Abstract: Conventional intra-prediction uses pixels from left and upper neighbour blocks to predict a macroblock (MB). Thus, the MBs must be sequentially processed, since reconstructed left and upper MBs must be available for prediction. In an improved method for encoding Intra predicted MBs, a MB is encoded in two steps: first, a first portion of the MB is encoded independently, without references outside the MB. Pixels of the first portion can be Intra predicted using DC mode. Then, the first portion is reconstructed. The remaining pixels of the MB, being a second portion, are intra predicted from the reconstructed pixels of the first portion and then reconstructed. The first portion comprises at least one column or one row of pixels of the MB. The encoding is applied to at least two Intra predicted MBs per slice, or per picture if no slices are used.

Abstract: A semiconductor structure and a method of forming the same are provided. In an embodiment, an exemplary semiconductor structure includes a gate structure disposed over a channel region of an active region, a drain feature disposed over a drain region of the active region; a source feature disposed over a source region of the active region, a backside source contact disposed under the source feature, an isolation feature disposed on and in contact with the source feature, a drain contact disposed over and electrically coupled to the drain feature, and a gate contact via disposed over and electrically coupled to the gate structure. A distance between the gate contact via and the drain contact is greater than a distance between the gate contact via and the isolation feature. The exemplary semiconductor structure would have a reduced parasitic capacitance and an enlarged leakage window.

Abstract: A card riser for an information handling system includes a bottom surface, multiple connector slots in physical communication with the bottom surface, and a locking mechanism in physical communication with the bottom surface. Each connector slot is configured to receive a corresponding connector of a different one of multiple cards. When the locking mechanism is in an unlocked position, a different one of the cards is inserted within a different one of the connector slots. When the locking mechanism is in a locked position, the locking mechanism is placed in physical communication with each of the cards to securely hold the cards within the card riser.

Abstract: A micro-light-emitting diode (microLED) display panel includes a plurality of microLEDs arranged in rows and columns. Anodes of microLEDs in a same row are connected to a corresponding data line, and cathodes of pixels in a same column are connected to a corresponding group of common lines, each of which is connected to cathodes of microLEDs of different colors.

Abstract: A flow stabilized chip includes a chip mainbody, a buffering chamber and two fluid delivery ports. The chip mainbody has a pipe-connection surface. The buffering chamber is disposed in the chip mainbody. The two fluid delivery ports are disposed on the pipe connection surface and connected to the buffering chamber. The chip mainbody includes, in order from the pipe-connection surface to a bottom of the chip mainbody, a first base plate, a first elastic membrane, a second base plate, a second elastic membrane and a third base plate. The first base plate includes a first opening. The second base plate includes a second opening. The third base plate includes a third opening. The first elastic membrane, the second base plate and the second elastic membrane are stacked in sequence to form the buffering chamber.

Abstract: A method of semiconductor fabrication includes providing a semiconductor structure having a substrate and first, second, third, and fourth fins above the substrate. The method further includes forming an n-type epitaxial source/drain (S/D) feature on the first and second fins, forming a p-type epitaxial S/D feature on the third and fourth fins, and performing a selective etch process on the semiconductor structure to remove upper portions of the n-type epitaxial S/D feature and the p-type epitaxial S/D feature such that more is removed from the n-type epitaxial S/D feature than the p-type epitaxial S/D feature.

Abstract: A FinFET device structure is provided. The FinFET device structure includes a fin structure formed over a substrate, and a first inter-layer dielectric (ILD) layer formed over the fin structure. The FinFET device structure includes a gate structure formed in the first ILD layer, and a first S/D contact structure formed in the first ILD layer and adjacent to the gate structure. The FinFET device structure also includes a first air gap formed on a sidewall of the first S/D contact structure, and the first air gap is in direct contact with the first ILD layer.

Abstract: The present disclosure provides semiconductor devices and methods of forming the same. A semiconductor device according to one embodiment of the present disclosure includes a first fin-shaped structure extending lengthwise along a first direction over a substrate, a first epitaxial feature over a source/drain region of the first fin-shaped structure, a gate structure disposed over a channel region of the first fin-shaped structure and extending along a second direction perpendicular to the first direction, and a source/drain contact over the first epitaxial feature. The bottom surface of the gate structure is closer to the substrate than a bottom surface of the source/drain contact.

Abstract: A construction method of ribosomal RNA database is provided, including the following steps: selecting a source of nucleic acid sequence database; performing normalization and homogenization on species classification rules; using AI technology for normalized classification and correction; selecting the kingdom to which the sequence species belongs; filtering out redundant sequences and sequences with inconsistent lengths; setting a threshold for unknown bases other than A, T, C or G, and excluding unknown bases that exceed the threshold; and excluding sequences with insufficient classification information.

Abstract: A cell layout design for an integrated circuit. In one embodiment, the integrated circuit includes a dual-gate cell forming two transistors connected with each other via a common source/drain terminal. The dual-gate cell includes an active region, two gate lines extending across the active region, at least one first gate via disposed on one or both of the two gate lines and overlapped with the active region, and second gate vias disposed on one or both of the two gate lines and located outside the active region.

Abstract: A semiconductor structure includes a substrate, nanostructures over the substrate, and a gate structure wrapping around the nanostructures. The gate structure includes a gate dielectric layer and a gate electrode wrapping around the gate dielectric layer. The semiconductor structure further includes a source/drain feature in contact with the nanostructures, a contact etch stop layer over the source/drain feature, and a seal layer over the air spacer and the gate structure, and on a sidewall of the contact etch stop layer. The contact etch stop layer is separated from the gate structure by an air spacer.

Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a source/drain region formed in a semiconductor substrate, a source/drain contact structure formed over the source/drain region, and a gate electrode layer formed adjacent to the source/drain contact structure. The semiconductor device structure also includes a first spacer and a second spacer laterally and successively arranged from the sidewall of the gate electrode layer to the sidewall of the source/drain contact structure. The semiconductor device structure further includes a silicide region formed in the source/drain region. The top width of the silicide region is greater than the bottom width of the source/drain contact structure and less than the top width of the source/drain region.

Abstract: A semiconductor structure and a method of forming the same are provided. In an embodiment, an exemplary method of forming the semiconductor structure includes forming a fin structure extending from a front side of a substrate, recessing a source region of the fin structure to form a source opening, forming a semiconductor plug under the source opening, planarizing the substrate to expose the semiconductor plug from a back side of the substrate, performing a pre-amorphous implantation (PAI) process to amorphize the substrate, replacing the amorphized substrate with a dielectric layer, and replacing the semiconductor plug with a backside source contact. By performing the PAI process, crystalline semiconductor is amorphized and may be substantially removed. Thus, the performance and reliability of the semiconductor structure may be advantageously improved.

Abstract: The present disclosure is directed to a semiconductor structure that includes a semiconductor substrate. A first interconnect layer is disposed over the semiconductor substrate. The first interconnect layer includes a first dielectric material having a conductive body embedded therein. The conductive body includes a first sidewall, a second sidewall, and a bottom surface. A spacer element has a sidewall which contacts the first sidewall of the conductive body and which contacts the bottom surface of the conductive body. A second interconnect layer overlies the first interconnect layer and includes a second dielectric material with at least one via therein. The at least one via is filled with a conductive material which is electrically coupled to the conductive body of the first interconnect layer.

Abstract: A semiconductor device and a method of forming the same are provided. In an embodiment, an exemplary semiconductor device includes two stacks of channel members; a source/drain feature extending between the two stacks of channel members along a direction; a source/drain contact disposed under and electrically coupled to the source/drain feature; two gate structures over and interleaved with the two stacks of channel members; a low-k spacer horizontally surrounding the source/drain contact; and a dielectric layer horizontally surrounding the low-k spacer.

Abstract: A dustproof magazine to be mounted in a nail gun including a muzzle unit includes a magazine body, a nail-pressing member, and a scroll spring connected therebetween. The magazine body includes spaced-apart first and second rail walls extending transverse to the muzzle unit, and disposed respectively distal from and adjacent to the muzzle unit. The nail-pressing member is mounted movably along and between the first and second rail walls, and includes a main body and a scraper set extending therefrom. Movement of the nail-pressing member away from the muzzle unit drives the scroll spring to resiliently convert from a winding state into an unwinding state, where a strip portion of the scroll spring unwinds and extends along the second rail wall. The scraper set is in contact with the strip portion during the movement of the nail-pressing member for scrapping foreign matters off the strip portion.

Abstract: A dustproof device for use in an electric nail gun includes a dustproof plate and two fastening members. The electric nail gun includes a muzzle unit used for discharging nails and a machine body unit connected to the muzzle unit and operable to strike the nails. The dustproof plate has a mounting surface facing the machine body unit, an exterior surface that is opposite to the mounting surface and prevents foreign matters from entering the machine body unit, and a through hole that extends through the mounting surface and the exterior surface, that permits the muzzle unit to extend fittingly therethrough, and that is complementary in shape with a contour of a cross section of the muzzle unit. The two fastening members extend from the mounting surface and are detachably connected to the machine body unit to secure the dustproof plate between the machine body unit and the muzzle unit.

Abstract: A semiconductor package and a method of manufacturing the same are provided. The semiconductor package includes a semiconductor die, an encapsulant and a redistribution structure. The encapsulant laterally encapsulates the semiconductor die. The redistribution structure is disposed on the encapsulant and electrically connected with the semiconductor die, wherein the redistribution structure comprises a first conductive via, a first conductive wiring layer and a second conductive via stacked along a stacking direction, the first conductive via has a first terminal surface contacting the first conductive wiring layer, the second conductive via has a second terminal surface contacting the first conductive wiring layer, an area of a first cross section of the first conductive via is greater than an area of the first terminal surface of the first conductive via, and an area of a second cross section of the second conductive via is greater than an area of the second terminal surface of the second conductive via.

Abstract: A semiconductor device includes a substrate, first and second fins protruding from the substrate, and first and second source/drain (S/D) features over the first and second fins respectively. The semiconductor device further includes an isolation feature over the substrate and disposed between the first and second S/D features, and a dielectric layer disposed on sidewalls of the first and second S/D features and on sidewalls of the isolation feature. A top portion of the isolation feature extends above the dielectric layer.

Abstract: An electric nail gun includes a cylinder unit, a nail-striking unit and a valve unit. The cylinder unit includes a striking cylinder that surrounds a first axis and that defines a cylinder chamber, and a cylinder lid that cooperates with the striking cylinder to define a gas storing chamber communicating with the cylinder chamber. The cylinder lid includes a passage that communicates with the gas storing chamber, and that extends along a second axis. The nail-striking unit includes a piston assembly that is adapted for striking a nail. The valve unit includes a valve assembly that is accommodated in the passage. The valve assembly is operable to convert between a first state, in which the gas is allowed to flow between the gas storing chamber and an external environment through the passage, and a second state, in which the gas is refrained from flowing through the passage.