Abstract: A semiconductor structure includes a first substrate, a metallic pad disposed over the first substrate, a dielectric structure disposed over the first substrate and exposing a portion of the metallic pad, a bonding structure disposed over and electrically connected to the metallic pad, a barrier ring surrounding the bonding structure, and a through-hole penetrating the first substrate and the dielectric structure. The bonding structure includes a bottom and a sidewall, the bottom of the bonding structure is in contact with the metallic pad, a first portion of the sidewall of the bonding structure is in contact with the dielectric structure, and a second portion of the sidewall of the bonding structure is in contact with the barrier ring.

Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a semiconductor substrate and a lower electrode over the semiconductor substrate. The semiconductor device structure also includes a first dielectric layer over the lower electrode, a second dielectric layer over the first dielectric layer, and a third dielectric layer over the second dielectric layer. Oxygen ions are bonded more tightly in the second dielectric layer than those in the first dielectric layer, and oxygen ions are bonded more tightly in the second dielectric layer than those in the third dielectric layer.

Abstract: In some embodiments, the present disclosure relates to a process tool which includes a housing that defines a vacuum chamber. A wafer chuck is in the housing and a carrier wafer is on the wafer chuck. A camera is integrated on the wafer chuck such that the camera faces a top of the housing. The camera is configured to wirelessly capture images of an object of interest within the housing. Outside of the housing is a wireless receiver. The wireless receiver is configured to receive the images from the camera while the vacuum chamber is sealed.

Abstract: Various embodiments of the present application are directed towards a trench capacitor with a conductive cap structure. In some embodiments, the trench capacitor comprises a lower capacitor electrode, a capacitor dielectric layer overlying the lower capacitor electrode, and an upper capacitor electrode overlying the capacitor dielectric layer. The capacitor dielectric layer and the upper capacitor electrode are depressed into the substrate and define a gap sunken into the substrate. The conductive cap structure overlies and seals the gap on the upper capacitor electrode. In some embodiments, the conductive cap structure comprises a metal layer formed by physical vapor deposition (PVD) and further comprises a metal nitride layer formed overlying the metal layer by chemical vapor deposition (CVD). In other embodiments, the conductive cap structure is or comprises other suitable materials and/or is formed by other deposition processes.

Abstract: Various embodiments of the present disclosure are directed towards a memory cell. The memory cell includes a bottom electrode overlying a substrate. A data storage structure overlies the bottom electrode. A top electrode overlies the data storage structure. Sidewalls of the top electrode and sidewall of the bottom electrode are aligned. Further, a getter layer abuts the bottom electrode.

Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a semiconductor substrate and a lower electrode over the semiconductor substrate. The semiconductor device structure also includes a first oxide layer over the lower electrode, a second oxide layer over the first oxide layer, and a third oxide layer over the second oxide layer. Oxygen ions are bonded more tightly in the second oxide layer than those in the first oxide layer, and oxygen ions are bonded more tightly in the second oxide layer than those in the third oxide layer. The semiconductor device structure further includes an upper electrode over the third oxide layer.

Abstract: A phase change memory (PCM) device including a PCM structure with a getter metal layer disposed between a phase change element (PCE) and a dielectric layer is provided. The PCM structure includes a dielectric layer, a bottom electrode, a via, a PCE, and a getter metal layer. The dielectric layer is disposed over a substrate. The bottom electrode overlies the dielectric layer. The via extends through the dielectric layer, from a bottom surface of the dielectric layer to a top surface of the dielectric layer. The phase change element overlies the bottom electrode. The getter metal layer is disposed between the dielectric layer and the PCE.

Abstract: In some embodiments, the present disclosure relates to an integrated chip. The integrated chip includes a bottom electrode disposed over one or more interconnect layers and a diffusion barrier layer is arranged over the bottom electrode. A data storage layer is separated from the bottom electrode by the diffusion barrier layer. A top electrode is over the data storage layer.

Abstract: The present disclosure, in some embodiments, relates to a resistive random access memory (RRAM) device. The RRAM device includes a first electrode over a substrate and a second electrode over the substrate. A data storage structure is disposed between the first electrode and the second electrode. The data storage structure has a plurality of sub-layers including one or more metals having non-zero concentrations that change as a distance from the first electrode increases.

Abstract: A semiconductor device includes a diffusion barrier structure, a bottom electrode, a top electrode over the bottom electrode, a switching layer and a capping layer. The bottom electrode is over the diffusion barrier structure. The top electrode is over the bottom electrode. The switching layer is between the bottom electrode and the top electrode, and configured to store data. The capping layer is between the top electrode and the switching layer. A thermal conductivity of the diffusion barrier structure is greater than approximately 20 W/mK.

Abstract: A phase change memory (PCM) device including a PCM structure with a getter metal layer disposed between a phase change element (PCE) and a dielectric layer is provided. The PCM structure includes a dielectric layer, a bottom electrode, a via, a PCE, and a getter metal layer. The dielectric layer is disposed over a substrate. The bottom electrode overlies the dielectric layer. The via extends through the dielectric layer, from a bottom surface of the dielectric layer to a top surface of the dielectric layer. The phase change element overlies the bottom electrode. The getter metal layer is disposed between the dielectric layer and the PCE.

Abstract: In some embodiments, a semiconductor device is provided. The semiconductor device includes a first amorphous switching structure disposed over a first electrode. A buffer structure is disposed over the first amorphous switching structure. A second amorphous switching structure is disposed over the buffer structure. A second electrode is disposed over the second amorphous switching structure, where the first and second amorphous switching structures are configured to switch between low resistance states and high resistance states depending on whether a voltage from the first electrode to the second electrode exceeds a threshold voltage.

Abstract: A semiconductor structure includes a first substrate, a metallic pad disposed over the first substrate, a dielectric structure disposed over the first substrate and exposing a portion of the metallic pad, a bonding structure disposed over and electrically connected to the metallic pad, a barrier ring surrounding the bonding structure, and a through-hole penetrating the first substrate and the dielectric structure. The bonding structure includes a bottom and a sidewall, the bottom of the bonding structure is in contact with the metallic pad, a first portion of the sidewall of the bonding structure is in contact with the dielectric structure, and a second portion of the sidewall of the bonding structure is in contact with the barrier ring.

Abstract: The present disclosure, in some embodiments, relates to a resistive random access memory (RRAM) device. The RRAM device includes a lower electrode over a conductive interconnect, and an upper electrode over the lower electrode. A data storage structure is disposed between the lower electrode and the upper electrode. The data storage structure includes a plurality of metal oxide layers having one or more metals from a first group of metals. A concentration of the one or more metals from the first group of metals changes as a distance from the lower electrode increases.

Abstract: In some embodiments, a semiconductor device is provided. The semiconductor device includes a first amorphous switching structure disposed over a first electrode. A buffer structure is disposed over the first amorphous switching structure. A second amorphous switching structure is disposed over the buffer structure. A second electrode is disposed over the second amorphous switching structure, where the first and second amorphous switching structures are configured to switch between low resistance states and high resistance states depending on whether a voltage from the first electrode to the second electrode exceeds a threshold voltage.

Abstract: A semiconductor device includes a bottom electrode, a top electrode, a switching layer and a diffusion harrier layer. The top electrode is over the bottom electrode. The switching layer is between the bottom electrode and the top electrode, and configured to store data. The diffusion barrier layer is between the bottom electrode and the switching layer to obstruct diffusion of ions between the switching layer and the bottom electrode.

Abstract: A structure and formation method of a semiconductor device structure is provided. The method includes forming a lower electrode layer over a semiconductor substrate and forming a data storage layer over the lower electrode layer. The method also includes forming an ion diffusion barrier layer over the data storage layer and forming a capping layer over the ion diffusion barrier layer. The ion diffusion barrier layer is a metal material doped with nitrogen, carbon, or a combination thereof. The capping layer is made of a metal material. The method further includes forming an upper electrode layer over the capping layer.

Abstract: A semiconductor structure includes a first conductive layer and a second conductive layer, and a memory device between the first conductive layer and the second conductive layer. The memory device includes a top electrode, a bottom electrode adjacent to the first conductive layer, and a phase change material between the top electrode and the bottom electrode. The bottom electrode includes a first portion and a second portion between the first portion and the first conductive layer.

Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a semiconductor substrate and a lower electrode over the semiconductor substrate. The semiconductor device structure also includes a first oxide layer over the lower electrode, a second oxide layer over the first oxide layer, and a third oxide layer over the second oxide layer. Oxygen ions are bonded more tightly in the second oxide layer than those in the first oxide layer, and oxygen ions are bonded more tightly in the second oxide layer than those in the third oxide layer. The semiconductor device structure further includes an upper electrode over the third oxide layer.

Abstract: A capacitive device includes: a first metal plate; a first planar dielectric layer disposed on the first metal plate; a second planar dielectric layer disposed on the first planar dielectric layer; a third planar dielectric layer disposed on the second planar dielectric layer; and a second metal plate disposed on the third planar dielectric layer; wherein the first planar dielectric layer has a first dielectric constant, the second planar dielectric layer has a second dielectric constant, and the third planar dielectric layer has a third dielectric constant, and the second dielectric constant is different from the first dielectric constant and the third dielectric constant, the second planar dielectric layer includes Tantalum pentoxide.