Abstract: A chip has a wafer portion of a first coefficient of thermal expansion, the wafer portion including at least one via defined by a peripheral sidewall, an insulating region having second average coefficient of thermal expansion, located within the via and covering at least a portion of the peripheral sidewall to a first thickness, a metallic region having a third average coefficient of thermal expansion, located within the via and covering the insulator to a second thickness, the first thickness and second thickness being selected such that expansion of the combination of the insulator and the metal due to heat will match the expansion of the wafer portion as a result of the combined effect of the first and second thicknesses and their respective second and third average coefficients of thermal expansion.

Abstract: An integrated circuit chip includes devices formed by doping of a semiconductor on a substrate and at least one post-device formation through-chip via made up of an annulus of insulating material, an annulus of metallization bounding an outer surface of the annulus of insulating material and an annulus of electrically conductive material within the annulus of insulating material, the annulus of metallization and the annulus of electrically conductive material being electrically isolated from each another.

Abstract: An apparatus for use with multiple chips having multiple posts as to engage at least a portion of a surface of one of the multiple chips, a frame configured to releasably constrain each of the posts so that, when unconstrained, each individual post can contact an individual chip and, when constrained, will allow a uniform vertical force to be applied to the chips.

Abstract: A method performed on a wafer having multiple chips, each including a doped semiconductor and substrate, involves etching an annulus trench partially into the substrate, metalizing an inner and outer perimeter side wall of the annulus trench with a metal, etching a via trench within the periphery of the annulus trench, making a length of the via trench electrically conductive, and thinning the substrate to expose the metal and the electrically conductive material so that the metal on the outer perimeter side wall and on the inner perimeter side wall are both electrically separated from each other and from the electrically conductive material.

Abstract: A method performed on a wafer having multiple chips, each including a doped semiconductor and substrate, involves etching an annulus trench partially into the substrate, metalizing the annulus trench with a metal, etching a via trench within the periphery of the annulus trench, making a length of the via trench electrically conductive, and thinning the substrate to expose the metal and the electrically conductive material.

Abstract: A method for use with multiple chips, each respectively having a bonding surface including electrical contacts and a surface on a side opposite the bonding surface involves bringing a hardenable material located on a body into contact with the multiple chips, hardening the hardenable material so as to constrain at least a portion of each of the multiple chips, moving the multiple chips from a first location to a second location, applying a force to the body such that the hardened, hardenable material will uniformly transfer a vertical force, applied to the body, to the chips so as to bring, under pressure, a bonding surface of each individual chip into contact with a bonding surface of an element to which the individual chips will be bonded, at the second location, without causing damage to the individual chips, element, or bonding surface.

Abstract: A method of attaching a pair of chips, each having primary contacts that can be mated to each other, involves forming one or more secondary contacts on each of the two chips of a shape sufficient to prevent an initial attachment material from contacting any of the primary contacts during a preliminary attachment operation, the secondary contacts further having a height that will prevent the primary contacts from touching when the secondary contacts are brought into contact with each other, bringing the secondary contacts into closer and closer aligned proximity to each other at least until the primary contacts touch in a first phase, and heating the primary contacts until material between each of corresponding primary contacts on each of the chips in the pair forms an electrical connection.

Abstract: A method performed on a wafer having multiple chips, each including a doped semiconductor and substrate, involves etching an annulus trench partially into the substrate, metalizing the annulus trench with a metal, etching a via trench within the periphery of the annulus trench, making a length of the via trench electrically conductive, and thinning the substrate to expose the metal and the electrically conductive material.

Abstract: A method performed on a wafer having multiple chips, each including a doped semiconductor and substrate, involves etching an annulus trench partially into the substrate, metalizing an inner and outer perimeter side wall of the annulus trench with a metal, etching a via trench within the periphery of the annulus trench, making a length of the via trench electrically conductive, and thinning the substrate to expose the metal and the electrically conductive material so that the metal on the outer perimeter side wall and on the inner perimeter side wall are both electrically separated from each other and from the electrically conductive material.

Abstract: A method of joining contacts on two chips, each having multiple contacts, to each other involves maintaining a first of the chips at a first temperature, the first of the chips having a rigid electrical contact thereon, bringing a second chip, having an electrical contact that is malleable with respect to the rigid contact and matingly corresponding thereto, into contact with the first such that the corresponding rigid and malleable contacts are brought together, locally raising the second of the chips to a local temperature that is sufficiently high to cause material of the rigid and malleable contact to interdiffuse, interpenetrate or both, but below both a temperature that would cause the material to become liquidus and a fuse temperature, and allowing the second of the chips to cool to at least the first temperature.

Abstract: An electrical connection between two chips includes an IC pad on a first chip, an IC pad on a second chip, a first barrier metal over the IC pad of the first chip, a second barrier metal over the IC pad of the second chip, a malleable electrically conductive metal, different from the barrier metals, trapped between the first barrier metal and the second barrier metal, the first barrier metal, the malleable conductive metal and the second barrier metal forming a complete electrically conductive path between the IC pad of the first chip and the IC pad of the second chip.

Abstract: A method involves stacking a first chip, comprising high-speed circuitry formed using a first fabrication process, together with a wafer comprising multiple iterations of low-speed circuitry formed using a second fabrication process, hybridizing the first chip to the wafer so as to form electrical connections between the first chip and one of the iterations of the low-speed circuitry so as to form a hybridized unit and dicing the unit from the wafer.

Abstract: A method of forming an electrical connection from a first chip, having a contact pad exposed through an opening in cover glass on the chip, to a second chip having a first side and a second side and involves attaching the second chip to the first chip, etching an annular via having an inner and outer perimeter, the inner perimeter corresponding to an outer perimeter of the contact pad, the annular via extending into and through the second chip and down to the cover glass such that the annular via's inner perimeter substantially corresponds to the contact pad's outer perimeter, filling the annular via with an insulator, removing semiconductor material of the second chip within the inner perimeter of the insulator to create a void extending from the second side to the contact pad, and filling at least some of the void with a conductive material.

Abstract: A chip having at least one electrical contact having a first end proximate to the chip and a second end removed from the chip, the second end including a pattern configured to facilitate penetration of the at least one contact into a malleable contact on another chip, the pattern comprising a non-planar surface having a perimeter and a surface area, the surface area being larger than a planar surface of an identical perimeter.

Abstract: A method of creating a semiconductor chip having a substrate, a doped semiconductor material abutting the substrate and a device pad at an outer side of the doped semiconductor material involves creating a via through at least a portion of the substrate, the via having a periphery and a bottom at a location and depth sufficient to bring the via into proximity with the device pad but be physically spaced apart from the device pad, introducing an electrically conductive material into the via, and connecting the electrically conductive material to a signal source so the signal will deliberately be propagated from the electrically conductive material to the device pad without any direct electrical connection existing between the electrically conductive material and the device pad.

Abstract: A system for connecting a first chip to a second chip having a post on the first chip having a first metallic material, a recessed wall within the second chip and defining a well within the second chip, a conductive diffusion layer material on a surface of the recessed wall within the well, and a malleable electrically conductive material on the post, the post being dimensioned for insertion into the well such that the malleable electrically conductive material will deform within the well and, upon heating to at least a tack temperature for the malleable, electrically conductive material, will form an electrically conductive tack connection with the diffusion layer to create an electrically conductive path between the first chip and the second chip.

Abstract: A method of electrically joining a first contact on a first wafer with a second contact on a second wafer, the first contact, a rigid material, and the second contact, a material that is malleable relative to the rigid material, such that when brought together the rigid material will penetrate the malleable material, the rigid and malleable materials both being electrically conductive involves bringing the rigid material into contact with the malleable material, applying a force to one of the first contact or the second contact so as to cause the rigid material to penetrate the malleable material, heating the rigid and malleable material so as to cause the malleable material to soften, and constraining the malleable material to within a pre-specified area.

Abstract: A method of physically and electrically joining two chips to each other involves aligning an electrically conductive contact of a first chip with a corresponding electrically conductive contact on a second chip, the electrically conductive contact of the first chip being a rigid material and the electrically conductive contact of the second chip being a material that is malleable, bringing the aligned electrically conductive contact of the first chip into contact with the corresponding electrically conductive contact on the second chip, elevating the contact of the chips to a temperature that is below a liquidus temperature for both the rigid material and the material that is malleable while applying pressure to the chips so as to cause the rigid material to penetrate the malleable material and form an electrically conductive connection, and, following the forming of the electrically conductive connection, cooling the contacts to an ambient temperature.

Abstract: A chip contact functionally having an IC pad, a barrier layer over the IC pad, and a malleable material over the barrier layer. An alternative chip contact functionally having an IC pad, a barrier layer over the IC pad, and a rigid material over the barrier layer.

Abstract: A system has a first chip having first semiconductor devices and first electrical connections, a second chip having second semiconductor devices and second electrical connections, and a third chip having third semiconductor devices and third electrical connections, the third chip being stacked on top of and physically spanning at least a portion of each of the first and second chips and being connected to the first and second chips.