Patents by Inventor An-Cheng Chang

An-Cheng Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11961892
    Abstract: A semiconductor device and methods of forming the same are disclosed. The semiconductor device includes a substrate, first and second source/drain (S/D) regions, a channel between the first and second S/D regions, a gate engaging the channel, and a contact feature connecting to the first S/D region. The contact feature includes first and second contact layers. The first contact layer has a conformal cross-sectional profile and is in contact with the first S/D region on at least two sides thereof. In embodiments, the first contact layer is in direct contact with three or four sides of the first S/D region so as to increase the contact area. The first contact layer includes one of a semiconductor-metal alloy, an III-V semiconductor, and germanium.
    Type: Grant
    Filed: June 10, 2022
    Date of Patent: April 16, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Carlos H. Diaz, Chung-Cheng Wu, Chia-Hao Chang, Chih-Hao Wang, Jean-Pierre Colinge, Chun-Hsiung Lin, Wai-Yi Lien, Ying-Keung Leung
  • Publication number: 20240122078
    Abstract: A semiconductor memory device includes a substrate having a conductor region thereon, an interlayer dielectric layer on the substrate, and a conductive via electrically connected to the conductor region. The conductive via has a lower portion embedded in the interlayer dielectric layer and an upper portion protruding from a top surface of the interlayer dielectric layer. The upper portion has a rounded top surface. A storage structure conformally covers the rounded top surface.
    Type: Application
    Filed: December 18, 2023
    Publication date: April 11, 2024
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Chia-Chang Hsu, Tang-Chun Weng, Cheng-Yi Lin, Yung-Shen Chen, Chia-Hung Lin
  • Publication number: 20240115616
    Abstract: The present disclosure provides a method for treating liver cirrhosis by using a composition including mesenchymal stem cells, extracellular vesicles produced by the mesenchymal stem cells, and growth factors. The composition of the present disclosure achieves the effect of treating liver cirrhosis through various efficacy experiments.
    Type: Application
    Filed: October 4, 2023
    Publication date: April 11, 2024
    Inventors: Po-Cheng Lin, Pi-Chun Huang, Zih-Han Hong, Ming-Hsi Chuang, Yi-Chun Lin, Chia-Hsin Lee, Chun-Hung Chen, Chao-Liang Chang, Kai-Ling Zhang
  • Publication number: 20240119346
    Abstract: There is provided a computer implemented method, system and device for automatically generating a machine learning model for forecasting a likelihood of compromise in one or more transaction devices and subsequently triggering performing an action on one or more related computing devices based on a potentially compromised transaction device.
    Type: Application
    Filed: October 7, 2022
    Publication date: April 11, 2024
    Inventors: CHENG CHANG, HIMANSHU RAI, YIFAN WANG, MOHSEN RAZA, GABRIEL KABO TSANG, MAKSIMS VOLKOVS
  • Patent number: 11952320
    Abstract: An aqueous solution (20) containing carbohydrate for generating smoke consists of 91.9-98.95 wt % of pure water, 1-8 wt % of carbohydrate, and 0.05-0.1 wt % of a water soluble aromatic substance of orange flavor. A method for generating smoke includes preparing an aqueous solution (20) including 91.9-98.95 wt % of pure water, 1-8 wt % of carbohydrate, and 0.05-0.1 wt % of a water soluble aromatic substance of orange flavor; and vibrating the aqueous solution (20) at a high frequency, causing gradual atomization from a surface of the aqueous solution (20) to form droplets containing the carbohydrate and having a diameter in a range of 6-20 ?m.
    Type: Grant
    Filed: January 15, 2021
    Date of Patent: April 9, 2024
    Assignee: NOVACORP INC.
    Inventor: Ming-Cheng Chang
  • Patent number: 11952662
    Abstract: Disclosed is a powder atomic layer deposition equipment with a quick release function, comprising a vacuum chamber, a shaft sealing device, and a driving unit connected to the shaft sealing device. The vacuum chamber is connected to the shaft sealing device, and an enclosed space is formed between the vacuum chamber and the shaft sealing device. At least one air extraction line is located in the shaft sealing device and fluidly connected to the enclosed space, the air extraction line being used in pumping gas out from the enclosed space to fix the vacuum chamber to the shaft sealing device so that the drive unit rotates the vacuum chamber via the shaft sealing device to facilitate the formation of a uniform thin film on powder surface. When the pumping stops, the vacuum chamber can be quickly released from the shaft sealing device to improve the process efficiency and convenience of use.
    Type: Grant
    Filed: October 18, 2021
    Date of Patent: April 9, 2024
    Assignee: SKY TECH INC.
    Inventors: Jing-Cheng Lin, Jung-Hua Chang, Chia-Cheng Ku
  • Patent number: 11953940
    Abstract: A display apparatus includes a light-transmitting structural plate, some optical microscopic structures, an optical film, a base plate and some light emitting elements. The light-transmitting structural plate has a first side and a second side opposite to each other. The optical microscopic structures are regularly arrayed and formed on the first side or the second side. The optical microscopic structure has an inclined surface connecting at a connecting line and forming an angle ranging between 30 degrees and 150 degrees with a corresponding inclined surface of an adjacent one of the optical microscopic structures. The optical film is located on the first side. The base plate is separated from the second side by a space. The light emitting elements are located inside the space and disposed on the base plate. The light emitting elements respectively emit a light ray to the light-transmitting structural plate.
    Type: Grant
    Filed: October 7, 2020
    Date of Patent: April 9, 2024
    Assignee: DARWIN PRECISIONS CORPORATION
    Inventors: Yu-Cheng Chang, Shu-Ching Peng, Yu-Ming Huang
  • Patent number: 11953448
    Abstract: A method for defect inspection includes receiving a substrate having a plurality of patterns; obtaining a gray scale image of the substrate, wherein the gray scale image includes a plurality of regions, and each of the regions has a gray scale value; comparing the gray scale value of each region to a gray scale references to define a first group, a second group and an Nth group, wherein each of the first group, the second group and the Nth group has at least a region; performing a calculation to obtain a score; and when the score is greater than a value, the substrate is determined to have an ESD defect, and when the score is less than the value, the substrate is determined to be free of the ESD defect.
    Type: Grant
    Filed: April 7, 2020
    Date of Patent: April 9, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Tsun-Cheng Tang, Hao-Ming Chang, Sheng-Chang Hsu, Cheng-Ming Lin
  • Patent number: 11955191
    Abstract: A memory device and a method of operating a memory device are disclosed. In one aspect, the memory device includes a plurality of non-volatile memory cells, each of the plurality of non-volatile memory cells is operatively coupled to a word line, a gate control line, and a bit line. Each of the plurality of non-volatile memory cells comprises a first transistor, a second transistor, a first diode-connected transistor, and a capacitor. The first transistor, second transistor, first diode-connected transistor are coupled in series, with the capacitor having a first terminal connected to a common node between the first diode-connected transistor and the second transistor.
    Type: Grant
    Filed: June 2, 2023
    Date of Patent: April 9, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Perng-Fei Yuh, Tung-Cheng Chang, Gu-Huan Li, Chia-En Huang, Chun-Ying Lee, Yih Wang
  • Patent number: 11955397
    Abstract: A semiconductor structure is provided. The semiconductor structure includes a substrate, a channel layer, a barrier layer, a compound semiconductor layer, a gate electrode, and a stack of dielectric layers. The channel layer is disposed on the substrate. The barrier layer is disposed on the channel layer. The compound semiconductor layer is disposed on the barrier layer. The gate electrode is disposed on the compound semiconductor layer. The stack of dielectric layers is disposed on the gate electrode. The stack of dielectric layers includes layers having different etching rates.
    Type: Grant
    Filed: November 9, 2020
    Date of Patent: April 9, 2024
    Assignee: Vanguard International Semiconductor Corporation
    Inventors: Shin-Cheng Lin, Cheng-Wei Chou, Ting-En Hsieh, Yi-Han Huang, Kwang-Ming Lin, Yung-Fong Lin, Cheng-Tao Chou, Chi-Fu Lee, Chia-Lin Chen, Shu-Wen Chang
  • Patent number: 11955528
    Abstract: Semiconductor devices, FinFET devices and methods of forming the same are disclosed. One of the semiconductor devices includes a substrate and a gate strip disposed over the substrate. The gate strip includes a high-k layer disposed over the substrate, an N-type work function metal layer disposed over the high-k layer, and a barrier layer disposed over the N-type work function metal layer. The barrier layer includes at least one first film containing TiAlN, TaAlN or AlN.
    Type: Grant
    Filed: October 11, 2022
    Date of Patent: April 9, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hsin-Yi Lee, Cheng-Lung Hung, Weng Chang, Chi-On Chui
  • Publication number: 20240110978
    Abstract: A semiconductor chip includes a physical layer and a processing circuit. The physical layer includes an input/output circuit, at least one sequence checking circuit and at least one signal transmission path, wherein the at least one sequence checking circuit is configured to generate at least one test result signal according to a clock signal transmitted through the input/output circuit and at least one test data signal transmitted through the at least one signal transmission path. The processing circuit is electrically coupled to the physical layer and is configured to determine an operation status of the at least one signal transmission path according to a voltage level of the at least one test result signal.
    Type: Application
    Filed: March 27, 2023
    Publication date: April 4, 2024
    Inventors: Hung-Yi CHANG, Bi-Yang LI, Shih-Cheng KAO
  • Publication number: 20240113199
    Abstract: A method of manufacturing a semiconductor device includes forming a gate electrode structure over a channel region, wherein the gate electrode structure includes a gate dielectric layer disposed over the first channel region, a gate electrode disposed over the gate dielectric layer, and insulating spacers disposed over opposing sidewalls of the gate electrode, wherein the gate dielectric layer is disposed over opposing sidewalls of the gate electrode. An interlayer dielectric layer is formed over opposing sidewalls of the insulating spacers. The insulating spacers are removed from an upper portion of the opposing sidewalls of the gate electrode to form trenches between the opposing sidewalls of the upper portion of the gate electrode and the interlayer dielectric layer, and the trenches are filled with an insulating material.
    Type: Application
    Filed: February 7, 2023
    Publication date: April 4, 2024
    Inventors: Jia-Chuan YOU, Chia-Hao Chang, Kuo-Cheng Chiang, Chin-Hao Wang
  • Publication number: 20240113183
    Abstract: Methods for tuning effective work functions of gate electrodes in semiconductor devices and semiconductor devices formed by the same are disclosed. In an embodiment, a semiconductor device includes a channel region over a semiconductor substrate; a gate dielectric layer over the channel region; and a gate electrode over the gate dielectric layer, the gate electrode including a first work function metal layer over the gate dielectric layer, the first work function metal layer including aluminum (Al); a first work function tuning layer over the first work function metal layer, the first work function tuning layer including aluminum tungsten (AlW); and a fill material over the first work function tuning layer.
    Type: Application
    Filed: November 30, 2023
    Publication date: April 4, 2024
    Inventors: Hsin-Yi Lee, Cheng-Lung Hung, Weng Chang, Chi On Chui
  • Publication number: 20240113080
    Abstract: A semiconductor device and a method of manufacture are provided. In particular, a semiconductor device using blocks, e.g., discrete connection blocks, having through vias and/or integrated passive devices formed therein are provided. Embodiments such as those disclosed herein may be utilized in PoP applications. In an embodiment, the semiconductor device includes a die and a connection block encased in a molding compound. Interconnection layers may be formed on surfaces of the die, the connection block and the molding compound. One or more dies and/or packages may be attached to the interconnection layers.
    Type: Application
    Filed: November 30, 2023
    Publication date: April 4, 2024
    Inventors: Ching-Wen Hsiao, Chen-Shien Chen, Wei Sen Chang, Shou-Cheng Hu
  • Patent number: 11946733
    Abstract: An image rendering device and an image rendering method are disclosed. For the elements of the image rendering device, a first sensor and a second sensor are configured to sense a target object in a two-dimensional (2D) mode and three-dimensional (3D) mode to generate a first surface-color-signal, a first 3D-depth-signal, a second surface-color-signal and a second 3D-depth-signal respectively. An IR projector is configured to generate an IR-dot-pattern. A processor is configured to control the IR projector to project the IR-dot-pattern on the target object in the 3D mode, and configured to process the first surface-color-signal, the second surface-color-signal, the first 3D-depth-signal and the second 3D-depth-signal to obtain a color 3D model of the target object.
    Type: Grant
    Filed: October 14, 2021
    Date of Patent: April 2, 2024
    Assignee: EYS3D MICROELECTRONICS CO.
    Inventors: Kuan-Cheng Chung, Tsung-Yi Huang, Shi-Fan Chang
  • Patent number: 11948835
    Abstract: A device comprises a first metal structure, a dielectric structure, a dielectric residue, and a second metal structure. The dielectric structure is over the first metal structure. The dielectric structure has a stepped sidewall structure. The stepped sidewall structure comprises a lower sidewall and an upper sidewall laterally set back from the lower sidewall. The dielectric residue is embedded in a recessed region in the lower sidewall of the stepped sidewall structure of the dielectric structure. The second metal structure extends through the dielectric structure to the first metal structure.
    Type: Grant
    Filed: April 14, 2021
    Date of Patent: April 2, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Che-Cheng Chang, Chih-Han Lin
  • Patent number: 11945383
    Abstract: A control system of a travelling system includes a directional controller, a first sensor, a second sensor, an image-capturing module and a preprocessor. The first sensor is disposed on a reference position. The second sensor and the image-capturing module are disposed on the directional controller. The preprocessor compares a first directional data from the first sensor and a second directional data from the second sensor to obtain a difference value, and provides a photographing parameter to the image-capturing module.
    Type: Grant
    Filed: November 1, 2021
    Date of Patent: April 2, 2024
    Assignee: ABILITY ENTERPRISE CO., LTD.
    Inventor: Cheng-Chang Wu
  • Patent number: 11948895
    Abstract: A semiconductor package structure includes a substrate having a wiring structure. A first semiconductor die is disposed over the substrate and is electrically coupled to the wiring structure. A second semiconductor die is disposed over the substrate and is electrically coupled to the wiring structure, wherein the first semiconductor die and the second semiconductor die are arranged side-by-side. Holes are formed on a surface of the substrate, wherein the holes are located within a projection of the first semiconductor die or the second semiconductor die on the substrate. Further, a molding material surrounds the first semiconductor die and the second semiconductor die, and surfaces of the first semiconductor die and the second semiconductor die facing away from the substrate are exposed by the molding material.
    Type: Grant
    Filed: July 4, 2022
    Date of Patent: April 2, 2024
    Assignee: MEDIATEK INC.
    Inventors: Tzu-Hung Lin, Chia-Cheng Chang, I-Hsuan Peng, Nai-Wei Liu
  • Patent number: 11944392
    Abstract: A method for intraoperative planning and facilitating a revision arthroplasty procedure includes displaying a virtual model of a bone, capturing positions of a tracked probe as the tracked probe contacts points at a perimeter of a primary implant component coupled to the bone, generating a virtual representation of an interface between the primary implant component and the virtual model of the bone using the positions of the tracked probe, planning a bone resection using the virtual representation of the interface, and guiding execution of the bone resection.
    Type: Grant
    Filed: July 28, 2021
    Date of Patent: April 2, 2024
    Assignee: MAKO Surgical Corp.
    Inventors: Viktor Krebs, Hyosig Kang, Snehal Kasodekar, Matt Harrow, Jienan Ding, Ta-Cheng Chang, Min Wu, Jean Gonzalez, Peter Ebbitt