Abstract: A (poly)amine compound represented by the following formula (0): wherein RX is a 2nA-valent group having 1 to 70 carbon atoms or a single bond; each R1A is independently any of an alkyl group having 1 to 30 carbon atoms and optionally having a substituent, an aryl group having 6 to 30 carbon atoms and optionally having a substituent, a crosslinking group having 2 to 30 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, a halogen atom, a nitro group, an amino group having 0 to 30 carbon atoms and optionally having a substituent, a carboxyl group, a thiol group and a hydroxy group, wherein when R1A is any of the alkyl group, the aryl group, the crosslinking group and the alkoxy group, R1A optionally contains at least one bond selected from the group consisting of an ether bond, a ketone bond and an ester bond, and at least one R1A is an amino group having 0 to 30 carbon atoms and optionally having a substituent; X is an oxygen at

Abstract: The present invention provides a film forming material for lithography comprising a compound having a group of the following formula (0):

Abstract: A film forming material containing a triazine-based compound represented by the following formula (1): wherein R1, R2, and R3 each independently represent a hydrogen atom, a linear alkyl group having 1 to 30 carbon atoms and optionally having a substituent, a branched alkyl group having 1 to 30 carbon atoms and optionally having a substituent, a cycloalkyl group having 3 to 30 carbon atoms and optionally having a substituent, an aryl group having 6 to 30 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, an alkylaryl group having 7 to 30 carbon atoms and optionally having a substituent, an arylalkyl group having 7 to 30 carbon atoms and optionally having a substituent, a hydroxyl group, or a group in which a hydrogen atom of a hydroxyl group is replaced with an acid dissociation group or a crosslinkable reactive group, wherein the alkyl group, th

Abstract: The present invention provides a resist base material containing a compound having a specific structure and/or a resin derived from the compound as a monomer.

Abstract: A compound represented by the following formula (1).

Abstract: A resist composition comprising one or more tannin compounds selected from the group consisting of a tannin comprising at least one crosslinking reactive group in the structure and a derivative thereof, and a resin obtained using the tannin or the derivative as a monomer.

Abstract: A compound represented by the following formula (1): wherein R1 is a 2n-valent group having 1 to 60 carbon atoms; R2 to R5 are each independently a linear, branched, or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a group in which a hydrogen atom of a hydroxy group is replaced with a vinylphenylmethyl group, a group selected from the group consisting of groups represented by the following formula (A), a thiol group, or a hydroxy group, wherein at least one of the R2 to the R5 is a group selected from a group represented by the formula (A); m2 and m3 are each independently an integer of 0 to 8; m4 and m5 are each independently an integer of 0 to 9, provided that m2, m3, m4, and m5 are not 0 at the same time; n is an integer of 1 to 4; and p2 to p5 are each indepen

Abstract: A method for purifying a material, the method comprising: a step of preparing a solution comprising a solvent and at least one material selected from the group consisting of a compound represented by the following formula (1A) and a resin having a structure represented by the following formula (2A); and a step of purification in which the solution is passed through a filter: wherein, X represents an oxygen atom, a sulfur atom, a single bond, or non-crosslinked state; Ra represents a 2n-valent group having 1 to 40 carbon atoms or a single bond; each Rb independently represents one of various functional groups; each m is independently an integer of 0 to 9; n is an integer of 1 to 4; and each p is independently an integer of 0 to 2; provided that at least one Rb represents a group comprising one selected from a hydroxyl group and a thiol group, and all m cannot be 0 at the same time; wherein, X, Ra, Rb, n and p are the same as defined in the formula (1A); Rc represents a single bond or an

Abstract: The present invention provides a compound selected from the group consisting of compounds represented by the following formula (1): wherein each RS is independently a hydrogen atom, an alkyl group, which has 1 to 30 carbon atoms, and which optionally has a substituent, an aryl group, which has 6 to 30 carbon atoms, and which optionally has a substituent, an alkenyl group, which has 2 to 30 carbon atoms, and which optionally has a substituent, an alkoxy group, which has 1 to 30 carbon atoms, and which optionally has a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a thiol group or a hydroxy group, wherein the alkyl group, the aryl group, the alkenyl group, and the alkoxy group each optionally contain an ether bond, a ketone bond, or an ester bond; wherein at least one RS is a hydroxy group; and each RT is independently a hydrogen atom, an alkyl group, which has 1 to 30 carbon atoms, and which optionally has a substituent, an aryl group, which has 6 to 30 carbon atoms

Abstract: A compound represented by the following formula (1): wherein each X independently represents an oxygen atom or a sulfur atom, or non-crosslinking, R1 represents a single bond or a 2n-valent group having 1 to 30 carbon atoms, the group may have an alicyclic hydrocarbon group, a double bond, a hetero atom, or an aryl group having 6 to 30 carbon atoms, each R2 independently represents a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, an aryloxy group having 6 to 30 carbon atoms, or a hydroxyl group, in which at least one R2 represents an alkoxy group having 1 to 30 carbon atoms or an aryloxy group having 6 to 30 carbon atoms, each m is independently an integer of 1 to 6, each p is independently 0 or 1, and n is an integer of 1 to 4.

Abstract: The present invention provides an optical member forming composition comprising a compound represented by the following formula (0):

Abstract: The resist material according to the present invention contains a compound represented by the following formula (1): wherein each R0 is independently a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group, or a halogen atom; and each p is independently an integer of 0 to 4.

Abstract: The present invention provides a compound represented by the following formula (0): wherein RY is a hydrogen atom, an alkyl group, which has 1 to 30 carbon atoms or an aryl group, which has 6 to 30 carbon atoms; RZ is an N-valent group, which has 1 to 60 carbon atoms or a single bond; RT is a hydrogen atom; each RS is independently an alkyl group, which has 1 to 30 carbon atoms, and which optionally has a substituent, an aryl group, which has 6 to 30 carbon atoms, and which optionally has a substituent, an alkenyl group, which has 2 to 30 carbon atoms, and which optionally has a substituent, an alkoxy group, which has 1 to 30 carbon atoms, and which optionally has a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a thiol group or a hydroxy group, wherein the alkyl group, the aryl group, the alkenyl group, and the alkoxy group each optionally contain an ether bond, a ketone bond, or an ester bond; each m is independently an integer of 0 to 7; and N is an integer of

Abstract: The present invention provides a resist composition which is excellent in heat resistance, has high solubility in a safe solvent, has high sensitivity, and can impart a good shape to a resist pattern.

Abstract: A compound or a resin represented by the following formula (1).

Abstract: A material for forming an underlayer film for lithography, in which a compound represented by the following formula (0) is used.

Abstract: The composition for forming an underlayer film for lithography according to the present invention contains a compound represented by a specific formula (1) and 20 to 99% by mass of a solvent component (S), in which 27 to 100% by mass of the compound represented by the formula (1) is included in a component (A) other than the solvent component (S).

Abstract: The material for forming a film for lithography according to the present invention contains a compound represented by the following formula (1): wherein, each R0 independently represents a monovalent group having an oxygen atom, a monovalent group having a sulfur atom, a monovalent group having a nitrogen atom, a hydrocarbon group or a halogen atom, and each p is independently an integer of 0 to 4.

Abstract: The resist composition according to the present invention contains a compound represented by a specific formula. The compound has high heat resistance attributed to its highly aromatic skeleton, in spite of its low molecular weight, and may be used even under high temperature baking conditions. By virtue of the above configuration, the resist composition according to the present invention is excellent in heat resistance, has high solubility in a safe solvent, has high sensitivity, and can impart a good shape to a resist pattern. That is, the resist composition according to the present invention is useful as an acid amplification type non-polymer based resist material.

Abstract: The compound according to the present invention is represented by a specific formula. The compound according to the present invention has a structure according to the specific formula, and therefore can be applied to a wet process and is excellent in heat resistance and etching resistance. In addition, the compound according to the present invention has such a specific structure, and therefore has a high heat resistance, a relatively high carbon concentration, a relatively low oxygen concentration and also a high solvent solubility. Therefore, the compound according to the present invention can be used to form an underlayer film whose degradation is suppressed at high-temperature baking and which is also excellent in etching resistance to oxygen plasma etching or the like. Furthermore, the compound is also excellent in adhesiveness with a resist layer and therefore can form an excellent resist pattern.