Patents by Inventor Dinesh Somasekhar

Dinesh Somasekhar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9230636
    Abstract: Described is an apparatus which comprises: a first power supply node to provide a first power supply, a second power supply node, and a third power supply node; a first transistor which is operable to couple the first and second power supply nodes; and a charge pump circuit to provide a boosted voltage to the third power supply node in one mode, and to recover charge from the second power node in another mode. Described is a memory unit which comprises: a DRAM which is operable to be refreshed; a gated power supply node coupled to the DRAM to provide a gated power supply to the DRAM; and a charge recycling circuit to recover charge from the gated power supply node after the DRAM is refreshed.
    Type: Grant
    Filed: December 20, 2013
    Date of Patent: January 5, 2016
    Assignee: Intel Corporation
    Inventors: Pascal A. Meinerzhagen, Jaydeep P. Kulkarni, Muhammad M. Khellah, Cyrille Dray, Dinesh Somasekhar, James W. Tschanz, Vivek K. De
  • Publication number: 20150241890
    Abstract: Described is an apparatus which comprises: a first oscillator to generate a first clock signal a second oscillator to generate a second clock signal; a phase frequency detector to detect phase difference between the first and second clock signals, and to generate a phase difference; and an output stage, coupled to a load, to generate a power supply for the load according to the phase difference.
    Type: Application
    Filed: September 25, 2012
    Publication date: August 27, 2015
    Inventors: Arijit Raychowdhury, Dinesh Somasekhar, James W. Tschanz, Vivek K. De
  • Patent number: 9105510
    Abstract: Methodology enabling a generation of fins having a variable fin pitch less than 40 nm, and the resulting device are disclosed. Embodiments include: forming a hardmask on a substrate; providing first and second mandrels on the hardmask; providing a first spacer on each side of each of the first and second mandrels; removing the first and second mandrels; providing, after removal of the first and second mandrels, a second spacer on each side of each of the first spacers; and removing the first spacers.
    Type: Grant
    Filed: August 18, 2014
    Date of Patent: August 11, 2015
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Youngtag Woo, Jongwook Kye, Dinesh Somasekhar
  • Publication number: 20150179247
    Abstract: Described is an apparatus which comprises: a first power supply node to provide a first power supply, a second power supply node, and a third power supply node; a first transistor which is operable to couple the first and second power supply nodes; and a charge pump circuit to provide a boosted voltage to the third power supply node in one mode, and to recover charge from the second power node in another mode. Described is a memory unit which comprises: a DRAM which is operable to be refreshed; a gated power supply node coupled to the DRAM to provide a gated power supply to the DRAM; and a charge recycling circuit to recover charge from the gated power supply node after the DRAM is refreshed.
    Type: Application
    Filed: December 20, 2013
    Publication date: June 25, 2015
    Inventors: Pascal A. MEINERZHAGEN, Jaydeep P. KULKARNI, Muhammad M. KHELLAH, Cyrille DRAY, Dinesh SOMASEKHAR, James W. TSCHANZ, Vivek K. DE
  • Patent number: 8962483
    Abstract: Methodology enabling a generation of an interconnection design utilizing an SIT process is disclosed. Embodiments include: providing a hardmask on a substrate; forming a mandrel layer on the hardmask including: first and second vertical portions extending along a vertical direction and separated by a horizontal distance; and a plurality of horizontal portions extending in a horizontal direction, wherein each of the horizontal portions is positioned between the first and second vertical portions and at a different position along the vertical direction; and forming a spacer layer on outer edges of the mandrel layer.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: February 24, 2015
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Youngtag Woo, Dinesh Somasekhar, Juhan Kim, Yunfei Deng, Jongwook Kye
  • Patent number: 8962421
    Abstract: A method for fabricating a FinFET integrated circuit includes depositing a first polysilicon layer at a first end of a diffusion region and a second polysilicon layer at a second end of the diffusion region; diffusing an n-type material into the diffusion region to form a diffused resistor; and epitaxially growing a silicon material between the first and second polysilicon layers to form fins structures over the diffused resistor and spanning between the first and second polysilicon layers.
    Type: Grant
    Filed: November 15, 2012
    Date of Patent: February 24, 2015
    Assignee: GLOBALFOUNDRIES, Inc.
    Inventors: Gopal Srinivasan, Andy Wei, Dinesh Somasekhar, Ali Keshavarzi, Subi Kengeri
  • Publication number: 20140353765
    Abstract: Methodology enabling a generation of fins having a variable fin pitch less than 40 nm, and the resulting device are disclosed. Embodiments include: forming a hardmask on a substrate; providing first and second mandrels on the hardmask; providing a first spacer on each side of each of the first and second mandrels; removing the first and second mandrels; providing, after removal of the first and second mandrels, a second spacer on each side of each of the first spacers; and removing the first spacers.
    Type: Application
    Filed: August 18, 2014
    Publication date: December 4, 2014
    Inventors: Youngtag WOO, Jongwook KYE, Dinesh SOMASEKHAR
  • Patent number: 8889561
    Abstract: Methodology enabling a generation of fins having a variable fin pitch less than 40 nm, and the resulting device are disclosed. Embodiments include: forming a hardmask on a substrate; providing first and second mandrels on the hardmask; providing a first spacer on each side of each of the first and second mandrels; removing the first and second mandrels; providing, after removal of the first and second mandrels, a second spacer on each side of each of the first spacers; and removing the first spacers.
    Type: Grant
    Filed: December 10, 2012
    Date of Patent: November 18, 2014
    Assignee: GlobalFoundries Inc.
    Inventors: Youngtag Woo, Jongwook Kye, Dinesh Somasekhar
  • Patent number: 8847633
    Abstract: Described is an integrated circuit (IC) which comprises: a first driver having stacked devices, the first driver operable on a first power supply and a first ground supply, the first driver to receive an input signal with a signal swing according to a second power supply and a second ground supply, the second power supply having a voltage level lower than a voltage level of the first power supply, and the second ground supply having a voltage level higher than a voltage level of the first ground supply; a second driver coupled to the first driver, the second driver operable on the second power supply and the second ground supply; and a pair of by-pass devices coupled to the first and second drivers, the pair of by-pass devices to provide the second power supply and the second ground supply according to an output of the first driver.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: September 30, 2014
    Assignee: Intel Corporation
    Inventors: Jaydeep P. Kulkami, Dinesh Somasekhar
  • Publication number: 20140273474
    Abstract: Methodology enabling a generation of an interconnection design utilizing an SIT process is disclosed. Embodiments include: providing a hardmask on a substrate; forming a mandrel layer on the hardmask including: first and second vertical portions extending along a vertical direction and separated by a horizontal distance; and a plurality of horizontal portions extending in a horizontal direction, wherein each of the horizontal portions is positioned between the first and second vertical portions and at a different position along the vertical direction; and forming a spacer layer on outer edges of the mandrel layer.
    Type: Application
    Filed: March 13, 2013
    Publication date: September 18, 2014
    Applicant: GLOBALFOUNDRIES Inc.
    Inventors: Youngtag WOO, Dinesh Somasekhar, Juhan Kim, Yunfei Deng, Jongwook Kye
  • Publication number: 20140253179
    Abstract: Described is an integrated circuit (IC) which comprises: a first driver having stacked devices, the first driver operable on a first power supply and a first ground supply, the first driver to receive an input signal with a signal swing according to a second power supply and a second ground supply, the second power supply having a voltage level lower than a voltage level of the first power supply, and the second ground supply having a voltage level higher than a voltage level of the first ground supply; a second driver coupled to the first driver, the second driver operable on the second power supply and the second ground supply; and a pair of by-pass devices coupled to the first and second drivers, the pair of by-pass devices to provide the second power supply and the second ground supply according to an output of the first driver.
    Type: Application
    Filed: March 8, 2013
    Publication date: September 11, 2014
    Inventors: Jayderep P. Kulkarni, Dinesh Somasekhar
  • Patent number: 8769376
    Abstract: Described herein is an apparatus for adjusting a power supply level for a memory cell to improve stability of a memory unit. The apparatus comprises memory circuitry including memory cells, error detection circuitry to detect error in data stored by memory cells of the memory circuitry, and supply voltage control circuitry to increase supply voltage for one or more memory cells of the memory circuitry based at least in part on detected error.
    Type: Grant
    Filed: September 25, 2012
    Date of Patent: July 1, 2014
    Assignee: Intel Corporation
    Inventors: Muhammad Khellah, Dinesh Somasekhar, Yibin Ye, Nam Sung Kim, Vivek De
  • Publication number: 20140159164
    Abstract: Methodology enabling a generation of fins having a variable fin pitch less than 40 nm, and the resulting device are disclosed. Embodiments include: forming a hardmask on a substrate; providing first and second mandrels on the hardmask; providing a first spacer on each side of each of the first and second mandrels; removing the first and second mandrels; providing, after removal of the first and second mandrels, a second spacer on each side of each of the first spacers; and removing the first spacers.
    Type: Application
    Filed: December 10, 2012
    Publication date: June 12, 2014
    Applicant: GLOBALFOUNDRIES Inc.
    Inventors: Youngtag WOO, Jongwook Kye, Dinesh Somasekhar
  • Publication number: 20140134822
    Abstract: A method for fabricating a FinFET integrated circuit includes depositing a first polysilicon layer at a first end of a diffusion region and a second polysilicon layer at a second end of the diffusion region; diffusing an n-type material into the diffusion region to form a diffused resistor; and epitaxially growing a silicon material between the first and second polysilicon layers to form fins structures over the diffused resistor and spanning between the first and second polysilicon layers.
    Type: Application
    Filed: November 15, 2012
    Publication date: May 15, 2014
    Applicant: GLOBALFOUNDRIES, INC.
    Inventors: Gopal Srinivasan, Andy Wei, Dinesh Somasekhar, Ali Keshavarzi, Subi Kengeri
  • Patent number: 8689154
    Abstract: An approach for providing timing-closed FinFET designs from planar designs is disclosed. Embodiments include: receiving one or more planar cells associated with a planar design; generating an initial FinFET design corresponding to the planar design based on the planar cells and a FinFET model; and processing the initial FinFET design to provide a timing-closed FinFET design. Other embodiments include: determining a race condition associated with a path of the initial FinFET design based on a timing analysis of the initial FinFET design; and increasing delay associated with the path to resolve hold violations associated with the race condition, wherein the processing of the initial FinFET design is based on the delay increase.
    Type: Grant
    Filed: April 13, 2012
    Date of Patent: April 1, 2014
    Assignee: GlobalFoundries Inc.
    Inventors: Mahbub Rashed, David Doman, Dinesh Somasekhar, Yan Wang, Yunfei Deng, Navneet Jain, Jongwook Kye, Ali Keshavarzi, Subramani Kengeri, Suresh Venkatesan
  • Patent number: 8667367
    Abstract: Described herein is an apparatus for adjusting a power supply level for a memory cell to improve stability of a memory unit. The apparatus comprises memory circuitry including memory cells, error detection circuitry to detect error in data stored by memory cells of the memory circuitry, and supply voltage control circuitry to increase supply voltage for one or more memory cells of the memory circuitry based at least in part on detected error.
    Type: Grant
    Filed: August 23, 2011
    Date of Patent: March 4, 2014
    Assignee: Intel Corporation
    Inventors: Muhammad Khellah, Dinesh Somasekhar, Yibin Ye, Nam Sung Kim, Vivek De
  • Patent number: 8640005
    Abstract: A cache memory system uses multi-bit Error Correcting Code (ECC) with a low storage and complexity overhead. In an embodiment, error correction logic may include a first error correction logic to determine a number of errors in data that is stored in a cache line of a cache memory, and a second error correction logic to receive the data from the first error correction logic if the number of errors is determined to be greater than one and to perform error correction responsive to receipt of the data. The cache memory system can be operated at very low idle power, without dramatically increasing transition latency to and from an idle power state due to loss of state. Other embodiments are described and claimed.
    Type: Grant
    Filed: May 21, 2010
    Date of Patent: January 28, 2014
    Assignee: Intel Corporation
    Inventors: Christopher B. Wilkerson, Alaa R. Alameldeen, Zeshan A. Chishti, Dinesh Somasekhar, Wei Wu, Shih-Lien Lu
  • Publication number: 20130275935
    Abstract: An approach for providing timing-closed FinFET designs from planar designs is disclosed. Embodiments include: receiving one or more planar cells associated with a planar design; generating an initial FinFET design corresponding to the planar design based on the planar cells and a FinFET model; and processing the initial FinFET design to provide a timing-closed FinFET design. Other embodiments include: determining a race condition associated with a path of the initial FinFET design based on a timing analysis of the initial FinFET design; and increasing delay associated with the path to resolve hold violations associated with the race condition, wherein the processing of the initial FinFET design is based on the delay increase.
    Type: Application
    Filed: April 13, 2012
    Publication date: October 17, 2013
    Applicant: GLOBALFOUNDRIES Inc.
    Inventors: Mahbub Rashed, David Doman, Dinesh Somasekhar, Yan Wang, Yunfei Deng, Navneet Jain, Jongwook Kye, Ali Keshavarzi, Subramani Kengeri, Suresh Venkatesan
  • Patent number: 8547777
    Abstract: A NOR architecture for selecting a word line driver in a DRAM is disclosed. Complements of separately decoded addresses in the low, mid and high ranges are used to select a final word line driver. The output of the word line driver is at a potential negative with respect to ground for a deselected word line and a positive potential more positive than the power supply potential for a selected word line.
    Type: Grant
    Filed: December 22, 2010
    Date of Patent: October 1, 2013
    Assignee: Intel Corporation
    Inventors: Swaroop Ghosh, Dinesh Somasekhar, Balaji Srinivasan, Fatih Hamzaoglu
  • Patent number: 8539303
    Abstract: Embodiments of an invention for low overhead error-correcting-code protection for stored information are described are disclosed. In one embodiment, an apparatus includes a data storage structure, a first check value storage structure, a second check value storage structure, and check value generation hardware. The data storage structure is to store a plurality of first data values. The first check value storage structure is to store a plurality of first check values. The second check value storage structure is to store a plurality of second check values. The check value generation hardware is to generate the first check values and the second check values. The first check values provide a first level of error protection for the first data values and the second check values provide a second level of error protection for a plurality of second data values.
    Type: Grant
    Filed: December 20, 2010
    Date of Patent: September 17, 2013
    Assignee: Intel Corporation
    Inventors: Shih-Lien L. Lu, Dinesh Somasekhar