Abstract: A process of forming a semiconductive capacitor device for a memory circuit includes forming a first capacitor cell recess and a second capacitor cell recess that are spaced apart by a capacitor cell boundary of a first height. The process includes lowering the first height of the capacitor cell boundary to a second height. A common plate capacitor bridges between the first recess and the second recess over the boundary above the second height and below the first height.

Abstract: An apparatus and method is described herein directly matching coded tags. An incoming tag address is encoded with error correction codes (ECCs) to obtain a coded, incoming tag. The coded, incoming tag is directly compared to a stored, coded tag; this comparison result, in one example, yields an m-bit difference between the coded, incoming tag and the stored, coded tag. ECC, in one described embodiment, is able to correct k-bits and detect k+1 bits. As a result, if the m-bit difference is within 2k+2 bits, then valid codes—coded tags—are detected. As an example, if the m-bit difference is less than a hit threshold, such as k-bits, then a hit is determined, while if the m-bit difference is greater than a miss threshold, such as k+1 bits, then a miss is determined.

Abstract: A capacitor includes a substrate (110, 210), a first electrically insulating layer (120, 220) over the substrate, and a fin (130, 231) including a semiconducting material (135) over the first electrically insulating layer. A first electrically conducting layer (140, 810) is located over the first electrically insulating layer and adjacent to the fin. A second electrically insulating layer (150, 910) is located adjacent to the first electrically conducting layer, and a second electrically conducting layer (160, 1010) is located adjacent to the second electrically insulating layer. The first and second electrically conducting layers together with the second electrically insulating layer form a metal-insulator-metal stack that greatly increases the capacitance area of the capacitor. In one embodiment the capacitor is formed using what may be referred to as a removable metal gate (RMG) approach.

Abstract: A capacitor includes a substrate (110, 210), a first electrically insulating layer (120, 220) over the substrate, and a fin (130, 231) including a semiconducting material (135) over the first electrically insulating layer. A first electrically conducting layer (140, 810) is located over the first electrically insulating layer and adjacent to the fin. A second electrically insulating layer (150, 910) is located adjacent to the first electrically conducting layer, and a second electrically conducting layer (160, 1010) is located adjacent to the second electrically insulating layer. The first and second electrically conducting layers together with the second electrically insulating layer form a metal-insulator-metal stack that greatly increases the capacitance area of the capacitor. In one embodiment the capacitor is formed using what may be referred to as a removable metal gate (RMG) approach.

Abstract: Embodiments of the invention relate to a method of fabricating logic transistors using replacement metal gate (RMG) logic flow with modified process to form recessed channel array transistors (RCAT) on a common semiconductor substrate. An embodiment comprises forming an interlayer dielectric (ILD) layer on a semiconductor substrate, forming a first recess in the ILD layer of a first substrate region, forming a recessed channel in the ILD layer and in the substrate of a second substrate region, depositing a first conformal high-k dielectric layer in the first recess and a second conformal high-k dielectric layer in the recessed channel, and filling the first recess with a first gate metal and the recessed channel with a second gate metal.

Abstract: In one embodiment, a capacitor comprises a substrate, a first electrically insulating layer over the substrate, a fin comprising a semiconducting material over the first electrically insulating layer, a cap formed from a suicide material on the first semiconducting fin, a first electrically conducting layer over the first electrically insulating layer and adjacent to the fin, a second electrically insulating layer adjacent to the first electrically conducting layer and a second electrically conducting layer adjacent to the second electrically insulating

Abstract: Methods and apparatuses to increase a surface area of a memory cell capacitor are described. An opening in a second insulating layer deposited over a first insulating layer on a substrate is formed. The substrate has a fin. A first insulating layer is deposited over the substrate adjacent to the fin. The opening in the second insulating layer is formed over the fin. A first conducting layer is deposited over the second insulating layer and the fin. A third insulating layer is deposited on the first conducting layer. A second conducting layer is deposited on the third insulating layer. The second conducting layer fills the opening. The second conducting layer is to provide an interconnect to an upper metal layer. Portions of the second conducting layer, third insulating layer, and the first conducting layer are removed from a top surface of the second insulating layer.

Abstract: In general, in one aspect, a method includes forming a semiconductor fin. A first insulating layer is formed adjacent to the semiconductor fin. A second insulating layer is formed over the first insulating layer and the semiconductor fin. A first trench is formed in the second insulating layer and the first insulating layer therebelow. The first trench is filed with a polymer. A third insulating layer is formed over the polymer. A second trench is formed in the third insulating layer, wherein the second trench is above the first trench and extends laterally therefrom. The polymer is removed from the first trench. A capacitor is formed within the first and the second trenches.

Abstract: Methods and apparatuses to increase a surface area of a memory cell capacitor are described. An opening in a second insulating layer deposited over a first insulating layer on a substrate is formed. The substrate has a fin. A first insulating layer is deposited over the substrate adjacent to the fin. The opening in the second insulating layer is formed over the fin. A first conducting layer is deposited over the second insulating layer and the fin. A third insulating layer is deposited on the first conducting layer. A second conducting layer is deposited on the third insulating layer. The second conducting layer fills the opening. The second conducting layer is to provide an interconnect to an upper metal layer. Portions of the second conducting layer, third insulating layer, and the first conducting layer are removed from a top surface of the second insulating layer.

Abstract: An embedded memory cell includes a semiconducting substrate (110), a transistor (120) having a source/drain region (121) at least partially embedded in the semiconducting substrate, and a capacitor (130) at least partially embedded in the semiconducting substrate. The capacitor includes a first electrode (131) and a second electrode (132) that are electrically isolated from each other by a first electrically insulating material (133). The first electrode is electrically connected to the semiconducting substrate and the second electrode is electrically connected to the source/drain region of the transistor.

Abstract: An integrated circuit includes a semiconducting substrate (110), electrically conductive layers (120) over the semiconducting substrate, and a capacitor (130) at least partially embedded within the semiconducting substrate such that the capacitor is entirely underneath the electrically conductive layers. A storage node voltage is on an outside layer (132) of the capacitor. In the same or another embodiment, the integrated circuit may act as a 1T-1C embedded memory cell including the semiconducting substrate, an electrically insulating stack (160) over the semiconducting substrate, a transistor (140) including a source/drain region (142) within the semiconducting substrate and a gate region (141) above the semiconducting substrate, a trench (111) extending through the electrically insulating layers and into the semiconducting substrate, a first electrically insulating layer (131) located within the trench, and the capacitor located within the trench interior to the first electrically insulating layer.

Abstract: A process of forming a semiconductive capacitor device for a memory circuit includes forming a first capacitor cell recess and a second capacitor cell recess that are spaced apart by a capacitor cell boundary of a first height. The process includes lowering the first height of the capacitor cell boundary to a second height. A common plate capacitor bridges between the first recess and the second recess over the boundary above the second height and below the first height.

Abstract: A processor may comprise a cache, which may be divided into a first and second section while the processor operates in a low-power mode. A cache line of the first section may be fragmented into segments. A first encoder may generate first data bits and check bits while encoding a first portion of a data stream and a second encoder may, separately, generate second data bits and check bits while encoding a second portion of the data stream. The first data bits may be stored in a first segment of the first section and the check bits in a first portion of the second section that is associated with the first segment. The first decoder may correct errors in multiple bit positions within the first data bits using the check bits stored in the first portion and the second decoder may, separately, decode the second data bits using the second set of check bits.

Abstract: Architectures including digital outphasing transmitters. Digital signal generation circuitry generates at least two base-band sinusoid signals. Bandpass modulation circuitry is coupled to receive the base-band sinusoid signals and generates at least two modulated digital signals. Power amplifiers are coupled to receive the modulated digital signals to amplify the modulated digital signals. The amplified modulated signals are combined and transmitted.

Abstract: Embodiments of the invention are generally directed to systems, methods, and apparatuses for inverter based return-to-zero (RZ)+non-RZ (NRZ) signaling. The interface circuit contains multiple ganged drivers (some or all of them are turned on at one point of time) and edge detection circuitry (to configure/modulate edges of the input data signal). These two circuits together generate weighted return-to-zero (RZ)+non-RZ (NRZ) signal.

Abstract: Provided herein are embodiments of layouts for applying impact ionization potentials across the channel of a selected floating body cell in an array without having to impose the potential on other unselected cells.

Abstract: For one embodiment, an apparatus may include a memory cell to store a bit value, wherein the memory cell may lose the bit value in response to a memory access operation. The apparatus may also include first circuitry to detect whether the memory cell loses the bit value in response to the memory access operation and second circuitry to restore the bit value in the memory cell in response to detection that the memory cell loses the bit value. Other embodiments include other apparatuses, methods, and systems.

Abstract: In some embodiments, provided is an integrated circuit with a first die coupled to a second die. The second die has through-silicon vias disposed through it to provide power references to the first die. The through-silicon vias are laterally re-positionable without inhibiting circuit sections in the second die.

Abstract: A signal generating circuit is provided. The signal generating circuit may include a plurality of delay circuits coupled to provide a plurality of control signals, a weighted-sum circuit to receive the plurality of control signals and to provide an output analog signal, and a comparator circuit to compare the output analog signal with a voltage and to provide a pulse width modulated (PWM) signal based on the comparison.

Abstract: For one disclosed embodiment, an integrated circuit may comprise a memory array on the integrated circuit and access control circuitry on the integrated circuit. The memory array may have a bit line with one or more resistors along the bit line and may have a plurality of memory cells coupled to the bit line at a plurality of locations along the bit line. At least one resistor along the bit line may be between two locations at which memory cells are coupled to the bit line. The access control circuitry may be to select a memory cell coupled to the bit line and to sense a signal on the bit line from the selected memory cell. Other embodiments are also disclosed.