Abstract: A fingerprint sensing chip packaging method and package are provided. The method includes: providing a cover plate, providing a fingerprint sensing chip, where a fingerprint sensing region and contact pads at periphery of the region are arranged on a front surface of the chip, electrically connecting the contact pads to a back surface of the chip, forming a first conductive structure electrically connected to the contact pads on the back surface of the chip, laminating the front surface of the chip with a back surface of the cover plate, providing a flexible printed circuit, where a second conductive structure is arranged on a back surface of the circuit and an opening is arranged in the circuit, laminating a front surface of the circuit with the back surface of the cover plate, and electrically connecting the first conductive structure to the second conductive structure.

Abstract: Semiconductor structures and fabrication methods are provided. An exemplary fabrication method includes providing a base substrate; forming a dielectric layer having an opening on the base substrate; forming a Ruthenium (Ru)-containing layer on side surfaces and a bottom of the opening and on a top surface of the dielectric layer; forming a Copper (Cu) containing layer to fill the opening and cover the Ruthenium (Ru)-containing layer; performing a first chemical mechanical polishing (CMP) step to remove a first partial thickness of the Copper (Cu)-containing layer; performing a second CMP step using a polishing slurry containing a Cu-corrosion-inhibitor to remove a second partial thickness of the Copper (Cu)-containing layer above the Ruthenium (Ru)-containing layer; and performing a third CMP step using a polishing slurry containing a Cu-corrosion-inhibitor to remove a third partial thickness of the Copper (Cu)-containing layer above the dielectric layer.

Abstract: A crossbar switch comprising: a first interconnect, a second interconnect, and a resistance change element. The resistance change element includes: a first electrode connected to the first interconnect and a second electrode connected to the second interconnect which are embedded in a first insulating film on a substrate having a transistor; a second insulating film covering the first insulating film and the first and second electrodes; first and second opening portions exposing parts of an upper surface including end portions of the first and second electrodes from the second insulating film with translational symmetry; first and second resistance change films covering the first and second opening portions and connecting to the first and second electrodes at the opening portions; third and fourth electrodes connecting to the first and second resistance change films; a fifth electrode connecting to the third and fourth electrodes and to a diffusion layer of the transistor.

Abstract: A structure includes an SRAM cell includes a first and a second pull-up MOS device, and a first and a second pull-down MOS device forming cross-latched inverters with the first pull-up MOS device and the second pull-up MOS device. A first metal layer is over the gate electrodes of the MOS devices in the SRAM cell. The structure further includes a first metal layer, and a CVss landing pad, wherein the CVss landing pad has a portion in the SRAM cell. The CVss landing pas is in a second metal layer over the first metal layer. A word-line is in the second metal layer. A CVss line is in a third metal layer over the second metal layer. The CVss line is electrically coupled to the CVss landing pad.

Abstract: A helmet layer is deposited on a plurality of conductive features on a first dielectric layer on a substrate. A second dielectric layer is deposited on a first portion of the helmet layer. An etch stop layer is deposited on a second portion the helmet layer.

Abstract: Devices and techniques for fabricating such devices are provided, which include an optical system having a combined permeation barrier and circular polarizer. The optical system is relatively thin and flexible, thereby allowing for OLED displays and similar devices that reduce glare while being suitable for use in flexible displays and similar devices.

Abstract: A method is provided for preparing a semiconductor-on-insulator structure comprising a multilayer dielectric layer.

Abstract: Embodiments disclosed herein relate to formation of a gate structure of a device, such as in a replacement gate process, and the device formed thereby. In an embodiment, a method includes conformally forming a gate dielectric layer on a fin extending from a substrate and along sidewalls of gate spacers over the fin, conformally depositing a dummy layer over the gate dielectric layer during a deposition process using a silicon-containing precursor and a dopant gas containing fluorine, deuterium, or a combination thereof, the dummy layer as deposited comprising a dopant of fluorine, deuterium, or a combination thereof, performing a thermal process to drive the dopant from the dummy layer into the gate dielectric layer, removing the dummy layer, and forming one or more metal-containing layers over the gate dielectric layer.

Abstract: A semiconductor chip module includes a chip unit including first and second semiconductor chips formed over a single body to be adjacent in a first direction with a scribe line region interposed therebetween, and having a first surface over which bonding pads of the first and second semiconductor chips are positioned; redistribution lines formed over the first surface, having one set of ends which are respectively electrically coupled to the bonding pads, and extending in a direction oblique to the first direction toward the scribe line region; and redistribution pads disposed over the first surface, and electrically coupled with another set of ends of the redistribution lines.

Abstract: A semiconductor package including a package base substrate; at least one semiconductor chip on the package base substrate; a heat sink attached on the at least one semiconductor chip, the heat sink including a base and a plurality of protrusion patterns on a top of the base; and a molding covering a top of the package base substrate, a side surface of the at least one semiconductor chip, and a side surface of the heat sink without covering a top of the heat sink.

Abstract: An organic light emitting display panel and a method for fabricating the same are provided by the present invention. The organic light emitting display panel includes: a substrate and a light emitting element layer disposed on the substrate. The light emitting element layer is provided with a plurality of first grooves. The organic light emitting display panel also includes an encapsulation layer disposed on the light emitting element layer, the plurality of first grooves are filled with the encapsulation layer.

Abstract: Crystalline heterostructures including an elevated fin structure extending from a sub-fin structure over a substrate. Devices, such as III-V transistors, may be formed on the raised fin structures while silicon-based devices (e.g., transistors) may be formed in other regions of the silicon substrate. A sub-fin isolation material localized to a transistor channel region of the fin structure may reduce source-to-drain leakage through the sub-fin, improving electrical isolation between source and drain ends of the fin structure. Subsequent to heteroepitaxially forming the fin structure, a portion of the sub-fin may be laterally etched to undercut the fin. The undercut is backfilled with sub-fin isolation material. A gate stack is formed over the fin. Formation of the sub-fin isolation material may be integrated into a self-aligned gate stack replacement process.

Abstract: A semiconductor device, comprising: a substrate which includes an active circuit region, and a boundary region surrounding the active circuit region, the boundary region including an edge portion of the substrate; a first lower conductive pattern disposed on the substrate of the boundary region; and a first upper conductive pattern connected to the first lower conductive pattern over the first lower conductive pattern, wherein the first upper conductive pattern includes a first portion having a first thickness, a second portion having a second thickness greater than the first thickness, and a third portion having a third thickness greater than the second thickness, and the third portion of the first upper conductive pattern is connected to the first lower conductive pattern, is provided.

Abstract: Hybrid trigate and nanowire CMOS device architecture, and methods of fabricating hybrid trigate and nanowire CMOS device architecture, are described. For example, a semiconductor structure includes a semiconductor device of a first conductivity type having a plurality of vertically stacked nanowires disposed above a substrate. The semiconductor structure also includes a semiconductor device of a second conductivity type opposite the first conductivity type, the second semiconductor device having a semiconductor fin disposed above the substrate.

Abstract: A semiconductor package including at least one semiconductor device, a first redistribution layer, a first molding compound, a second molding compound, conductive vias and a second redistribution layer. The first redistribution layer is disposed beneath the semiconductor device and electrically connected to the semiconductor device. The first molding compound is disposed over the first redistribution layer and surrounds the semiconductor device. The second molding compound surrounds the first redistribution layer and at least a part of the first molding compound. The conductive vias extend through the second molding compound. The second redistribution layer is disposed on a surface of the second molding compound away from the first redistribution layer. The second redistribution layer is electrically connected to the first redistribution layer through the conductive vias.

Abstract: Packaged semiconductor die and CTE-engineering die pairs and methods to form packaged semiconductor die and CTE-engineering die pairs are described. For example, a semiconductor package includes a substrate. A semiconductor die is embedded in the substrate and has a surface area. A CTE-engineering die is embedded in the substrate and coupled to the semiconductor die. The CTE-engineering die has a surface area the same and in alignment with the surface area of the semiconductor die.

Abstract: The present disclosure provides a carbon nanotube thin film transistor (CNT-TFT) and its manufacturing method. The carbon nanotube thin film transistor includes a source electrode, a drain electrode, a channel region, a plurality of protrusions, and a carbon nanotube layer. The channel region is between the source electrode and the drain electrode. The plurality of protrusions are at, and extend in a length direction of, the channel region. The carbon nanotube layer is disposed over the plurality of protrusions, and comprises a plurality of carbon nanotubes.

Abstract: A semiconductor device including a stacked assembly. The stacked assembly includes a metal substrate, a stacked substrate mounted on the metal substrate and having an electrode pattern, a semiconductor element mounted on the stacked substrate, and a lead frame interconnection electrically connecting the semiconductor element and the electrode pattern. The lead frame interconnection includes a first bonding portion in contact with the semiconductor element, a second bonding portion in contact with the electrode pattern, and an interconnect portion connecting the first and second bonding portions. At least one of the first bonding portion and the second bonding portion is wider than the interconnect portion.

Abstract: An image sensor and a method for fabricating the same are provided, in which the image sensor includes a substrate including a first sensing region having a photoelectric device therein, a boundary isolation film partitioning the first sensing region, an inner reflection pattern film within the substrate in the sensing region, an infrared filter on the substrate, and a micro lens on the infrared filter.

Abstract: A photoelectric conversion element according to an embodiment of the present disclosure includes: a first electrode and a second electrode facing each other; and a photoelectric conversion layer provided between the first electrode and the second electrode, and including a first organic semiconductor material, a second organic semiconductor material, and a third organic semiconductor material that have mother skeletons different from one another. The first organic semiconductor material is one of fullerenes and fullerene derivatives. The second organic semiconductor material in a form of a single-layer film has a higher linear absorption coefficient of a maximal light absorption wavelength in a visible light region than a single-layer film of the first organic semiconductor material and a single-layer film of the third organic semiconductor material. The third organic semiconductor material has a value equal to or higher than a HOMO level of the second organic semiconductor material.