Patents by Inventor Chia Ying Lee

Chia Ying Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220296514
    Abstract: A lipid-based nanoparticle (LNP) with high DL ratio and normalized release. The LNP of the present invention comprises an outer lipid monolayer encapsulating a plurality of lipid-active pharmaceutical ingredient (API)-ion complexes, wherein each lipid-API-ion complex comprises a complex of anionic lipid, API and ion wherein the API comprises a positively charged form of an API and wherein the outer lipid monolayer of the LNP comprises neutral lipids. The present invention further comprises a method of preparation of the LNP of the present invention.
    Type: Application
    Filed: March 18, 2022
    Publication date: September 22, 2022
    Inventors: Chin-tin Chen, Chia Ying Lee, Tsuimin Tsai, Po-Chun Peng
  • Publication number: 20220296518
    Abstract: A lipid-based nanoparticle (LNP) with high DL ratio and normalized release. The LNP of the present invention comprises an outer lipid monolayer encapsulating a plurality of lipid-active pharmaceutical ingredient (API) complexes, wherein each lipid-API complex comprises a complex of anionic lipid and API wherein the API comprises a positively charged form of an API and wherein the outer lipid monolayer of the LNP comprises neutral lipids. The present invention further comprises a method of preparation of the LNP of the present invention.
    Type: Application
    Filed: March 18, 2022
    Publication date: September 22, 2022
    Inventors: Chin-tin Chen, Chia Ying Lee, Tsuimin Tsai, Po-Chun Peng
  • Publication number: 20220293471
    Abstract: A method of forming a semiconductor device includes: forming a metal gate structure over a fin that protrudes above a substrate, the metal gate structure being surrounded by an interlayer dielectric (ILD) layer; recessing the metal gate structure below an upper surface of the ILD layer distal from the substrate; after the recessing, forming a first dielectric layer over the recessed metal gate structure; forming an etch stop layer (ESL) over the first dielectric layer and the ILD layer; forming a second dielectric layer over the ESL; performing a first dry etch process to form an opening that extends through the second dielectric layer, through the ESL, and into the first dielectric layer; after the first dry etch process, performing a wet etch process to clean the opening; and after the wet etch process, performing a second dry etch process to extend the opening through the first dielectric layer.
    Type: Application
    Filed: May 25, 2021
    Publication date: September 15, 2022
    Inventors: Meng Jhe Tsai, Hong-Jie Yang, Meng-Chun Chang, Hao Chiang, Chia-Ying Lee, Huan-Just Lin, Chuan Chang
  • Publication number: 20220263168
    Abstract: The disclosure provides seals for devices that operate at elevated temperatures and have reactive metal vapors, such as lithium, sodium or magnesium. In some examples, such devices include energy storage devices that may be used within an electrical power grid or as part of a standalone system. The energy storage devices may be charged from an electricity production source for later discharge, such as when there is a demand for electrical energy consumption.
    Type: Application
    Filed: February 11, 2022
    Publication date: August 18, 2022
    Inventors: Greg Thompson, David J. Bradwell, Vimal Pujari, Chia-Ying Lee, David McCleary, Jennifer Cocking, James D. Fritz
  • Publication number: 20220172945
    Abstract: A photo resist layer is used to protect a dielectric layer and conductive elements embedded in the dielectric layer when patterning an etch stop layer underlying the dielectric layer. The photo resist layer may further be used to etch another dielectric layer underlying the etch stop layer, where etching the next dielectric layer exposes a contact, such as a gate contact. The bottom layer can be used to protect the conductive elements embedded in the dielectric layer from a wet etchant used to etch the etch stop layer.
    Type: Application
    Filed: February 14, 2022
    Publication date: June 2, 2022
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yu-Shih Wang, Hong-Jie Yang, Chia-Ying Lee, Po-Nan Yeh, U-Ting Chiu, Chun-Neng Lin, Ming-Hsi Yeh, Kuo-Bin Huang
  • Publication number: 20220164976
    Abstract: A device, method and system for estimating elevation in images from camera devices is provided. The device detects humans at respective positions in images from a camera device, the camera device having a fixed orientation and fixed focal length. The device estimates, for the humans in the images, respective elevations of the humans, relative to the camera device, at the respective positions based at least on camera device parameters defining the fixed orientation and the fixed focal length. The device associates the respective elevations with the respective positions in the images. The device determines, using the respective elevations associated with the respective positions, a function that estimates elevation in an image from the camera device, using a respective image position coordinate as an input. The device provides the function to a video analytics engine to determine relative real-world positions in subsequent images from the camera device.
    Type: Application
    Filed: November 23, 2020
    Publication date: May 26, 2022
    Inventor: Chia Ying LEE
  • Patent number: 11289759
    Abstract: The disclosure provides seals for devices that operate at elevated temperatures and have reactive metal vapors, such as lithium, sodium or magnesium. In some examples, such devices include energy storage devices that may be used within an electrical power grid or as part of a standalone system. The energy storage devices may be charged from an electricity production source for later discharge, such as when there is a demand for electrical energy consumption.
    Type: Grant
    Filed: March 25, 2020
    Date of Patent: March 29, 2022
    Assignee: Ambri, Inc.
    Inventors: Greg Thompson, David J. Bradwell, Vimal Pujari, Chia-Ying Lee, David McCleary, Jennifer Cocking, James D. Fritz
  • Patent number: 11276571
    Abstract: A photo resist layer is used to protect a dielectric layer and conductive elements embedded in the dielectric layer when patterning an etch stop layer underlying the dielectric layer. The photo resist layer may further be used to etch another dielectric layer underlying the etch stop layer, where etching the next dielectric layer exposes a contact, such as a gate contact. The bottom layer can be used to protect the conductive elements embedded in the dielectric layer from a wet etchant used to etch the etch stop layer.
    Type: Grant
    Filed: June 22, 2020
    Date of Patent: March 15, 2022
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yu Shih Wang, Hong-Jie Yang, Chia-Ying Lee, Po-Nan Yeh, U-Ting Chiu, Chun-Neng Lin, Ming-Hsi Yeh, Kuo-Bin Huang
  • Publication number: 20220028114
    Abstract: A computer-implemented method of localizing an image of a person captured using a camera is provided, the person in the field of view of a camera, comprising: obtaining the image captured using a camera, the image comprising the person within a bounding box; determining at least one slant value associated with the person within the bounding box; determining head image coordinates and feet image coordinates for the person using the at least one slant value; and localizing the person by projecting the head image coordinates to a head plane and the feet image coordinates for the person to a ground plane.
    Type: Application
    Filed: July 22, 2020
    Publication date: January 27, 2022
    Inventors: CHIA YING LEE, YIN WANG, ALEKSEY LIPCHIN
  • Patent number: 11177138
    Abstract: The present disclosure, in some embodiments, relates to a method of forming an integrated circuit. The method includes forming a first hard mask layer over a substrate and forming a second hard mask layer over the first hard mask layer. The second hard mask layer is patterned to define an island having a first width along a first direction. The island is patterned to form a patterned island having a second width along the first direction that is less than the first width. A sacrificial mask is formed over the first hard mask layer and the first hard mask layer is patterned according to the patterned island and the sacrificial mask.
    Type: Grant
    Filed: April 1, 2020
    Date of Patent: November 16, 2021
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Ying Lee, Jyu-Horng Shieh
  • Patent number: 11170267
    Abstract: A method, system and computer program product for region proposals are disclosed. The method includes generating a map of a video frame by calculating a plurality of pixel-level values. Each pixel-level value corresponds to a respective one of a plurality of pixels and provides an associated indication of how likely the respective one of the plurality of pixels forms part of a particular object of interest.
    Type: Grant
    Filed: June 5, 2020
    Date of Patent: November 9, 2021
    Assignee: MOTOROLA SOLUTIONS, INC.
    Inventors: Chia Ying Lee, Ying Wang, Weijuan Wu
  • Patent number: 11164438
    Abstract: Methods for detecting anomalies in a geographic area include receiving, from an electronic computing device, expected relationship data indicating expected relationships between a plurality of entities within the geographic area; detecting the plurality of entities within the geographic area; generating observed relationship data indicating observed relationships between the plurality of entities; identifying the expected relationships between the plurality of entities based on the expected relationship data; determining that a given observed relationship between two entities of the plurality of entities is likely to represent an anomaly based on the expected relationship data; and providing an electronic notification to a safety officer, the electronic notification indicating that the given observed relationship is likely to represent the anomaly.
    Type: Grant
    Filed: April 1, 2020
    Date of Patent: November 2, 2021
    Assignee: MOTOROLA SOLUTIONS, INC.
    Inventors: Dung-Han Lee, Yanyan Hu, Qifan Liang, Kangyan Liu, Yin Wang, Weijuan Wu, Chia Ying Lee
  • Publication number: 20210312783
    Abstract: Methods for detecting anomalies in a geographic area include receiving, from an electronic computing device, expected relationship data indicating expected relationships between a plurality of entities within the geographic area; detecting the plurality of entities within the geographic area; generating observed relationship data indicating observed relationships between the plurality of entities; identifying the expected relationships between the plurality of entities based on the expected relationship data; determining that a given observed relationship between two entities of the plurality of entities is likely to represent an anomaly based on the expected relationship data; and providing an electronic notification to a safety officer, the electronic notification indicating that the given observed relationship is likely to represent the anomaly.
    Type: Application
    Filed: April 1, 2020
    Publication date: October 7, 2021
    Inventors: DUNG-HAN LEE, YANYAN HU, QIFAN LIANG, KANGYAN LIU, YIN WANG, WEIJUAN WU, CHIA YING LEE
  • Publication number: 20210225707
    Abstract: An integrated circuit structure includes a first Inter-Layer Dielectric (ILD), a gate stack in the first ILD, a second ILD over the first ILD, a contact plug in the second ILD, and a dielectric protection layer on opposite sides of, and in contact with, the contact plug. The contact plug and the dielectric protection layer are in the second ILD. A dielectric capping layer is over and in contact with the contact plug.
    Type: Application
    Filed: April 9, 2021
    Publication date: July 22, 2021
    Inventors: Yu-Chan Yen, Ching-Feng Fu, Chia-Ying Lee
  • Publication number: 20210202238
    Abstract: A photo resist layer is used to protect a dielectric layer and conductive elements embedded in the dielectric layer when patterning an etch stop layer underlying the dielectric layer. The photo resist layer may further be used to etch another dielectric layer underlying the etch stop layer, where etching the next dielectric layer exposes a contact, such as a gate contact. The bottom layer can be used to protect the conductive elements embedded in the dielectric layer from a wet etchant used to etch the etch stop layer.
    Type: Application
    Filed: June 22, 2020
    Publication date: July 1, 2021
    Inventors: Yu Shih Wang, Hong-Jie Yang, Chia-Ying Lee, Po-Nan Yeh, U-Ting Chiu, Chun-Neng Lin, Ming-Hsi Yeh, Kuo-Bin Huang
  • Patent number: 11037789
    Abstract: The present disclosure relates to a method of performing a semiconductor fabrication process. The method may be performed by forming a spacer material over an underlying layer. The spacer material has sidewalls defining a first trench. A cut material is formed over the spacer material and within the first trench. The cut material separates the trench into a pair of trench segments having ends separated by the cut material. The underlying layer is patterned according to the spacer material and the cut material.
    Type: Grant
    Filed: December 6, 2019
    Date of Patent: June 15, 2021
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Kuan-Wei Huang, Chia-Ying Lee, Ming-Chung Liang
  • Patent number: 11031044
    Abstract: A method, system and computer program product for self-learned and probabilistic-based prediction of inter-camera object movement is disclosed. The method includes building and storing a transition model defined by transition probability and transition time distribution data generated during operation of a first video camera and one or more other video cameras over time. The method also includes employing at least one balance flow algorithm on the transition probability and transition time distribution data to determine a subset of the video cameras to initiate a search for an object based on a query. The method also includes running the search for the object over the subset of the video cameras.
    Type: Grant
    Filed: March 16, 2020
    Date of Patent: June 8, 2021
    Assignee: MOTOROLA SOLUTIONS, INC.
    Inventors: Chia Ying Lee, Aleksey Lipchin, Ying Wang, Kangyan Liu
  • Publication number: 20210143020
    Abstract: The present disclosure, in some embodiments, relates to a method of forming an integrated circuit. The method includes forming a hard mask over a dielectric layer of a substrate. A blocking layer is formed on the hard mask and spacers are formed over the blocking layer. The spacers laterally straddle opposing edges of the blocking layer. The hard mask is etched according to the spacers and the blocking layer. The dielectric layer is etched according to the hard mask.
    Type: Application
    Filed: January 20, 2021
    Publication date: May 13, 2021
    Inventors: Chia-Ying Lee, Jyu-Horng Shieh
  • Patent number: D920472
    Type: Grant
    Filed: August 3, 2020
    Date of Patent: May 25, 2021
    Assignee: BEIJING KOHLER LTD.
    Inventors: Han Chew, Sophie Su, Chia Ying Lee
  • Patent number: D933367
    Type: Grant
    Filed: November 10, 2020
    Date of Patent: October 19, 2021
    Assignee: Kohler (China) Investment Co., Ltd.
    Inventors: Chia Ying Lee, Fei Ying Su, Ji Min Niu, Hui Ren