Abstract: A 6F2 DRAM cell with paired cells is described. In one embodiment the cell pairs are separated by n-type isolation transistors having gates defining dummy word lines. The dummy word lines are fabricated from a metal with a work function favoring p-channel devices.

Abstract: Embodiments for data dependent boosted (DDB) bit cells that may allow for smaller minimum cell supplies (Vmin) without necessarily having to increase device dimensions are presented.

Abstract: A NAND architecture for selecting a word line driver in a DRAM is disclosed. Separately decoded addresses in the low, mid and high ranges are used to select a final word line driver. The output of the word line driver is at a potential negative with respect to ground for a deselected word line and a positive potential more positive than the power supply potential for a selected word line.

Abstract: A hierarchical DRAM sensing apparatus and method which employs local bit line pairs and global bit lines. A word line selects the cells in a cluster of sense amplifiers, each of the amplifiers being associated with a pair of bit lines. One of the local bit lines is selected for coupling to global bit lines and a global sense amplifier. Clusters are located in a plurality of subarrays forming a bank with the global bit lines extending from each of the banks to the global sense amplifier.

Abstract: Described herein is an apparatus for adjusting a power supply level for a memory cell to improve stability of a memory unit. The apparatus comprises memory circuitry including memory cells, error detection circuitry to detect error in data stored by memory cells of the memory circuitry, and supply voltage control circuitry to increase supply voltage for one or more memory cells of the memory circuitry based at least in part on detected error.

Abstract: Embodiments for data dependent boosted (DDB) bit cells that may allow for smaller minimum cell supplies (Vmin) without necessarily having to increase device dimensions are presented.

Abstract: A 6F2 DRAM cell with paired cells is described. In one embodiment the cell pairs are separated by n-type isolation transistors having gates defining dummy word lines. The dummy word lines are fabricated from a metal with a work function favoring p-channel devices.

Abstract: In some embodiments, provided is an integrated circuit with a first die coupled to a second die. The second die has through-silicon vias disposed through it to provide power references to the first die. The through-silicon vias are laterally re-positionable without inhibiting circuit sections in the second die.

Abstract: A processor may comprise a cache, which may be divided into a first and second section while the processor operates in a low-power mode. A cache line of the first section may be fragmented into segments. A first encoder may generate first data bits and check bits while encoding a first portion of a data stream and a second encoder may, separately, generate second data bits and check bits while encoding a second portion of the data stream. The first data bits may be stored in a first segment of the first section and the check bits in a first portion of the second section that is associated with the first segment. The first decoder may correct errors in multiple bit positions within the first data bits using the check bits stored in the first portion and the second decoder may, separately, decode the second data bits using the second set of check bits.

Abstract: Methods and apparatuses to increase a surface area of a memory cell capacitor are described. An opening in a second insulating layer deposited over a first insulating layer on a substrate is formed. The substrate has a fin. A first insulating layer is deposited over the substrate adjacent to the fin. The opening in the second insulating layer is formed over the fin. A first conducting layer is deposited over the second insulating layer and the fin. A third insulating layer is deposited on the first conducting layer. A second conducting layer is deposited on the third insulating layer. The second conducting layer fills the opening. The second conducting layer is to provide an interconnect to an upper metal layer. Portions of the second conducting layer, third insulating layer, and the first conducting layer are removed from a top surface of the second insulating layer.

Abstract: A NAND architecture for selecting a word line driver in a DRAM is disclosed. Separately decoded addresses in the low, mid and high ranges are used to select a final word line driver. The output of the word line driver is at a potential negative with respect to ground for a deselected word line and a positive potential more positive than the power supply potential for a selected word line.

Abstract: A NOR architecture for selecting a word line driver in a DRAM is disclosed. Complements of separately decoded addresses in the low, mid and high ranges are used to select a final word line driver. The output of the word line driver is at a potential negative with respect to ground for a deselected word line and a positive potential more positive than the power supply potential for a selected word line.

Abstract: Embodiments of an invention for low overhead error-correcting-code protection for stored information are described are disclosed. In one embodiment, an apparatus includes a data storage structure, a first check value storage structure, a second check value storage structure, and check value generation hardware. The data storage structure is to store a plurality of first data values. The first check value storage structure is to store a plurality of first check values. The second check value storage structure is to store a plurality of second check values. The check value generation hardware is to generate the first check values and the second check values. The first check values provide a first level of error protection for the first data values and the second check values provide a second level of error protection for a plurality of second data values.

Abstract: A capacitor includes a substrate (110, 210), a first electrically insulating layer (120, 220) over the substrate, and a fin (130, 231) including a semiconducting material (135) over the first electrically insulating layer. A first electrically conducting layer (140, 810) is located over the first electrically insulating layer and adjacent to the fin. A second electrically insulating layer (150, 910) is located adjacent to the first electrically conducting layer, and a second electrically conducting layer (160, 1010) is located adjacent to the second electrically insulating layer. The first and second electrically conducting layers together with the second electrically insulating layer form a metal-insulator-metal stack that greatly increases the capacitance area of the capacitor. In one embodiment the capacitor is formed using what may be referred to as a removable metal gate (RMG) approach.

Abstract: For one disclosed embodiment, an apparatus comprises memory circuitry including memory cells, error detection circuitry to detect error in data stored by memory cells of the memory circuitry, and supply voltage control circuitry to increase supply voltage for one or more memory cells of the memory circuitry based at least in part on detected error. Other embodiments are also disclosed.

Abstract: A cache memory system is provided that uses multi-bit Error Correcting Code (ECC) with a low storage and complexity overhead. The cache memory system can be operated at very low idle power, without dramatically increasing transition latency to and from an idle power state due to loss of state.

Abstract: Embodiments of the invention relate to a method of fabricating logic transistors using replacement metal gate (RMG) logic flow with modified process to form recessed channel array transistors (RCAT) on a common semiconductor substrate. An embodiment comprises forming an interlayer dielectric (ILD) layer on a semiconductor substrate, forming a first recess in the ILD layer of a first substrate region, forming a recessed channel in the ILD layer and in the substrate of a second substrate region, depositing a first conformal high-k dielectric layer in the first recess and a second conformal high-k dielectric layer in the recessed channel, and filling the first recess with a first gate metal and the recessed channel with a second gate metal.

Abstract: Embodiments of the invention relate to a method of fabricating logic transistors using replacement metal gate (RMG) logic flow with modified process to form recessed channel array transistors (RCAT) on a common semiconductor substrate. An embodiment comprises forming an interlayer dielectric (ILD) layer on a semiconductor substrate, forming a first recess in the ILD layer of a first substrate region, forming a recessed channel in the ILD layer and in the substrate of a second substrate region, depositing a first conformal high-k dielectric layer in the first recess and a second conformal high-k dielectric layer in the recessed channel, and filling the first recess with a first gate metal and the recessed channel with a second gate metal.

Abstract: For one embodiment, an apparatus comprises memory circuitry including memory cells, error detection circuitry to detect error in data stored by memory cells of the memory circuitry, and supply voltage control circuitry to increase supply voltage for one or more memory cells of the memory circuitry based at least in part on detected error. Other embodiments have one or more other features.

Abstract: An embedded memory cell includes a semiconducting substrate (110), a transistor (120) having a source/drain region (121) at least partially embedded in the semiconducting substrate, and a capacitor (130) at least partially embedded in the semiconducting substrate. The capacitor includes a first electrode (131) and a second electrode (132) that are electrically isolated from each other by a first electrically insulating material (133). The first electrode is electrically connected to the semiconducting substrate and the second electrode is electrically connected to the source/drain region of the transistor.