Abstract: A resistive memory cell is disclosed. The resistive memory cell comprises a pair of electrodes and a multi-layer resistance-switching network disposed between the pair of electrodes. The multi-layer resistance-switching network comprises a pair of carbon doping layers and a group-IV element doping layer disposed between the pair of carbon doping layers. Each carbon doping layer comprises silicon oxide doped with carbon. The group-IV doping layer comprises silicon oxide doped with a group-IV element. A method of fabricating a resistive memory cell is also disclosed. The method comprises forming a first carbon doping layer on a first electrode using sputtering, forming a group-IV element doping layer on the first carbon doping layer using sputtering, forming a second carbon doping layer on the group-IV element doping layer using sputtering, and forming a second electrode on the second carbon doping layer using sputtering.

Abstract: A resistive memory cell is disclosed. The resistive memory cell comprises a pair of electrodes and a resistance-switching network disposed between the pair of electrodes. The resistance-switching network comprises a group-IV element doping layer and a porous low-k layer. The group-IV doping layer comprises silicon oxide doped with a group-IV element. The porous low-k layer comprises porous silicon oxide or porous hafnium oxide. The group-IV element may comprise zirconium, titanium, or hafnium. The porous low-k layer may be prepared by inductively coupled plasma (ICP) treatment. A method of fabricating a resistive memory is disclosed. The method comprises forming a resistance-switching network on a first electrode using sputtering and forming a second electrode on the resistance-switching network using sputtering. The resistance-switching network comprises a group-IV element doping layer and a porous low-k layer.

Abstract: A resistive memory cell is disclosed. The resistive memory cell comprises a pair of electrodes and a multi-layer resistance-switching network disposed between the pair of electrodes. The multi-layer resistance-switching network comprises a pair of carbon doping layers and a group-IV element doping layer disposed between the pair of carbon doping layers. Each carbon doping layer comprises silicon oxide doped with carbon. The group-IV doping layer comprises silicon oxide doped with a group-IV element. A method of fabricating a resistive memory cell is also disclosed. The method comprises forming a first carbon doping layer on a first electrode using sputtering, forming a group-IV element doping layer on the first carbon doping layer using sputtering, forming a second carbon doping layer on the group-IV element doping layer using sputtering, and forming a second electrode on the second carbon doping layer using sputtering.

Abstract: A resistive random access memory (RRAM), a controlling method for the RRAM, and a manufacturing method therefor are provided. The RRAM includes a first electrode layer; a resistance switching layer disposed on the first electrode layer; a diffusion metal layer disposed on the resistance switching layer; and a second electrode layer disposed on the diffusion metal layer, wherein at least one extension electrode is disposed in the resistance switching layer.

Abstract: A clinical specimen detector includes a clip having a clamping end and a pressing end; and wherein a pair of compressing slices are disposed on the clamping end, and a channel is disposed in the lower end of at least one of the pair of compressing slices. A detecting reagent test chip is attached to the outer surface of the compressing slice. The lower end of the detecting reagent test chip is substantially aligned with and is adjacent to the channel. The lower ends of the compressing slices clamp an adsorptive material adsorbed with body fluid such that the body fluid can be released from the adsorptive material because of the compression of the compressing slices and can be delivered to the lower end of the detecting reagent test chip via the channel, so as to perform disease testing and physiological condition testing with the detecting reagent test chip.

Abstract: The present invention discloses a clinical specimen sampler, including a filtering device; and a sampling device. The sampling device includes a sampling adsorber and a rod. The sampling adsorber is connected with one end of the rod, and the sampling adsorber is encompassed in the filtering device. The sampling adsorber is utilized to absorb the body fluid secreted by the intima of an organ, and the filtering device is employed to prevent the mucosal tissue of the intima of the organ from entering the sampling adsorber and enable the body fluid secreted by the intima of the organ to enter the sampling adsorber, so as to be absorbed by the sampling adsorber.

Abstract: A method for performing a programming operation to a first memory bit and a second memory bit of a device is described. The method includes applying a pulse train voltage to a metal gate of the device and grounding a substrate of the device. By floating/grounding a drain of the device and/or by floating/grounding the source of the device, the first memory and the second memory bit are programmed. The pulse train voltage includes 10 to 1000 pulses. One pulse includes a peak voltage and a base voltage. The peak voltage ranges from 0.5 V to 10 V. A duration of the peak voltage ranges from 1 nanosecond to 1 millisecond. The base voltage is 0 V. A duration of the base voltage ranges from 1 nanosecond to 1 millisecond.

Abstract: A thin-film transistor (TFT) device comprises a gate, a source, a drain, an insulation layer and an active area. The insulation layer electrically separates the gate from the source and the drain. The active area including a plurality of contacting areas contacting the source and the drain, respectively, and generates a channel including a channel width and a channel length. The active area includes a semiconductor material and has a plurality of active-area edges. In the direction parallel to the channel width, a distance between at least a contacting-area edge of the contacting areas and the active-area edge of the active area that is near to the contacting-area edge is larger than 2.5 ?m and less than or equal to 16 ?m. A TFT display apparatus is also disclosed.

Abstract: A resistive random access memory (RRAM), a controlling method for the RRAM, and a manufacturing method therefor are provided. The RRAM includes a first electrode layer; a resistance switching layer disposed on the first electrode layer; a diffusion metal layer disposed on the resistance switching layer; and a second electrode layer disposed on the diffusion metal layer, wherein at least one extension electrode is disposed in the resistance switching layer.

Abstract: A method for performing a programming operation to a first memory bit and a second memory bit of a device is described. The method includes applying a pulse train voltage to a metal gate of the device and grounding a substrate of the device. By floating/grounding a drain of the device and/or by floating/grounding the source of the device, the first memory and the second memory bit are programmed. The pulse train voltage includes 10 to 1000 pulses. One pulse includes a peak voltage and a base voltage. The peak voltage ranges from 0.5 V to 10 V. A duration of the peak voltage ranges from 1 nanosecond to 1 millisecond. The base voltage is 0 V. A duration of the base voltage ranges from 1 nanosecond to 1 millisecond.

Abstract: A resistance random access memory element includes a first electrode, an insulating layer, a diffusing metal layer, and a second electrode superimposed in sequence. The insulating layer includes a plurality of pointed electrodes. A method for making a resistance random access memory element includes growing and forming an insulating layer on a surface of a first electrode. A diffusing metal layer is formed on a surface of the insulating layer. A second electrode is mounted on a surface of the diffusing metal layer. A negative pole and a positive pole of a driving voltage are connected with the first and second electrodes, respectively. The diffusing metal in the diffusing metal layer is oxidized into metal ions by the driving voltage. The metal ions are driven into the insulating layer and form a plurality of pointed electrodes after reduction.

Abstract: Methods and apparatuses for a resistive random access memory (RRAM) device are disclosed. The RRAM device comprises a bottom electrode, a resistive switching layer disposed on the bottom electrode, and a top electrode disposed on the resistive switching layer. The resistive switching layer is made of a composite of a metal, Si, and O. There may be an additional tunnel barrier layer between the top electrode and the bottom electrode. The top electrode and the bottom electrode may comprise multiple sub-layers.

Abstract: A transistor operating method is applicable to a transistor including a first gate, a first gate insulating layer, a semiconductor layer, a source, a drain, a second gate insulating layer and a second gate. The transistor operating method includes: grounding the first gate and the source, applying a negative bias to the second gate and applying a positive bias to the drain, so that the transistor acts as an optical detector; alternatively, grounding the source, grounding or floating the second gate, applying a bias to the first gate and applying a positive bias to the drain, so that the transistor acts as a pixel switch.

Abstract: There is a method for enabling a SONOS transistor to be used as both a switch and a memory. FN tunneling is carried out through the source or drain of the transistor, so as to further change the state of electrons stored in an upper charge storage layer adjacent to the drain or source, and the variation in gate-induced drain leakage is used to recognize the memory state of the drain and source. A stable threshold voltage of the transistor is always maintained during this operation. The present invention enables one single transistor having dual features of switch and memory, while being provided with a two-bit memory effect, thus providing a higher memory density in comparison with a general transistor.

Abstract: A dual-gate transistor includes a first gate formed on a substrate, a first dielectric layer covering the first gate and the substrate, a semiconductor layer formed on the first dielectric layer, first and second electrodes formed on the semiconductor layer and spaced with an interval in order to separate each other, a second dielectric layer covering the first and second electrodes, and a second gate formed on the second dielectric layer, in which at least one of the first and second gates is non-overlapped with the second electrode.

Abstract: A type of resistance random access memory structure having the function of diode rectification includes a first electrode, a second electrode and a resistance conversion layer. The resistance conversion layer is disposed between the first electrode and the second electrode; and it includes a first oxidized insulating layer which is adjacently connected to the first electrode; a second oxidized insulating layer which is adjacently connected to the second electrode; as well as an energy barrier turning layer disposing between the first oxidized insulating layer and the second oxidized insulating layer. An energy barrier high can be adjusted and controlled to change the resistance by voltage between the energy barrier turning layer and the first oxidized insulating layer. A fixed energy barrier is formed between the second oxidized insulating layer and the energy barrier turning layer, so that the resistance random access memory element features the function of diode rectification.

Abstract: One embodiment of the present invention provides an operation method of a memory device. The memory device includes a source, a drain, and a channel region between the source and the drain, a gate dielectric with a charge storage layer on the channel region, and a gate on the gate dielectric, wherein the source, the drain and the channel region are located in a substrate. The operation method includes the following steps: applying a reverse bias between the gate and the drain of the memory device to generate band-to-band hot holes in the substrate near the drain; injecting the band-to-band hot holes to a drain side of the charge storage layer; and performing a program/erase operation upon the memory device. The band-to-band hot holes in the drain side of the charge storage layer are not completely vanished by the program/erase operation.

Abstract: A method for operating a memory device is provided. In accordance with the method, the charges are stored in a source storage region, a drain storage region, and a channel storage region of a charge storage layer which respectively correspond to a source, a drain, and a channel of a SONOS transistor, thereby achieving 3-bit information storage in one cell. The channel storage region is programmed and erased by FN tunneling. Both of the source storage region and the drain storage region are programmed by channel hot electrons and erased by source-side or drain-side FN tunneling. The present invention can store three-bit data per cell, such that the storage density of the memory device can be substantially increased.

Abstract: A resistance random access memory element includes a first electrode, an insulating layer, a diffusing metal layer, and a second electrode superimposed in sequence. The insulating layer includes a plurality of pointed electrodes. A method for making a resistance random access memory element includes growing and forming an insulating layer on a surface of a first electrode. A diffusing metal layer is formed on a surface of the insulating layer. A second electrode is mounted on a surface of the diffusing metal layer. A negative pole and a positive pole of a driving voltage are connected with the first and second electrodes, respectively. The diffusing metal in the diffusing metal layer is oxidized into metal ions by the driving voltage. The metal ions are driven into the insulating layer and form a plurality of pointed electrodes after reduction.

Abstract: A pixel circuit includes a first transistor coupled to a supply voltage end, a second transistor coupled to a ground end, a storage capacitor, a third transistor coupled to a data end, a fourth transistor, a fifth transistor coupled to the second transistor and the second end of the storage capacitor, and a light-emitting element coupled to the fourth transistor. The first transistor is used for conducting a supply voltage from the supply voltage end in response to a trigger of an enable signal. The second transistor is used for conducting a ground voltage from the ground end when a scan signal voltage is triggered. The storage capacitor includes a first end and a second end coupled to the first transistor and the second transistor, respectively. The third transistor is used for conducting a data signal voltage when the scan signal voltage is triggered. The fourth transistor is used for generating a conducting current based on the data signal voltage when the scan signal voltage is not triggered.