Patents by Inventor Hsiang Wang

Hsiang Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240363151
    Abstract: The present invention provides a storage device suitable for high temperature. A plurality of memory devices are disposed on the top of a substrate, respectively, and connected electrically to a control device and a temperature sensor. The temperature sensor includes a first predetermined temperature, a second predetermined temperature, and a third predetermined temperature. The temperature sensor is used for sensing the temperature of the plurality of memory devices and generating a temperature value. The control device adjusts the transmission rate of the storage signal to make the storage device adapt to high temperature environments.
    Type: Application
    Filed: June 15, 2023
    Publication date: October 31, 2024
    Inventors: CHIN FENG CHANG, Hsun Chia Ma, Wei Hsiang Wang
  • Publication number: 20240355761
    Abstract: In some embodiments, the present disclosure relates to a semiconductor structure. The semiconductor substrate includes a semiconductor material over a base substrate. The semiconductor substrate has one or more sidewalls forming a crack stop trench that is laterally between a central region of the semiconductor substrate and a peripheral region of the semiconductor substrate that surrounds the central region. The peripheral region of the semiconductor substrate includes a plurality of cracks.
    Type: Application
    Filed: July 1, 2024
    Publication date: October 24, 2024
    Inventors: Jiun-Yu Chen, Chun-Lin Tsai, Yun-Hsiang Wang, Chia-Hsun Wu, Jiun-Lei Yu, Po-Chih Chen
  • Publication number: 20240355711
    Abstract: Various embodiments of the present application are directed towards an integrated circuit (IC) chip comprising a front-end-of-line (FEOL) through semiconductor-on-substrate via (TSV), as well as a method for forming the IC chip. In some embodiments, a semiconductor layer overlies a substrate. The semiconductor layer may, for example, be or comprise a group III-V semiconductor and/or some other suitable semiconductor(s). A semiconductor device is on the semiconductor layer, and a FEOL layer overlies the semiconductor device. The FEOL TSV extends through the FEOL layer and the semiconductor layer to the substrate at a periphery of the IC chip. An intermetal dielectric (IMD) layer overlies the FEOL TSV and the FEOL layer, and an alternating stack of wires and vias is in the IMD layer.
    Type: Application
    Filed: July 2, 2024
    Publication date: October 24, 2024
    Inventors: Yun-Hsiang Wang, Chun Lin Tsai, Jiun-Lei Jerry Yu, Po-Chih Chen
  • Patent number: 12125366
    Abstract: A system for physical-distancing detection in a specified area includes a locator locating a positioning quadrangle plane in a specified area; an image-capturing device obliquely capturing an image of the specified area to generate a captured image of the specified area; and a coordinate converter defining a coordinate conversion function according to raw coordinates of selected points of the positioning quadrangle plane in the captured image of the specified area and reference coordinates of the selected points of the positioning quadrangle plane in an overlooked image of the specified area. The image-capturing device converts raw coordinates of the captured image of the specified area into converted coordinates of the overlooked image of the specified area by way of the coordinate conversion function, determines a physical-distancing condition between two persons according to the converted coordinates, and automatically takes an action corresponding to the physical-distancing condition.
    Type: Grant
    Filed: January 11, 2022
    Date of Patent: October 22, 2024
    Assignee: ALPHA NETWORKS INC.
    Inventor: Cheng-Hsiang Wang
  • Publication number: 20240341061
    Abstract: A charging device includes a liquid cooled cable, a charging gun, a charging station, a station connector and a communicating pipe. The liquid cooled cable has a gun end and a station end. The liquid cooled cable includes a first insulating tube, a second insulating tube, a tape, a filler and a sheath. The first insulating tube has a first channel. The second insulating tube has a second channel and a braided copper mesh. The charging gun is connected to the gun end of the liquid cooled cable. The charging gun includes a gun connector and a first liquid return channel. The station connector includes a second liquid return channel and a connection part. One end of the second liquid return channel communicates to the second channel. The connection part is connected to the station end of the liquid cooled cable.
    Type: Application
    Filed: May 9, 2023
    Publication date: October 10, 2024
    Inventors: Ko-Ming CHEN, Duan-Yih LIN, Cheng-Hong CHEN, Shih-Wei WANG, Shih-Hsiang WANG
  • Patent number: 12111715
    Abstract: The present invention provides a memory structure, which is disposed on a first circuit board and connected electrically to a system power supply of a second circuit board. The memory structure comprises a plurality of memory unit, a power control component, and a display component. The power control component receives a first voltage of the system power supply. The power control component includes a power management unit and a linear voltage stabilizing unit. The display component includes a light-emitting unit and a control unit. The power control component provides a second voltage to the plurality of memory units using the power management unit. The linear voltage stabilizing unit provides a third voltage to the light-emitting unit and the control unit. The power management unit distributes the power supply to the plurality of memory units, the light-emitting unit, and the control unit for further usage.
    Type: Grant
    Filed: February 3, 2023
    Date of Patent: October 8, 2024
    Assignee: TEAM GROUP INC.
    Inventors: Yu Hsuan Yen, Hsi Lin Kuo, Wei Hsiang Wang, Chin Feng Chang
  • Publication number: 20240332411
    Abstract: In some embodiments, the present disclosure relates to a semiconductor device. The semiconductor device includes a channel layer over a base substrate and an active layer over the channel layer. A source and a drain are over the active layer. A gate is over the active layer and laterally between the source and the drain. A dielectric is over the active layer and laterally surrounds the source, the drain, and the gate. A cap structure laterally contacts the source and is disposed laterally between the gate and the source. The source vertically extends to a top of the cap structure.
    Type: Application
    Filed: June 11, 2024
    Publication date: October 3, 2024
    Inventors: Ming-Cheng Lin, Chen-Bau Wu, Chun Lin Tsai, Haw-Yun Wu, Liang-Yu Su, Yun-Hsiang Wang
  • Patent number: 12107080
    Abstract: The application discloses a light-emitting device including a carrier which includes an insulating layer, an upper conductive layer formed on the insulating layer, a plurality of conducting vias passing through the insulating layer, and a lower conductive layer formed under the insulating layer; four light-emitting elements arranged in rows and columns flipped on the carrier; and a light-passing unit formed on the carrier and covering the four light-emitting elements; wherein each of the light-emitting elements including a first light-emitting bare die emitting a first dominant wavelength, a second light-emitting bare die emitting a second dominant wavelength, and a third light-emitting bare die emitting a third dominant wavelength; and wherein two adjacent first light-emitting bare die in a row has a first distance W1, two adjacent first light-emitting bare die in a column has a second distance W2, and W1 is the same as W2.
    Type: Grant
    Filed: November 29, 2022
    Date of Patent: October 1, 2024
    Assignee: EPISTAR CORPORATION
    Inventors: Min-Hsun Hsieh, Tzu-Hsiang Wang
  • Publication number: 20240322056
    Abstract: An optical device includes a photoelectric conversion layer, an underlying layer, an anti-reflection layer, and a plurality of meta units. The underlying layer is disposed on the photoelectric conversion layer. The anti-reflection layer is disposed on the underlying layer. The meta units are disposed above the photoelectric conversion layer, in which each of the meta units includes a top portion and a bottom portion, and a projection of the bottom portion on the photoelectric conversion layer is within a projection of the top portion on the photoelectric conversion layer.
    Type: Application
    Filed: March 21, 2023
    Publication date: September 26, 2024
    Inventors: Shin-Hong KUO, Kai-Hao CHANG, Po-Hsiang WANG, Han-Lin WU, Hung-Jen TSAI
  • Patent number: 12100757
    Abstract: In some embodiments, the present disclosure relates to a method of forming a high electron mobility transistor (HEMT) device. The method includes forming a passivation layer over a substrate. A source contact and a drain contact are formed within the passivation layer. A part of the passivation layer is removed to form a cavity. The cavity has a lower portion formed by a first sidewall and a second sidewall of the passivation layer and an upper portion formed by the first sidewall of the passivation layer and a sidewall of the source contact. A gate structure is formed within the passivation layer between the drain contact and the cavity. A cap structure is formed within the cavity.
    Type: Grant
    Filed: July 7, 2023
    Date of Patent: September 24, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ming-Cheng Lin, Chen-Bau Wu, Chun Lin Tsai, Haw-Yun Wu, Liang-Yu Su, Yun-Hsiang Wang
  • Patent number: 12101091
    Abstract: A method includes fabricating a first transistor and a second transistor on a substrate and fabricating a first conducting line and a second conducting line in a first metal layer. The method also includes connecting a gate of the first transistor to the first conducting line and connecting a gate of the second transistor to the second conducting line. The first conducting line and the second conducting line are parallel and adjacent to each other in the first metal layer above the first transistor and the second transistor. The method still includes connecting a source and a drain of the first transistor to a third conducting line.
    Type: Grant
    Filed: April 25, 2023
    Date of Patent: September 24, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Szu-Lin Liu, Jaw-Juinn Horng, Yi-Hsiang Wang, Wei-Lin Lai
  • Patent number: 12094838
    Abstract: In some embodiments, the present disclosure relates to a semiconductor structure. The semiconductor structure includes a stacked semiconductor substrate having a semiconductor material disposed over a base semiconductor substrate. The base semiconductor substrate has a first coefficient of thermal expansion and the semiconductor material has a second coefficient of thermal expansion that is different than the first coefficient of thermal expansion. The stacked semiconductor substrate includes one or more sidewalls defining a crack stop ring trench that continuously extends in a closed path between a central region of the stacked semiconductor substrate and a peripheral region of the stacked semiconductor substrate surrounding the central region. The peripheral region of the stacked semiconductor substrate includes a plurality of cracks and the central region is substantially devoid of cracks.
    Type: Grant
    Filed: July 20, 2023
    Date of Patent: September 17, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Jiun-Yu Chen, Chun-Lin Tsai, Yun-Hsiang Wang, Chia-Hsun Wu, Jiun-Lei Yu, Po-Chih Chen
  • Publication number: 20240304705
    Abstract: A semiconductor device includes a gate structure on a substrate, a first spacer on a sidewall of the gate structure, a second spacer on a sidewall of the first spacer, a third spacer on a sidewall of the second spacer, and first and second stacks of an epitaxial layer and a cap layer respectively disposed at first and second sides of the gate structure. Preferably, a part of the second spacer comprises an I-shape, the cap layer includes a planar top surface and an inclined sidewall, the cap layer contacts the second spacer and the third spacer directly, and the cap layer includes a vertical sidewall connected to the inclined sidewall.
    Type: Application
    Filed: May 16, 2024
    Publication date: September 12, 2024
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Wei-Chih Chuang, Chia-Jong Liu, Kuang-Hsiu Chen, Chung-Ting Huang, Chi-Hsuan Tang, Kai-Hsiang Wang, Bing-Yang Jiang, Yu-Lin Cheng, Chun-Jen Chen, Yu-Shu Lin, Jhong-Yi Huang, Chao-Nan Chen, Guan-Ying Wu
  • Publication number: 20240304635
    Abstract: An electronic device includes a substrate, a signal line, a semiconductor, a first conductive portion and a second conductive portion. The signal line is disposed on the substrate. The semiconductor is disposed on the substrate and overlapped with the signal line. Wherein the semiconductor is electrically connected to the first conductive portion and the second conductive portion. Wherein in a top view, at least a portion of the signal line is disposed between the first conductive portion and the second conductive portion. Wherein the first conductive portion has a first curve edge, the second conductive portion has a second curve edge, and the first curve edge and the second curve edge are facing the at least a portion of the signal line and are convex toward the at least a portion of the signal line.
    Type: Application
    Filed: May 21, 2024
    Publication date: September 12, 2024
    Inventors: Cheng-Hsiung CHEN, Pei-Chieh CHEN, Chao-Hsiang WANG, Yi-Ching CHEN
  • Publication number: 20240297261
    Abstract: A semiconductor device includes a substrate, a buffer layer, a gradient layer, an active layer, a window layer, and an optical filtering layer. The substrate includes a first element and a second element. The buffer layer is disposed on the substrate. The gradient layer is formed on the buffer layer, and includes sublayers. Each sublayer includes the first, second, and third elements. For each sublayer, a lattice constant thereof is adjusted by changing a ratio of the second element to the third element. The active layer is formed on the gradient layer, and includes the first, second, and third elements. The window layer is formed on the active layer. The optical filtering layer includes the first, second, and third elements, and is formed on the window layer to block a portion of light having a wavelength in a predetermined wavelength range.
    Type: Application
    Filed: March 1, 2024
    Publication date: September 5, 2024
    Inventors: Hung-Wen HUANG, Yung-Chao CHEN, Yi-Hsiang WANG, Wei LIN
  • Publication number: 20240280872
    Abstract: The electronic device includes a substrate; an active layer disposed above the first substrate; a first signal line disposed above the substrate and overlapped with the active layer; and a conductive pattern disposed above the substrate. The conductive pattern includes a first side extending in a first direction, a second side extending in the first direction, and a third side connected between the first side and the second side, and wherein the third side includes a part that the part is not parallel to the first direction and not perpendicular to the first direction, and the part is located out of the first signal line and overlapped with the active layer.
    Type: Application
    Filed: April 30, 2024
    Publication date: August 22, 2024
    Inventors: Chung-Wen YEN, Yu-Tsung LIU, Chao-Hsiang WANG, Te-Yu LEE
  • Publication number: 20240274715
    Abstract: A semiconductor device includes a gate structure on a substrate and an epitaxial layer adjacent to the gate structure, in which the epitaxial layer includes a first buffer layer, an anisotropic layer on the first buffer layer, a second buffer layer on the first buffer layer, and a bulk layer on the anisotropic layer. Preferably, a concentration of boron in the bulk layer is less than a concentration of boron in the anisotropic layer, a concentration of boron in the first buffer layer is less than a concentration of boron in the second buffer layer, and the concentration of boron in the second buffer layer is less than the concentration of boron in the anisotropic layer.
    Type: Application
    Filed: March 21, 2023
    Publication date: August 15, 2024
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Kai-Hsiang Wang, Yi-Fan Li, Chung-Ting Huang, Chi-Hsuan Tang, Chun-Jen Chen, Ti-Bin Chen, Chih-Chiang Wu
  • Publication number: 20240247820
    Abstract: An evaporative-cooling window fan is configured to draw air from outdoors to indoors such that it is cooled and filtered as it passes there-through.
    Type: Application
    Filed: January 25, 2023
    Publication date: July 25, 2024
    Inventors: Chi Hsiang Wang, Hao Han Wang
  • Patent number: 12046537
    Abstract: Various embodiments of the present application are directed towards an integrated circuit (IC) chip comprising a front-end-of-line (FEOL) through semiconductor-on-substrate via (TSV), as well as a method for forming the IC chip. In some embodiments, a semiconductor layer overlies a substrate. The semiconductor layer may, for example, be or comprise a group III-V semiconductor and/or some other suitable semiconductor(s). A semiconductor device is on the semiconductor layer, and a FEOL layer overlies the semiconductor device. The FEOL TSV extends through the FEOL layer and the semiconductor layer to the substrate at a periphery of the IC chip. An intermetal dielectric (IMD) layer overlies the FEOL TSV and the FEOL layer, and an alternating stack of wires and vias is in the IMD layer.
    Type: Grant
    Filed: July 21, 2022
    Date of Patent: July 23, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yun-Hsiang Wang, Chun Lin Tsai, Jiun-Lei Jerry Yu, Po-Chih Chen
  • Publication number: 20240242584
    Abstract: A monitoring method of tracking and recognizing based on thermal images is executed by a monitoring system. The monitoring system includes a monitoring host and a monitoring server. The monitoring host is installed in a ward room, a bathroom, a workplace, or an operation place that needs monitoring. The monitoring host utilizes an infrared camera to capture thermal image frames of care recipients, and utilizes a trained AI human detection model to analyze the thermal image frames for recognizing a motion of a human in the thermal image frames. When the motion matches a condition for generating a warning signal, the monitoring host generates and transmits the warning signal to the monitoring server. Therefore, a care provider can determine whether the care recipients have unexpected behaviors, such as falling from a bed, falling, or staying still for a long time, and can deal with it immediately.
    Type: Application
    Filed: January 16, 2023
    Publication date: July 18, 2024
    Inventors: Chin-Feng Chung, Chia-Po Wei, Chung-Hsiang Wang