Abstract: A microelectronic assembly includes a first microelectronic package having a substrate with first and second opposed surfaces and substrate contacts thereon. The first package further includes first and second microelectronic elements, each having element contacts electrically connected with the substrate contacts and being spaced apart from one another on the first surface so as to provide an interconnect area of the first surface between the first and second microelectronic elements. A plurality of package terminals at the second surface are electrically interconnected with the substrate contacts for connecting the package with a component external thereto. A plurality of stack terminals are exposed at the first surface in the interconnect area for connecting the package with a component overlying the first surface of the substrate.

Abstract: A semiconductor package includes a first substrate, a second substrate, a composite solder ball and a first semiconductor component. The composite solder ball includes a core, an encapsulating layer and a barrier layer. The composite solder ball is disposed between the first substrate and the second substrate for electrically connecting the first substrate and the second substrate. The barrier layer is disposed between the core and the encapsulating layer. Wherein a melting point of the barrier layer is higher than a melting point of the core, the melting point of the core is higher than a melting point of the encapsulating layer. The first semiconductor component is disposed between the first substrate and the second substrate.

Abstract: A nonlinear memristor device with a three-layer selector includes a memristor in electrical series with a three-layer selector. The memristor comprises at least one electrically conducting layer and at least one electrically insulating layer. The three-layer selector comprises a three-layer structure selected from the group consisting of XN—XO—XN; XN—YO—ZN; XN—YO—XN; XO—XN—XO; XO—YN—XO; XO—YN—ZO; XO—YO—XO; XO—YO—ZO; XN—YN—ZN; and XN—YN—XN, X represents a compound-forming metal different from Y and Z.

Abstract: Array contacts for semiconductor memories may be formed using a first set of parallel stripe masks and subsequently a second set of parallel stripe masks transverse to the first set. For example, one set of masks may be utilized to etch a dielectric layer, to form parallel spaced trenches. Then the trenches may be filled with a sacrificial material. That sacrificial material may then be masked transversely to its length and etched, for example. The resulting openings may be filled with a metal to form array contacts.

Abstract: The present invention relates to a delayed fluorescence-quantum dot (QD) electroluminescent diode, the delayed fluorescence-quantum dot electroluminescent diode includes an anode, a cathode, and a light emitting layer located between the anode and the cathode, and the light emitting layer includes a QD and a delayed fluorescence material which supplies energy to the QD.

Abstract: A fingerprint sensor package and method are provided. Embodiments include a sensor and a sensor surface material encapsulated within the fingerprint sensor package. An array of electrodes of the sensor are electrically connected using through vias that are located either in the sensor, in connection blocks separated from the sensor, or through connection blocks, or else connected through other connections such as wire bonds. A high voltage die is attached in order to increase the sensitivity of the fingerprint sensor.

Abstract: There is provided a semiconductor multilayer structure, including: an n-type GaN layer; and a p-type GaN layer which is formed on the n-type GaN layer and into which Mg is ion-implanted, and generating an electroluminescence emission having a peak at a photon energy of 3.0 eV or more, by applying a voltage to a pn-junction formed by the n-type GaN layer and the p-type GaN layer.

Abstract: An organic light-emitting diode (OLED) display device is provided having a color emission layer including a plurality of organic light-emitting elements in a first arrangement and an electronics layer. The electronics layer includes a plurality of pixel drive circuits each including an electrode contact. The electronics layer includes a plurality of independently addressable sub-regions each sub-region including an identical pattern of electrode contacts created using a single reticle exposure. Each sub-region is orientated differently within a plane such that the first arrangement of light-emitting elements is electrically connected to the patterned electronics layer.

Abstract: A semiconductor module includes a plurality of semiconductor chips that include gate electrodes on front surfaces, a gate terminal that receives a control signal from outside, and a print substrate. The print substrate includes a gate wiring layer that separates the control signal that is input into the gate terminal and passes the control signal to the gate electrodes of the semiconductor chips, and a cross-sectional area of the gate wiring layer becomes larger as the gate wiring layer gets closer to the gate terminal from the gate electrodes.

Abstract: Semiconductor devices and FinFET devices are disclosed. A substrate has first and second regions. First and second gates are on the substrate in the first region, and a first end sidewall of the first gate is faced to a second end sidewall of the second gate. Third and fourth gates are on the substrate in the second region, and a third end sidewall of the third gate is faced to a fourth end sidewall of the fourth gate. A dielectric layer is between the first and second gates and between the third and fourth gates. The first and second regions have different pattern densities, and an included angle between the substrate and a sidewall of the dielectric layer between the first and second gates is different from an included angle between the substrate and a sidewall of the dielectric layer between the third and fourth gates.

Abstract: A semiconductor device includes a substrate having a first region and a second region, a plurality of first gate structures in the first region, the first gate structures being spaced apart from each other by a first distance, a plurality of second gate structures in the second region, the second gate structures being spaced apart from each other by a second distance, a first spacer on sidewalls of the first gate structures, a dielectric layer on the first spacer, a second spacer on sidewalls of the second gate structures, and a third spacer on the second spacer.

Abstract: A semiconductor package is provided. The semiconductor package includes a package substrate having a first region and a second region defined between an edge of the package substrate and an edge of the first region. A semiconductor die is disposed on the package substrate in the first region. A three-dimensional (3D) antenna is disposed on the package substrate in the second region. The 3D antenna includes a planar structure portion and a bridge or wall structure portion. A molding compound encapsulates the semiconductor die and at least a portion of the 3D antenna. A conductive shielding element is inside the molding compound or partially covers the molding compound. A semiconductor package assembly having the semiconductor package is also provided.

Abstract: A semiconductor device includes line patterns extending in a first direction, and separated from each other in a second direction perpendicular to the first direction. The plurality of line patterns includes at least two line sets, and each of the line sets includes four line patterns consecutively disposed in the second direction and having a length which varies based on location, and the at least two line sets have substantially an identical length.

Abstract: A memory-array is disclosed in which an array of threshold switching devices is constructed having an area per transistor of 2F2. This array of threshold switching devices is suitable for a variety of memory or other applications including PRAM, MRAM, RRAM, FRAM, OPT-RAM and 3-D memory.

Abstract: A system and method for forming a wafer level package. In one example, a substrate used in the wafer level package includes a surface defined by a wafer level package (WLP) region and an external region, and a layer of getter material is disposed on at least a portion of the external region. According to one embodiment, the external region comprises a saw-to-reveal (STR) region of the wafer.

Abstract: A structure includes an electrical interconnection between a first substrate including a plurality of protrusions and a second substrate including a plurality of solder bumps, the plurality of protrusions includes sharp tips that penetrate the plurality of solder bumps, and a permanent electrical interconnection is established by physical contact between the plurality of protrusions and the plurality of solder bumps including a metallurgical joint.

Abstract: An organic light-emitting device includes a first substrate, a light-emitting structure layer, a first electrode layer, a second electrode layer, a second substrate, first conduction members, a second conduction member and protection structures. The light-emitting structure layer is disposed on the first substrate. The first electrode layer is disposed on the light-emitting structure layer and includes pad-like patterns. The second electrode layer is disposed between the light-emitting structure layer and the first substrate. The second substrate is adhered on the first electrode layer and includes a first circuit and a second circuit. The first circuit includes a continuous pattern and contact portions. The first conduction members are connected between the first circuit and the first electrode layer. The second conduction member is connected between the second circuit and the second electrode layer.

Abstract: Provided is an oxide semiconductor thin film transistor with low parasitic capacitance and high reliability. A thin film transistor includes a substrate, an oxide semiconductor layer including a channel region, a source region, and a drain region, a gate insulating film, and a gate electrode. The gate insulating film includes one layer or two layers, at least one of the layers of the gate insulating film is a patterned gate insulating film located at a position separated from the source electrode and the drain electrode. A length of a lower surface of the patterned gate insulating film in a channel length direction is greater than a length of a lower surface of the gate electrode in the channel length direction. The length of the lower surface of the patterned gate insulating film in the channel length direction is greater than a length of the channel region in the channel length direction. The source region and the drain region have a higher hydrogen concentration than the channel region.

Abstract: Transistors and methods of forming the same include forming a fin having an active layer between two sacrificial layers. A dummy gate is formed over the fin. Spacers are formed around the dummy gate. The dummy gate is etched away to form a gap over the fin. Material from the two sacrificial layers is etched away in the gap. A gate stack is formed around the active layer in the gap. Source and drain regions are formed in contact with the active layer.

Abstract: An integrated circuit package with improved reliability and methods for creating the same are disclosed. More specifically, integrated circuit packages are created using one or more sacrificial layers that provide support for ink printed wires prior to package processing, but are removed during package processing. Once each of the sacrificial layers is removed, molding compound is placed around each ink printed wire, which may have a substantially rectangular cross section that can vary in dimension along a length of a given wire. While substantially surrounding each wire in and of itself improves reliability, removing non-conductive paste, fillets, or other adhesive materials also minimizes adhesion issues between the molding compound and those materials, which increases the bond of the molding compound to the package and its components. The net result is a more reliable integrated circuit package that is less susceptible to internal cracking and wire damage.