Abstract: An embodiment of a circuit is described that includes a first inductor comprising a first end and a second end, where the first end of the first inductor forms an input node of the circuit. The embodiment of the circuit further includes a second inductor comprising a first end and a second end, where the second end of the first inductor is coupled to the first end of the second inductor forming an output node of the circuit; a resistor coupled to the second end of the second inductor; and an electrostatic discharge structure coupled to the output node and configured to provide an amount of electrostatic discharge protection, where the amount of electrostatic discharge protection is based on a parasitic bridge capacitance and a load capacitance metric.

Abstract: A system for protecting metal oxide semiconductor field effect transistor (MOSFET) output drivers within an integrated circuit (IC) from an electrostatic discharge (ESD) includes a first MOSFET output driver and a second MOSFET output driver positioned within a common IC diffusion material. The system includes a contact ring coupled to the common IC diffusion material and arranged along an outer edge of a perimeter surrounding the MOSFET output drivers. A centroid of each MOSFET output driver is common with a centroid of the perimeter surrounding both MOSFET output drivers. Each MOSFET output driver has a value of substrate resistance (Rsub) that initiates bipolar snapback in the MOSFET output driver at which an ESD event occurs. The value of Rsub depends upon a composite distance from the centroid of each MOSFET output driver to the contact ring.

Abstract: A method of generating a circuit design comprising a T-coil network includes determining inductance for inductors and a parasitic bridge capacitance of the T-coil network. The parasitic bridge capacitance is compared with a load capacitance metric that depends upon parasitic capacitance of a load coupled to an output of the T-coil network. An amount of electrostatic discharge (ESD) protection of the circuit design that is coupled to the output of the T-coil network and/or a parameter of the inductors of the T-coil network is selectively adjusted according to the comparison. The circuit design, which can specify inductance of the inductors, the amount of ESD protection, and/or the width of windings of the inductors, is outputted.

Abstract: An integrated circuit device includes an integrated circuit formed in a semiconductor die and an integrated circuit package containing the semiconductor die. The integrated circuit package includes a thermal interface material substantially between the semiconductor die and a heat spreader of the integrated circuit device for conducting heat from the semiconductor die to the heat spreader. The thermal interface material includes diamond particles and has a thickness selected to reduce capacitance between the semiconductor die and the heat spreader over that of a conventional integrated circuit device without reducing the rate of thermal conduction from the semiconductor die to the heat spreader. As a result, the integrated circuit device has improved electrostatic discharge immunity.

Abstract: An input/output (“I/O”) circuit has a first N-channel metal-oxide semiconductor (“NMOS”) field-effect transistor (“FET”) coupled to the input pin with a silicide block. A first P-channel metal-oxide semiconductor (“PMOS”) FET is directly connected to the input pin, with its N-well electrically coupled to an ESD well bias circuit. An NMOS low-voltage differential signal (“LVDS”) driver is also directly connected to the input pin, and has cascaded NMOS FETs. The first NMOS FET of the LVDS driver is fabricated within a first P-tap guard ring electrically coupled to ground and an N-well guard ring coupled to the ESD well bias. The second NMOS FET of the LVDS driver is fabricated within a second P-tap guard ring electrically coupled to ground.

Abstract: Electro-static discharge (“ESD”) protection for a die of a multi-chip module is described. A contact has an externally exposed surface after formation of the die and prior to assembly of the multi-chip module. The contact is for a die-to-die interconnect of the multi-chip module. The contact is for an internal node of the multi-chip module after the assembly of the multi-chip module. A driver circuit is coupled to the contact and has a first input impedance. A discharge circuit is coupled to the contact for electrostatic discharge protection of the driver circuit and has a first forward bias impedance associated with a first discharge path. The first forward bias impedance is a fraction of the first input impedance.

Abstract: An embodiment of the invention involves: providing a database that includes layout information representing a layout within an integrated circuit of an electrical circuit; identifying from the information in the database each conductive path of a selected type in the electrical circuit; extracting layout information from the database for each conductive path of the selected type; and calculating an electrical parameter for each conductive path of the selected type, as a function of the layout information obtained for that conductive path during the extracting. In addition, in a different configuration of the embodiment, a report can be generated containing information based on the electrical parameter calculated during the calculating for at least one of the conductive paths of the selected type.

Abstract: An embodiment of a method to form a hybrid integrated circuit device is described. This embodiment of the method comprises: forming a first die using a first lithography, where the first die is on a substrate; and forming a second die using a second lithography, where the second die is on the first die. The first lithography used to form the first die is a larger lithography than the second lithography used to form the second die. The first die is an IO die.

Abstract: An MOS transistor is programmed in a non-volatile memory cell. A storage capacitor in the non-volatile memory cell is used to enhance programming efficiency by providing additional charge to the programming terminal of the MOS transistor during breakdown of the gate dielectric, thus avoiding soft programming faults. In a particular embodiment the storage capacitor is a second MOS transistor having a thicker gate dielectric layer than the dielectric layer of the programmable MOS transistor.

Abstract: A method of generating a circuit design comprising a T-coil network includes determining inductance for inductors and a parasitic bridge capacitance of the T-coil network. The parasitic bridge capacitance is compared with a load capacitance metric that depends upon parasitic capacitance of a load coupled to an output of the T-coil network. An amount of electrostatic discharge (ESD) protection of the circuit design that is coupled to the output of the T-coil network and/or a parameter of the inductors of the T-coil network is selectively adjusted according to the comparison. The circuit design, which can specify inductance of the inductors, the amount of ESD protection, and/or the width of windings of the inductors, is outputted.

Abstract: Formation of a hybrid integrated circuit device is described. A design for the integrated circuit is obtained and separated into at least two portions responsive to component sizes. A first die is formed for a first portion of the hybrid integrated circuit device using at least in part a first minimum dimension lithography. A second die is formed for a second portion of the device using at least in part a second minimum dimension lithography, where the second die has the second minimum dimension lithography as a smallest lithography used for the forming of the second die. The first die and the second die are attached to one another via coupling interconnects respectively thereof to provide the hybrid integrated circuit device.

Abstract: A system for protecting metal oxide semiconductor field effect transistor (MOSFET) output drivers within an integrated circuit (IC) from an electrostatic discharge (ESD) includes a first MOSFET output driver and a second MOSFET output driver positioned within a common IC diffusion material. The system includes a contact ring coupled to the common IC diffusion material and arranged along an outer edge of a perimeter surrounding the MOSFET output drivers. A centroid of each MOSFET output driver is common with a centroid of the perimeter surrounding both MOSFET output drivers. Each MOSFET output driver has a value of substrate resistance (Rsub) that initiates bipolar snapback in the MOSFET output driver at which an ESD event occurs. The value of Rsub depends upon a composite distance from the centroid of each MOSFET output driver to the contact ring.

Abstract: Enhanced electrostatic discharge (“ESD”) protection for an integrated circuit is described. An embodiment relates generally to a circuit for protection against ESD. The circuit has an input/output node and a driver. The driver has a first transistor and a second transistor. A first source/drain node of the first transistor is coupled to the input/output node. A second source/drain node of the first transistor forms a first interior node capable of accumulating charge when electrically floating. A first current flow control circuit is coupled to a discharge node and the second source/drain node of the first transistor. The first current flow control circuit is electrically oriented in a bias direction for allowing accumulated charge to discharge from the first interior node via the first current flow control circuit to the discharge node.

Abstract: An integrated circuit includes a pass gate having an input and an output. An NMOS pass transistor is connected between the input and the output. The drain of the NMOS pass transistor is connected to the input and the source of the NMOS pass transistor is connected to a node between the source of the NMOS transistor and the output of the pass gate. A current clamp is connected between the node and a current sink so as to conduct current to the current sink when the node reaches a threshold value.

Abstract: A method of protecting a circuit design implemented within an integrated circuit (IC) from electrostatic discharge (ESD) can include positioning a device array pair comprising first and second device arrays on the IC to share a common centroid, wherein the first and second device arrays are matched. An ESD diode array pair comprising first and second ESD diode arrays can be positioned on the IC adjacent to a first perimeter encompassing the first and second device arrays, wherein the first and second ESD diode arrays share the common centroid and are matched. A cathode terminal of each ESD diode of the first ESD diode array can be coupled to an input of the first device array, and a cathode terminal of each ESD diode of the second ESD diode array can be coupled to an input of the second device array.

Abstract: An input/output (“I/O”) circuit has a first N-channel metal-oxide semiconductor (“NMOS”) field-effect transistor (“FET”) coupled to the input pin with a silicide block. A first P-channel metal-oxide semiconductor (“PMOS”) FET is directly connected to the input pin, with its N-well electrically coupled to an ESD well bias circuit. An NMOS low-voltage differential signal (“LVDS”) driver is also directly connected to the input pin, and has cascaded NMOS FETs. The first NMOS FET of the LVDS driver is fabricated within a first P-tap guard ring electrically coupled to ground and an N-well guard ring coupled to the ESD well bias. The second NMOS FET of the LVDS driver is fabricated within a second P-tap guard ring electrically coupled to ground.

Abstract: A method of protecting a circuit design implemented within an integrated circuit (IC) from electrostatic discharge (ESD) can include positioning a device array pair comprising first and second device arrays on the IC to share a common centroid, wherein the first and second device arrays are matched. An ESD diode array pair comprising first and second ESD diode arrays can be positioned on the IC adjacent to a first perimeter encompassing the first and second device arrays, wherein the first and second ESD diode arrays share the common centroid and are matched. A cathode terminal of each ESD diode of the first ESD diode array can be coupled to an input of the first device array, and a cathode terminal of each ESD diode of the second ESD diode array can be coupled to an input of the second device array.

Abstract: A MOS transistor is used as a programmable three-terminal non-volatile memory element. The gate dielectric layer of the MOS transistor has a first portion with a relatively higher dielectric breakdown strength than a second portion. The location of the second portion is chosen so as to avoid having the gate dielectric layer break down near the edge of the active area or isolation area during programming. In a particular embodiment, the gate dielectric layer is silicon oxide, and the first portion is thicker than the second portion.

Abstract: Formation of a hybrid integrated circuit device (400) is described. A design for the integrated circuit (100) is obtained and separated into at least two portions responsive to component sizes. A first die (200) is formed for a first portion of the hybrid integrated circuit device (400) using at least in part a first minimum dimension lithography. A second die (300) is formed for a second portion of the device using at least in part a second minimum dimension lithography, where the second die (300) has the second minimum dimension lithography as a smallest lithography used for the forming of the second die (300). The first die (200) and the second die (300) are attached to one another via coupling interconnects respectively thereof to provide the hybrid integrated circuit device (400).

Abstract: An MOS transistor is programmed in a non-volatile memory cell. A storage capacitor in the non-volatile memory cell is used to enhance programming efficiency by providing additional charge to the programming terminal of the MOS transistor during breakdown of the gate dielectric, thus avoiding soft programming faults. In a particular embodiment the storage capacitor is a second MOS transistor having a thicker gate dielectric layer than the dielectric layer of the programmable MOS transistor.