reading-side transistor and a plurality of memory sections for holding signals for 104 image frames. A photocharge storage operation is simultaneously performed at all the pixels, and the thereby produced signals are outputted to the pixel output lines. In the memory unit, with the writing-side transistor in the ON state, the sampling transistor of a different memory section is sequentially turned on for each exposure cycle so as to sequentially hold a signal in the capacitor of each memory section. After a burst imaging operation is completed, all the pixel signals are sequentially read. Unlike CCDs, the present device does not simultaneously drive all gate loads, so that it can be driven at high speeds with low power consumption.
    Type: Grant
    Filed: June 10, 2009
    Date of Patent: September 24, 2013
    Assignees: Shimadzu Corporation, Tohoku University
    Inventors: Shigetoshi Sugawa, Yasushi Kondo, Hideki Tominaga
  • Patent number: 8535494
    Abstract: Provided is a rotary magnet sputtering apparatus which includes a plasma shielding member and an outer wall connected to the ground and which has a series resonant circuit and a parallel resonant circuit between the plasma shielding member and the outer wall. The series resonant circuit has a very low impedance only at its resonant frequency while the parallel resonant circuit has a very high impedance only at its resonant frequency. With this configuration, the impedance between substrate RF power and the plasma shielding member becomes very high so that it is possible to suppress the generation of plasma between a substrate 10 to be processed and the plasma shielding member. Further, since a series resonant circuit is provided between a target and the ground, the RF power is efficiently supplied only to a region where the substrate passes under the target, so that a self-bias voltage is generated.
    Type: Grant
    Filed: March 2, 2009
    Date of Patent: September 17, 2013
    Assignees: National University Corporation Tohoku University, Tokyo Electron Limited
    Inventors: Tadahiro Ohmi, Tetsuya Goto, Takaaki Matsuoka
  • Patent number: 8530947
    Abstract: A floating diffusion region is formed at an edge of a light-receiving surface of an embedded photodiode, with a transfer gate electrode located therebetween. A first region, with radially extending portions centered on the FD region, and a second region, located to the outside of the first region, are created in the substantially sector-shaped light-receiving surface. A dopant whose conductivity type is the same as the signal charges to be collected in the first region are introduced, whereby an electric field for moving the signal charges from the radially extending sections towards the center is created due to a three-dimensional field effect. As a result, the charge-transfer time is reduced. Additionally, since a circuit element in the subsequent stage can be placed adjacent to the floating diffusion region, the parasitic capacitance of the floating diffusion region can be reduced and a highly sensitive element can be obtained.
    Type: Grant
    Filed: June 23, 2010
    Date of Patent: September 10, 2013
    Assignees: Shimadzu Corporation, Tohoku University
    Inventors: Yasushi Kondo, Hideki Tominaga, Kenji Takubo, Ryuta Hirose, Shigetoshi Sugawa, Hideki Mutoh
  • Patent number: 8524122
    Abstract: A production method capable of producing ITO particles without using a solvent with a high boiling point as a solvent used in the producing step by a simple treatment method without through a heating process in an atmosphere which disadvantageously causes sintering among the ITO particles to coarsen the ITO particles. An ITO powder suitable for a coating material for a transparent electroconductive material, being produced by a first step of dissolving salt containing indium and salt containing tin into an organic solvent, then adding to this organic solvent, an organic solvent containing a basic precipitant, to thereby manufacture a mixture of a precursor containing indium and tin, and the organic solvent; and a second step of applying heat treatment to the mixture of the precursor containing indium and tin, and the organic solvent in a pressurizing vessel at 200° C. or more and 300° C. or less, to generate ITO particles.
    Type: Grant
    Filed: June 30, 2009
    Date of Patent: September 3, 2013
    Assignees: Tohoku University, Dowa Electronics Materials Co., Ltd.
    Inventors: Atsushi Muramatsu, Kiyoshi Kanie, Kazuhisa Saito, Koji Tanoue, Akira Nagatomi
  • Publication number: 20130220451
    Abstract: A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP1 (where K is a proportionality constant) or as Qc=KP2m (P1?P2)n (where K is a proportionality constant, m and n constants) by using orifice upstream side pressure P1 and/or orifice downstream side pressure P2. A fluid passage between the downstream side of a control valve and a fluid supply pipe of the pressure type flow rate control apparatus comprises at least 2 fluid passages in parallel, and orifices having different flow rate characteristics are provided for each of these fluid passages, wherein fluid in a small flow quantity area flows to one orifice for flow control of fluid in the small flow quantity area, while fluid in a large flow quantity area flows to the other orifice for flow control of fluid in the large flow quantity area.
    Type: Application
    Filed: February 8, 2013
    Publication date: August 29, 2013
    Applicants: Fujikin Incorporated, Tokyo Electron Ltd., National University Corporation Tohoku University
    Inventors: Fujikin Incorporated, National University Corporation Tohoku University, Tokyo Electron Ltd.
  • Patent number: 8520433
    Abstract: A magnetoresistive element according to an embodiment includes a first magnetic layer, a second magnetic layer, and a first nonmagnetic layer provided between the first magnetic layer and the second magnetic layer, at least one of the first magnetic layer and the second magnetic layer including a magnetic film of MnxAlyGez (10 atm %?x?44 atm %, 10 atm %?y?65 atm %, 10 atm %?z?80 atm %, x+y+z=100 atm %).
    Type: Grant
    Filed: September 20, 2012
    Date of Patent: August 27, 2013
    Assignees: Kabushiki Kaisha Toshiba, Tohoku University
    Inventors: Yushi Kato, Tadaomi Daibou, Eiji Kitagawa, Takahide Kubota, Shigemi Mizukami, Terunobu Miyazaki
  • Patent number: 8518828
    Abstract: According to a disclosed semiconductor device fabrication method according to one embodiment of the present invention, a layer having a line-and-space pattern extending in one direction is etched using another layer having a line-and-space pattern extending in another direction intersecting the one direction, thereby obtaining a mask having two-dimensionally arranged dots. An underlying layer is etched using the mask, thereby providing two-dimensionally arranged pillars.
    Type: Grant
    Filed: November 23, 2009
    Date of Patent: August 27, 2013
    Assignees: Tokyo Electron Limited, Tohoku University
    Inventors: Tetsuo Endoh, Eiichi Nishimura
  • Patent number: 8512248
    Abstract: An ultrasonic diagnostic apparatus includes: a transmitting section for driving an ultrasonic probe that sends out an ultrasonic transmitted wave toward a vital tissue; a receiving section for amplifying an ultrasonic reflected wave, produced by getting the ultrasonic transmitted wave reflected by the vital tissue and then received at the ultrasonic probe, to generate a received signal; a reference point shift measuring section for measuring the magnitude of shift of a reference point that has been set on the received signal; a received signal adjusting section for adjusting the position of the received signal in a distance direction according to the magnitude of shift of the reference point; and a shape variation calculating section for determining the magnitudes of positional displacements at multiple measuring points that have been set in the vital tissue by the received signal adjusted.
    Type: Grant
    Filed: September 25, 2007
    Date of Patent: August 20, 2013
    Assignees: Tohoku University, Panasonic Corporation
    Inventors: Hiroshi Kanai, Hideyuki Hasegawa, Takao Suzuki
  • Patent number: 8512884
    Abstract: A perpendicular magnetic recording medium including at least a soft under layer, an orientation control layer, a magnetic recording layer and a protective layer on a non-magnetic substrate, wherein the orientation control layer is composed of three or more layers including a seed layer, a first intermediate layer and a second intermediate layer sequentially, formed in that order from the substrate side, the crystal grains that constitute the first intermediate layer are epitaxially grown on the crystal grains of the seed layer, the crystal grains that constitute the second intermediate layer are epitaxially grown on the crystal grains of the first intermediate layer, and the crystal grains that constitute the second intermediate layer are finer than the crystal grains that constitute the first intermediate layer.
    Type: Grant
    Filed: August 28, 2008
    Date of Patent: August 20, 2013
    Assignees: Showa Denko K.K., Kabushiki Kaisha Toshiba, Tohoku University
    Inventors: Migaku Takahashi, Shin Saito, Gohei Kurokawa, Yuzo Sasaki, Tatsu Komatsuda, Atsushi Hashimoto, Akihiko Takeo, Tomoyuki Maeda
  • Patent number: 8514403
    Abstract: A sample analysis method is provided for analyzing a sample having a permeability to terahertz radiation and accurately measure the composition, physical properties, mass and dimensions of a very small sample or a minute amount of sample by irradiating the sample with terahertz radiation. In the method, a reflective member is provided adjoining a first principal surface of the sample, an entrance member is provided adjoining a second principal surface of the sample, terahertz radiation is delivered from outside of entrance member towards the sample, and the sample is analyzed using an interference wave generated from a first-surface reflected wave at the interface between the first principal surface of the sample and the reflective member and a second-surface reflected wave at the interface between the second principal surface of the sample and the entrance member.
    Type: Grant
    Filed: April 14, 2011
    Date of Patent: August 20, 2013
    Assignees: Tohoku University, Murata Manufacturing Co., Ltd.
    Inventors: Yuichi Ogawa, Shinichiro Hayashi, Seiji Kamba, Takashi Kondo
  • Patent number: 8502191
    Abstract: A semiconductor device includes: a silicon layer (12); an intermediate silicide layer (28) that is provided on the silicon layer (12), has openings, and includes barium silicide; and an upper silicide layer (14) that covers the intermediate silicide layer (28), is positioned to be in contact with the silicon layer (12) through the openings, has a higher dopant concentration than the dopant concentration of the intermediate silicide layer (28), and includes barium silicide.
    Type: Grant
    Filed: May 11, 2010
    Date of Patent: August 6, 2013
    Assignees: University of Tsukuba, Tohoku University
    Inventors: Takashi Suemasu, Noritaka Usami
  • Patent number: 8496792
    Abstract: In a rotary magnet sputtering apparatus, a target consumption displacement quantity is measured, and corresponding to the measurement results, a distance between a rotating magnet group and a target is adjusted, and uniform film forming rate is achieved over a long period of time so as to reduce the change of a target surface due to consumption of the target and to reduce the change of the film forming rate with time. An ultrasonic sensor or a laser transmitting/receiving device may be used as a means for measuring the consumption displacement quantity of the target.
    Type: Grant
    Filed: March 28, 2008
    Date of Patent: July 30, 2013
    Assignees: National University Corporation Tohoku University, Tokyo Electron Limited
    Inventors: Tadahiro Ohmi, Tetsuya Goto, Takaaki Matsuoka
  • Patent number: 8497214
    Abstract: A semiconductor device manufacturing method, the method including: forming a semiconductor element on a semiconductor substrate; and by using microwaves as a plasma source, forming an insulation film on the semiconductor element by performing a CVD process using microwave plasma having an electron temperature of plasma lower than 1.5 eV and an electron density of plasma higher than 1×1011 cm?3 near a surface of the semiconductor substrate.
    Type: Grant
    Filed: August 7, 2008
    Date of Patent: July 30, 2013
    Assignees: Tokyo Electron Limited, National University Corporation Tohoku University
    Inventors: Hirokazu Ueda, Toshihisa Nozawa, Takaaki Matsuoka, Akinobu Teramoto, Tadahiro Ohmi
  • Patent number: 8493526
    Abstract: A lighting device includes: a light guide plate; a light source disposed on a side face of the light guide plate; and a light modulation element disposed on a surface or in the inside of the light guide plate and adhered to the light guide plate. The light modulation element has a pair of transparent substrates disposed separately and oppositely, a pair of electrodes provided on respective surfaces of the pair of transparent substrates, and a light modulation layer provided in a gap between the pair of transparent substrates. The light modulation layer includes a first region, having optical anisotropy, responsive to an electric field, and a second region, having optical anisotropy, unresponsive to an electric field. The second region has a striped structure with average striped texture size of 0.05 ?m to 10 ?m both inclusive in a short axis direction.
    Type: Grant
    Filed: March 30, 2011
    Date of Patent: July 23, 2013
    Assignees: Sony Corporation, Tohoku University
    Inventors: Tatsuo Uchida, Takahiro Ishinabe, Tohru Kawakami, Tomoaki Suzuki, Kentaro Okuyama, Akira Ebisui, Harumi Sato, Mamoru Mizuno, Masahiro Ikeda, Shogo Shinkai
  • Patent number: 8492879
    Abstract: On a surface of a semiconductor substrate, a plurality of terraces formed stepwise by an atomic step are formed in the substantially same direction. Using the semiconductor substrate, a MOS transistor is formed so that no step exists in a carrier traveling direction (source-drain direction).
    Type: Grant
    Filed: October 6, 2008
    Date of Patent: July 23, 2013
    Assignees: National University Corporation Tohoku University, Shin-Etsu Handotai Co., Ltd.
    Inventors: Tadahiro Ohmi, Akinobu Teramoto, Tomoyuki Suwa, Rihito Kuroda, Hideo Kudo, Yoshinori Hayamizu
  • Patent number: 8487060
    Abstract: Provided is a polychloroprene latex extremely favorable in adhesive properties. The present invention relates to a method of producing a polychloroprene latex, comprising polymerizing chloroprene or a mixture of chloroprene and a monomer copolymerizable with chloroprene in an aqueous medium containing a surfactant at a concentration of lower than its critical micelle concentration (CMC) and a polymer dispersant of a metal salt of aromatic sulfonic acid formalin condensate added thereto. The polymer dispersant for use is preferably a metal salt of aromatic sulfonic acid formalin condensate. The polychloroprene latex obtained can be used as an adhesive.
    Type: Grant
    Filed: August 17, 2010
    Date of Patent: July 16, 2013
    Assignees: Denki Kagaku Kogyo Kabushiki Kaisha, Tohoku University
    Inventors: Naoki Kobayashi, Mikio Konno, Daisuke Nagao, Yoshihiro Mashiko, Toshiaki Otsu
  • Patent number: 8485534
    Abstract: A metal gasket includes an outer ring that is formed in a substantially C-shaped cross-section having an opening in a circumferential direction and an inner ring that is disposed inside the outer ring, wherein the inner ring is configured in a polygonal shape of a cross section, and a pair of corner portions opposing to each other in the inner ring are disposed on inner circumferential faces on the both sides of the opening in the outer ring.
    Type: Grant
    Filed: May 7, 2009
    Date of Patent: July 16, 2013
    Assignees: Tohoku University, Nippon Valqua Industries, Ltd.
    Inventors: Tadahiro Ohmi, Yasuyuki Shirai, Koji Sato, Masayuki Noguchi, Tsutomu Yoshida, Akira Muramatsu, Satoshi Kumaki, Yuki Kuwamura