Abstract: A chip package including a substrate is provided. The substrate has a first surface and a second surface opposite thereto. The substrate includes a sensing or device region which is adjacent to the first surface. A recess is in the substrate. The recess extends from the second surface towards the first surface, and vertically overlaps the sensing or device region. A redistribution layer is electrically connected to the sensing or device region, and extends from the second surface into the recess. A method of forming the chip package is also provided.

Abstract: A manufacturing method of a semiconductor structure includes the following steps. A first isolation layer is formed on a first surface of a wafer substrate. A conductive pad is formed on the first isolation layer. A hollow region through the first surface and a second surface of the wafer substrate is formed, such that the first isolation layer is exposed through the hollow region. A laser etching treatment is performed on the first isolation layer that is exposed through the hollow region, such that a first opening is formed in the first isolation layer, and a concave portion exposed through the first opening is formed in the conductive pad.

Abstract: An embodiment of this invention provides a separation apparatus for separating a stacked article, such as a semiconductor chip package with sensing functions, comprising a substrate and a cap layer formed on the substrate. The separation apparatus comprises a vacuum nozzle head including a suction pad having a top surface and a bottom surface, a through hole penetrating the top surface and the bottom surface of the suction pad, and a hollow vacuum pipe connecting the through hole to a vacuum pump; a stage positing under the vacuum nozzle head and substantially aligning with the suction pad; a control means coupling to the vacuum nozzle head to lift upward or lower down the vacuum nozzle head; and a first cutter comprising a first cutting body and a first knife connecting to the first cutting body.

Abstract: A chip package includes a chip, an adhesive layer, and a dam element. The chip has a sensing area, a first surface, and a second surface that is opposite to the first surface. The sensing area is located on the first surface. The adhesive layer covers the first surface of the chip. The dam element is located on the adhesive layer and surrounds the sensing area. The thickness of the dam element is in a range from 20 ?m to 750 ?m, and the wall surface of the dam element surrounding the sensing area is a rough surface.

Abstract: A chip package includes a substrate, an isolation layer, a redistribution layer, a passivation layer, a first conductive layer, a second conductive layer, and a conductive structure. The isolation layer is located on the substrate. The redistribution layer is located on the isolation layer. The passivation layer is located on the isolation layer and the redistribution layer. The passivation layer has an opening, a wall surface that surrounds the opening, and a surface that faces away from the isolation layer. A portion of the redistribution layer is exposed through the opening. The first conductive layer is located on the redistribution layer that is in the opening, and extends to the wall surface and the surface of the passivation layer. The second conductive layer covers the first conductive layer. The conductive structure is located on the second conductive layer and protrudes from the passivation layer.

Abstract: A chip package includes a chip, a first adhesive layer, a second adhesive layer, and a protection cap. The chip has a sensing area, a first surface, a second surface that is opposite to the first surface, and a side surface adjacent to the first and second surfaces. The sensing area is located on the first surface. The first adhesive layer covers the first surface of the chip. The second adhesive layer is located on the first adhesive layer, such that the first adhesive layer is between the first surface and the second adhesive layer. The protection cap has a bottom board and a sidewall that surrounds the bottom board. The bottom board covers the second adhesive layer, and the sidewall covers the side surface of the chip.

Abstract: An optical cover plate for image sensor package includes a transparent substrate, at least an annular dam structure, and a barrier layer. The annular dam structure is disposed on the transparent substrate and encompasses a light-receiving area. The barrier layer conformally covers at least a sidewall of the annular dam structure. A method of manufacturing the optical cover plate, an image sensor package and fabrication method thereof are also disclosed.

Abstract: A chip package includes a chip, a dam element, and a height-increasing element. The chip has an image sensing area, a first surface, and a second surface opposite to the first surface. The image sensing area is located on the first surface of the chip. The dam element is located on the first surface of the chip and surrounds the image sensing area. The height-increasing element is located on the dam element, such that the dam element is between the height-increasing element and the chip.

Abstract: A method for forming a chip package is provided. The method includes providing a substrate and a capping layer, wherein the substrate has a sensing device therein adjacent to a surface of the substrate. The capping layer is attached to the surface of the substrate by an adhesive layer, wherein the adhesive layer covers the sensing device. A dicing process is performed on the substrate, the adhesive layer, and the capping layer along a direction to form individual chip packages.

Abstract: A chip package including a semiconductor substrate is provided. A recess is in the semiconductor substrate and adjoins a side edge of the semiconductor substrate, wherein the semiconductor substrate has at least one spacer protruding from the bottom of the recess. A conducting layer is disposed on the semiconductor substrate and extends into the recess.

Abstract: A lock is provided, including a shell body, a lock main body and an abutting assembly. The shell body is for being fixedly disposed on an object. The lock main body has a first end and a second end which is opposite to the first end, the second end has a first engaging portion, the lock main body is releasably and rotatably inserted into the shell body along a first direction, and the first direction is defined as a connection between the first end and the second end. The abutting assembly has a base, a second engaging portion, which is connected to the base and positionably engaged with the first engaging portion, and a lock plate which is connected to the base and driven by the lock main body, and the lock plate is for being optionally locked with the object.

Abstract: This present invention provides a method of manufacturing a chip scale sensing chip package, comprising the steps of: providing a sensing device wafer having a first top surface and a first bottom surface opposite to each other, whereby the sensing device wafer comprises a plurality of chip areas, and each of the chip areas comprising a sensing device and a plurality of conductive pads adjacent to the sensing chip nearby the first top surface; providing a cap wafer having a second top surface and a second bottom surface opposite to each other, and bonding the second surface of the cap wafer to the first top surface of the sensing device wafer by sandwiching a first adhesive layer therebetween; providing a temporary carrier substrate, and bonding the temporary carrier substrate to the second top surface of the cap wafer by sandwiching a second adhesive layer therebetween; forming a wiring layer connecting to each of the conductive pads on the first bottom surface of the sensing device wafer; providing a first

Abstract: A lock is provided, including: a main body, including a locking mechanism which is movable; a mechanical driving mechanism, for being operated to dismiss the locking mechanism from a locked state; an electronic unit, disposed on the main body for receiving an unlocking signal from an electronic device, the electronic unit including an electronic driving mechanism; wherein when the electronic unit receives the unlocking signal, the electronic driving mechanism dismisses the locking mechanism from the locked state. An electronic lock assembly is further provided, including the lock mentioned above, the electronic lock assembly further including an electronic device, the electronic device including a signal sending device which is capable of sending the unlocking signal.

Abstract: A manufacturing method of a semiconductor structure includes the following steps. A patterned photoresist layer is formed on a wafer of the wafer structure. The wafer is etched, such that channels are formed in the wafer, and a protection layer of the wafer structure is exposed through the channels. The protection layer is etched, such that openings aligned with the channels are formed in the protection layer. Landing pads in the protection layer are respectively exposed through the openings and the channels, and the caliber of each of the openings is gradually increased toward the corresponding channel. Side surfaces of the wafer surrounding the channels are etched, such that the channels are expanded to respectively form hollow regions. The caliber of the hollow region is gradually decreased toward the opening, and the caliber of the opening is smaller than that of the hollow region.

Abstract: A fixing mechanism with quick-releasing function for assembling a cover with a base includes a buckling component and an actuating component. The buckling component includes a main body, a first wedging portion, a hooking portion and a pushing portion. The first wedging portion is disposed on a hole on the main body. The hooking portion and the pushing portion are disposed on the main body and respectively protrude from the main body at different directions. The actuating component includes a shaft body and a second wedging portion. The hooking portion is engaged with a constraining portion of the base to constrain a movement between the base and the cover while the buckling component is in the first position. The pushing portion pushes the constraining portion to separate the base and the cover while the buckling component is in the second position.

Abstract: A chip package is provided. The chip package comprises a semiconductor chip, an isolation layer, a redistributing metal layer, and a bonding pad. The semiconductor chip has a first conducting pad disposed on a lower surface, and a first hole corresponding to the first conducting pad. The first hole and the isolation layer extend from an upper surface to the lower surface to expose the first conducting pad. The redistributing metal layer is disposed on the isolation layer and has a redistributing metal line corresponding to the first conducting pad, the redistributing metal line is connected to the first conducting pad through the opening. The bonding pad is disposed on the isolation layer and one side of the semiconductor chip, wherein the redistributing metal line extends to the bonding pad to electrically connect the first conducting pad to the bonding pad. A method thereof is also provided.

Abstract: A manufacturing method of a semiconductor structure includes the following steps. A patterned photoresist layer is formed on a wafer of the wafer structure. The wafer is etched, such that channels are formed in the wafer, and a protection layer of the wafer structure is exposed through the channels. The protection layer is etched, such that openings aligned with the channels are formed in the protection layer. Landing pads in the protection layer are respectively exposed through the openings and the channels, and the caliber of each of the openings is gradually increased toward the corresponding channel. Side surfaces of the wafer surrounding the channels are etched, such that the channels are expanded to respectively form hollow regions. The caliber of the hollow region is gradually decreased toward the opening, and the caliber of the opening is smaller than that of the hollow region.

Abstract: A fixing mechanism with quick-releasing function for assembling a cover with a base includes a buckling component and an actuating component. The buckling component includes a main body, a first wedging portion, a hooking portion and a pushing portion. The first wedging portion is disposed on a hole on the main body. The hooking portion and the pushing portion are disposed on the main body and respectively protrude from the main body at different directions. The actuating component includes a shaft body and a second wedging portion. The hooking portion is engaged with a constraining portion of the base to constrain a movement between the base and the cover while the buckling component is in the first position. The pushing portion pushes the constraining portion to separate the base and the cover while the buckling component is in the second position.

Abstract: A fabrication method of a chip package includes the following steps. A wafer structure having a wafer and a protection layer is provided. The first opening of the wafer is aligned with and communicated with the second opening of the protection layer. A first insulating layer having a first thickness is formed on a conductive pad exposed from the second opening, and a second insulating layer having a second thickness is formed on a first sidewall of the protection layer surrounding the second opening and a second sidewall of the wafer surrounding the first opening. The first and second insulating layers are etched, such that the first insulating layer is completely removed, and the second thickness of the second insulating layer is reduced.

Abstract: A manufacturing method of a semiconductor structure includes the following steps. A patterned photoresist layer is formed on a wafer of the wafer structure. The wafer is etched, such that channels are formed in the wafer, and a protection layer of the wafer structure is exposed through the channels. The protection layer is etched, such that openings aligned with the channels are formed in the protection layer. Landing pads in the protection layer are respectively exposed through the openings and the channels, and the caliber of each of the openings is gradually increased toward the corresponding channel. Side surfaces of the wafer surrounding the channels are etched, such that the channels are expanded to respectively form hollow regions. The caliber of the hollow region is gradually decreased toward the opening, and the caliber of the opening is smaller than that of the hollow region.