Abstract: In a method for manufacturing a silicon carbide semiconductor device having a JFET, a trench is formed in a semiconductor substrate, and a channel layer and a second gate region are formed on an inner wall of the trench. The channel layer and the second gate region are planarized to expose a source region. A first recess deeper than a thickness of the source region is formed on both leading ends of the trench, and an activation annealing process of 1300° C. or higher is conducted in an inert gas atmosphere. A first conductivity type layer formed by the annealing process to cover a corner which is a boundary between a bottom and a side of the first recess is removed.

Abstract: Disclosed herein is a method of assembling an array of light emitting diode (LED) dies on a substrate comprising: positioning dies in fluid; exposing the dies to a magnetic force to attract the dies onto magnets that are arranged at pre-determined locations either on or near the substrate; and forming permanent connections between the dies and the substrate thereby constituting an array of LED dies on a substrate.

Abstract: In a method of manufacturing a silicon carbide semiconductor device having a JFET, after forming a second concave portion configuring a second mesa portion, a thickness of a source region is detected by observing a pn junction between the source region and a first gate region exposed by the second concave portion. Selective etching is conducted on the basis of the detection result to form a first concave portion deeper than the thickness of the source region and configuring a first mesa portion inside of an outer peripheral region in an outer periphery of a cell region, and to make the second concave portion deeper than the second gate region.

Abstract: Vacuum processing, such as a backside metallization (BSM) deposition, is performed on a taped wafer after a gas escape path is formed between a base film of the tape and the wafer frontside surface following backgrind. Venting provided by the gas escape path reduces formation of bubbles under the tape. The gas escape path may be provided, for example, by a selective pre-curing of tape adhesive, to breach an edge seal and place the wafer frontside surface internal to the edge seal in fluid communication with an environment external to the edge seal. With the thinned wafer supported by the pre-cured tape, BSM is then deposited while the wafer and tape are cooled, for example, via a cooled electrostatic chuck.

Abstract: A method of manufacturing multiple light emitting diode lighting assemblies each having a different initial light output is provided. A first heat sink is manufactured and a first platform assembly with a plurality of light emitting diodes is formed with an automated device. The automated device selects a first predetermined lumen output. A second heat sink is then manufactured using the same manufacturing process, and a second platform assembly with a plurality of light emitting diodes is formed with the automated device. During this time, the automated device selects a second predetermined lumen output based on information inputted into the automated device.

Abstract: A manufacturing method of pixel structure includes forming a first conductive layer on a substrate and forming a first insulation layer thereon; forming a second conductive layer on the first insulation layer; forming a second insulation layer on the second conductive layer; forming a semiconductor layer on the second insulation layer above the gate; forming a third conductive layer on the second insulation layer, wherein the gate, the semiconductor layer, the source, and the drain together constitute a thin film transistor, and the first electrode, the second electrode, and the third electrode together constitute a capacitor; forming a third insulation layer on the third conductive layer; and forming a pixel electrode on the third insulation layer, the pixel electrode being electrically connected to the drain.

Abstract: A method includes aligning a top package to a bottom package using an alignment mark in the bottom package, and placing the top package over the bottom package, wherein the top package is aligned to the bottom package after the placing the top package over the bottom package. A reflow is then performed to bond the top package to the bottom package.

Abstract: An integrated circuit features a FET, an UTBOX layer plumb with the FET, an underlayer ground plane with first doping plumb with the FET's gate and channel, first and second underlayer semiconducting elements, both plumb with the drain or source, electrodes in contact respectively with the ground plane and with the first element, one having first doping and being connected to a first voltage, the other having the first doping and connected to a second bias voltage different from the first, a semiconducting well having the second doping and plumb with the first ground plane and both elements, a first trench isolating the first FET from other components of the integrated circuit and extending through the layer into the well, and second and third trenches isolating the FET from the electrodes, and extending to a depth less than a plane/well interface.

Abstract: A semiconductor device, in which the generation of interface states in the interface region between a nitride semiconductor layer and an aluminum oxide layer is suppressed, includes a first nitride semiconductor layer and an aluminum oxide layer. The first nitride semiconductor layer includes Ga. The aluminum oxide layer directly contacts the upper surface of the first nitride semiconductor layer, and includes H (hydrogen) atoms at least within a defined region from the interface with the first nitride semiconductor layer. In addition, the peak value of an H atom concentration in the above region is in a range of 1×1020 cm?3 to 5×1021 cm?3.

Abstract: System and method of manufacturing an integrated circuit packaging system using transferable trace lead frame. A lead frame is provided having lower metal contacts. A masking layer can be formed on an upper surface of the lead frame for protection and shielding purposes. Routing layer and conductive lands may subsequently be formed by shaping the lead frame, along with bottom encapsulation. The masking layer may subsequently be removed for additional processing steps including connecting an integrated circuit die to the upper surface of the lead frame.

Abstract: Provided is a light-emitting element with a small degree of luminance degradation with accumulation of driving time (a long-lifetime light-emitting element). Provided is a light-emitting element in which a light-emitting layer with an electron-transport property is formed with a plurality of layers containing different host materials. Further, the LUMO level of a host material on an anode side is higher than the LUMO level of a host material on a cathode side. With such a structure, it is possible to provide a long-lifetime light-emitting element with little degradation in luminance with accumulation of driving time.

Abstract: A plurality of gate structures are formed straddling nFET semiconductor fins and pFET semiconductor fins which extend upwards from a surface of a semiconductor substrate. A boron-doped silicon germanium alloy material is epitaxially grown from exposed surfaces of both the nFET semiconductor fins and the pFET semiconductor fins not protected by the gate structures. An anneal is then performed. During the anneal, silicon and germanium from the boron-doped silicon germanium alloy material diffuse into the nFET semiconductor fins and act as an n-type dopant forming a junction in the nFET semiconductor fins. Since boron is a Group IIIA element it does not have any adverse effect. During the same anneal, boron from the boron-doped silicon germanium alloy material will diffuse into the pFET semiconductor fins to form a junction therein.

Abstract: A chip includes a semiconductor substrate, and a first N-type Metal Oxide Semiconductor Field Effect Transistor (NMOSFET) at a surface of the semiconductor substrate. The first NMOSFET includes a gate stack over the semiconductor substrate, a source/drain region adjacent to the gate stack, and a dislocation plane having a portion in the source/drain region. The chip further includes a second NMOSFET at the surface of the semiconductor substrate, wherein the second NMOSFET is free from dislocation planes.

Abstract: A non-volatile memory cell that includes a semiconductor substrate; a coupling capacitor located in a first active region of the semiconductor substrate; and at a shared second active region of the semiconductor substrate, a sense transistor and a tunnelling capacitor configured in parallel with the gate of the sense transistor. The coupling capacitor, sense transistor and tunnelling capacitor share a common floating gate electrode and the sense transistor includes source and drain regions arranged such that the tunnelling capacitor is defined by an overlap between the floating gate electrode and the drain region of the sense transistor. Word-line contacts may be to a separate active area from the coupling capacitor. This and/or other features can help to reduce Frenkel-Poole conduction.

Abstract: One method disclosed herein includes forming a patterned mask layer above a surface of a semiconductor substrate, performing at least one etching process through the patterned mask layer to define a plurality of intersecting ridges that define a ridged surface in the substrate, and forming a Group III-V material on the ridged surface of the substrate. An illustrative device disclosed herein includes a Group IV substrate having a ridged surface comprised of a plurality of intersecting ridges and a Group III-V material layer positioned on the ridged surface of the Group IV substrate.

Abstract: A method of processing a semiconductor assembly is presented. The method includes fabricating a photovoltaic module including a semiconductor assembly. The fabrication step includes performing an efficiency enhancement treatment on the semiconductor assembly, wherein the efficiency enhancement treatment includes light soaking the semiconductor assembly, and heating the semiconductor assembly. The semiconductor assembly includes a window layer having an average thickness less than about 80 nanometers, wherein the window layer includes cadmium and sulfur. A related system is also presented.

Abstract: The invention provides a semiconductor package with a through silicon via (TSV) interconnect and a method for fabricating the same. An exemplary embodiment of the semiconductor package with a TSV interconnect includes a semiconductor substrate. A through hole is formed through the semiconductor substrate. A TSV interconnect is disposed in a through hole. A conductive layer lines a sidewall of the through hole, surrounding the TSV interconnect.

Abstract: Thermosetting resin compositions useful for liquid compression molding encapsulation of a silicon wafer are provided. The so-encapsulated silicon wafers offer improved resistance to warpage, compared to unencapsulated wafers or wafers encapsulated with known encapsulation materials.

Abstract: Disclosed herein is a method of assembling an array of light emitting diode (LED) dies on a substrate comprising: positioning dies in fluid; exposing the dies to a magnetic force to attract the dies onto magnets that are arranged at pre-determined locations either on or near the substrate; and forming permanent connections between the dies and the substrate thereby constituting an array of LED dies on a substrate.

Abstract: Disclosed are chalcogenide-containing precursors for use in the manufacture of semiconductor, photovoltaic, LCD-TFT1 or flat panel type devices. Also disclosed are methods of synthesizing the chalcogenide-containing precursors and vapor deposition methods, preferably thermal ALD, using the chalcogenide-containing precursors to form chalcogenide-containing films.