Vaporizer for substrate processing apparatus

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Description

FIG. 1 is a front, perspective view of a vaporizer for substrate processing apparatus showing our new design;

FIG. 2 is a front, bottom perspective view thereof;

FIG. 3 is a front elevational view thereof, the back elevation view being the same therefore omitted;

FIG. 4 is a left side elevational view thereof, the right side elevation view being the same therefore omitted;

FIG. 5 is a top plan view thereof;

FIG. 6 is a bottom plan view thereof; and,

FIG. 7 is a cross-sectional view taken along line 7-7 in FIG. 5.

The back elevational view is the same as the front elevational view and has, therefore, been omitted; the right side elevational view is the same as the left side elevational view and has, therefore been omitted.

Claims

The ornamental design for a vaporizer for substrate processing apparatus, as shown and described.

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Patent History
Patent number: D741823
Type: Grant
Filed: Jan 9, 2014
Date of Patent: Oct 27, 2015
Assignee: HITACHI KOKUSAI ELECTRIC INC. (Tokyo)
Inventors: Hideto Tateno (Toyama), Daisuke Hara (Toyama), Masahisa Okuno (Toyama), Takuya Joda (Toyama)
Primary Examiner: Elizabeth J Oswecki
Application Number: 29/478,836