Abstract: There is provided a technique that includes: forming an initial oxide layer on a surface of a substrate by performing a set m times (where m is an integer equal to or greater than 1), the set including non-simultaneously performing: (a) oxidizing the surface of the substrate under a condition that an oxidation amount of the substrate increases from an upstream side to a downstream side of a gas flow by supplying an oxygen-containing gas and a hydrogen-containing gas to the substrate; and (b) oxidizing the surface of the substrate under a condition that the oxidation amount of the substrate decreases from the upstream side to the downstream side of the gas flow by supplying the oxygen-containing gas and the hydrogen-containing gas to the substrate; and forming a film on the initial oxide layer by supplying a precursor gas to the substrate.

Abstract: A display device may include a substrate including a display area and a non-display area, pixels provided in the display area and each pixel including a pixel transistor and a light emitting element connected to the pixel transistor, a first driver provided in the non-display area and configured to provide a scan signal to the pixel, a scan line configured to transfer the scan signal to the pixel, a first fan-out line provided in the non-display area and connected to the scan line, and a first electrostatic discharge portion provided in the non-display area and located between the first fan-out line and the scan line. The first electrostatic discharge portion may include a bottom metal layer disposed on the substrate and a transistor disposed on and electrically connected to the bottom metal layer.

Abstract: Disclosed herein are a wafer purging-type shelf assembly and a buffer module having the same. The wafer purging-type shelf assembly includes: a shelf formed to support a wafer receiving container; a supply nozzle configured to be connected to an injection port of the wafer receiving container; and a gas supply line configured to supply an inert gas discharged from a factory gas facility to the wafer receiving container through the supply nozzle, wherein the gas supply line includes a proportional pressure control valve unit that adjusts a supply flow rate of the inert gas to the wafer receiving container by an area control method.

Abstract: The collapsed pattern recovering method is a method for recovering a collapsed pattern which is a pattern formed on a front surface of a substrate, and the method includes a reactive gas supplying step which supplies to the front surface of the substrate a reactive gas that can react with a product existing on the front surface. The reactive gas supplying step includes a hydrogen fluoride vapor supplying step which supplies vapor that contains hydrogen fluoride to the front surface of the substrate. The collapsed pattern recovering method further includes a substrate heating step which heats the substrate in parallel with the hydrogen fluoride vapor supplying step.

Abstract: The disclosure relates to an electronic device including a housing filled to a fill level with a first matrix produced from a first potting compound, and a circuit board having a component arranged thereon and having a passageway that connects a component side arranged within the housing interior filled with the first matrix and a front face of the component arranged outside the housing interior filled with the first matrix, the passageway acts as capillaries for media whose viscosity is less than a limit and as barriers for media whose viscosity is greater than the limit, the component is arranged in a spatially bounded region adjoining the component side, a second matrix produced from a second potting compound having a viscosity exceeding the limit, which second matrix effects a terminal sealing of the connection formed by the passageway against the first potting compound used for producing the first matrix.

Abstract: An autoteach enclosure system includes a plurality of surfaces that at least partially enclose an interior volume of the autoteach enclosure system. The autoteach enclosure system further includes an autoteach pin at least partially disposed within the interior volume. The autoteach pin is a scannable feature having a fixed position within the autoteach enclosure system. The autoteach enclosure system further includes a front interface coupled to one or more of the plurality of surfaces to interface the autoteach enclosure system with a substantially vertical portion of a load port of a wafer processing system. The autoteach pin enables an autoteach operation of a robot arm of the wafer processing system. The autoteach operation is an operation to automatically teach the fixed position within the autoteach enclosure system to the robot arm of the wafer processing system.

Abstract: A method for preventing a collision in a wafer processing system is provided. The method includes aligning a first sensor and a second sensor. The first sensor is disposed on a predetermined position of an elevating member connected to a bottom of a vertical wafer boat of the wafer processing system, and the second sensor is disposed on a shutter of a chamber of the wafer processing system. The method further includes activating the first sensor and the second sensor to monitor a path alongside the vertical wafer boat when the chamber is closed by the shutter.

Abstract: A protective member forming method for forming a protective member on the top surface of a substrate having projections and depressions on the top surface covers the top surface of the substrate with a resin film, adheres the resin film to the substrate so as to conform to the projections and depressions, supplies a curable liquid resin to a region superimposed on the substrate on the upper surface of the resin film, presses the liquid resin by a flat pressing surface via a cover film, thus spreads the liquid resin and cures the liquid resin, and thereby forms the protective member including the resin film, the cured liquid resin, and the cover film on the top surface of the substrate.

Abstract: Embodiments disclosed herein include an apparatus for measuring chucking force and methods of using such apparatuses. In an embodiment, the apparatus for measuring a chucking force comprises a substrate having a chucking surface, where the chucking surface is the surface that is supported by a chuck. In an embodiment, the apparatus further comprises a plurality of sensors over the chucking surface, where the plurality of sensors are thin film sensors with a thickness that is less than a thickness of the substrate. In an embodiment, the apparatus further comprises a wireless communication module electrically coupled to each of the plurality of sensors.

Abstract: A method for printing on a substrate includes printing a support structure by printing a liquid precursor material and curing the liquid precursor material, printing one or more alignment markers by printing the liquid precursor material outside the support structure and curing the liquid precursor material, positioning a substrate within the support structure, performing a registration of the substrate using the one or more alignment markers, and printing one or more device structures on the substrate while registered by printing and curing the liquid precursor material.

Abstract: An electronics manufacturing system includes a first substrate transfer via having position detection sensors to detect a position of a substrate in the first substrate transfer via and flow-controlled valves to inject inert gas through a floor and move the substrate in a predetermined direction with reference to the position within the first substrate transfer via by adjusting a pressure of the inert gas underneath the substrate. A processing chamber is coupled to the first substrate transfer via and having a pedestal with apertures and flow-controlled devices to inject inert gas through the apertures to receive the substrate from the first substrate transfer via and move the substrate into a second substrate transfer via after processing of the substrate.

Abstract: This board storing container is provided with a container body, a lid 3, and a lid-side board support unit 7 which, when the lid 3 closes a container body opening, is arranged in the part of the lid 3 opposite of the board storage space and which can support the edge of multiple boards. The lid-side board support unit 7 is provided with a lid-side board receiving unit which receives the edge of a board when supporting the board, and a frame part 71 held on the inner surface of the lid 3 and having a first surface 711 facing the inner surface of the lid 3 and a second surface 712 opposite of the first surface 711. The lid 3 is provided with a frame holding unit 35 for holding the frame 71 in an inserted state, and comprises a third surface 353 opposite of the first surface 711 and a fourth surface 354 opposite of the second surface 712.

Abstract: There is provided a processing method including the steps of measuring a thickness of the wafer, holding the wafer on a holder, supplying a liquid resin to a table that faces the holder, relatively moving the holder and the table closely to each other to coat the wafer with the liquid resin, and hardening the liquid resin that has coated the wafer. In the resin applying step, a distance by which the holder and the table are to be relatively moved closely to each other to coat the wafer with the liquid resin is determined depending on the measured thickness of the wafer.

Abstract: A sputtering target for an insulating oxide film, the sputtering target including a sintered body including a lanthanum oxide and at least one selected from the group consisting of a beryllium oxide, a magnesium oxide, a calcium oxide, a strontium oxide, and a barium oxide, wherein lanthanum has highest molar ratio among elements other than oxygen contained in the sintered body.

Abstract: A method for manufacturing a semiconductor device is provided. The method includes forming a plurality of light-emitting elements on a first substrate and forming a first pattern array on a second substrate. The method also includes transferring the plurality of light-emitting elements from the first substrate to the second substrate. The method further includes forming the first pattern array on a third substrate. In addition, the method includes transferring the plurality of light-emitting elements from the second substrate to the third substrate. The method also includes forming a second pattern array on a fourth substrate. The method further includes transferring the plurality of light-emitting elements from the third substrate to the fourth substrate. The pitch between the plurality of light-emitting elements on the first substrate is different than the pitch of the first pattern array.

Abstract: Provided are an apparatus and a method which ensure the wafers immersing in the chemical solution from one cleaning tank to the other cleaning tanks. The apparatus includes an inner tank (1001); at least one divider (1002) for dividing the inner tank (1001) into at least two cleaning tanks filled with chemical solution; a first robot (1005) equipped with at least a pair of end effectors (1051) for gripping and taking a wafer from a first cleaning tank (1011) to a second cleaning tank (1012); wherein each cleaning tank is provided with a cassette bracket (1003) in the bottom for holding wafers, and the at least one divider (1002) is provided with at least one slot (1004)< wherein the first robot (1005) grips and takes the wafer from the first cleaning tank (1011) to the second cleaning tank (1012) through the slot (1004) while keeping the wafer immersing.

Abstract: Three-dimensional (3D) object manufacturing systems and methods are operable to manufacture printed 3D objects corresponding to user-selected physical objects of interest shown in a media content event that have been viewed by a user, wherein at least one 3D printer that is accessible by the user of the media device is operable to manufacture the printed 3D object corresponding to the viewed physical object of interest.

Abstract: Methods of forming a DRAM bit line to improve line edge roughness (LER) and lower resistance are described. The method comprises implanting an inert species into a bit line metal layer having a first grain size on a substrate to form an amorphized bit line metal layer having a second grain size smaller than the first grain size. A film stack is then deposited on the amorphized bit line metal layer. The film stack and amorphized bit line metal layer are etched to form a patterned film stack on the substrate. The patterned film stack on the substrate is thermally annealed.

Abstract: A light-emitting element containing a fluorescent material and having high emission efficiency is provided. The light-emitting element contains the fluorescent material and a host material. The host material contains a first organic compound and a second organic compound. The first organic compound and the second organic compound can form an exciplex. The proportion of a delayed fluorescence component in light emitted from the exciplex is higher than or equal to 5%, and the delayed fluorescence component contains a delayed fluorescence component whose fluorescence lifetime is 10 ns or longer and 50 ?s or shorter.

Abstract: A backside illumination (BSI) image sensor and a method of forming the same are provided. A method includes forming a plurality of photosensitive pixels in a substrate, the substrate having a first surface and a second surface, the second surface being opposite the first surface, the substrate having one or more active devices on the first surface. A first portion of the second surface is protected. A second portion of the second surface is patterned to form recesses in the substrate. An anti-reflective layer is formed on sidewalls of the recesses. A metal grid is formed over the second portion of the second surface, the anti-reflective layer being interposed between the substrate and the metal grid.