Patents by Inventor Satoshi Sakai

Satoshi Sakai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030190174
    Abstract: In the present invention, a toner image produced through a development process of supplying a liquid toner onto an image bearing body bearing an electrostatic latent image is transferred from the image bearing body onto an intermediate transfer body and then transferred from the intermediate transfer body onto a printing medium by use of a backup roller in a transfer-and-fixation zone. The printing medium is preheated to a temperature required for transfer and fixation before the printing medium reaches the transfer-and-fixation zone. No heating means is provided in the transfer-and-fixation zone, and the intermediate transfer body and the backup roller are pressed against each other at a high pressure ranging from 10 kg/cm2 to 60 kg/cm2.
    Type: Application
    Filed: February 19, 2003
    Publication date: October 9, 2003
    Inventors: Hironaga Hongawa, Satoshi Sakai, Eri Yamanashi, Isao Nagata, Shigeharu Okano, Yutaka Nakashima, Tadashi Nishikawa, Akihiko Inamoto, Satoshi Miyamoto
  • Publication number: 20030181005
    Abstract: Provided is a method of manufacturing a semiconductor device having an n-type FET and a p-type EFT each formed over a semiconductor substrate, which comprises (a) forming, over the n-type FET and p-type FET, a first insulating film for generating a tensile stress in the channel formation region of the n-type FET so as to cover gate electrodes of the FETs, while covering, with an insulating film, a semiconductor region between the gate electrode of the p-type FET and an element isolation region of the semiconductor substrate; (b) selectively removing the first insulating film from the upper surface of the p-type FET by etching; (c) forming, over the n-type and p-type FETs, a second insulating film for generating a compressive stress in the channel formation region of the p-type FET so as to cover the gate electrodes of the FETs; and (d) selectively removing the second insulating film from the upper surface of the n-type FET.
    Type: Application
    Filed: December 31, 2002
    Publication date: September 25, 2003
    Inventors: Kiyota Hachimine, Akihiro Shimizu, Nagatoshi Ooki, Satoshi Sakai, Naoki Yamamoto
  • Patent number: 6625415
    Abstract: A liquid-development full-color electrophotographic apparatus utilizes a development section having a liquid toner as a liquid developer to form a toner image according to an electric field established between the development section and a photosensitive drum. The toner image is transferred from the photosensitive drum onto an intermediate transfer roller according to an electric field established between the intermediate transfer roller and the photosensitive drum, from the intermediate transfer roller to an intermediate transfer belt, and then to a transfer-and-fixation section, which melt-transfers the toner image onto a printing medium. A voltage controlled according to electric characteristics of each color toner is applied to the corresponding photosensitive drums while the roller is grounded. A toner cohesion enhancement unit is provided for enhancing the degree of toner cohesion of a toner image transferred and reverse transfer is suppressed.
    Type: Grant
    Filed: January 18, 2002
    Date of Patent: September 23, 2003
    Assignee: Pfu Limited
    Inventors: Yutaka Nakashima, Akihiko Inamoto, Shigeki Uesugi, Satoru Moto, Motoharu Ichida, Masanari Takabatake, Shigeharu Okano, Seiichi Takeda, Tadashi Nishikawa, Satoshi Miyamoto, Hitoshi Terashima, Satoshi Sakai, Hironaga Hongawa, Masanobu Hongo, Jiyun Du
  • Patent number: 6596650
    Abstract: A method for fabricating a semiconductor integrated circuit device of the invention comprises feeding oxidation species containing a low concentration of water, which is generated from hydrogen and oxygen by the catalytic action, to the main surface of or in the vicinity of a semiconductor wafer, and forming a thin oxide film serving as a gate insulating film of an MOS transistor and having a thickness of 5 nm or below on the main surface of the semiconductor wafer at an oxide film-growing rate sufficient to ensure fidelity in formation of an oxide film and uniformity in thickness of the oxide film.
    Type: Grant
    Filed: August 28, 2001
    Date of Patent: July 22, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Yoshikazu Tanabe, Satoshi Sakai, Nobuyoshi Natsuaki
  • Patent number: 6582308
    Abstract: The present invention relates to an image processing device which allows character aspects to be changed continuously. The present device is capable of displaying a cursor point and a character in standard aspect on a screen, and by transforming and displaying character aspect in accordance with parameters for defining characters, moving the cursor point in line with movement commands from peripheral devices, and continuously changing the parameters which define the character in line with the movement of the cursor point, serves continuously to transform and display character aspect.
    Type: Grant
    Filed: March 23, 1998
    Date of Patent: June 24, 2003
    Assignee: Kabushiki Kaisha Sega Enterprises
    Inventors: Tatsuo Yamajiri, Satoshi Sakai, Manabu Kusunoki, Yukio Futatsugi, Kenichi Ikejiri
  • Patent number: 6569780
    Abstract: A method for fabricating a semiconductor integrated circuit device of the invention comprises feeding oxidation species containing a low concentration of water, which is generated from hydrogen and oxygen by the catalytic action, to the main surface of or in the vicinity of a semiconductor wafer, and forming a thin oxide film serving as a gate insulating film of an MOS transistor and having a thickness of 5 nm or below on the main surface of the semiconductor wafer at an oxide film-growing rate sufficient to ensure fidelity in formation of an oxide film and uniformity in thickness of the oxide film.
    Type: Grant
    Filed: August 28, 2001
    Date of Patent: May 27, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Yoshikazu Tanabe, Satoshi Sakai, Nobuyoshi Natsuaki
  • Patent number: 6571075
    Abstract: Provided are an applicator roller for conveying and applying liquid toner onto a developing roller in the form of a level, thin layer, and a conductive blade which comes into contact with a liquid toner layer on the developing roller. A predetermined amount of liquid toner passes through a gap between the conductive blade and the developer roller; and voltage is applied to the conductive blade so as to establish a state such that toner particles contained in the liquid toner are sparsely scattered in a surface region of a level, thin toner layer on the developing roller. Subsequently, the liquid toner, whose surface region is in a state such that toner particles are sparsely scattered, is brought into contact with an image bearer body for performing development.
    Type: Grant
    Filed: December 14, 2001
    Date of Patent: May 27, 2003
    Assignee: PFU Limited
    Inventors: Yutaka Nakashima, Akihiko Inamoto, Shigeki Uesugi, Satoru Moto, Masanari Takabatake, Motoharu Ichida, Shigeharu Okano, Seiichi Takeda, Tadashi Nishikawa, Satoshi Miyamoto, Hitoshi Terashima, Satoshi Sakai, Hironaga Hongawa, Masanobu Hongo, Hideaki Shibata, Yasuhiko Kishimoto, Tatsuo Nozaki
  • Publication number: 20030096501
    Abstract: The invention provides a method that forms a circuit to achieve a high-speed performance and a circuit to attain a high reliability on one and the same substrate, in a semiconductor integrated circuit device containing MIS transistors in which the gate insulating film is made of a high dielectric constant insulating film. The method removes the high dielectric constant insulating film on the diffusion regions of the MIS transistors in the logic region and I/O region, and forms the silicide layers of a low resistance on the surfaces of the diffusion regions. In the memory region, on the other hand, it does not form the silicide layers on the diffusion regions of the MIS transistors, and covers the diffusion regions with the high dielectric constant insulating film, thereby preventing damages to the semiconductor substrate during forming the spacers, silicide layers, and contact holes.
    Type: Application
    Filed: October 28, 2002
    Publication date: May 22, 2003
    Inventors: Fumio Ootsuka, Satoshi Yamamoto, Satoshi Sakai
  • Publication number: 20030092233
    Abstract: In a process of forming MISFETs mutually different in thickness of the gate insulating film on the same substrate, the formation of an undesirable natural oxide film at the interface between the semiconductor substrate and the gate insulating film is suppressed. A gate insulating film of MISFETs (Qn1 and Qp1) constituting an internal circuit is comprised of a silicon oxynitride film. Another gate insulating film of MISFETs (Qn2 and Qp2) constituting an I/O circuit is comprised of a laminated film of a silicon oxynitride film and a high dielectric film. A process of forming the two types of gate insulating films on the substrate is continuously carried out in a treatment apparatus of a multi-chamber system. Accordingly, the substrate will not be exposed to air. Therefore, it is possible to suppress the inclusion of undesirable foreign matters and the formation of a natural oxide film at the interface between the substrate and the gate insulating films.
    Type: Application
    Filed: November 6, 2002
    Publication date: May 15, 2003
    Inventors: Ryoichi Furukawa, Satoshi Sakai, Satoshi Yamamoto
  • Patent number: 6528431
    Abstract: A method for fabricating a semiconductor integrated circuit device of the invention comprises feeding oxidation species containing a low concentration of water, which is generated from hydrogen and oxygen by the catalytic action, to the main surface of or in the vicinity of a semiconductor wafer, and forming a thin oxide film serving as a gate insulating film of an MOS transistor and having a thickness of 5 nm or below on the main surface of the semiconductor wafer at an oxide film-growing rate sufficient to ensure fidelity in formation of an oxide film and uniformity in thickness of the oxide film.
    Type: Grant
    Filed: January 3, 2001
    Date of Patent: March 4, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Yoshikazu Tanabe, Satoshi Sakai, Nobuyoshi Natsuaki
  • Patent number: 6518202
    Abstract: A method for fabricating a semiconductor integrated circuit device of the invention comprises feeding oxidation species containing a low concentration of water, which is generated from hydrogen and oxygen by the catalytic action, to the main surface of or in the vicinity of a semiconductor wafer, and forming a thin oxide film serving as a gate insulating film of an MOS transistor and having a thickness of 5 nm or below on the main surface of the semiconductor wafer at an oxide film-growing rate sufficient to ensure fidelity in formation of an oxide film and uniformity in thickness of the oxide film.
    Type: Grant
    Filed: January 3, 2001
    Date of Patent: February 11, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Yoshikazu Tanabe, Satoshi Sakai, Nobuyoshi Natsuaki
  • Patent number: 6518201
    Abstract: A method for fabricating a semiconductor integrated circuit device of the invention comprises feeding oxidation species containing a low concentration of water, which is generated from hydrogen and oxygen by the catalytic action, to the main surface of or in the vicinity of a semiconductor wafer, and forming a thin oxide film serving as a gate insulating film of an MOS transistor and having a thickness of 5 nm or below on the main surface of the semiconductor wafer at an oxide film-growing rate sufficient to ensure fidelity in formation of an oxide film and uniformity in thickness of the oxide film.
    Type: Grant
    Filed: January 31, 2000
    Date of Patent: February 11, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Yoshikazu Tanabe, Satoshi Sakai, Nobuyoshi Natsuaki
  • Publication number: 20030003639
    Abstract: A protection film is formed on a silicon oxide film 6 formed on the surface of a semiconductor substrate, a silicon oxide film is removed from a region where a thin gate-insulating film is to be formed by using, as a mask, a photoresist pattern that covers a region where a thick gate-insulating film is to be formed, and, then, the photoresist pattern is removed followed by washing. Then, the semiconductor substrate is heat-oxidized or a film is deposited thereon to form gate-insulating films having different thicknesses.
    Type: Application
    Filed: August 5, 2002
    Publication date: January 2, 2003
    Inventors: Takayuki Kanda, Atsushi Hiraiwa, Norio Suzuki, Satoshi Sakai, Shuji Ikeda, Yasuko Yoshida, Shinichi Horibe
  • Publication number: 20030004815
    Abstract: The problem is to provide a business method and business operation/management apparatus intended to promote merchandise sales through an increase in the customer attraction and enhanced appeal of the gift-forwarding service by allowing the customer to exchange or deposit the value of (receive credit for) the received gift merchandise.
    Type: Application
    Filed: June 22, 2001
    Publication date: January 2, 2003
    Applicant: ORBIT TECHNOLOGY CORPORATION
    Inventors: Satoshi Sakai, Soji Ishida
  • Publication number: 20020159794
    Abstract: Provided are an applicator roller for conveying and applying liquid toner onto a developing roller in the form of a level, thin layer, and a conductive blade which comes into contact with a liquid toner layer on the developing roller. A predetermined amount of liquid toner passes through a gap between the conductive blade and the developer roller; and voltage is applied to the conductive blade so as to establish a state such that toner particles contained in the liquid toner are sparsely scattered in a surface region of a level, thin toner layer on the developing roller. Subsequently, the liquid toner, whose surface region is in a state such that toner particles are sparsely scattered, is brought into contact with an image bearer body for performing development.
    Type: Application
    Filed: December 14, 2001
    Publication date: October 31, 2002
    Inventors: Yutaka Nakashima, Akihiko Inamoto, Shigeki Uesugi, Satoru Moto, Masanari Takabatake, Motoharu Ichida, Shigeharu Okano, Seiichi Takeda, Tadashi Nishikawa, Satoshi Miyamoto, Hitoshi Terashima, Satoshi Sakai, Hironaga Hongawa, Masanobu Hongo, Hideaki Shibata, Yasuhiko Kishimoto, Tatsuo Nozaki
  • Publication number: 20020159801
    Abstract: A liquid-development electrophotographic apparatus using a liquid toner is disclosed. A nonvolatile, high-viscosity, high-concentration liquid toner is used as a liquid developer. A developing section is in contact with photosensitive drums 11-14, on which an electrostatic latent image is formed, so that the liquid developer is supplied onto photosensitive drums 11-14. Toner particles contained in the liquid developer are caused to adhere to the photosensitive drums 11-14 according to an electric field established between the developing section and the photosensitive drums 11-14 to thereby form toner images. An intermediate transfer section includes an intermediate transfer roller 15 and an intermediate transfer belt 16. The toner images are transferred from the photosensitive drums 11-14 to the intermediate transfer section according to an electric field established between the intermediate transfer section and the photosensitive drums 11-14.
    Type: Application
    Filed: December 12, 2001
    Publication date: October 31, 2002
    Inventors: Yutaka Nakashima, Akihiko Inamoto, Shigeki Uesugi, Satoru Moto, Masanari Takabatake, Motoharu Ichida, Shigeharu Okano, Seiichi Takeda, Tadashi Nishikawa, Satoshi Miyamoto, Hitoshi Terashima, Satoshi Sakai, Hironaga Hongawa, Masanobu Hongo, Jiyun Du
  • Patent number: 6466756
    Abstract: A toner image is transferred from a photosensitive member 10 onto an intermediate transfer belt 24. Toner particles transferred onto the intermediate transfer belt 24 are melted through application of heat, and the molten toner is transferred onto a printing medium. A carrier-removing roller 29 is disposed downstream of a position where a toner layer on the intermediate transfer belt 24 is melted through application of heat. Through utilization of a phenomenon that toner particles (resin component) are melted and integrated in a heating process and a phenomenon that the carrier solvent (liquid component) is isolated in the heating process, the carrier solvent is removed efficiently. Also, there is disposed at the position of the heating process a carrier-removing roller 28 for removing the carrier solvent from the intermediate transfer belt 24 while the toner layer on the intermediate transfer belt 24 is being melted through application of heat.
    Type: Grant
    Filed: May 7, 2001
    Date of Patent: October 15, 2002
    Assignee: PFU Limited
    Inventors: Yutaka Nakashima, Akihiko Inamoto, Shigeki Uesugi, Satoru Moto, Motoharu Ichida, Masanari Takabatake, Shigeharu Okano, Seiichi Takeda, Hironaga Hongawa, Hitoshi Terashima, Satoshi Sakai, Satoshi Miyamoto
  • Publication number: 20020106220
    Abstract: A development section uses a liquid toner as a liquid developer and forms a toner image according to an electric field established between the development section and a photosensitive drum. The toner image is transferred from the photosensitive drum onto an intermediate transfer roller 15 according to an electric field established between the same and the photosensitive drum. The toner image is further transferred from the intermediate transfer roller to an intermediate transfer belt 16 and then transferred to a transfer-and-fixation section, which melt-transfers the toner image onto a printing medium. Photosensitive drums 11-14 are provided so as to correspond to a plurality of colors. Toner images formed on the corresponding photosensitive drums are sequentially transferred and superposed on the intermediate transfer roller.
    Type: Application
    Filed: January 18, 2002
    Publication date: August 8, 2002
    Inventors: Yutaka Nakashima, Akihiko Inamoto, Shigeki Uesugi, Satoru Moto, Motoharu Ichida, Masanari Takabatake, Shigeharu Okano, Seiichi Takeda, Tadashi Nishikawa, Satoshi Miyamoto, Hitoshi Terashima, Satoshi Sakai, Hironaga Hongawa, Masanobu Hongo, Jiyun Du
  • Patent number: 6417114
    Abstract: A method for fabricating a semiconductor integrated circuit device of the invention comprises feeding oxidation species containing a low concentration of water, which is generated from hydrogen and oxygen by the catalytic action, to the main surface of or in the vicinity of a semiconductor wafer, and forming a thin oxide film serving as a gate insulating film of an MOS transistor and having a thickness of 5 nm or below on the main surface of the semiconductor wafer at an oxide film-growing rate sufficient to ensure fidelity in formation of an oxide film and uniformity in thickness of the oxide film.
    Type: Grant
    Filed: January 3, 2001
    Date of Patent: July 9, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Yoshikazu Tanabe, Satoshi Sakai, Nobuyoshi Natsuaki
  • Patent number: 6411862
    Abstract: An apparatus and method is provided for managing and distributing design and manufacturing information throughout a factory in order to facilitate the production of components, such as bent sheet metal components. In accordance with an aspect of the present invention, the management and distribution of critical design and manufacturing information is achieved by storing and distributing the design and manufacturing information associated with each job. By replacing the traditional paper job set-up or work sheet with, for example, an electronically stored job sheet that can be accessed instantaneously from any location in the factory, the present invention improves the overall efficiency of the factory. In addition, through the various aspects and features of the invention, the organization and accessibility of part information and stored expert knowledge is improved.
    Type: Grant
    Filed: March 18, 1999
    Date of Patent: June 25, 2002
    Assignee: Amada Company, Ltd.
    Inventors: Kensuke Hazama, Kalev Kask, Satoshi Sakai, Anand Subbaraman