Patents by Inventor Wen Chan

Wen Chan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11864381
    Abstract: In a method of manufacturing a semiconductor device, the semiconductor device includes a non-volatile memory formed in a memory cell area and a ring structure area surrounding the memory cell area. In the method, a protrusion of a substrate is formed in the ring structure area. The protrusion protrudes from an isolation insulating layer. A high-k dielectric film is formed, thereby covering the protrusion and the isolation insulating layer. A poly silicon film is formed over the high-k dielectric film. The poly silicon film and the high-k dielectric film are patterned. Insulating layers are formed over the patterned poly silicon film and high-k dielectric film, thereby sealing the patterned high-k dielectric film.
    Type: Grant
    Filed: January 3, 2022
    Date of Patent: January 2, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Meng-Han Lin, Chih-Ren Hsieh, Ching-Wen Chan
  • Patent number: 11854823
    Abstract: An integrated circuit device includes a substrate, a first isolation feature, a memory cell, and a semiconductor device. The substrate has a cell region, a peripheral region, and a transition region between the cell region and the peripheral region. The first isolation feature is in the transition region. The substrate includes a protrusion portion between a first portion and a second portion of the first isolation feature, the second portion is between the first portion and the cell region, and a top surface of the first portion of the first isolation feature has a first part and a second part lower than the first part, and the second part is between the first part and the second portion of the first isolation feature. The memory cell is over the cell region of the substrate. The semiconductor device is over the peripheral region of the substrate.
    Type: Grant
    Filed: January 12, 2022
    Date of Patent: December 26, 2023
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Meng-Han Lin, Chih-Ren Hsieh, Chih-Pin Huang, Ching-Wen Chan
  • Publication number: 20230398436
    Abstract: A mouse and a gaming system are respectively provided. The gaming system includes a mouse and an intermediate application program. The mouse includes an operation module, a solid-state disk (SSD), and a processing module. The processing module is connected to an electronic device. When the electronic device runs a game, the processing module records an operation signal generated by an operation of a user in the SSD. The processing module can store settings made by the user to the game and to the mouse in the SSD. When the game is ended in the electronic device, the processing module stores a game result information in the SSD. When the electronic device runs the same game and the same mouse is used to play the same game, the user can read the settings in the SSD to quickly perform the same settings on the game and the mouse.
    Type: Application
    Filed: December 20, 2022
    Publication date: December 14, 2023
    Inventors: Luca Di Fiore, SHAO-WEN HSU, SHUN-WEN CHAN
  • Publication number: 20220139718
    Abstract: An integrated circuit device includes a substrate, a first isolation feature, a memory cell, and a semiconductor device. The substrate has a cell region, a peripheral region, and a transition region between the cell region and the peripheral region. The first isolation feature is in the transition region. The substrate includes a protrusion portion between a first portion and a second portion of the first isolation feature, the second portion is between the first portion and the cell region, and a top surface of the first portion of the first isolation feature has a first part and a second part lower than the first part, and the second part is between the first part and the second portion of the first isolation feature. The memory cell is over the cell region of the substrate. The semiconductor device is over the peripheral region of the substrate.
    Type: Application
    Filed: January 12, 2022
    Publication date: May 5, 2022
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Meng-Han LIN, Chih-Ren HSIEH, Chih-Pin HUANG, Ching-Wen CHAN
  • Publication number: 20220123002
    Abstract: In a method of manufacturing a semiconductor device, the semiconductor device includes a non-volatile memory formed in a memory cell area and a ring structure area surrounding the memory cell area. In the method, a protrusion of a substrate is formed in the ring structure area. The protrusion protrudes from an isolation insulating layer. A high-k dielectric film is formed, thereby covering the protrusion and the isolation insulating layer. A poly silicon film is formed over the high-k dielectric film. The poly silicon film and the high-k dielectric film are patterned. Insulating layers are formed over the patterned poly silicon film and high-k dielectric film, thereby sealing the patterned high-k dielectric film.
    Type: Application
    Filed: January 3, 2022
    Publication date: April 21, 2022
    Inventors: Meng-Han LIN, Chih-Ren HSIEH, Ching-Wen CHAN
  • Patent number: 11239089
    Abstract: A method for manufacturing a semiconductor device is provided. The method includes forming a first isolation feature in a peripheral region of a substrate; recessing the cell region of the substrate after forming the first isolation feature; forming a second isolation feature in a cell region of the substrate after recessing the cell region of the substrate; forming a plurality of control gates over the cell region of the substrate; and forming a gate stack over the peripheral region of the substrate.
    Type: Grant
    Filed: December 16, 2019
    Date of Patent: February 1, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Meng-Han Lin, Chih-Ren Hsieh, Chih-Pin Huang, Ching-Wen Chan
  • Patent number: 11217597
    Abstract: In a method of manufacturing a semiconductor device, the semiconductor device includes a non-volatile memory formed in a memory cell area and a ring structure area surrounding the memory cell area. In the method, a protrusion of a substrate is formed in the ring structure area. The protrusion protrudes from an isolation insulating layer. A high-k dielectric film is formed, thereby covering the protrusion and the isolation insulating layer. A poly silicon film is formed over the high-k dielectric film. The poly silicon film and the high-k dielectric film are patterned. Insulating layers are formed over the patterned poly silicon film and high-k dielectric film, thereby sealing the patterned high-k dielectric film.
    Type: Grant
    Filed: September 27, 2019
    Date of Patent: January 4, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Meng-Han Lin, Chih-Ren Hsieh, Ching-Wen Chan
  • Publication number: 20210183659
    Abstract: A method for manufacturing a semiconductor device is provided. The method includes forming a first isolation feature in a peripheral region of a substrate; recessing the cell region of the substrate after forming the first isolation feature; forming a second isolation feature in a cell region of the substrate after recessing the cell region of the substrate; forming a plurality of control gates over the cell region of the substrate; and forming a gate stack over the peripheral region of the substrate.
    Type: Application
    Filed: December 16, 2019
    Publication date: June 17, 2021
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Meng-Han LIN, Chih-Ren HSIEH, Chih-Pin HUANG, Ching-Wen CHAN
  • Publication number: 20210137773
    Abstract: A massage device is disclosed that is made by converting an existing breast pump using a massage adapter ring that allows for the easy conversion to and from a massage device to breast pump.
    Type: Application
    Filed: December 28, 2018
    Publication date: May 13, 2021
    Applicant: FITSON SINGAPORE PTE. LTD.
    Inventor: Yi Wen CHAN
  • Patent number: 10879251
    Abstract: An integrated circuit includes a substrate, a first isolation feature, and a plurality of memory cells. The substrate has a cell region, a peripheral region, and a transition region between the cell region and the peripheral region. A top surface of the cell region is lower than a top surface of the peripheral region, and the substrate includes at least one protrusion portion in the transition region. The first isolation feature is in the transition region and covers the protrusion portion of the substrate. The memory cells are over the cell region of the substrate.
    Type: Grant
    Filed: February 26, 2018
    Date of Patent: December 29, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Meng-Han Lin, Chin-Wen Chan, Chih-Ren Hsieh
  • Publication number: 20200302130
    Abstract: A card reader device which consumes almost no power until a user's access card is presented includes a power source module, a wireless tag reader, a switch module, and a sensor. The switch module can electrically connect and disconnect to the power source module and the wireless tag reader. The sensor can detect a change in a magnetic field caused by proximity of the access card. When the card reader device is not in use, the switch module is turned off, and the power source module does not provide power to the wireless tag reader. When the change in the magnetic field is detected by the sensor, a signal from the sensor turns on the switch module, and the power source module provides power to the wireless tag reader. A related access system employing the card reader device is also disclosed.
    Type: Application
    Filed: December 20, 2019
    Publication date: September 24, 2020
    Inventors: PENG CHANG, WEI-WEN CHAN
  • Patent number: 10770469
    Abstract: In a method of manufacturing a semiconductor device, the semiconductor device includes a non-volatile memory formed in a memory cell area and a ring structure area surrounding the memory cell area. In the method, a protrusion of a substrate is formed in the ring structure area. The protrusion protrudes from an isolation insulating layer. A high-k dielectric film is formed, thereby covering the protrusion and the isolation insulating layer. A poly silicon film is formed over the high-k dielectric film. The poly silicon film and the high-k dielectric film are patterned. Insulating layers are formed over the patterned poly silicon film and high-k dielectric film, thereby sealing the patterned high-k dielectric film.
    Type: Grant
    Filed: September 7, 2017
    Date of Patent: September 8, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Meng-Han Lin, Chih-Ren Hsieh, Chin Wen Chan
  • Patent number: 10564366
    Abstract: A plug device for plugging in at least two optical modules is provided, wherein the plug device is disposed in a housing and includes a first circuit board, a first connecting module, and a movable module. The first connecting module includes a plurality of electrical connectors, and the movable module includes a plate, at least one frame, and at least one joining member. The electrical connectors are disposed on the first circuit board. The frame is connected to the plate and has a plurality of accommodating portions. The optical modules can be respectively accommodated in the accommodating portions. The plate can be affixed to or separated from the housing by the joining member.
    Type: Grant
    Filed: May 31, 2018
    Date of Patent: February 18, 2020
    Assignee: Delta Electronics, Inc.
    Inventors: I-Wen Chan, Shu-Hong Chu
  • Publication number: 20200027890
    Abstract: In a method of manufacturing a semiconductor device, the semiconductor device includes a non-volatile memory formed in a memory cell area and a ring structure area surrounding the memory cell area. In the method, a protrusion of a substrate is formed in the ring structure area. The protrusion protrudes from an isolation insulating layer. A high-k dielectric film is formed, thereby covering the protrusion and the isolation insulating layer. A poly silicon film is formed over the high-k dielectric film. The poly silicon film and the high-k dielectric film are patterned. Insulating layers are formed over the patterned poly silicon film and high-k dielectric film, thereby sealing the patterned high-k dielectric film.
    Type: Application
    Filed: September 27, 2019
    Publication date: January 23, 2020
    Inventors: Meng-Han LIN, Chih-Ren HSIEH, Chin Wen CHAN
  • Publication number: 20190243075
    Abstract: A plug device for plugging in at least two optical modules is provided, wherein the plug device is disposed in a housing and includes a first circuit board, a first connecting module, and a movable module. The first connecting module includes a plurality of electrical connectors, and the movable module includes a plate, at least one frame, and at least one joining member. The electrical connectors are disposed on the first circuit board. The frame is connected to the plate and has a plurality of accommodating portions. The optical modules can be respectively accommodated in the accommodating portions. The plate can be affixed to or separated from the housing by the joining member.
    Type: Application
    Filed: May 31, 2018
    Publication date: August 8, 2019
    Inventors: I-Wen CHAN, Shu-Hong CHU
  • Patent number: 10351427
    Abstract: A method for manufacturing high purity sulfuric acid is provided. A mixed solution subsequently undergoes a first preheating step, a second preheating step, a distilling step and an evaporating step to remove peroxide, water, oxygen and insoluble impurities, so as to obtain the first gas containing sulfur trioxide, sulfuric acid and hydrogen oxide. And then, the sulfur trioxide is absorbed by a sulfuric acid solution, thereby forming the high purity sulfuric acid.
    Type: Grant
    Filed: February 12, 2018
    Date of Patent: July 16, 2019
    Assignee: ASIA UNION ELECTRONIC CHEMICAL CORP.
    Inventors: Curtis Douglas Dove, Goang-Cheng Chang, Yuen-Ming Kung, Hung-Wen Chan, Wei-Hsuan Hsu
  • Patent number: 10123106
    Abstract: A multifunctional headphone cable includes: a connecting line, two ends thereof respectively having an audio connection portion configured with a noise receiving microphone; a controller, configured on the connecting line and including a control circuit, the control circuit being configured with an active noise cancelling (ANC) module in connection with the noise receiving microphone, the control circuit being configured with a hearing amplifier adapted to amplify audio signals, memory module, wireless communication module and wireless charging module; and a power supply unit, configured on the connecting line and in connection with the control circuit.
    Type: Grant
    Filed: January 10, 2017
    Date of Patent: November 6, 2018
    Assignee: CONSONANCE TECHNOLOGY CORPORATION
    Inventors: Yung-Yi Chiu, Kang-Chou Liu, Jin-Wen Chan
  • Publication number: 20180315765
    Abstract: An integrated circuit includes a substrate, a first isolation feature, and a plurality of memory cells. The substrate has a cell region, a peripheral region, and a transition region between the cell region and the peripheral region. A top surface of the cell region is lower than a top surface of the peripheral region, and the substrate includes at least one protrusion portion in the transition region. The first isolation feature is in the transition region and covers the protrusion portion of the substrate. The memory cells are over the cell region of the substrate.
    Type: Application
    Filed: February 26, 2018
    Publication date: November 1, 2018
    Inventors: Meng-Han LIN, Chin-Wen CHAN, Chih-Ren HSIEH
  • Patent number: D919614
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: May 18, 2021
    Assignee: ADATA TECHNOLOGY CO., LTD.
    Inventors: Chih-Chun Huang, Shun-Wen Chan
  • Patent number: D939497
    Type: Grant
    Filed: July 19, 2019
    Date of Patent: December 28, 2021
    Assignee: ADATA TECHNOLOGY CO., LTD.
    Inventors: Chih-Chun Huang, Shun-Wen Chan