Abstract: The present invention is applicable to the field of electronic component technologies and provides a manufacturing method of a self-aligned metal oxide TFT component, including: selecting a substrate and preparing a gate on the substrate; successively disposing an insulation layer, a transparent electrode layer, and a photoresist on the gate; using the gate as a mask to perform exposure from a back side of the substrate, so as to form a source and a drain that are aligned with the gate; depositing a metal oxide semiconductor layer on the transparent electrode layer; performing etching on the semiconductor layer, the source, and the drain, so that outer ends of the source and the drain are exposed out of the metal oxide semiconductor layer; and depositing a passivation layer and leading out the source and the drain.

Abstract: A display device may include the following elements: a transistor; a first pixel electrode electrically connected to a drain electrode of the transistor and including a first-type subpixel electrode and a second-type subpixel electrode; a first-type common electrode overlapping the first-type subpixel electrode; a second-type common electrode overlapping the second-type subpixel electrode; a first-type common voltage line electrically connected to the first-type common electrode, electrically insulated from the second-type common electrode, and overlapping each of the first-type common electrode and the second-type common electrode; and a second-type common voltage line electrically insulated from the first-type common electrode, electrically connected to the second-type common electrode, and overlapping each of the first-type common electrode and the second-type common electrode.

Abstract: A semiconductor device includes a first semiconductor region that has an external profile including at least one corner, and that includes a semiconductor of a first conductivity type, and a first insulation region that surrounds an outer periphery of the first semiconductor region, and that includes an insulator that, at a corner portion corresponding to the corner, has a depth deeper than a depth at a location other than the corner portion. The semiconductor device further includes a second semiconductor region that surrounds an outer periphery of the first insulation region, and that includes a semiconductor of a second conductivity type, and a second insulation region that surrounds an outer periphery of the second semiconductor region, and that includes an insulator that is deeper than the depth of the first insulation region at the location other than the corner portion.

Abstract: A backside illuminated image sensor includes a substrate, a backside passivation layer disposed on backside of the substrate, and a transparent conductive layer disposed on the backside passivation layer.

Abstract: The three dimensional (3D) circuit includes a first tier including a semiconductor substrate, a second tier disposed adjacent to the first tier, a three dimensional inductor including an inductive element portion, the inductive element portion including a conductive via extending from the first tier to a dielectric layer of the second tier. The 3D circuit includes a ground shield surrounding at least a portion of the conductive via. In some embodiments, the ground shield includes a hollow cylindrical cage. In some embodiments, the 3D circuit is a low noise amplifier.

Abstract: A memory device is disclosed. The memory device includes a substrate, including a substrate, including a source region and a drain region; and a gate stack, formed over a surface of the substrate, wherein the gate stack includes: a tunneling layer; a first layer; a second layer; a third layer; and a blocking layer; wherein each of the tunneling layer and the blocking layer has an oxygen proportion higher than the first, the second and the third layers; the first layer has a highest silicon proportion among the first, the second and the third layers; the second layer has a highest oxygen proportion among the first, the second and the third layers; and the first layer has a highest nitrogen proportion among the first, the second and the third layers. An associated gate stack and a manufacturing method are also disclosed.

Abstract: A vertically oriented BARITT diode is formed in an integrated circuit. The BARITT diode has a source proximate to the top surface of the substrate of the integrated circuit, a drift region immediately below the source in the semiconductor material of the substrate, and a collector in the semiconductor material of the substrate immediately below the drift region. A dielectric isolation structure laterally surrounds the drift region, extending from the source to the collector. The source may optionally include a silicon germanium layer or may optionally include a schottky barrier contact.

Abstract: The inventive concepts provide semiconductor devices and methods of manufacturing the same. Semiconductor devices of the inventive concepts may include a fin region comprising a first fin subregion and a second fin subregion separated and isolated from each other by an isolation insulating layer disposed therebetween, a first gate intersecting the first fin subregion, a second gate intersecting the second fin subregion, and a third gate intersecting the isolation insulating layer.

Abstract: An interconnection structure fabrication method is provided. The method includes providing a substrate; forming a conductive film with a first thickness and having a first lattice structure and a first grain size, wherein the first thickness is greater than the first grain size; and performing an annealing process to change the first lattice structure of the conductive film to a second lattice structure and to change the first grain size to a second grain size. The second grain size is greater than the first grain size, and the first thickness is greater than or equal to the second grain size. The method also includes etching portion of the conductive film to form at least one conductive layer; etching portion of the conductive layer to form at least one trench having a depth smaller than the first thickness in the conductive layer to form an electrical interconnection wire and conductive vias; and forming a dielectric layer covering the substrate, sidewalls of the conductive layer, and the trench.

Abstract: A semiconductor device includes a first semiconductor layer having a first conductive type; a circuit layer including a second semiconductor layer; and a plurality of layered members. Each of the layered members includes an interlayer insulation film and a wiring layer formed on the interlayer insulation film. The second semiconductor layer includes a circuit element. The layered members form a multilayer wiring layer. The semiconductor device further includes a penetrating conductive member; a conductive portion; and a first conductive type region. The penetrating conductive member penetrates from the first semiconductor layer to the interlayer insulation film of the layered member at the highest position. The conductive portion includes an electrode formed in the wiring layer of the layered member at the highest position and connected to the penetrating conductive member. The first conductive type region has an impurity concentration greater than that of the first semiconductor layer.

Abstract: To provide an oxide semiconductor film having stable electric conductivity and a highly reliable semiconductor device having stable electric characteristics by using the oxide semiconductor film. The oxide semiconductor film contains indium (In), gallium (Ga), and zinc (Zn) and includes a c-axis-aligned crystalline region aligned in the direction parallel to a normal vector of a surface where the oxide semiconductor film is formed. Further, the composition of the c-axis-aligned crystalline region is represented by In1+?Ga1-?O3(ZnO)m (0<?<1 and m=1 to 3 are satisfied), and the composition of the entire oxide semiconductor film including the c-axis-aligned crystalline region is represented by InxGayO3(ZnO)m (0<x<2, 0<y<2, and m=1 to 3 are satisfied).

Abstract: The present invention provides a nanowire sensor comprising nanowires, in which the nanowires are stacked to form a three-dimensional structure so that they have a large exposed surface area compared to that of a conventional straight nanowire sensor in the same limited area, thereby increasing the probability of attachment of a target material to the nanowires to thereby increase the measurement sensitivity of the sensor. Thus, a change in the electrical conductivity (conductance or resistance) of the nanowires can be sensed with higher sensitivity, suggesting that the sensor has increased sensitivity.

Abstract: Methods for temporary bussing of semiconductor package substrates are disclosed and may include metal plating regions of a packaging substrate utilizing a plurality of bussed traces, which may be decoupled by forming debuss holes at intersections of the bussed traces. The decoupled traces may then be electrically tested, and the packaging substrate may be singulated into a plurality of substrates utilizing a sawing process through singulation areas in the packaging substrate. The traces may be electrically coupled via plating bars in the substrate. The plating bars may be located in the singulation areas. The intersections of the bussed traces may be in a Y pattern, which may be repeated along the singulation areas. The debuss holes may be formed utilizing mechanical drilling or lasing. The regions of the packaging substrate may be metal plated utilizing an electroplating process. The plurality of bussed traces may be biased for the electroplating process.

Abstract: A cross-domain electrostatic protection device having four embedded silicon controlled rectifiers (a QSCR structure) embedded in a single cell. Two grounded-gate NMOS transistors are embedded into the cross-domain electrostatic protection device for reducing trigger voltage of the QSCR structure. Furthermore, an external trigger circuit and a bias circuit are applied to the cross-domain electrostatic protection device to reduce trigger voltage of the QSCR structure and leakage current.

Abstract: A method of manufacturing a microelectronic assembly (100) and a microelectronic device (4100) that include a stacked structure (101). The stacked structure includes a heat spreader (104), at least one die (106) thermally coupled to at least a portion of one side of the heat spreader, at least one other die (108) thermal coupled to at least a portion of an opposite side of the heat spreader, at least one opening (401) in the heat spreader located in a region of between the two die, an insulator (603) disposed in the at least one opening, and electrically conductive material (1308, 1406) in an insulated hole (705) in the insulator. The heat spreader allows electrical communication between the two die through the opening while the insulator isolates the electrically conductive material and the heat spreader from each other.

Abstract: Embodiments of mechanisms for forming an image sensor device are provided. The image sensor device includes a semiconductor substrate and an isolation structure in the semiconductor substrate. The image sensor device also includes an active region in the semiconductor substrate and surrounded by the isolation structure. The active region includes a light sensing region and a doped region, and the doped region has a horizontal length and a vertical length. A ratio of the horizontal length to the vertical length is in a range from about 1 to about 4.

Abstract: A method of manufacturing a thin-film photovoltaic module in which a photoelectric conversion element is deposited on a substrate, includes removing the photoelectric conversion element at a frame shape area from sides of the substrate toward inside with a predetermined width by a first removing step of scanning a first photoelectric conversion element removing device at the area along the sides of the substrate to remove the photoelectric conversion element for the predetermined width, and a second removing step of scanning a second photoelectric conversion element removing device within the area along the sides of the substrate to remove the photoelectric conversion element that is not removed in the first removing step at a width narrower than the predetermined width and without superimposing a center line of a scanning path on a center line of a scanning path of the first photoelectric conversion element removing device.

Abstract: A method includes forming a sacrificial layer over a bottom substrate. The sacrificial layer is patterned based on a desired etching distance. A top layer is formed over the sacrificial layer. At least one release hole is formed through the top layer. The sacrificial layer is etched through the at least one release hole.

Abstract: Quantum dot light emitting diodes (QD-LEDs) are formed that are transparent and emit light from the top and bottom faces. At least one electrode of the QD-LEDs is a dielectric/metal/dielectric layered structure, where the first dielectric comprises metal oxide nanoparticles or polymer-nanoparticle blends and is 10 to 40 nm in thickness, the metal layer is 5 to 25 nm in thickness, and the second dielectric layer is a nanoparticulate, polymer-nanoparticle blend or continuous layer of 30 to 200 nm in thickness and is situated distal to the light emitting layer of the QD-LED.

Abstract: In an approach to fabricating a silicon on insulator wafer, one or more semiconductor device elements are implanted and one or more shallow trench isolations are formed on a top surface of a first semiconductor wafer. A first dielectric material layer is deposited over the top surface of the first semiconductor wafer, filling the shallow trench isolations. A dielectric material layer on a bottom surface of a second semiconductor wafer is bonded to a dielectric material layer on the top of the first semiconductor wafer and one or more semiconductor devices are formed on a top surface of the second semiconductor wafer. Then, one or more through silicon vias are created connecting the one or more semiconductor devices on the top surface of the second semiconductor wafer and the one or more semiconductor device elements on the top surface of the first semiconductor wafer.