Abstract: A method of producing ions from a sample is disclosed. The method comprises directing a spray of droplets onto a sample, and causing droplets comprising analyte from the sample to impact upon a surface so as to generate analyte ions.

Abstract: The present invention relates to a method for examining a measuring tip of a scanning probe microscope, wherein the method includes the following steps: (a) generating at least one test structure before a sample is analyzed, or after said sample has been analyzed, by the measuring tip; and (b) examining the measuring tip with the aid of the at least one generated test structure.

Abstract: Presented herein are apparatuses for use in capillary separations. An apparatus includes a coupling that integrates a capillary with a voltage source, a sheath liquid system, a fluid exit port, and a manifold. The coupling may be an elbow connector or equivalent. The manifold receives incident light from an incident light input, and emitted light is collected by a collected light output. The capillary enters the manifold at an input for the capillary, traverses the coupling, and terminates at the fluid exit port, for example an electrospray emitter. The capillary may also enter the manifold at an input for the capillary and terminates inside the manifold.

Abstract: Integrated system for delivering sample to a mass spectrometer, which includes a chamber extending from a top to bottom end, an open port probe disposed in the chamber such that an open end of the probe, which is configured for receiving a sample, is positioned in proximity to top end of the chamber. The system can further include a solvent inlet port coupled to said chamber for receiving a solvent and directing said solvent to said probe, and a solvent outlet port for receiving a flow of the solvent from the open port probe and directing the received solvent out of the chamber. The system can also include an adapter for receiving a sample holder having an outlet port, the adapter is releasable and replaceable and couple with chamber to align the outlet port of sample holder with open end of probe for delivering sample to the probe.

Abstract: A device includes a first surface, a second surface and a controller. The second surface is adjacent to the first surface. The first and the second surfaces define a first ion channel therebetween. The first ion channel extends along a first direction. The second surface includes a first plurality of electrodes including a first electrode and a second electrode spaced apart from the first electrode along a second direction lateral to the first direction. The first plurality of electrodes extends along the first direction. The first electrode is configured to receive a first voltage signal and generate at least a portion of a pseudopotential that inhibits ions in the first ion channel from approaching the second surface. The second plurality of electrodes is located between the first electrode and the second electrode and arranged along the first direction.

Abstract: The present disclosure relates to a method of identifying components present in a lipoprotein. Methods provided include single particle mass spectrometry, such as charge detection mass spectrometry (CDMS). Distinct subpopulations that exist within lipoprotein classes are determined by correlating m/z and mass.

Abstract: A system and method for controlling electrostatic clamping of multiple platens on a spinning disk is disclosed. The system comprises a semiconductor processing system, such as a high energy implantation system. The semiconductor processing system produces a spot ion beam, which is directed to a plurality of workpieces, which are disposed on a spinning disk. The spinning disk comprises a rotating central hub with a plurality of platens. The plurality of platens may extend outward from the central hub and workpieces are electrostatically clamped to the platens. The central hub provides the electrostatic clamping voltages to each of the plurality of platens. Further, the plurality of platens may also be capable of rotation about an axis orthogonal to the rotation axis of the central hub. The central hub controls the rotation of each of the platens. Power connections and communications are provided to the central hub via the spindle assembly.

Abstract: A system and method for etching workpieces in a uniform manner are disclosed. The system includes a semiconductor processing system that generates a ribbon ion beam, and a workpiece holder that scans the workpiece through the ribbon ion beam. The workpiece holder includes a portion that extends beyond the workpiece, referred to as a halo. The halo may be independently heated to compensate for etch rate non-uniformities. In some embodiments, the halo may be independently biased such that its potential is different from the potential applied to the workpiece. In certain embodiments, the halo may be divided into a plurality of thermal zones that can be separately controlled. In this way, various etch rate non-uniformities may be addressed by controlling the potential and/or temperature of the various thermal zones of the halo.

Abstract: A method of manufacturing a multipole device includes the steps of: (a) forming an intermediate device by assembling a plurality of components including a plurality of precursor multipole electrodes, wherein the plurality of precursor multipole electrodes in the assembled device extend along and are distributed around a central axis; (b) forming a multipole device from the intermediate device by machining the precursor multipole electrodes within the intermediate device to provide a plurality of multipole electrodes having a predetermined spatial relationship; wherein a first component of the multipole device that includes a multipole electrode is attached non-permanently to a second component of the multipole device, the first component including a first alignment formation, and the second component including a second alignment portion configured to engage with the first alignment formation on the first component so as to facilitate alignment of the first component and the second component when the first com

Abstract: A vibration damping system for a charged particle beam apparatus according to the present invention includes a column through which a charged particle beam passes, a vibration detection unit that detects vibration of the column, a damping mechanism that applies vibration to the column to suppress the vibration of the column, and a control device that controls the damping mechanism. The control device includes a damping gain control unit that amplifies a detection signal of the vibration detection unit with a set amplification factor and outputs an amplified detection signal as a control signal to the damping mechanism, and a saturation suppression unit that adjusts a feedback gain value of the damping gain control unit according to a detection signal of the vibration detection unit, a signal of the damping mechanism, and a maximum output value and a minimum output value of the damping mechanism.

Abstract: According to one aspect of the present invention, an electron beam irradiation apparatus includes a photoelectric surface configured to receive irradiation of excitation light on a side of a front surface, and generate electron beams from a side of a back surface; a blanking aperture array mechanism provided with passage holes corresponding to the electron beams and configured to perform deflection control on each of the plurality of electron beams passing through the passage holes; and an adjustment mechanism configured to adjust at least one of an orbit of transmitted light that passes through at least one of arrangement objects including the photoelectric surface, the blanking aperture array mechanism, and the limit aperture substrate up to the stage and reaches the stage, among an irradiated excitation light, and an orbit of the electron beams, wherein the arrangement objects shield at least a part of the transmitted light.

Abstract: A system and method to modify surface tension at atmosphere across a hydrophobic, anti-fouling, and oleophobic coated substrate. The substrate has a hydrophobic surface defined by a surface friction. The system modifies the surface tension, or smoothness, across the hydrophobic surface. The modification in surface tension is accomplished by generating power through an ion source to create an ion cloud. The ion cloud is generated in proximity to the substrate. The ions interact with the hydrophobic surface to create a modification of surface tension. A gas carrier device introduces an inert carrier gas through the ion cloud to increase density of the ions, which in turn increases surface friction. The system is variable, selectively increasing and decreasing surface tension by: varying the duration that the hydrophobic surface is exposed to the ion cloud; varying power applied to ion source; and varying distance between the ion cloud and the hydrophobic surface.

Abstract: The present invention relates to a reaction chamber (12) for an IMR-MS apparatus or a PTR-MS apparatus, comprising an essentially gaslight outer housing (14), comprising at least two ion lenses (16) with essentially constant orifice dimensions and/or at least two ion lenses (17) with different orifice dimensions arranged around the reaction region (20), and at least one at least partly gaslight sealing (19), characterized in that the ion lenses (16,17) are placed inside the essentially gaslight outer housing (14), wherein between at least two adjacent ion lenses (16,17) an at least partly gaslight sealing (19) is mounted, wherein the room between at least other two ion lenses (16, 17) is such to allow a gas flow through said room from the reaction region (20) into the outer space (21). The present invention further relates to a method to operate an apparatus according to the invention.

Abstract: A particle beam system includes a particle source to produce a first beam of charged particles. The particle beam system also includes a multiple beam producer to produce a plurality of partial beams from a first incident beam of charged particles. The partial beams are spaced apart spatially in a direction perpendicular to a propagation direction of the partial beams. The plurality of partial beams includes at least a first partial beam and a second partial beam. The particle beam system further includes an objective to focus incident partial beams in a first plane so that a first region, on which the first partial beam is incident in the first plane, is separated from a second region, on which a second partial beam is incident. The particle beam system also a detector system including a plurality of detection regions and a projective system.

Abstract: Provided is a spray chamber including a sample introduction port portion into which a gas flow containing sample droplets that have been atomized by a nebulizer is introduced, a discharge port portion that discharges at least a part of the gas flow introduced into the sample introduction port portion to the outside, and a flow passage tube portion that has the sample introduction port portion on one end portion thereof and the discharge port portion on the other end portion thereof and serves as a flow passage for the introduced gas flow, wherein the flow passage tube portion includes a first tube portion having the discharge port portion on one end portion thereof and a second tube portion having the sample introduction port portion on one end portion thereof, the spray chamber includes a double tube portion.

Abstract: A mass spectrometer includes a vacuum chamber, a turbomolecular pump, and a roughing pump. The vacuum chamber is divided into a low vacuum chamber and a high vacuum chamber respectively provided with, on their wall surfaces, a first opening and a second opening. The turbomolecular pump has an operation chamber including in its inside a blade rotor and being provided with a first intake port, and an exhaust chamber communicating with the operation chamber and being provided with a second intake port and an exhaust port. The turbomolecular pump is placed so that the high vacuum chamber and the operation chamber communicate with each other through the second opening and the first intake port, and the low vacuum chamber and the exhaust chamber communicate with each other through the first opening and the second intake port. The roughing pump is connected to the exhaust port.

Abstract: An EUV light source module includes an EUV vessel, a collector disposed in the EUV vessel, a droplet generator, a droplet catcher, and a droplet collecting system. The droplet generator is coupled to the EUV vessel and configured to provide a plurality of target droplets into the EUV vessel. The droplet catcher is coupled to the EUV vessel and configured to catch at least a target droplet from the EUV vessel. The droplet colleting system is coupled to the droplet catcher. The droplet collecting system includes a connecting port coupled to the droplet catcher, and a thermal insulating device surrounding the droplet catcher. The droplet generator and the droplet catcher are disposed at opposite locations in the EUV vessel.

Abstract: Disclosed herein are apparatuses and systems for reentrant fluid delivery techniques. An example system includes at least a fluid delivery conduit extending between first and second electrical potentials, wherein the fluid delivery conduit is formed into a tilted helical so that a fluid flowing through the fluid delivery conduit experiences an electric field reversal through each winding of the fluid delivery conduit.

Abstract: A mass spectrometer includes a first vacuum chamber, which is provided with an atmospheric pressure interface communicating with an external atmospheric pressure environment and to a first vacuum pump, the range of working pressure P1 of the first vacuum chamber being P1>30 mbar; a second vacuum chamber, which is connected to the first vacuum chamber by means of a vacuum interface to receive the analyte from the first vacuum chamber and to a second vacuum pump, the range of working pressure P2 of the second vacuum chamber being 0.5 mbar?P2?30 mbar; and a third vacuum chamber, which is connected to the second vacuum chamber by means of a vacuum interface to receive the analyte from the second vacuum chamber and to a third vacuum pump, the first vacuum pump or the second vacuum pump being used as a forepump of the third vacuum pump.

Abstract: An apparatus includes an ion chamber and a valve assembly. The ion chamber may include a housing enclosing a gas and one or more electrodes. The valve assembly is coupled to the ion chamber allowing control of replacement of the gas within the housing.