Patents by Inventor Ming Ren

Ming Ren has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8222680
    Abstract: A double gate metal-oxide semiconductor field-effect transistor (MOSFET) includes a fin, a first gate and a second gate. The first gate is formed on top of the fin. The second gate surrounds the fin and the first gate. In another implementation, a triple gate MOSFET includes a fin, a first gate, a second gate, and a third gate. The first gate is formed on top of the fin. The second gate is formed adjacent the fin. The third gate is formed adjacent the fin and opposite the second gate.
    Type: Grant
    Filed: October 22, 2002
    Date of Patent: July 17, 2012
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Ming-Ren Lin, Judy Xilin An, Zoran Krivokapic, Cyrus E. Tabery, Haihong Wang, Bin Yu
  • Patent number: 8174388
    Abstract: A combination Electronic Article Surveillance/Radio Frequency Identification (“EAS/RFID”) tag and method and system for deactivating said combination EAS/RFID tags without the need to physically contact the tag with a deactivation device. The EAS/RFID tag replaces the conventional diode with a non-linear device such as a capacitor with a given breakdown voltage threshold. Inducing a predetermined voltage across the capacitor results in destruction of the capacitor rendering the EAS/RFID tag undetectable in the interrogation systems.
    Type: Grant
    Filed: May 21, 2009
    Date of Patent: May 8, 2012
    Assignee: Sensormatic Electronics, LLC
    Inventors: Ming-Ren Lian, Richard Loyd Copeland
  • Patent number: 8163078
    Abstract: An improved pigment spacing composition and method of manufacture. A coating composition wherein the pigment particles are spaced more uniformly resulting in improved coating properties. In another embodiment, the present invention relates to a composition having nanoparticles interacting with pigmentary titanium dioxide to provide for more uniform spacing of the titanium dioxide.
    Type: Grant
    Filed: May 11, 2010
    Date of Patent: April 24, 2012
    Assignee: Behr Process Corporation
    Inventors: Ming-Ren Tarng, Kim Chu, Mark Steffenhagen, Shaune Friedman
  • Patent number: 8133403
    Abstract: An acidic etcher solution for etching a substrate's surface. The acidic etcher solution includes an acid and a pH indicator, the pH indicator having at least one color transition at a pH below 7. The acidic etcher solution having an initial color at an initial pH when applied to the surface to allow determination of the evenness of the coating and the etcher having a second color at a second pH higher than the first pH wherein visual inspection allows for a determination that the etcher is substantially finished reacting.
    Type: Grant
    Filed: July 31, 2007
    Date of Patent: March 13, 2012
    Assignee: Behr Process Corporation
    Inventors: Jigui Li, Ming-Ren Tarng
  • Patent number: 8054185
    Abstract: A magnetic detacher has a core magnet and a ring magnet. The core magnet has a body with a top and bottom surface, and produces a first magnetic field. The ring magnet defines a cavity. The ring magnet has a body with a top and bottom and produces a second magnetic field. The ring magnet is axially aligned with the core magnet such that the first magnetic field opposes the second magnetic field along the bodies and enhances it within the cavity. The top surface of the core magnet is separated from the bottom surface of the ring magnet by a predetermined distance thereby producing a resultant magnetic field having a first resultant field strength at a specific position greater than a second resultant field strength produced at the same position when the top surface of the core magnet abuts the bottom surface of the ring magnet.
    Type: Grant
    Filed: April 7, 2009
    Date of Patent: November 8, 2011
    Assignee: Sensormatic Electronics, LLC
    Inventors: Ming-Ren Lian, Wing K. Ho, Ronald Joseph Davis, William Johnson, III
  • Publication number: 20110263094
    Abstract: A method of manufacturing a semiconductor device structure, such as a FinFET device structure, is provided. The method begins by providing a substrate comprising a bulk semiconductor material, a first conductive fin structure formed from the bulk semiconductor material, and a second conductive fin structure formed from the bulk semiconductor material. The first conductive fin structure and the second conductive fin structure are separated by a gap. Next, spacers are formed in the gap and adjacent to the first conductive fin structure and the second conductive fin structure. Thereafter, an etching step etches the bulk semiconductor material, using the spacers as an etch mask, to form an isolation trench in the bulk semiconductor material. A dielectric material is formed in the isolation trench, over the spacers, over the first conductive fin structure, and over the second conductive fin structure.
    Type: Application
    Filed: July 5, 2011
    Publication date: October 27, 2011
    Applicant: Advanced Micro Devices, Inc.
    Inventors: Ming-ren LIN, Zoran KRIVOKAPIC, Witek MASZARA
  • Publication number: 20110224349
    Abstract: The present invention provides increased stain resistance, tannin blocking, adhesion, and various other properties. A composition in accordance with the principles of the present invention comprises at least three binders, nanoparticle pigment, and pigmentary titanium dioxide. In one embodiment, the present invention relates to a coating on a substrate wherein the coating has three binders, nanoparticle metal oxide pigment, and pigmentary titanium dioxide. Various additives may be included to formulate paint as known in the art.
    Type: Application
    Filed: May 23, 2011
    Publication date: September 15, 2011
    Applicant: Behr Process Corporation
    Inventors: Ming-Ren Tarng, Mark Minamyer, Anh Pham, Stan Brownell, Annie Pham, Anil Alexander, Deven Shah, Kim L. Nguyen, My Linh Pham, Sidney Maxey
  • Patent number: 8013742
    Abstract: An Electronic Article Surveillance (“EAS”) tag and method and system for deactivating EAS tags without the need to physically contact the tag with a deactivation device. The EAS tag replaces the conventional diode with a non-linear device such as a metal-oxide-semiconductor (“MOS”) capacitor with a given breakdown voltage threshold. Inducing a predetermined voltage across the MOS capacitor results in destruction of the MOS capacitor rendering the EAS tag undetectable in the EAS interrogation system.
    Type: Grant
    Filed: December 10, 2008
    Date of Patent: September 6, 2011
    Assignee: Sensormatic Electronics, LLC
    Inventors: Ming-Ren Lian, Richard Loyd Copeland
  • Patent number: 8008136
    Abstract: A method may include forming a gate electrode over a fin structure, depositing a first metal layer on a top surface of the gate electrode, performing a first silicide process to convert a portion of the gate electrode into a metal-silicide compound, depositing a second metal layer on a top surface of the metal-silicide compound, and performing a second silicide process to form a fully-silicided gate electrode.
    Type: Grant
    Filed: April 20, 2006
    Date of Patent: August 30, 2011
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Ming-Ren Lin, Witold P. Maszara, Haihong Wang, Bin Yu
  • Patent number: 7994020
    Abstract: A method of manufacturing a semiconductor device structure, such as a FinFET device structure, is provided. The method begins by providing a substrate comprising a bulk semiconductor material, a first conductive fin structure formed from the bulk semiconductor material, and a second conductive fin structure formed from the bulk semiconductor material. The first conductive fin structure and the second conductive fin structure are separated by a gap. Next, spacers are formed in the gap and adjacent to the first conductive fin structure and the second conductive fin structure. Thereafter, an etching step etches the bulk semiconductor material, using the spacers as an etch mask, to form an isolation trench in the bulk semiconductor material. A dielectric material is formed in the isolation trench, over the spacers, over the first conductive fin structure, and over the second conductive fin structure.
    Type: Grant
    Filed: July 21, 2008
    Date of Patent: August 9, 2011
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Ming-ren Lin, Zoran Krivokapic, Witek Maszara
  • Patent number: 7947763
    Abstract: The present invention provides increased stain resistance, tannin blocking, adhesion, and various other properties. A composition in accordance with the principles of the present invention comprises at least three binders, nanoparticle pigment, and pigmentary titanium dioxide. In one embodiment, the present invention relates to a coating on a substrate wherein the coating has three binders, nanoparticle metal oxide pigment, and pigmentary titanium dioxide. Various additives may be included to formulate paint as known in the art.
    Type: Grant
    Filed: June 13, 2006
    Date of Patent: May 24, 2011
    Assignee: Behr Process Corporation
    Inventors: Ming-Ren Tarng, Mark Minamyer, Anh Pham, Stan Brownell, Annie Pham, Anil Alexander, Deven Shah, Kim L. Nguyen, My Linh Pham, Sidney Maxey
  • Publication number: 20110073515
    Abstract: A food container comprises a first container and a second container which has opposite shapes and can be stacked together. Two snap-fit portions are provided on the top edge of the second food container and a plurality of spoons are stacked over the second food container. Third containers with corresponding sizes are further stacked between the first container and the second container. In this manner, the containers and the spoons are stacked together to form minimal volume. Not only the storage space can be saved but also it is handy for carry-out use.
    Type: Application
    Filed: September 28, 2009
    Publication date: March 31, 2011
    Inventors: Chingi-Lin Tai, Ming-Ren Su
  • Patent number: 7915128
    Abstract: A transistor suitable for high-voltage applications and a method of manufacture is provided. A first device is formed by depositing a dielectric layer and a conductive layer over a substrate. A hard mask is deposited over the conductive layer and patterned using photolithography techniques. The photoresist material is removed prior to etching the underlying conductive layer and dielectric layer. The hard mask is also used as an implant mask. Another mask may be deposited and formed over the conductive layer to form other devices in other regions of the substrate. The other mask is preferably removed from over the hard mask prior to etching the conductive layer and the dielectric layer.
    Type: Grant
    Filed: February 29, 2008
    Date of Patent: March 29, 2011
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yu Wen Chen, Fu-Hsin Chen, Ming-Ren Tsai, William Wei-Yuan Tien
  • Patent number: 7888140
    Abstract: An integrated circuit package may include a substrate and an integrated circuit. The substrate may include at least one region, and a first magnetic material associated with the at least one region. The integrated circuit may have a second magnetic material associated therewith. The second magnetic material may be attracted to the first magnetic material to coupled the integrated circuit to the at least one region of the substrate. The IC package may be utilized in an RFID tag of an RFID system. An associated method for assembling an integrated circuit to a substrate is also provided.
    Type: Grant
    Filed: September 26, 2009
    Date of Patent: February 15, 2011
    Assignee: Sensormatic Electronics, LLC
    Inventors: Ming-Ren Lian, Gary Mark Shafer, George A. Reynolds
  • Patent number: 7871873
    Abstract: A method of manufacturing semiconductor fins for a semiconductor device may begin by providing a bulk semiconductor substrate. The method continues by growing a layer of first epitaxial semiconductor material on the bulk semiconductor substrate, and by growing a layer of second epitaxial semiconductor material on the layer of first epitaxial semiconductor material. The method then creates a fin pattern mask on the layer of second epitaxial semiconductor material. The fin pattern mask has features corresponding to a plurality of fins. Next, the method anisotropically etches the layer of second epitaxial semiconductor material, using the fin pattern mask as an etch mask, and using the layer of first epitaxial semiconductor material as an etch stop layer. This etching step results in a plurality of fins formed from the layer of second epitaxial semiconductor material.
    Type: Grant
    Filed: March 27, 2009
    Date of Patent: January 18, 2011
    Assignee: GLOBAL FOUNDRIES Inc.
    Inventors: Witold Maszara, Ming-Ren Lin, Jin Cho, Zoran Krivokapic
  • Publication number: 20100279056
    Abstract: The invention may include a novel composition for and/or processing of an active element for an EAS marker that achieves the same or better performance of existing materials while solving the problem of higher cost. It may include a magnetomechanical active element formed by planar strip of amorphous magnetostrictive alloy having a composition FeaNibMc wherein a+b+c=100, wherein a is in a range of 40-70 weight percent, b is in a range of 10-50 weight percent, and c is in a range of 10-50 weight percent, and where M is the balance of remaining elements; wherein the magnetomechanical active element is subject to batch annealing in the presence of a magnetic field that is substantially transverse to the ribbon length of the element and at a temperature of less than about 300° C. and for a time greater than at least about one hour.
    Type: Application
    Filed: June 7, 2007
    Publication date: November 4, 2010
    Applicant: Sensomatic Electronics Corporation
    Inventors: Ming-Ren Lian, Nen-Chin Liu, Chaitali China, Kevin R. Coffey
  • Publication number: 20100248454
    Abstract: A method of manufacturing semiconductor fins for a semiconductor device may begin by providing a bulk semiconductor substrate. The method continues by growing a layer of first epitaxial semiconductor material on the bulk semiconductor substrate, and by growing a layer of second epitaxial semiconductor material on the layer of first epitaxial semiconductor material. The method then creates a fin pattern mask on the layer of second epitaxial semiconductor material. The fin pattern mask has features corresponding to a plurality of fins. Next, the method anisotropically etches the layer of second epitaxial semiconductor material, using the fin pattern mask as an etch mask, and using the layer of first epitaxial semiconductor material as an etch stop layer. This etching step results in a plurality of fins formed from the layer of second epitaxial semiconductor material.
    Type: Application
    Filed: March 27, 2009
    Publication date: September 30, 2010
    Applicant: ADVANCED MICRO DEVICES, INC.
    Inventors: Witold MASZARA, Ming-Ren LIN, Jin CHO, Zoran KRIVOKAPIC
  • Patent number: 7791540
    Abstract: A near field antenna is disclosed which is configured to read an RFID label such that a localized electric E field emitted by the antenna at an operating wavelength resides substantially within a zone defined by the near field. The localized E field directs a current distribution along an effective length of the antenna corresponding to a half-wave to a full-wave structure.
    Type: Grant
    Filed: November 2, 2005
    Date of Patent: September 7, 2010
    Assignee: Sensormatic Electronics, LLC
    Inventors: Gary Mark Shafer, Karen Bellum Bomber, George A. Reynolds, Jr., John Ford, Ming-Ren Lian, Edward Di Carlo, Richard L. Copeland, Marcus Christopher
  • Publication number: 20100218702
    Abstract: An improved pigment spacing composition and method of manufacture. A coating composition wherein the pigment particles are spaced more uniformly resulting in improved coating properties. In another embodiment, the present invention relates to a composition having nanoparticles interacting with pigmentary titanium dioxide to provide for more uniform spacing of the titanium dioxide.
    Type: Application
    Filed: May 11, 2010
    Publication date: September 2, 2010
    Inventors: Ming-Ren Tarng, Kim Chu, Mark Steffenhagen, Shaune Friedman
  • Publication number: 20100148965
    Abstract: A method and system for increasing the read range of a security tag by supplying an additional antenna system to the tag in order to provide power to a radio frequency identification (“RFID”) chip without the need to rely solely on power from the RFID reader. The security tag includes an RFID chip and a first antenna circuit coupled to the RFID chip where the first antenna circuit is adapted to decode interrogation signals from an RFID reader. The security tag also includes a second antenna circuit coupled to the RFID chip. The second antenna circuit is adapted to induce power from signals received from at least an alternate power source, such as an EAS transmitter, so that the RFID chip can be powered up and activated during an RFID interrogation round.
    Type: Application
    Filed: December 16, 2008
    Publication date: June 17, 2010
    Applicant: SENSORMATIC ELECTRONICS CORPORATION
    Inventors: Mark ALEXIS, Ming-Ren LIAN, Gary Mark SHAFER