Abstract: In an IC card according to the present invention, a base sheet formed of thermoplastic material is sandwiched between a substrate sheet and a dummy sheet both formed of nonplastic material lower in thermoplasticity than the base sheet. The substrate sheet is fitted with at least one IC chip and input/output terminals electrically connected to the IC chip. First and second cover sheets formed of thermoplastic material are put individually on the outer surfaces of the substrate sheet and the dummy sheet. The cover sheet on the substrate sheet is formed with apertures through which the input/output terminals are exposed to the outside.

Abstract: Junction field effect transistor, specifically a static induction transistor, and method of fabricating. A low resistivity N-type surface layer is formed at the surface of a high resistivity N-type epitaxial layer which has been grown on a low resistivity N-type substrate of silicon. The surface of the surface layer is coated with silicon dioxide and portions of the silicon dioxide layer are removed to expose alternating gate surface areas and source surface areas. P-type conductivity material is diffused into the silicon from the gate surface areas to produce zones of graded concentration. The difference in concentration of N-type conductivity imparting material in the surface layer and in the remainder of the epitaxial layer causes the resulting P-type gate regions to extend laterally toward each other so as to produce narrow channel regions at a depth beyond the surface layer while limiting the lateral extensions of the P-type gate regions adjacent to the surface.

Abstract: A semiconductor device includes a plurality of circuit groups constituting an integrated circuit and each constituted by a plurality of circuit blocks and a bias circuit which applies a bias potential to said circuit blocks. The device further includes a plurality of power buses provided above the circuit groups through an insulating layer so as to feed power to circuit elements in the circuit groups. At least one of the power buses is constituted by a first bus for feeding power to the circuit groups and a plurality of second buses respectively provided for the circuit groups so that each second bus receives power from the first bus and feeds power to circuit elements in the corresponding circuit group. Each of the second buses is connected to the first bus at a predetermined position on the corresponding circuit group.

Abstract: A semiconductor device employing a new isolation process is disclosed, wherein an isolation area is a region in which a burying material is buried in a deep groove formed in a semiconductor body with a substantially constant width by anisotropic dry etching, semiconductor elements are formed in selected ones of semiconductor regions isolated by the isolation area, and others of the semiconductor regions, with no semiconductor element formed therein, have their whole surface covered with a thick oxide film which is produced by the local oxidation of the semiconductor body. The new isolation process is well-suited for a bipolar type semiconductor device, wherein the deep groove is formed so as to reach a semiconductor substrate through an N.sup.+ -type buried layer, and a thick oxide film formed simultaneously with the aforementioned thick oxide film isolates the base region and collector contact region of a bipolar transistor.

Abstract: One p-type dopant is implanted into a substrate to modify the diffusion characteristics of another p-type dopant implanted into the substrate. As an example, gallium is diffused into a p-type region along with boron to confine the diffusion of the boron, and thereby produce smaller device regions in silicon. Along with the confined volume, the resulting regions exhibit electrical activity that is greater than the simple additive behavior of boron and gallium acting alone.

Abstract: A gallium arsenide integrated circuit device compatible with a silicon emitter-coupled logic device includes a plurality of transistors constituting an logic circuit and an output transistor driving an externally provided load in response to an output of the logic circuit. The output transistor has its threshold voltage that is larger in absolute value than the threshold voltages of the remaining transistor, so that an output signal having the ECL level is produced without sacrificing a power consumption and a semiconductor chip area.

Abstract: A cell layout provides a practical masterslice design for random logic in any LSI FET technology. Each cell is capable of the order of about 20 different functions at any of several different power levels. Multiple cells can be combined to form standard macro functions.

Abstract: In a CMOS FET IC element including at least one pair of transistors with connected drains, one an N-channel MOSFET and one a P-channel MOSFET, the N-channel MOSFET having a first threshold voltage controlled by the implantation of an ion, and the P-channel MOSFET having a second threshold voltage control are implanted with the same type of ion, so that one of the pair of transistors, either the N-channel MOSFET or the P-channel MOSFET is of a type that is normally ON, and the other MOSFET is of a type that is normally OFF with any gate voltage between the two voltages supplied to their sources.

Abstract: Insulating layers responsible for the trapping of electric charge in non-volatile semiconductor memories, such as FAMOS or MNOS, are fabricated as thicker layers when doped with metals having partially filled d or f electron shells. Typically the insulating layer is silicon oxide doped with up to 10 atomic % of a first transition series metal.

Abstract: A semiconductor device which is provided with a surface channel type or bulk channel type MIS FET. The MIS FET comprises at least a semiconductor substrate of a first conductivity type, a layer member formed in a predetermined pattern on the major surface of the substrate and having an insulating side surface; an insulating layer formed on the major surface of the substrate to extend from the insulating side surface in a direction opposite from the layer member; a conductive layer formed on the major surface of the insulating layer in contact with the insulating side surface of the layer member; and a first semiconductor region of a second conductivity type formed in the semiconductor substrate having a marginal edge corresponding to that of the conductive layer.

Abstract: An improved short-channel field effect transistor including a standard tip implant type of source and drain each disposed in the surface of a semiconductor substrate and a gate electrode positioned upon the substrate between the source and drain and control plugs disposed in the substrate and associated with and contiguous to the source and drain for eliminating substrate punch-through currents without substantially increasing the device junction capacitance.

Abstract: A dual dielectric gate system utilizes a dual dielectric system with a first silicon dioxide dielectric film or layer at the monocrystalline substrate surface, or termination. The substrate is of silicon optionally counterdoped with germanium. The dual dielectric system includes a dielectric film at the substrate surface of thicknesses of from 200.ANG. to 1000.ANG. (or greater). A layer of undoped amorphous silicon and a second layer of silicon dioxide, respectively overlie the first layer silicon dioxide, and an aluminum gate metal layer overlies the second silicon dioxide layer. The structure can be patterned by selectively patterning photoresist and a dry or a dry/wet etch processes. The structure is patterned and etched as desired.

Abstract: A temperature controller includes a block-shaped heat sink in which a plurality of semiconductor devices to be controlled are mounted, a temperature sensor mounted in the heat sink, and a temperature controlling element mounted on the heat sink. The temperature sensor detects the temperature of the semiconductor devices through the heat sink, and the temperature controlling element responds to an output signal from the temperature sensor for controlling the temperature of the semiconductor devices through the heat sink so that the temperature will be substantially constant. Therefore, the semiconductor devices can be simultaneously controlled in temperature through the single temperature sensor and the single temperature controlling element.

Abstract: A semiconductor device which is provided with a surface channel type or bulk channel type MIS FET. The MIS FET comprises at least a semiconductor substrate of a first conductivity type, a layer member formed in a predetermined pattern on the major surface of the substrate and having an insulating side surface; an insulating layer formed on the major surface of the substrate to extend from the insulating side surface in a direction opposite from the layer member; a conductive layer formed on the major surface of the insulating layer in contact with the insulating side surface of the layer member; and a first semiconductor region of a second conductivity type formed in the semiconductor substrate having a marginal edge corresponding to that of the conductive layer.

Abstract: A high voltage bidirectional output semiconductor field effect transistor (BOSFET) is disclosed which is turned on from the electrical output of a photovoltaic stack which is energized from an LED. The process for manufacture of the device is also disclosed. The BOSFET device consists of two lateral field effect transistors formed in an implanted N(-) region in a P(-) substrate. Two spaced drain regions feed inwardly toward a common N(+) source region separated from the drains by respective P type diffusions. The surface of these diffusions can be inverted by application of voltage to the suitably disposed gate electrode. The depletion field between channel and drain regions is well controlled over the surface of the device. The source contact remains close to the potential of the gate contact at all times so that the device can be used for high voltage switching of either polarity.

Abstract: A semiconductor device which is provided with a surface channel type or bulk channel type MIS FET. The MIS FET comprises at least a semiconductor substrate of a first conductivity type, a layer member formed in a predetermined pattern on the major surface of the substrate and having an insulating side surface; an insulating layer formed on the major surface of the substrate to extend from the insulating side surface in a direction opposite from the layer member; a conductive layer formed on the major surface of the insulating layer in contact with the insulating side surface of the layer member; and a first semiconductor region of a second conductivity type formed in the semiconductor substrate having a marginal edge corresponding to that of the conductive layer.

Abstract: This invention provides a semiconductor device lead frame comprising a mounting tab for a semiconductor chip located within the lead frame and multiple inner leads extending to the area adjacent to the perimeter of the tab. The configuration of the inner leads with respect to one another and the mounting tab is stabilized by adhering at least a portion of the leads and, optionally, the mounting tab to a dielectric film coated on one side with a cured, heat-activated silicone adhesive.

Abstract: A semiconductor device which is provided with a surface channel type or bulk channel type MIS FET. The MIS FET comprises at least a semiconductor substrate of a first conductivity type, a layer member formed in a predetermined pattern on the major surface of the substrate and having an insulating side surface; an insulating layer formed on the major surface of the substrate to extend from the insulating side surface in a direction opposite from the layer member; a conductive layer formed on the major surface of the insulating layer in contact with the insulating side surface of the layer member; and a first semiconductor region of a second conductivity type formed in the semiconductor substrate having a marginal edge corresponding to that of the conductive layer.

Abstract: The gate electrode of a first CMOS inverter is connected to the drains of each transistor of a second CMOS inverter via an interconnection, and the gate electrode of the second CMOS inverter is connected to the drains of the first CMOS inverter via an interconnection, to form a flip-flop circuit. A pair of transfer transistors are connected to the nodes of this flip-flop circuit. A plurality of memory cells each constructed by the flip-flop circuit and the pair of transfer transistors are integrated in a matrix form to form a semiconductor memory device. The pair of gate electrodes are formed of a first polycrystalline silicon layer which includes an impurity of the first conductivity type. The pair of interconnections are formed of an impurity-doped second polycrystalline silicon layer and a high-melting point metal layer, and formed on a first interlayer insulation film.

Abstract: A passivated dual dielectric gate system compatible with low temperature processing utilizes a dual dielectric system with a silicon dioxide dielectric film or layer at the monocrystalline substrate surface, or termination. The dual dielectric system includes a dielectric film at the substrate surface of thicknesses of from 200 to 1000 .ANG.(or greater ). Respective layers of undoped amorphous silicon and titanium nitride overlie the top of the silicon dioxide and an aluminum gate metal layer overlies the titanium nitride layer. The structure can be patterned by selectively patterning photoresist and a dry or dry/wet etch processses. The structure is patterned and etched as desired.