Abstract: A light emitting element module according to an embodiment of the present invention includes a first metal substrate; a second metal substrate on the first metal substrate; an insulation layer on the second metal substrate and including at least one of a carbide-based insulation material and a nitride-based insulation material; a circuit pattern on the insulation layer; and a light emitting element on the insulation layer.

Abstract: The semiconductor device having flip chip structure includes: an insulating substrate; a signal wiring electrode disposed on the insulating substrate; a power wiring electrode disposed on the insulating substrate or disposed so as to pass through the insulating substrate; a semiconductor chip disposed in flip chip configuration on the insulating substrate and comprising a semiconductor substrate, a source pad electrode and a gate pad electrode disposed on a surface of the semiconductor substrate, and a drain pad electrode disposed on a back side surface of the semiconductor substrate; agate connector disposed on the gate pad electrode; and a source connector disposed on the source pad electrode. The gate connector, the gate pad electrode and the signal wiring electrode are bonded, and the source connector, the source pad electrode and the power wiring electrode are bonded, by using solid phase diffusion bonding.

Abstract: A light emitting device includes a substrate, a plurality of micro light emitting chips, a plurality of reflective structures and a plurality of conductive bumps. The substrate has a plurality of pads. The micro light emitting chips are disposed on the substrate in dispersion, and each of the micro light emitting chips includes a light emitting layer. The reflective structures are disposed around the micro light emitting chips in dispersion, and at least cover the micro light emitting layers of the light emitting chips. The conductive bumps are disposed corresponding to the micro light emitting chips and located between the micro light emitting chips and the substrate, wherein the micro light emitting chips are electrically connected to the pads of the substrate through the conductive bumps.

Abstract: A device includes a semiconductor substrate, a body region in the semiconductor substrate having a first conductivity type and in which a channel is formed during operation, source and drain regions in the semiconductor substrate and having a second conductivity type, the source region being disposed on the body region, and a composite drift region in the semiconductor substrate, having the second conductivity type, and through which charge carriers from the source region drift to reach the drain region after passing through the channel. The composite drift region includes a first section adjacent the channel, a second section adjacent the drain region, and a third section disposed between the first and second sections. The first and second sections have a lower effective dopant concentration level than the third section.

Abstract: A fuse includes a semiconductor layer having a dielectric material formed thereon. An epitaxially grown material is formed in a trench within the dielectric material. The epitaxially grown material includes a peak region. A fuse metal is formed over the peak region and extends along sidewalls of the trench and over the dielectric material outside the trench. Contacts are formed outside the trench connecting to fuse metal over the dielectric material.

Abstract: A semiconductor device includes a gate dielectric layer over a substrate, a metal layer over the gate dielectric layer, a capping layer over the metal layer, wherein the capping layer includes a plurality of dipole forming elements concentrated at the interface between the metal layer and the capping layer.

Abstract: A display panel includes a substrate, a first stacking unit, and a second stacking unit. The first stacking unit is disposed on the substrate and connected to a scan line. The first stacking unit includes a first conducting layer, a second conducting layer, at least one first through hole, and a first protruding portion. The first conducting layer is interposed between the second conducting layer and the substrate. The first through hole connects the first conducting layer and the second conducting layer. The position of the first protruding portion is relative to the position of the second protruding portion.

Abstract: A semiconductor device includes a first gate stack arranged about a first nanowire and a second nanowire, the first nanowire is arranged above a second nanowire, the first nanowire is connected to a first source/drain region and a second source/drain region. A second gate stack is arranged about a third nanowire and a fourth nanowire, the third nanowire is arranged above a fourth nanowire, the third nanowire is connected to a third source/drain region and a fourth source/drain region. An insulator layer having a first thickness is arranged adjacent to the first gate stack.

Abstract: A multiple junction thin film transistor (TFT) is disclosed. The body of the TFT may have an n+ layer residing in a p? region of the body. The TFT may have an n+ source and an n+ drain on either side of the p? region of the body. Thus, the TFT has an n+/p?/n+/p?/n+ structure in this example. The n+ layer in the p? region increases the breakdown voltage. Also, drive current is increased. The impurity concentration in the n+ layer in the p? body and/or thickness of the n+ layer in the p? body may be tuned to increase performance of the TFT. In an alternative, the body of the TFT has a p+ layer residing in an n? region of the body. The TFT may have a p+ source and a p+ drain on either side of the p? region of the body.

Abstract: A method of manufacturing a package may include: providing a first device having a first redistribution layer (RDL) and an insulator layer disposed over the first RDL; and forming a first micro-bump line over the insulator layer of the first device. The first micro-bump line may extend laterally over a surface of the insulator layer facing away from the first RDL, and a first inductor of the package comprises the first RDL and the first micro-bump line.

Abstract: A semiconductor device includes an interlayer insulating layer having openings, contact plugs formed in lower parts of the openings, wherein the contact plugs include a first conductive layer, and bit lines formed in upper parts of the openings and coupled to the contact plugs, wherein the bit lines include a second conductive layer.

Abstract: A method of manufacturing a wide band gap semiconductor device includes the steps of preparing a wide band gap semiconductor substrate, separating the wide band gap semiconductor substrate into a plurality of first semiconductor chips, fixing the plurality of first semiconductor chips on a fixation member, measuring a breakdown voltage of each of the first semiconductor chips while immersing at least the first semiconductor chips in inert liquid, and after the step of measuring a breakdown voltage of each of the first semiconductor chips, providing a plurality of second semiconductor chips each having each of the first semiconductor chips fixed on the fixation member, by cutting the fixation member.

Abstract: A method for manufacturing a package, includes preparing a lead frame that, in a region where the package is to be formed, has a first electrode and a second electrode that is different from the first electrode; clamping the first electrode and the second electrode between an upper molding die and a lower molding die; injecting a first resin into the molding dies between which the first electrode and the second electrode have been clamped, through an injection opening formed adjacent to the first electrode and on the outside of the region where the package is to be formed; curing or solidifying the injected first resin; and cutting out an injection mark of the injection opening for the first resin from next to the first electrode after the first resin has been cured or solidified.

Abstract: An electronic device for implementing digital functions comprising a first and a second electrode regions, separated by an interposing region comprising a dielectric region, is described. The first and the second electrode regions comprise at least one first electrode and at least one second electrode, respectively, configured to generate in the interposing region an electric field depending on an electric potential difference applied thereto. In the interposing region, a molecular layer is comprised, which is composed of a plurality of molecules, each being capable of assuming one or more states, in a controllable manner, depending on a sensed electric field. The dielectric region has a spatially variable dielectric profile, to determine a respective spatially variable field profile of the sensed electric field at the molecular layer.

Abstract: A multi-chip module and method of fabricating a multi-chip module. The multi-chip module includes: a substrate having a top surface and a bottom surface and containing multiple wiring layers, first pads on the top surface of the substrate and second pads on the bottom surface of the substrate; a first active component attached to a first group of the first pads and a second active component attached to a second group of the first pads; wherein at least one pad of the second pads is a split pad having a first section and a non-contiguous second section separated by a gap, the first section connected by a first wire of the multiple wires to a pad of the first group of first pads and the second section is connected by a second wire of the multiple wires to a pad of the second group of first pads.

Abstract: A white light-emitting device of the present invention includes a substrate (101); a diamond semiconductor layer (105) provided on the substrate (101), in which one or a plurality of p-type ? layers (102), a p-type or n-type ? layer (103), and one or a plurality of n-type ? layers (104) are laminated in this order from the substrate (101); a first electrode (106) provided on the ? layer (102) which injects an electric current; a second electrode (107) provided on the ? layer (104) which injects an electric current; and a fluorescent member (108) which coats a light emission extraction region of the surface of the diamond semiconductor layer.

Abstract: Techniques for effectively confining n-well dopants during fabrication of relaxed SiGe on SRB devices are provided. In one aspect, a method for forming a semiconductor device includes the steps of: forming a SiGe stress relief buffer layer on a substrate; growing a bottom confinement layer on the stress relief buffer layer; growing a SiGe layer on the bottom confinement layer; growing a top confinement layer on the SiGe layer; forming STI regions extending through the top confinement layer, through the SiGe layer, and at least down to the bottom confinement layer, wherein the STI regions define at least one active area in the SiGe layer; and implanting at least one well dopant into the at least one active area which is confined to the at least one active area by the top confinement layer, the bottom confinement layer, and the STI regions. A semiconductor device is also provided.

Abstract: A light emitting device has: a plurality of light emitting elements, a base having a first main surface and a second main surface on the opposite side from the first main surface, the base having conductive patterns disposed on the first main surface on which the light emitting elements are mounted, conductive patterns disposed on the second main surface, and a groove provided on the second main surface of the base corresponding to a space between the light emitting elements, and a light reflecting member that integrally covers side surfaces of the plurality of light emitting elements.

Abstract: A semiconductor device can include a field insulation layer including a planar major surface extending in first and second orthogonal directions and a protruding portion that protrudes a particular distance from the major surface relative to the first and second orthogonal directions. First and second multi-channel active fins can extend on the field insulation layer, and can be separated from one another by the protruding portion. A conductive layer can extend from an uppermost surface of the protruding portion to cross over the protruding portion between the first and second multi-channel active fins.

Abstract: A display device including a wiring substrate having a wiring electrode; a plurality of semiconductor light emitting devices which form pixels; and a conductive adhesive layer configured to electrically connect the wiring electrode with the plurality of semiconductor light emitting devices. Further, the conductive adhesive layer includes a body provided with a resin having an adhesive property; and a metallic aggregation part disposed in the body, and formed as metallic atoms precipitated from a metal-organic compound and aggregated with each other.