Abstract: A semiconductor device and its manufacturing method are presented. The semiconductor device includes a collection region, a base region adjacent to the collection region, an emission region adjacent to the base region, and a doped semiconductor layer on the emission region. The width of the doped semiconductor layer is larger than the width of the emission region, a conductive type (e.g., P-type or N-type) of the doped semiconductor layer is the same as a conductive type of the emission region. In this inventive concept, the width of the doped semiconductor layer on the emission region is larger than the width of the emission region, that equivalently increases the width of the emission region, which in turn increases the DC amplification factor (?) and therefore improves the overall performance of the semiconductor device.

Abstract: A stacked III-V semiconductor diode having an n+-layer with a dopant concentration of at least 1019 N/cm3, an n?-layer with a dopant concentration of 1012-1016 N/cm3, a layer thickness of 10-300 microns, a p+-layer with a dopant concentration of 5×1018-5×1020 cm3, with a layer thickness greater than 2 microns, wherein said layers follow one another in the sequence mentioned, each comprising a GaAs compound. The n+-layer or the p+-layer is formed as the substrate and a lower side of the n?-layer is materially bonded with an upper side of the n+-layer, and a doped intermediate layer is arranged between the n?-layer and the p+-layer and materially bonded with an upper side and a lower side.

Abstract: A semiconductor device includes an insulating interlayer disposed on a substrate, a first protection pattern, a first barrier pattern, a first adhesion pattern, and a first conductive pattern. The insulating interlayer includes a via hole and a first trench. The via hole extends through a lower portion of the insulating interlayer. The first trench is connected to the via hole and extends through an upper portion of the insulating interlayer. The first protection pattern covers a lower surface and sidewalls of the via hole and a portion of a lower surface and a lower sidewall of the first trench, and includes a conductive material. The first barrier pattern covers the protection pattern and an upper sidewall of the first trench. The first adhesion pattern covers the first barrier pattern. The first conductive pattern is disposed on the first adhesion pattern, and fills the via hale and the first trench.

Abstract: A method of forming a semiconductor device that includes forming a gate structure over a plurality of fin structures, wherein the gate structure provides a first fill pinch off between the fin structures separated by a first pitch; and forming a material stack of a silicon containing layer, and a dielectric layer over the plurality of fin structures, wherein the dielectric provides a second fill pinch off between fin structures separated by a second pitch. The silicon containing layer is converted into an oxide material layer. The second dielectric that provides the second fill pinch off is removed, and an opening is etched in a remaining silicon containing layer exposed by removing the second fill pinch off. An underlying gate cut region is etched in the gate structure using the opening in the remaining portion of the silicon containing layer.

Abstract: A semiconductor package includes a semiconductor die embedded in a molded package body, leads electrically connected to the die and protruding from a side face of the molded package body, and a recess extending inward from the side face and into a bottom main face of the molded package body to forma single groove. The recess begins below a region of the side face from which the leads protrude, so that this region of the side face is flat and each of the leads exits the molded package body in the same plane. A first subset of the leads is bent inward towards the molded package body and seated in the single groove, to form a first row of leads configured for surface mounting. A second subset of the leads extends outward from the molded package body, to form a second row of leads configured for surface mounting.

Abstract: A novel four-terminal packaged semiconductor device is particularly useful in a 400 volt DC output PFC boost converter circuit. Within the body of the package an NFET die and a fast inverse diode die are mounted such that a bottomside drain electrode of the NFET is electrically coupled via a die attach tab to a bottomside P type anode region of the inverse diode. First terminal T1 is coupled the die attach tab. Second terminal T2 is coupled to the gate of the NFET die. Third terminal T3 is coupled to the source of the NFET die. Fourth terminal T4 is coupled to a topside cathode electrode of the fast inverse diode die. Due to a novel P+ type charge carrier extraction region of the inverse diode die, the packaged device is fast and has a low reverse leakage current in the PFC boost converter circuit application.

Abstract: An array substrate includes: a plurality of pixels including sub-pixels forming a matrix, each sub-pixel including a pair of sub-pixel portions; a plurality of data lines; a plurality of gate lines intersecting with the plurality of data lines; and a plurality of pairs of transistors configured to control the plurality of pairs of sub-pixel portions; wherein: each pair of transistors are disposed adjacent to an intersection between a gate line and a data line, across at least one of the gate line or the data line, and are configured to control a pair of sub-pixel portions in neighboring rows or columns of sub-pixel portions.

Abstract: A semiconductor package includes a substrate, a first electronic component, a first conductive layer, a first pillar layer and a first package body. The first electronic component is disposed on the substrate. The first pillar layer connects the first conductive layer and the substrate. The first package body encapsulates the first conductive layer, the first pillar layer and the first electronic component. The first conductive layer is embedded in the first package body.

Abstract: A group III nitride semiconductor light emitting element includes an active layer between an n-type layer and a p-type layer, having an n-electrode on the n-type layer and a p-electrode on the p-type layer, and having a mesa structure containing the p-type layer. In a top view of the group III nitride semiconductor light emitting element, the distance between a portion of an end part of the mesa structure and the periphery of the p-electrode is ? or more of a diffusion length Ls.

Abstract: In some examples, an electrostatic discharge (ESD) device includes a substrate layer, a transition layer positioned on the substrate layer, a plurality of superlattice layers on the transition layer and including at least two doped superlattice layers. The ESD device further includes a plurality of doped contact structures extending from the transition layer to a surface of an outermost layer of the plurality of superlattice layers, where a first of the plurality of doped contact structures comprises an anode and a second of the plurality of doped contact structures comprises a cathode, where the plurality of doped contact structures are to generate a zero capacitance ESD device.

Abstract: A method and apparatus for soldering a chip (1a) to a substrate (3). A chip carrier (8) is provided between a flash lamp (5) and the substrate (3). The chip (1a) is attached to the chip carrier (8) on a side of the chip carrier (8) facing the substrate (3). A solder material (2) is disposed between the chip (1a) and the substrate (3). The flash lamp (5) generates a light pulse (6) for heating the chip (1a). The heating of the chip (1a) causes the chip (1a) to be released from the chip carrier (8) towards the substrate (3). The solder material (2) is at least partially melted by contact with the heated chip (1a) for attaching the chip (1a) to the substrate (3).

Abstract: A method for etching a magnetic tunneling junction (MTJ) structure is described. A stack of MTJ layers is provided on a bottom electrode. A top electrode is provided on the MTJ stack. The top electrode is patterned. Thereafter, the MTJ stack not covered by the patterned top electrode is oxidized or nitridized. Then, the MTJ stack is patterned to form a MTJ device wherein any sidewall re-deposition formed on sidewalls of the MTJ device is non-conductive and wherein some of the dielectric layer remains on horizontal surfaces of the bottom electrode.

Abstract: A wiring is formed over a semiconductor substrate via an interlayer insulation film, and another interlayer insulation film is formed over the interlayer insulation film so as to cover the wiring, and a pad is formed over the another interlayer insulation film. Over the another interlayer insulation film, a layered film having an opening portion in which a pad is exposed is formed, and a redistribution wiring electrically connected to the pad is formed over the layered film and over the pad exposed in the opening portion. An end portion of the wiring is located below a connection region between the pad and the redistribution wiring. The wiring has a plurality of opening portions formed therein, and at least a part of the plurality of opening portions overlaps with the connection region in plan view.

Abstract: A display panel including first and second sub pixel electrodes, a first light emitting unit, first and second charge generation layers, a second light emitting unit, and an upper electrode. The first light emitting unit is provided with a first contact hole. The first charge generation layer includes a first contact part being in the first contact hole and coupled to a portion of the first sub pixel electrode exposed by the first contact hole, and a first extension part extending from the first contact part and being on the first light emitting unit. The second charge generation layer and the second light emitting unit are provided with a second contact hole. The upper electrode includes a first upper electrode part being in the second contact hole and coupled to a second contact part of the second charge generation layer exposed by the second contact hole.

Abstract: A method of forming a passivation layer on an integrated circuit (IC) chip including a device layer on a substrate. The method may include forming a crosslinked precursor passivation layer on the IC chip, and curing the crosslinked precursor passivation layer at a first temperature to form a passivation layer. The method may further include maintaining the device layer at a second, lower temperature during the curing of the crosslinked precursor passivation layer. Maintaining the device layer at the second, lower temperature may mitigate and/or prevent damage to the device layer conventionally caused by exposure to the first temperature during the curing of the crosslinked precursor passivation layer. The method may include using a curing system including a chamber, an infrared source for controlling the first temperature for curing the crosslinked precursor passivation layer, and a temperature control device for controlling the second, lower temperature of the device layer.

Abstract: A semiconductor device is provided. The semiconductor device includes a n? type layer disposed at a first surface of a n+ type silicon carbide substrate and a trench disposed at the n? type layer. Additionally, a first gate electrode and a second gate electrode are disposed in the trench and separated from each other. A source electrode is insulated from the first gate electrode and the second gate electrode. Further, the semiconductor includes a drain electrode that is disposed at a second surface of the n+ type silicon carbide substrate, a first channel disposed adjacent to a side surface of the trench and a second channel disposed under the lower surface of the trench. The first channel and the second channel are separated from each other.

Abstract: A vertical transistor device includes a vertically-oriented channel semiconductor (VOCS) structure positioned above a substrate and a first bottom spacer positioned above the substrate adjacent the VOCS structure. The first bottom spacer extends around less than an entirety of a perimeter of the VOCS structure. A gate structure is positioned around the VOCS structure. Only a portion of the gate structure is positioned vertically above the first bottom spacer so as to thereby define an air gap that is positioned under the gate structure. The air gap extends around a majority of a perimeter of the VOCS structure and a second bottom spacer positioned above the substrate. An upper portion of the second bottom spacer contacts a material formed around the VOCS structure so as to seal the air gap. The second bottom spacer has a vertical thickness that is greater than a vertical thickness of the air gap.

Abstract: A system and method for providing a conductive line is provided. In an embodiment the conductive line is formed by forming two passivation layers, wherein each passivation layer is independently patterned. Once formed, a seed layer is deposited into the two passivation layers, and a conductive material is deposited to fill and overfill the patterns within the two passivation layers. A planarization process such as a chemical mechanical polish may then be utilized in order to remove excess conductive material and form the conductive lines within the two passivation layers.

Abstract: An image sensor includes a plurality of photodiodes disposed in a semiconductor material, and a through-semiconductor-via coupled to a negative voltage source. Deep trench isolation structures are disposed between individual photodiodes in the plurality of photodiodes to electrically and optically isolate the individual photodiodes. The deep trench isolation structures include a conductive material coupled to the through-semiconductor-via, and a dielectric material disposed on sidewalls of the deep trench isolation structures between the semiconductor material and the conductive material.

Abstract: A method for co-integrating wimpy and nominal devices includes growing source/drain regions on semiconductor material adjacent to a gate structure to form device structures with a non-electrically active material. Selected device structures are masked with a block mask. Unmasked device structures are selectively annealed to increase electrical activity of the non-electrically active material to adjust a threshold voltage between the selected device structures and the unmasked device structures.