Abstract: A method of manufacturing a semiconductor device having a semiconductor die within an extended substrate and a bottom substrate may include bonding a bottom surface of a semiconductor die to a top surface of a bottom substrate, forming an adhering member to a top surface of the semiconductor die, bonding an extended substrate to the semiconductor die and to the top surface of the bottom substrate utilizing the adhering member and a conductive bump on a bottom surface of the extended substrate and a conductive bump on the bottom substrate. The semiconductor die and the conductive bumps may be encapsulated utilizing a mold member. The conductive bump on the bottom surface of the extended substrate may be electrically connected to a terminal on the top surface of the extended substrate. The adhering member may include a laminate film, a non-conductive film adhesive, or a thermal hardening liquid adhesive.

Abstract: A microelectronic device comprises a first pillar of a semiconductive material, a second pillar of the semiconductive material adjacent to the first pillar of the semiconductive material, an active word line extending between the first pillar and the second pillar, and a passing word line extending on a side of the second pillar opposite the active word line, the passing word line extending into an isolation region within the semiconductive material, the isolation region comprising a lower portion and an upper portion having a substantially circular cross-sectional shape and a larger lateral dimension than the lower portion. Related microelectronic devices, electronic systems, and methods are also described.

Abstract: The present disclosure relates to a semiconductor memory device and a method of fabricating the same, and the semiconductor memory device includes a substrate, an active structure and a shallow trench isolation. The active structure is disposed within the substrate and includes a first active region and a second active region. The first active region includes a plurality of active region units, and the second active region is disposed at an outer side of the first active region to directly connect to a portion of the active region units. The second active region includes a plurality of first openings disposed an edge of the second active region. The shallow trench isolation is disposed within the substrate, to surround the active structure.

Abstract: A method including forming an inter-layer insulation layer on a substrate, forming a plug material penetrating the inter-layer insulation layer and contacting a portion of the substrate, forming a contact plug by etching the plug material, forming a trench exposing a side wall of the contact plug by etching the substrate and the inter-layer insulation layer to be aligned with a side wall of the contact plug, forming a gate insulation layer on a surface of the trench and the exposed side wall of the contact plug, and forming a gate electrode partially filling the trench on the gate insulation layer. The method includes an inter-layer insulation layer formed on a substrate, a contact plug penetrating the inter-layer insulation layer and contacting a portion of the substrate, trenches extending in a line shape and aligned with side walls of the contact plug, and a plug spacer positioned between the trenches and surrounding the contact plug.

Abstract: A semiconductor device structure includes a silicon substrate, a transistor, and an interconnection. The silicon substrate has a silicon surface. The transistor includes a gate structure, a first conductive region, a second conductive region, and a channel under the silicon surface. The interconnection is extended beyond the transistor and coupled to the first conductive region of the transistor. The interconnection is disposed under the silicon surface and isolated from the silicon substrate by an isolation region.

Abstract: The present disclosure provides one embodiment of a method making semiconductor structure. The method includes forming a composite stress layer on a semiconductor substrate, wherein the forming of the composite stress layer includes forming a first stress layer of a dielectric material with a first compressive stress and forming a second stress layer of the dielectric material with a second compressive stress on the first stress layer, the second compressive stress being greater than the first compressive stress; and patterning the semiconductor substrate to form fin active regions using the composite stress layer as an etch mask.

Abstract: An integrated circuit structure comprises a lower device layer that includes a first structure comprising a plurality of PMOS transistors. An upper device layer is formed on the lower device layer, wherein the upper device layer includes a second structure comprising a plurality of NMOS thin-film transistors (TFT).

Abstract: Aspects of the present disclosure provide 3D semiconductor apparatus and a method for fabricating the same. The 3D semiconductor apparatus can include a first semiconductor device including first S/D regions, a first gate region sandwiched by the first S/D regions, and a first channel surrounded by the first S/D regions and the first gate region; a second semiconductor device stacked on the first semiconductor device that includes second S/D regions, a second gate region sandwiched by the second S/D regions, and a second channel surrounded by the second S/D regions and the second gate region and formed vertically in-situ on the first channel; and silicide formed between the first and second semiconductor devices where the first and second channels interface and coupled to an upper one of the first S/D regions of the first semiconductor device and a lower one of the second S/D regions of the second semiconductor device.

Abstract: A highly portable and highly browsable light-emitting device is provided. A light-emitting device that is less likely to be broken is provided. The light-emitting device has a strip-like region having high flexibility and a strip-like region having low flexibility that are arranged alternately. In the region having high flexibility, a light-emitting panel and a plurality of spacers overlap with each other. In the region having low flexibility, the light-emitting panel and a support overlap with each other. When the region having high flexibility is bent, the angle between normals of facing planes of the two adjacent spacers changes according to the bending of the light-emitting panel; thus, a neutral plane can be formed in the light-emitting panel or in the vicinity of the light-emitting panel.

Abstract: A method for manufacturing an electronic device includes the following steps. A substrate including a main region and a peripheral region is provided. A seed layer is formed on the substrate. A circuit structure layer is formed on the seed layer, and the circuit structure layer has a plurality of chip connection structures disposed on the main region and a plurality of test circuit structures disposed on the peripheral region. The chip connection structures and the test circuit structures are physically separated from each other, and the chip connection structures and the test circuit structures are electrically connected through the seed layer. A circuit test process is performed and includes applying a predetermined voltage to the test circuit structures to test the chip connection structures. A test result is obtained to determine whether a chip is electrically connected to the chip connection structures.

Abstract: A highly portable and highly browsable light-emitting device is provided. A light-emitting device that is less likely to be broken is provided. The light-emitting device has a strip-like region having high flexibility and a strip-like region having low flexibility that are arranged alternately. In the region having high flexibility, a light-emitting panel and a plurality of spacers overlap with each other. In the region having low flexibility, the light-emitting panel and a support overlap with each other. When the region having high flexibility is bent, the angle between normals of facing planes of the two adjacent spacers changes according to the bending of the light-emitting panel; thus, a neutral plane can be formed in the light-emitting panel or in the vicinity of the light-emitting panel.

Abstract: A flexible display panel and a manufacturing method thereof are provided. By filling a protective film in a stress concentration area of an inorganic film layer at a corner of a dam, a slope of a side wall of the dam can be effectively reduced, and stress concentration effect of the inorganic film layer in an upper packaging structure is reduced to a certain extent. When the protective film is subjected to stress, it can effectively relieve the stress and weaken or even eliminate stress effect of the packaging structure on an anode layer at a corner of the dam.

Abstract: A package substrate includes a multilayer circuit structure, a gas-permeable structure, a heat conducting component, a first circuit layer, a second circuit layer and a build-up circuit structure. The gas-permeable structure and the heat conducting component are respectively disposed in a first and a second through holes of the multilayer circuit structure. The first and the second circuit layers are respectively disposed on an upper and a lower surfaces of the multilayer circuit structure and expose a first and a second sides of the gas-permeable structure. The build-up circuit structure is disposed on the first circuit layer and includes at least one patterned photo-imageable dielectric layer and at least one patterned circuit layer alternately stacked. The patterned circuit layer is electrically connected to the first circuit layer by at least one opening. The build-up circuit structure and the first circuit layer exposed by a receiving opening form a recess.

Abstract: A multi-chip package structure includes outer leads, a first chip and a second chip. The outer leads are disposed on four sides of a chip bonding area of a package carrier thereof, respectively. The first chip is fixed on the chip bonding area and includes a core and a seal ring. Input/output units, and first bonding pads are disposed, in an outward order, on the sides of the core. Each first bonding pad is electrically connected to a corresponding outer lead through a first wire. Dummy pads are disposed between the input/output units and the at least one side of the core. The second chip is stacked on the core and includes second bonding pads connected to the corresponding outer leads through second wires and dummy pads, so as to prevent from short circuit caused by soldering overlap and contact between the wires.

Abstract: An organic light emitting diode display substrate includes a light emitting unit layer, a first band gap layer and a color conversion layer. The first band gap layer and the color conversion layer are on a light exit path of the light emitting unit layer. The light emitting unit layer includes first, second and third light emitting units periodically arranged on a driving substrate and emitting light of a first color. The color conversion layer converts a part of the light of the first color into light of a second color and a third color. The first band gap layer is between the light emitting unit layer and the color conversion layer. The first band gap layer transmits the light of the first color in a light exit direction, and reflects the light of the second color and the light of the third color.

Abstract: A multi-chip package structure includes outer leads, a first chip and a second chip. The outer leads are disposed on a side of a chip bonding area of a package carrier thereof. The first chip is fixed on the chip bonding area and includes a core and a seal ring. Input/output units, and first bonding pads are disposed, in an outward order, on at a side of the core. Each first bonding pad is electrically connected to a corresponding outer lead through a first wire. Dummy pads are disposed between the input/output units and adjacent first bonding pads on the side of the core. The second chip is stacked on the core and includes second bonding pads connected to the corresponding outer leads through second wires and dummy pads, so as to prevent from short circuit caused by soldering overlap and contact between the wires.

Abstract: A fin structure of a FinFET device is formed over a substrate. A first layer is formed over the fin structure. A gate layer is formed over the fin structure and over the first layer. The gate layer is patterned into a gate stack that wraps around the fin structure. A second layer is formed over the first layer and over the gate stack. A first etching process is performed to remove portions of the second layer formed over the fin structure, the first layer serves as an etching-stop layer during the first etching process. A second etching process is performed to remove portions of the first layer to expose a portion of the fin structure. A removal of the portions of the first layer does not substantially affect the second layer. A source/drain region is epitaxially grown on the exposed portion of the fin structure.

Abstract: A semiconductor device includes an oxide semiconductor layer including a crystalline region over an insulating surface, a source electrode layer and a drain electrode layer in contact with the oxide semiconductor layer, a gate insulating layer covering the oxide semiconductor layer, the source electrode layer, and the drain electrode layer, and a gate electrode layer over the gate insulating layer in a region overlapping with the crystalline region. The crystalline region includes a crystal whose c-axis is aligned in a direction substantially perpendicular to a surface of the oxide semiconductor layer.

Abstract: A semiconductor structure includes a substrate, a drain region, a word line, a gate structure, and a first bit line. The drain region is disposed on the substrate. The gate structure is disposed on the drain region and has a portion in the word line. The first bit line is disposed on the gate structure to serve as a source region.

Abstract: Various embodiments of the present disclosure are directed towards a semiconductor device including a gate structure. The semiconductor device further includes a pair of spacer segments on a semiconductor substrate. A high-? gate dielectric structure overlies the semiconductor substrate. The high-? gate dielectric structure is laterally between and borders the spacer segments. The gate structure overlies the high-k gate dielectric structure and has a top surface about even with a top surface of the spacer segments. The gate structure includes a metal structure and a gate body layer. The gate body layer has a top surface that is vertically offset from a top surface of the metal structure and further has a lower portion cupped by the metal structure.