Abstract: A field effect transistor includes a gate electrode disposed on a first conductivity type semiconductor substrate via an insulating film, a second conductivity type region having a first dopant impurity concentration region in the substrate at the drain side of the gate electrode contacting the insulating film, a second conductivity type region in the substrate having a higher dopant impurity concentration than the first dopant impurity concentration at the source side of the gate electrode contacting the insulating film, and a first conductivity type region in the substrate having a higher dopant impurity concentration than the substrate and surrounding the source region in the substrate. The ON-resistance of the transistor is reduced. The first conductivity type region improves the drain-source breakdown voltage, suppresses variations in the threshold voltage, and reduces the gate-source and gate-drain capacitances.

Abstract: A leadframe for semiconductor devices is disclosed. The leadframe includes a die pad supported on the leadframe. A semiconductor chip is mounted on the die pad. The chip has a plurality of pads including at least one group of designated pads for communicating an identical signal, such as a power supply signal of the same level, with external circuits. A terminal on the leadframe is coupled to the group of designated pads. The terminal is attached to selected one or more leads on the leadframe for communicating the identical signal with the external circuits. The other pads on the chip, such as signal pads, are coupled to the corresponding leads on the leadframe. Thus, the total number of leads on the leadframe is reduced and more leads are available for the signal pads, resulting in efficient connections between the chip pads and the leads.

Abstract: A user-programmable interconnect device includes a first lower electrode comprising a conductive material. A layer of dielectric material is disposed over the top surface of the lower conductor. An antifuse material, such as one or more layers of a dielectric material, amorphous silicon, or combinations of such materials, is located in an aperture in the dielectric material where the interconnect element of the present invention is to be formed. A second, upper electrode of conductive material is formed over the top of the antifuse material. A portion of the upper electrode located immediately above the antifuse material is fabricated as a fuse material. A passivation layer covers the second electrode and may have an aperture located therein at a location immediately above the antifuse and fuse material. Electrical connections to circuitry incorporating the interconnect element of the present invention are made to the lower and upper electrodes.

Abstract: A method of forming a metal-to-metal antifuse. An antifuse stack 32 is formed comprising a first metal layer 16, an antifuse dielectric layer, and an etchstop layer. The etchstop layer may, for example, comprise an oxide layer 24 and an amorphous silicon layer 28. An antifuse via 44 is etched through an interlevel dielectric layer 36 to the antifuse stack 32. Next, a portion of the etchstop layer at the bottom of via 44 is removed. Finally, a second layer of metal 48 is deposited to fill antifuse via 44 and etched to form the desired interconnections.

Abstract: A protective device for protecting a CMOS circuit included in an internal circuit of an IC against overvoltage applied to a power source wiring and preventing the CMOS from being latched-up by surge voltage due to external noise during a normal operation of the IC is disclosed. An N channel MOS FET and a P channel MOS FET are arranged in parallel to each other and connected between a power source wiring and a ground wiring. Gate electrodes of the N channel and the P channel MOS FETs are connected to the ground wiring and the power source wiring, respectively. Positive overvoltage or surge voltage applied to the power source wiring is relieved by breakdown of drain junctions of both the MOS FETs.

Abstract: An inspecting device inspects the printed state of cream solder by projecting a plurality of light patterns varying in phase onto a printed circuit board printed with cream solder, and processing signals obtained by an image pick-up device for picking up the image on the surface of the printed circuit board using a phase shifting method. A printed position, area, thickness or amount of the cream solder can be detected. By comparing the data thus obtained with reference data, the printed state is evaluated. The printed state of the cream solder may be examined quickly and positively, while a continuous automatic processing can be effected without stopping the mounting process of the printed circuit board in a production line.

Abstract: A semiconductor memory device capable of being electrically written and erased comprising a floating gate, wherein, a silicon nitride, silicon oxinitride, aluminum oxide, or silicon carbide film is incorporated between the drain region and the floating gate.

Abstract: A buried source and drain microwave field effect transistor which provides reduced current density and reduced electric field intensity near the transistor's surface region is disclosed. Operating life and reliability of the transistor are improved by the buried source and drain structure which locates necessary regions of high electrical field intensity and large current density well within the body of the transistor. Comparisons of the buried source and drain field effect transistor with the conventional metal semiconductor field effect transistor are disclosed and include current density, electric field intensity, voltage potentials and I-V curve comparisons. A salient steps fabrication sequence for the buried source and drain field effect transistor is also disclosed.

Abstract: A charge-coupled device having an improved charge-transfer efficiency over a broad temperature range.

Abstract: A back gate bias voltage is applied to the underside of a lateral bipolar transistor to desensitize a portion of the collector-base depletion region to changes in the collector-base voltage. Emitter-collector current flows through an active base region bypassing the portion of the collector-base depletion region that remains sensitive to the collector bias. This allows for a control over the charge in the active base region by the back gate bias, generally independent of the collector-base bias. The transistor is preferably implemented in a silicon-on-insulator-on-silicon (SOIS) configuration, with the back gate bias applied to a doped silicon substrate. The base doping concentration and the thickness of the underlying insulator are preferably selected to produce an inversion layer in the base region adjacent the insulating layer, thereby reducing the collector access resistance.

Abstract: A MOSFET device (100) having a silicon carbide substrate (102). A channel region (106) of a first conductivity type and an epitaxial layer (104) of a second conductivity type are located above the silicon carbide substrate (102). First and second source/drain regions (118), also of the first conductivity type are located directly within the channel region (106). No well region is placed between the first and second source/drain regions (118) and the channel region (106). A gate (120) is separated from the channel region (106) by an insulator layer (110). Insulator layer (110) has a thin portion (114) and a thick portion (116).

Abstract: An optically triggered silicon controlled rectifier (SCR) circuit (20) has a number of semiconductor layers diffused into an N- substrate (21). The layers form an SCR (50) having a P+ anode region (25), a P+ gate region (24), and an N+ cathode region (27). An adjustable base-shunt resistance, in the form of a P- channel depletion mode MOSFET (Q3), connects between the SCR gate region and the cathode region. The MOSFET includes a MOSFET gate region (35), a P+ drain region (24), a P-- channel (26), and a P+ source region (23). The substrate also accommodates a PN photodiode (22, D1) which connects to the MOSFET gate region for switching the MOSFET on and off in response to incident optical radiation (L) thereon. The SCR gate region also comprises photosensitive material. When sufficient optical radiation illuminates the photodiode and the SCR gate region, the MOSFET is turned off and the SCR is triggered, permitting anode-to-cathode current to flow.

Abstract: The present invention provides a semiconductor device including nonvolatile memories and a manufacturing method thereof which have advantages in reliability of writing operation and in erasing time of erasing operation. This semiconductor device comprises a silicon substrate 40, a N type drain 40 formed in the surface of the substrate 36, a N type source 36, a tunnel oxide layer 14 located on the surface of the substrate, and a floating gate located on the tunnel oxide layer 14, having a first portion 55 in side of the source 36 and a second portion 54 in both sides of the drain 40 and the substrate 2, the second portion 54 being of a lower N type dosage than the first portion 55.

Abstract: Ends of inner leads are disposed in the vicinity of a peripheral end of a semiconductor chip and a portion of an insulating film tape is affixed to a main surface of the semiconductor chip by an adhesive while other portions of the insulating film tape are affixed to portions of the inner leads by an adhesive. Electrode pads provided in the main surface of the semiconductor chip are electrically connected to the ends of the corresponding inner leads by bonding wires, and the semiconductor chip, the inner leads, the electrode pads, the insulating film tape and the bonding wires are sealed by a resin molding. A thickness of the insulating film tape is smaller than a height from the main surface of the semiconductor chip to an apex of the bonding wire. Surfaces of the ends of the inner leads connected to the bonding wires are positioned to be lower than the main surface of the semiconductor chip and the inner leads are positioned between the main surface and an opposite surface of the semiconductor chip.

Abstract: In a circuit board having four-layered conductive pattern on which a control circuit is arranged, wiring sub-patterns 133a in the first layer are divided into four areas A1-A3 and A8, for respective sets of circuit parts having same power potentials. Respective sub-patterns belonging to the areas A1-A3 are partially or fully surrounded by wiring sub-patterns PEa1 PEa3 connected to negative power potentials of circuit parts belonging to respective areas, respectively. Similarly, at least part of a wiring patten Pa2 for transmitting an input signal to a semiconductor active element is surrounded by a wiring pattern PEa4. Penetration of electric noises to the wiring patterns for the control circuit, in particular to the wiring pattern for transmitting the input signal to semiconductor element, is decreased to thereby prevent misoperation due to electric noises.

Abstract: A DRAM having a stacked-type capacitor whose structure has a capacitor lower electrode, a first impurity region connected thereto, a third impurity region formed by thermal diffusion of impurities included in the capacitor lower electrode, is disclosed in which an end portion of a third impurity region on the side of gate electrode can be effectively prevented from being extended from an end portion of a first impurity region on the side of gate electrode in the subsequent heat treatment. In the DRAM, an epitaxial silicon layer 8 or a polycrystalline silicon layer 28 having an impurity concentration lower than that of capacitor lower electrode 9 is interposed between capacitor lower electrode 9 and a first impurity region 3b, so that thermal diffusion of impurities in capacitor lower electrode 9 is reduced as compared with the conventional case.

Abstract: The ballast resistance of a semiconductor device is increased without decreasing the figure of merit of the device. The semiconductor device includes an emitter feeder, a first contact coupled to the emitter feeder, a second contact, a resistive medium connected between the first contact and the second contact, an emitter, and a further resistive medium connected between the second contact and the emitter. The ballast resistance of the semiconductor device is increased without decreasing the figure of merit of the device by increasing the distance between the first contact and the second contact.

Abstract: A semiconductor device capable of accommodating a larger semiconductor chip in its package than a comparable conventional device and providing flexibility in the design of the semiconductor chip. An insulating tape includes an opening which receives a plurality of electrode pads disposed on the central part of the top surface of the semiconductor chip. The insulating tape is disposed between the semiconductor chip and inner leads of a lead frame. Circuit pattern traces are present on top of the insulating tape. The inner end of each circuit pattern trace is connected to a corresponding electrode pad with a fine metallic wire, and the outer end of each circuit pattern trace is connected to the corresponding inner lead.

Abstract: High transparency, low-haze, static dissipative cover tapes for two-piece surface mount device packaging tapes are described comprising a metallized backing film, e.g. a polyester film one side of which is coated with a thin layer of aluminum, and a heat-sealable adhesive, e.g. an adhesive comprising a styrenic block elastomer, a tackifier, a plasticizing agent, an antiblock agent, and a conductive material such as nickel flakes. The cover tapes of this invention can be used with carrier tapes made from either polystyrene or polyvinyl chloride, and demonstrate a consistent peel strength of between 30 and 80 grams.

Abstract: A synapse MOS transistor has gate electrodes of different lengths, different widths or different lengths and widths, between one source region and one drain region. Thus, when using the synapse MOS transistor to implement a neural network, the chip area can be greatly reduced.